JP2019079030A5 - - Google Patents

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Publication number
JP2019079030A5
JP2019079030A5 JP2018146251A JP2018146251A JP2019079030A5 JP 2019079030 A5 JP2019079030 A5 JP 2019079030A5 JP 2018146251 A JP2018146251 A JP 2018146251A JP 2018146251 A JP2018146251 A JP 2018146251A JP 2019079030 A5 JP2019079030 A5 JP 2019079030A5
Authority
JP
Japan
Prior art keywords
light
substrate
shielding member
exposure apparatus
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018146251A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019079030A (ja
Filing date
Publication date
Application filed filed Critical
Priority to PCT/JP2018/038416 priority Critical patent/WO2019082726A1/ja
Priority to KR1020207013921A priority patent/KR102433510B1/ko
Priority to CN201880069270.4A priority patent/CN111356955A/zh
Publication of JP2019079030A publication Critical patent/JP2019079030A/ja
Priority to US16/853,431 priority patent/US10921717B2/en
Publication of JP2019079030A5 publication Critical patent/JP2019079030A5/ja
Pending legal-status Critical Current

Links

JP2018146251A 2017-10-24 2018-08-02 露光装置および物品の製造方法 Pending JP2019079030A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
PCT/JP2018/038416 WO2019082726A1 (ja) 2017-10-24 2018-10-16 露光装置および物品の製造方法
KR1020207013921A KR102433510B1 (ko) 2017-10-24 2018-10-16 노광장치 및 물품의 제조방법
CN201880069270.4A CN111356955A (zh) 2017-10-24 2018-10-16 曝光装置和物品制造方法
US16/853,431 US10921717B2 (en) 2017-10-24 2020-04-20 Exposure apparatus and article manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017205644 2017-10-24
JP2017205644 2017-10-24

Publications (2)

Publication Number Publication Date
JP2019079030A JP2019079030A (ja) 2019-05-23
JP2019079030A5 true JP2019079030A5 (enExample) 2021-09-02

Family

ID=66626547

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018146251A Pending JP2019079030A (ja) 2017-10-24 2018-08-02 露光装置および物品の製造方法

Country Status (4)

Country Link
US (1) US10921717B2 (enExample)
JP (1) JP2019079030A (enExample)
KR (1) KR102433510B1 (enExample)
CN (1) CN111356955A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112394619A (zh) * 2019-08-13 2021-02-23 苏州源卓光电科技有限公司 一种直写光刻机的曝光系统
US12189137B2 (en) * 2022-02-23 2025-01-07 The Boeing Company System and method for super-resolution imaging

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5117254A (en) * 1988-05-13 1992-05-26 Canon Kabushiki Kaisha Projection exposure apparatus
US5117255A (en) * 1990-09-19 1992-05-26 Nikon Corporation Projection exposure apparatus
JPH104053A (ja) * 1996-06-13 1998-01-06 Canon Inc 面位置検出装置及びそれを用いたデバイスの製造方法
US5969820A (en) 1996-06-13 1999-10-19 Canon Kabushiki Kaisha Surface position detecting system and exposure apparatus using the same
JP4279053B2 (ja) 2002-06-07 2009-06-17 富士フイルム株式会社 露光ヘッド及び露光装置
JP4312535B2 (ja) * 2003-08-06 2009-08-12 シャープ株式会社 パターン露光装置
JP2006060152A (ja) * 2004-08-24 2006-03-02 Nikon Corp 光学特性測定装置、ステージ装置及び露光装置
JP2007286243A (ja) * 2006-04-14 2007-11-01 Sumitomo Heavy Ind Ltd 露光装置
EP2048543B1 (en) * 2007-10-09 2013-12-04 ASML Netherlands B.V. An optical focus sensor, an inspection apparatus and a lithographic apparatus
JP2009272387A (ja) * 2008-05-01 2009-11-19 Canon Inc 走査露光装置及びデバイス製造方法。
JP5280305B2 (ja) 2009-06-16 2013-09-04 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
KR20120116329A (ko) * 2010-02-20 2012-10-22 가부시키가이샤 니콘 광원 최적화 방법, 노광 방법, 디바이스 제조 방법, 프로그램, 노광 장치, 리소그래피 시스템, 광원 평가 방법 및 광원 변조 방법
NL2006254A (en) 2010-02-23 2011-08-24 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5837693B2 (ja) * 2011-08-18 2015-12-24 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
JP6261207B2 (ja) * 2013-07-02 2018-01-17 キヤノン株式会社 露光装置、露光方法、それらを用いたデバイスの製造方法

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