JP2019068044A5 - - Google Patents
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- Publication number
- JP2019068044A5 JP2019068044A5 JP2018136555A JP2018136555A JP2019068044A5 JP 2019068044 A5 JP2019068044 A5 JP 2019068044A5 JP 2018136555 A JP2018136555 A JP 2018136555A JP 2018136555 A JP2018136555 A JP 2018136555A JP 2019068044 A5 JP2019068044 A5 JP 2019068044A5
- Authority
- JP
- Japan
- Prior art keywords
- bonding layer
- structure according
- aperture
- layer structure
- penetrating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023150739A JP7682966B2 (ja) | 2017-10-03 | 2023-09-19 | Ｕｍベース構成 |
| JP2025080901A JP2025122029A (ja) | 2017-10-03 | 2025-05-14 | Ｕｍベース構成 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/724,045 | 2017-10-03 | ||
| US15/724,045 US10688750B2 (en) | 2017-10-03 | 2017-10-03 | Bonding structure of E chuck to aluminum base configuration |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023150739A Division JP7682966B2 (ja) | 2017-10-03 | 2023-09-19 | Ｕｍベース構成 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019068044A JP2019068044A (ja) | 2019-04-25 |
| JP2019068044A5 true JP2019068044A5 (https=) | 2021-08-12 |
| JP7353024B2 JP7353024B2 (ja) | 2023-09-29 |
Family
ID=65896401
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018136555A Active JP7353024B2 (ja) | 2017-10-03 | 2018-07-20 | Ｕｍベース構成 |
| JP2023150739A Active JP7682966B2 (ja) | 2017-10-03 | 2023-09-19 | Ｕｍベース構成 |
| JP2025080901A Pending JP2025122029A (ja) | 2017-10-03 | 2025-05-14 | Ｕｍベース構成 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023150739A Active JP7682966B2 (ja) | 2017-10-03 | 2023-09-19 | Ｕｍベース構成 |
| JP2025080901A Pending JP2025122029A (ja) | 2017-10-03 | 2025-05-14 | Ｕｍベース構成 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US10688750B2 (https=) |
| JP (3) | JP7353024B2 (https=) |
| KR (2) | KR102669140B1 (https=) |
| CN (4) | CN209461436U (https=) |
| TW (2) | TWI786194B (https=) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10688750B2 (en) | 2017-10-03 | 2020-06-23 | Applied Materials, Inc. | Bonding structure of E chuck to aluminum base configuration |
| US10847402B2 (en) | 2018-04-02 | 2020-11-24 | Applied Materials, Inc. | Bond protection around porous plugs |
| US11456161B2 (en) | 2018-06-04 | 2022-09-27 | Applied Materials, Inc. | Substrate support pedestal |
| JP7387764B2 (ja) * | 2019-05-24 | 2023-11-28 | アプライド マテリアルズ インコーポレイテッド | 結合層の保護が改善された基板支持キャリア |
| JP7291046B2 (ja) * | 2019-09-18 | 2023-06-14 | 新光電気工業株式会社 | 基板固定装置 |
| JP7319158B2 (ja) * | 2019-09-30 | 2023-08-01 | 日本特殊陶業株式会社 | 保持装置 |
| CN112687602B (zh) * | 2019-10-18 | 2024-11-08 | 中微半导体设备(上海)股份有限公司 | 一种静电吸盘及其制造方法、等离子体处理装置 |
| CN112908919B (zh) * | 2019-12-04 | 2024-07-09 | 中微半导体设备(上海)股份有限公司 | 静电吸盘装置及包括该静电吸盘装置的等离子体处理装置 |
| JP7458195B2 (ja) * | 2020-02-10 | 2024-03-29 | 東京エレクトロン株式会社 | 載置台、プラズマ処理装置及びクリーニング処理方法 |
| KR102779855B1 (ko) | 2021-02-17 | 2025-03-10 | 어플라이드 머티어리얼스, 인코포레이티드 | 다공성 플러그 본딩 |
| JP7255659B1 (ja) * | 2021-11-25 | 2023-04-11 | 住友大阪セメント株式会社 | 静電チャック装置 |
| US11794296B2 (en) | 2022-02-03 | 2023-10-24 | Applied Materials, Inc. | Electrostatic chuck with porous plug |
| JP7645838B2 (ja) | 2022-03-31 | 2025-03-14 | 日本碍子株式会社 | ウエハ載置台 |
| US12340980B2 (en) | 2022-04-01 | 2025-06-24 | Applied Materials, Inc. | Plasma showerhead with improved uniformity |
| WO2024129283A1 (en) * | 2022-12-16 | 2024-06-20 | Lam Research Corporation | Electrostatic chuck with halogen modulated silicone dike |
| CN120513512A (zh) * | 2023-01-26 | 2025-08-19 | 日本碍子株式会社 | 晶片载放台 |
| US20250037978A1 (en) * | 2023-07-24 | 2025-01-30 | Applied Materials, Inc. | Gas distribution assemblies for semiconductor devices |
| WO2025038231A1 (en) * | 2023-08-16 | 2025-02-20 | Lam Research Corporation | Electrostatic chuck with ceramic coating adhesion |
Family Cites Families (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6490144B1 (en) | 1999-11-29 | 2002-12-03 | Applied Materials, Inc. | Support for supporting a substrate in a process chamber |
| US7411331B2 (en) * | 2002-05-10 | 2008-08-12 | Massachusetts Institute Of Technology | Dielectric elastomer actuated systems and methods |
| US7789736B2 (en) * | 2006-10-13 | 2010-09-07 | Applied Materials, Inc. | Stepped retaining ring |
| KR101553423B1 (ko) | 2007-12-19 | 2015-09-15 | 램 리써치 코포레이션 | 반도체 진공 프로세싱 장치용 필름 점착제 |
| US9520314B2 (en) | 2008-12-19 | 2016-12-13 | Applied Materials, Inc. | High temperature electrostatic chuck bonding adhesive |
| US20100326602A1 (en) * | 2009-06-30 | 2010-12-30 | Intevac, Inc. | Electrostatic chuck |
| JP5604888B2 (ja) * | 2009-12-21 | 2014-10-15 | 住友大阪セメント株式会社 | 静電チャックの製造方法 |
| JP5558178B2 (ja) * | 2010-04-07 | 2014-07-23 | オリンパス株式会社 | 蛍光観察装置 |
| JP5143184B2 (ja) | 2010-05-07 | 2013-02-13 | 日本碍子株式会社 | ウエハー載置装置の製造方法 |
| KR20110138788A (ko) * | 2010-06-22 | 2011-12-28 | 하나 마이크론(주) | 적층형 반도체 패키지 |
| TWI540672B (zh) | 2011-09-28 | 2016-07-01 | 住友大阪水泥股份有限公司 | 靜電吸持裝置 |
| WO2013049586A1 (en) * | 2011-09-30 | 2013-04-04 | Applied Materials, Inc. | Electrostatic chuck |
| KR101196441B1 (ko) * | 2011-12-20 | 2012-11-01 | 이준호 | 정전 척의 리페어 방법 |
| KR101902349B1 (ko) * | 2012-02-08 | 2018-09-28 | 스미토모 오사카 세멘토 가부시키가이샤 | 정전 척 장치 |
| KR20130104738A (ko) * | 2012-03-15 | 2013-09-25 | 코리아세미텍 주식회사 | 정전척 및 그 제조방법 |
| JP6005579B2 (ja) * | 2012-04-27 | 2016-10-12 | 日本碍子株式会社 | 半導体製造装置用部材 |
| US9685356B2 (en) | 2012-12-11 | 2017-06-20 | Applied Materials, Inc. | Substrate support assembly having metal bonded protective layer |
| JP6140457B2 (ja) | 2013-01-21 | 2017-05-31 | 東京エレクトロン株式会社 | 接着方法、載置台及び基板処理装置 |
| JP6110159B2 (ja) | 2013-02-22 | 2017-04-05 | 日本特殊陶業株式会社 | 複合部材及びその製造方法 |
| JP6162428B2 (ja) * | 2013-02-27 | 2017-07-12 | 日本特殊陶業株式会社 | 支持装置 |
| JP5633766B2 (ja) | 2013-03-29 | 2014-12-03 | Toto株式会社 | 静電チャック |
| KR101385950B1 (ko) * | 2013-09-16 | 2014-04-16 | 주식회사 펨빅스 | 정전척 및 정전척 제조 방법 |
| JP6181572B2 (ja) * | 2014-02-13 | 2017-08-16 | 日本特殊陶業株式会社 | 静電チャック用の接着シート及びその製造方法 |
| JP5811513B2 (ja) * | 2014-03-27 | 2015-11-11 | Toto株式会社 | 静電チャック |
| CN204102876U (zh) * | 2014-10-16 | 2015-01-14 | 中芯国际集成电路制造(北京)有限公司 | 一种晶片承载装置 |
| JP6658509B2 (ja) | 2015-02-18 | 2020-03-04 | 住友大阪セメント株式会社 | 静電チャック装置及び半導体製造装置 |
| JP6728196B2 (ja) | 2015-03-20 | 2020-07-22 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 高温ポリマー接合によって金属ベースに接合されたセラミックス静電チャック |
| JP6008063B1 (ja) * | 2015-03-24 | 2016-10-19 | 住友大阪セメント株式会社 | 静電チャック装置 |
| US9608550B2 (en) | 2015-05-29 | 2017-03-28 | Lam Research Corporation | Lightup prevention using multi-layer ceramic fabrication techniques |
| US11227749B2 (en) | 2016-02-18 | 2022-01-18 | Lam Research Corporation | 3D printed plasma arrestor for an electrostatic chuck |
| US10249526B2 (en) | 2016-03-04 | 2019-04-02 | Applied Materials, Inc. | Substrate support assembly for high temperature processes |
| JP6604239B2 (ja) * | 2016-03-08 | 2019-11-13 | 住友大阪セメント株式会社 | 静電チャック装置 |
| JP6688715B2 (ja) | 2016-09-29 | 2020-04-28 | 東京エレクトロン株式会社 | 載置台及びプラズマ処理装置 |
| US10688750B2 (en) | 2017-10-03 | 2020-06-23 | Applied Materials, Inc. | Bonding structure of E chuck to aluminum base configuration |
| JP6994981B2 (ja) | 2018-02-26 | 2022-01-14 | 東京エレクトロン株式会社 | プラズマ処理装置及び載置台の製造方法 |
-
2017
- 2017-10-03 US US15/724,045 patent/US10688750B2/en active Active
-
2018
- 2018-07-20 JP JP2018136555A patent/JP7353024B2/ja active Active
- 2018-09-28 CN CN201821592086.1U patent/CN209461436U/zh active Active
- 2018-09-28 CN CN202510891131.1A patent/CN120727644A/zh active Pending
- 2018-09-28 CN CN201811139451.8A patent/CN109599356B/zh active Active
- 2018-09-28 CN CN201921479845.8U patent/CN211700228U/zh active Active
- 2018-10-01 TW TW107134588A patent/TWI786194B/zh active
- 2018-10-01 TW TW111143111A patent/TWI806799B/zh active
- 2018-10-02 KR KR1020180117680A patent/KR102669140B1/ko active Active
-
2020
- 2020-05-18 US US16/876,326 patent/US11192323B2/en active Active
-
2021
- 2021-11-11 US US17/523,973 patent/US11794441B2/en active Active
-
2023
- 2023-09-19 JP JP2023150739A patent/JP7682966B2/ja active Active
-
2024
- 2024-05-20 KR KR1020240065235A patent/KR102918494B1/ko active Active
-
2025
- 2025-05-14 JP JP2025080901A patent/JP2025122029A/ja active Pending
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