JP2018538382A5 - - Google Patents

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Publication number
JP2018538382A5
JP2018538382A5 JP2018519469A JP2018519469A JP2018538382A5 JP 2018538382 A5 JP2018538382 A5 JP 2018538382A5 JP 2018519469 A JP2018519469 A JP 2018519469A JP 2018519469 A JP2018519469 A JP 2018519469A JP 2018538382 A5 JP2018538382 A5 JP 2018538382A5
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JP
Japan
Prior art keywords
layer
alkyl
coating
copolymer
grafted
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JP2018519469A
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English (en)
Japanese (ja)
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JP2018538382A (ja
JP6788668B2 (ja
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Priority claimed from US14/885,328 external-priority patent/US9574104B1/en
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JP2018519469A 2015-10-16 2016-10-13 ブロックコポリマーの自己組織化のための組成物及び方法 Active JP6788668B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/885,328 US9574104B1 (en) 2015-10-16 2015-10-16 Compositions and processes for self-assembly of block copolymers
US14/885,328 2015-10-16
PCT/EP2016/074614 WO2017064199A1 (en) 2015-10-16 2016-10-13 Compositions and processes for self-assembly of block copolymers

Publications (3)

Publication Number Publication Date
JP2018538382A JP2018538382A (ja) 2018-12-27
JP2018538382A5 true JP2018538382A5 (OSRAM) 2019-09-26
JP6788668B2 JP6788668B2 (ja) 2020-11-25

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Application Number Title Priority Date Filing Date
JP2018519469A Active JP6788668B2 (ja) 2015-10-16 2016-10-13 ブロックコポリマーの自己組織化のための組成物及び方法

Country Status (7)

Country Link
US (1) US9574104B1 (OSRAM)
EP (1) EP3362404B1 (OSRAM)
JP (1) JP6788668B2 (OSRAM)
KR (1) KR102398438B1 (OSRAM)
CN (1) CN108137313B (OSRAM)
TW (1) TWI599582B (OSRAM)
WO (1) WO2017064199A1 (OSRAM)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016223046A (ja) * 2015-06-04 2016-12-28 東京応化工業株式会社 表面にパターンを有する繊維の製造方法
KR102402958B1 (ko) * 2015-11-11 2022-05-27 삼성전자주식회사 반도체 장치의 패턴 형성 방법 및 반도체 장치의 제조 방법
JP6955176B2 (ja) * 2016-07-06 2021-10-27 Jsr株式会社 膜形成用組成物、膜形成方法及び自己組織化リソグラフィープロセス
EP3500637B1 (en) 2016-08-18 2022-06-22 Merck Patent GmbH Polymer compositions for self-assembly applications
US10691019B2 (en) * 2016-10-07 2020-06-23 Jsr Corporation Pattern-forming method and composition
TWI755344B (zh) 2016-12-21 2022-02-11 德商馬克專利公司 用於嵌段共聚物之自組裝之新穎組合物及方法
US10734239B2 (en) * 2017-03-01 2020-08-04 Brewer Science, Inc. High-chi block copolymers with tunable glass transition temperatures for directed self-assembly
US10961383B2 (en) 2018-02-01 2021-03-30 Brewer Science, Inc. Gradient block copolymers for directed self-assembly
JP7081377B2 (ja) * 2018-08-01 2022-06-07 Jsr株式会社 組成物及び基板表面の修飾方法
CN113490696B (zh) * 2018-12-07 2022-12-23 默克专利股份有限公司 用于聚苯乙烯-b-聚(甲基丙烯酸甲酯)二嵌段共聚物的接触孔自组装的快速可交联中性底层及其配制剂
EP3772370A1 (en) * 2019-08-05 2021-02-10 Helmholtz-Zentrum Geesthacht Zentrum für Material- und Küstenforschung GmbH Method of producing a polymeric membrane
JP7646684B2 (ja) * 2020-08-17 2025-03-17 Jsr株式会社 下層膜形成用組成物、下層膜、及び、リソグラフィープロセス
EP4341310B1 (en) * 2021-05-18 2025-06-25 Merck Patent GmbH Hydrophobic crosslinkable pinning underlayers with improved dry etch capabilities for patterning directed self-assembly of ps-b-pmma type block copolymers
EP4441110A1 (en) 2021-12-02 2024-10-09 Merck Patent GmbH Neutral layer and hydrophobic pinning mat materials for use in dsa with improved substrate compatibility
CN115826359A (zh) * 2022-11-22 2023-03-21 西南科技大学 用于光刻图案化的全碳氢低介电损耗光敏树脂的制备及应用
WO2024170492A1 (en) 2023-02-14 2024-08-22 Merck Patent Gmbh Block copolymer formulation for the improvement of self-assembled morphology in directed self-assembly application

Family Cites Families (15)

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Publication number Priority date Publication date Assignee Title
JP4101658B2 (ja) * 2001-02-23 2008-06-18 エーエムエス−ケミエ アーゲー ポリアルキル（メタ）アクリレートセグメントおよびポリアミドセグメントからなる熱可塑性ブロックコポリマーならびにその使用
US20090286927A1 (en) * 2005-06-27 2009-11-19 Niels Dan Anders Sodergard Hyperbranched Polymers
KR100926697B1 (ko) * 2007-06-12 2009-11-17 연세대학교 산학협력단 온도와 조성에 의한 부피 수축 원리를 이용한 다공성 나노구조체의 기공 크기 조절
US7521094B1 (en) 2008-01-14 2009-04-21 International Business Machines Corporation Method of forming polymer features by directed self-assembly of block copolymers
US8425982B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
US8114301B2 (en) * 2008-05-02 2012-02-14 Micron Technology, Inc. Graphoepitaxial self-assembly of arrays of downward facing half-cylinders
US7560141B1 (en) 2008-11-11 2009-07-14 International Business Machines Corporation Method of positioning patterns from block copolymer self-assembly
US8569427B2 (en) * 2009-10-08 2013-10-29 University Of South Carolina Polymers derived from rosin and their methods of preparation
US8691925B2 (en) * 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof
US8835581B2 (en) * 2012-06-08 2014-09-16 Az Electronic Materials (Luxembourg) S.A.R.L. Neutral layer polymer composition for directed self assembly and processes thereof
KR102245179B1 (ko) * 2013-04-03 2021-04-28 브레우어 사이언스, 인코포레이션 지향성 자가 조립용 블록 공중합체에 사용하기 위한 고도로 내에칭성인 중합체 블록
US9291909B2 (en) 2013-05-17 2016-03-22 Az Electronic Materials (Luxembourg) S.A.R.L. Composition comprising a polymeric thermal acid generator and processes thereof
KR102422401B1 (ko) * 2013-12-31 2022-07-18 다우 글로벌 테크놀로지스 엘엘씨 방향성 자가-조립 패턴 형성방법 및 조성물
JP6558894B2 (ja) * 2013-12-31 2019-08-14 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ コポリマーの設計、その製造方法およびそれを含む物品
WO2015109224A1 (en) * 2014-01-16 2015-07-23 Brewer Science Inc. High-chi block copolymers for directed self-assembly

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