JP2018525840A - 低誘電特性を有するガラス基板アセンブリ - Google Patents

低誘電特性を有するガラス基板アセンブリ Download PDF

Info

Publication number
JP2018525840A
JP2018525840A JP2018509741A JP2018509741A JP2018525840A JP 2018525840 A JP2018525840 A JP 2018525840A JP 2018509741 A JP2018509741 A JP 2018509741A JP 2018509741 A JP2018509741 A JP 2018509741A JP 2018525840 A JP2018525840 A JP 2018525840A
Authority
JP
Japan
Prior art keywords
glass
layer
dielectric
dielectric layer
substrate assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018509741A
Other languages
English (en)
Japanese (ja)
Inventor
マシュー ガーナー，ショーン
マシュー ガーナー，ショーン
リン，ジェン−チエ
レスリー ソレンセン，マイケル
レスリー ソレンセン，マイケル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of JP2018525840A publication Critical patent/JP2018525840A/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0029—Etching of the substrate by chemical or physical means by laser ablation of inorganic insulating material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/0222—Scoring using a focussed radiation beam, e.g. laser
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
    • H01L21/4807—Ceramic parts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/12—Mountings, e.g. non-detachable insulating substrates
    • H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/15—Ceramic or glass substrates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0213—Electrical arrangements not otherwise provided for
    • H05K1/0237—High frequency adaptations
    • H05K1/024—Dielectric details, e.g. changing the dielectric material around a transmission line
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0277—Bendability or stretchability details
    • H05K1/028—Bending or folding regions of flexible printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/11—Printed elements for providing electric connections to or between printed circuits
    • H05K1/115—Via connections; Lands around holes or via connections
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/445—Organic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0313—Organic insulating material
    • H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/036—Multilayers with layers of different types
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0183—Dielectric layers
    • H05K2201/0195—Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/095—Conductive through-holes or vias
    • H05K2201/09509—Blind vias, i.e. vias having one side closed
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/0143—Using a roller; Specific shape thereof; Providing locally adhesive portions thereon
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0736—Methods for applying liquids, e.g. spraying
    • H05K2203/0743—Mechanical agitation of fluid, e.g. during cleaning of the conductive pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0736—Methods for applying liquids, e.g. spraying
    • H05K2203/075—Global treatment of printed circuits by fluid spraying, e.g. cleaning a conductive pattern using nozzles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
    • H05K2203/0776—Uses of liquids not otherwise provided for in H05K2203/0759 - H05K2203/0773
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0789—Aqueous acid solution, e.g. for cleaning or etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107—Using laser light
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1194—Thermal treatment leading to a different chemical state of a material, e.g. annealing for stress-relief, aging
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1545—Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/107—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by filling grooves in the support with conductive material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • H05K3/4629—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Composite Materials (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Laminated Bodies (AREA)
  • Laser Beam Processing (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
JP2018509741A 2015-08-21 2016-08-19 低誘電特性を有するガラス基板アセンブリ Pending JP2018525840A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201562208282P 2015-08-21 2015-08-21
US62/208,282 2015-08-21
US201562232076P 2015-09-24 2015-09-24
US62/232,076 2015-09-24
PCT/US2016/047728 WO2017034958A1 (en) 2015-08-21 2016-08-19 Glass substrate assemblies having low dielectric properties

Publications (1)

Publication Number Publication Date
JP2018525840A true JP2018525840A (ja) 2018-09-06

Family

ID=56853833

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2018509741A Pending JP2018525840A (ja) 2015-08-21 2016-08-19 低誘電特性を有するガラス基板アセンブリ
JP2018508643A Abandoned JP2018536276A (ja) 2015-08-21 2016-08-19 可撓性基体ウェブに特徴物を連続して作製する方法、および、それに関する生成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2018508643A Abandoned JP2018536276A (ja) 2015-08-21 2016-08-19 可撓性基体ウェブに特徴物を連続して作製する方法、および、それに関する生成物

Country Status (7)

Country Link
US (2) US20180249579A1 (enExample)
EP (2) EP3338521A1 (enExample)
JP (2) JP2018525840A (enExample)
KR (2) KR20180052646A (enExample)
CN (2) CN107926110B (enExample)
TW (1) TWI711348B (enExample)
WO (2) WO2017034969A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10626040B2 (en) * 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
CN107498955A (zh) * 2017-09-21 2017-12-22 电子科技大学 一种宽带电磁透明复合式玻璃
CN113853359A (zh) * 2019-05-14 2021-12-28 肖特玻璃科技(苏州)有限公司 具有高弯曲强度的薄玻璃基板及其制备方法
JPWO2021020241A1 (enExample) * 2019-08-01 2021-02-04
JP7503894B2 (ja) * 2019-08-05 2024-06-21 日東電工株式会社 ガラスフィルムの製造方法
CN112440532A (zh) * 2019-08-27 2021-03-05 康宁股份有限公司 用于高频印刷电路板应用的有机/无机层叠体
US11342649B2 (en) * 2019-09-03 2022-05-24 Corning Incorporated Flexible waveguides having a ceramic core surrounded by a lower dielectric constant cladding for terahertz applications
US12247438B2 (en) 2020-08-07 2025-03-11 Cardinal Cg Company Double-pane insulating glazing units
US12352102B2 (en) 2020-08-07 2025-07-08 Cardinal Cg Company Aerogel glazing adhesion and IG unit technology
WO2022031536A1 (en) 2020-08-07 2022-02-10 Cardinal Cg Company Optical device with aerogel tiling technology
CN114195399A (zh) * 2020-09-18 2022-03-18 徐强 一种连续法生产柔性玻璃卷材的化学减薄工艺
EP4323318A1 (en) 2021-04-15 2024-02-21 Cardinal CG Company Flexible aerogel, flexible glass technology
US20220399206A1 (en) * 2021-06-11 2022-12-15 V-Finity Inc. Method for building conductive through-hole vias in glass substrates

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4737236A (en) * 1986-09-08 1988-04-12 M/A-Com, Inc. Method of making microwave integrated circuits
JPH0831972A (ja) * 1994-07-11 1996-02-02 Nippon Telegr & Teleph Corp <Ntt> Ｉｃ化実装用基板
JP2004169049A (ja) * 2002-11-15 2004-06-17 Polyplastics Co 環状オレフィン系樹脂成形品表面への金属複合方法及び金属複合化環状オレフィン系樹脂成形品
JP2004282412A (ja) * 2003-03-17 2004-10-07 Renesas Technology Corp 高周波電子回路部品
US20050040513A1 (en) * 2003-08-20 2005-02-24 Salmon Peter C. Copper-faced modules, imprinted copper circuits, and their application to supercomputers
US20140116615A1 (en) * 2012-10-25 2014-05-01 Central Glass Company, Limited Adhesive Composition, Bonding Method Using Adhesive Composition, and Separation Method After Bonding
WO2014133923A1 (en) * 2013-02-26 2014-09-04 Corning Incorporated Methods of forming shape-retaining flexible glass-polymer laminates

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3964232A (en) * 1973-10-04 1976-06-22 Johns-Manville Corporation Method of packaging fibrous mat structure
US4833104A (en) * 1987-11-27 1989-05-23 Corning Glass Works Glass-ceramic substrates for electronic packaging
JP3238064B2 (ja) * 1996-02-05 2001-12-10 ティーディーケイ株式会社 低誘電性高分子材料の使用方法ならびにそれを用いたフィルム、基板および電子部品の使用方法
US5753968A (en) * 1996-08-05 1998-05-19 Itt Industries, Inc. Low loss ridged microstrip line for monolithic microwave integrated circuit (MMIC) applications
US5922453A (en) * 1997-02-06 1999-07-13 Rogers Corporation Ceramic-filled fluoropolymer composite containing polymeric powder for high frequency circuit substrates
US6054379A (en) * 1998-02-11 2000-04-25 Applied Materials, Inc. Method of depositing a low k dielectric with organo silane
JP2002359445A (ja) * 2001-03-22 2002-12-13 Matsushita Electric Ind Co Ltd レーザー加工用の誘電体基板およびその加工方法ならび半導体パッケージおよびその製作方法
DE10222958B4 (de) * 2002-04-15 2007-08-16 Schott Ag Verfahren zur Herstellung eines organischen elektro-optischen Elements und organisches elektro-optisches Element
TWI234210B (en) * 2002-12-03 2005-06-11 Sanyo Electric Co Semiconductor module and manufacturing method thereof as well as wiring member of thin sheet
WO2004055110A1 (ja) * 2002-12-13 2004-07-01 Kaneka Corporation 熱可塑性ポリイミド樹脂フィルム、積層体およびそれからなるプリント配線板の製造方法
US20050183589A1 (en) * 2004-02-19 2005-08-25 Salmon Peter C. Imprinting tools and methods for printed circuit boards and assemblies
US7880556B2 (en) * 2004-03-04 2011-02-01 Banpil Photonics, Inc. Interconnection system with a dielectric system having holes therein that run uninterrupted through the dielectric system
US7663064B2 (en) * 2004-09-25 2010-02-16 Banpil Photonics, Inc. High-speed flex printed circuit and method of manufacturing
US20090110916A1 (en) * 2005-07-05 2009-04-30 Valery Ostrovsky Multi-Layered Product for Printed Circuit Boards, and a Process for Continuous Manufacture of Same
JP4827460B2 (ja) * 2005-08-24 2011-11-30 三井・デュポンフロロケミカル株式会社 含フッ素樹脂積層体
JP4994052B2 (ja) * 2006-03-28 2012-08-08 京セラ株式会社 基板およびこれを用いた回路基板
JP2007320088A (ja) * 2006-05-30 2007-12-13 Nof Corp プリプレグ及びプリント配線板用金属張り基板
DE102006034480A1 (de) * 2006-07-26 2008-01-31 M.A.S. Systeme Gesellschaft für Kunststoffprodukte mbH Leiterplattenmaterial und Herstellungsverfahren für dieses
US7678721B2 (en) * 2006-10-26 2010-03-16 Agy Holding Corp. Low dielectric glass fiber
US7829490B2 (en) * 2006-12-14 2010-11-09 Ppg Industries Ohio, Inc. Low dielectric glass and fiber glass for electronic applications
US8019187B1 (en) * 2009-08-17 2011-09-13 Banpil Photonics, Inc. Super high-speed chip to chip interconnects
US9656901B2 (en) * 2010-03-03 2017-05-23 Nippon Electric Glass Co., Ltd. Method of manufacturing a glass roll
CN201783991U (zh) * 2010-08-17 2011-04-06 嘉联益科技股份有限公司 卷对卷连续水平式钻孔设备
CN201833420U (zh) * 2010-08-24 2011-05-18 嘉联益科技股份有限公司 卷对卷连续水平式钻孔设备
JP5831096B2 (ja) * 2011-02-08 2015-12-09 日立化成株式会社 電磁結合構造、多層伝送線路板、電磁結合構造の製造方法、及び多層伝送線路板の製造方法
US9462688B2 (en) * 2011-09-07 2016-10-04 Lg Chem, Ltd. Flexible metal laminate containing fluoropolymer
WO2013121928A1 (ja) * 2012-02-13 2013-08-22 株式会社村田製作所 複合積層セラミック電子部品
JP2013201344A (ja) * 2012-03-26 2013-10-03 Sumitomo Electric Fine Polymer Inc フッ素樹脂基板
US9615453B2 (en) * 2012-09-26 2017-04-04 Ping-Jung Yang Method for fabricating glass substrate package
KR102157750B1 (ko) * 2012-11-29 2020-09-21 코닝 인코포레이티드 레이저 손상 및 에칭에 의한 유리 제품의 제조방법
JP6186016B2 (ja) * 2013-04-04 2017-08-23 エル・ピー・ケー・エフ・レーザー・ウント・エレクトロニクス・アクチエンゲゼルシヤフト 基板に貫通穴を開ける方法及び装置
WO2014192322A1 (ja) * 2013-05-31 2014-12-04 住友電気工業株式会社 高周波用プリント配線板及び配線材料
KR20150024093A (ko) * 2013-08-26 2015-03-06 삼성전기주식회사 인쇄회로기판 및 인쇄회로기판 제조 방법
US9296646B2 (en) * 2013-08-29 2016-03-29 Corning Incorporated Methods for forming vias in glass substrates
EP3056343B1 (en) * 2013-10-11 2020-05-06 Sumitomo Electric Printed Circuits, Inc. Fluororesin base material, printed wiring board, and circuit module
US20150165563A1 (en) * 2013-12-17 2015-06-18 Corning Incorporated Stacked transparent material cutting with ultrafast laser beam optics, disruptive layers and other layers
US9687936B2 (en) * 2013-12-17 2017-06-27 Corning Incorporated Transparent material cutting with ultrafast laser and beam optics
US10293436B2 (en) 2013-12-17 2019-05-21 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US9425125B2 (en) * 2014-02-20 2016-08-23 Altera Corporation Silicon-glass hybrid interposer circuitry
WO2016114002A1 (ja) * 2015-01-14 2016-07-21 日立化成株式会社 多層伝送線路板
CN107771125B (zh) * 2015-06-09 2020-07-28 罗杰斯公司 电路材料和由其形成的制品
JP2017031256A (ja) * 2015-07-29 2017-02-09 日東電工株式会社 フッ素樹脂多孔質体、それを用いた金属層付多孔質体及び配線基板

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4737236A (en) * 1986-09-08 1988-04-12 M/A-Com, Inc. Method of making microwave integrated circuits
JPH0831972A (ja) * 1994-07-11 1996-02-02 Nippon Telegr & Teleph Corp <Ntt> Ｉｃ化実装用基板
JP2004169049A (ja) * 2002-11-15 2004-06-17 Polyplastics Co 環状オレフィン系樹脂成形品表面への金属複合方法及び金属複合化環状オレフィン系樹脂成形品
JP2004282412A (ja) * 2003-03-17 2004-10-07 Renesas Technology Corp 高周波電子回路部品
US20050040513A1 (en) * 2003-08-20 2005-02-24 Salmon Peter C. Copper-faced modules, imprinted copper circuits, and their application to supercomputers
US20140116615A1 (en) * 2012-10-25 2014-05-01 Central Glass Company, Limited Adhesive Composition, Bonding Method Using Adhesive Composition, and Separation Method After Bonding
WO2014133923A1 (en) * 2013-02-26 2014-09-04 Corning Incorporated Methods of forming shape-retaining flexible glass-polymer laminates

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
鈴木巧一、尾山卓司: "材料［ＩＩ］", 真空, vol. ３１巻第７号, JPN6021024779, 20 July 1988 (1988-07-20), JP, pages 704 - 712, ISSN: 0004703749 *

Also Published As

Publication number Publication date
EP3338521A1 (en) 2018-06-27
US20180166353A1 (en) 2018-06-14
EP3338520A1 (en) 2018-06-27
TW201714500A (zh) 2017-04-16
TWI711348B (zh) 2020-11-21
WO2017034958A1 (en) 2017-03-02
WO2017034969A1 (en) 2017-03-02
CN107926110A (zh) 2018-04-17
US20180249579A1 (en) 2018-08-30
CN107926110B (zh) 2021-04-30
KR20180052646A (ko) 2018-05-18
KR20180048723A (ko) 2018-05-10
JP2018536276A (ja) 2018-12-06
CN107926111A (zh) 2018-04-17

Similar Documents

Publication Publication Date Title
JP2018525840A (ja) 低誘電特性を有するガラス基板アセンブリ
TWI738008B (zh) 高頻銅箔基板及其製法
CN103959927B (zh) 复合电磁波吸收片
CN112514061B (zh) 具有高峰值带宽i/o通道的模块
TWI474921B (zh) 覆金屬之積層板
TW200842905A (en) Flat cable
JP2012243923A (ja) フレキシブルプリント回路及びその製造方法
CN102548200A (zh) 电路基板及其制作方法
CN103809237A (zh) 光电混载基板
KR20140145870A (ko) 방열 복합시트
KR102288004B1 (ko) 플렉시블 구리 피복 적층판 및 플렉시블 회로 기판
US20250354294A1 (en) Low-transmission-loss copper-based composite material and preparation method thereof, pcb, and electronic component
JP4829028B2 (ja) 回路基板及び回路基板の製造方法
Fan et al. 3D flexible frequency selective surface with stable electromagnetic transmission properties
JP4723391B2 (ja) プリント基板における信号ラインの設計方法及びこの設計方法を用いて製造されたプリント基板
JP2007262493A (ja) フレキシブルプリント基板用材料およびその製造方法
WO2013097127A1 (zh) 电路基板及其制作方法
WO2013161133A1 (ja) セラミック基板複合体およびセラミック基板複合体の製造方法
TW479442B (en) Printed circuit board for RAMBUS
WO2021020241A1 (ja) ガラスフィルム及びこれを用いたガラスロール
JP6788827B2 (ja) 電波送受信用基板及びその製造方法
KR20210096838A (ko) 고주파용 다층 세라믹 기판 및 그의 제조 방법
TWI829033B (zh) 一種複合式高頻基板及其製備方法
CN113690604B (zh) 一种天线制备方法及天线、电子设备
CN109291603B (zh) 一种有机硅薄膜为基体的挠性覆铜板及其制备方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20190816

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20200807

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200826

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20201126

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210126

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210630

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20210930

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20220209