JP2018523300A - 電荷をトラップするための層を含む半導体素子の製造方法 - Google Patents
電荷をトラップするための層を含む半導体素子の製造方法 Download PDFInfo
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- 238000010438 heat treatment Methods 0.000 claims abstract description 43
- 238000011084 recovery Methods 0.000 claims abstract description 27
- 238000012545 processing Methods 0.000 claims description 30
- 238000000137 annealing Methods 0.000 claims description 11
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- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 6
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- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
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- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
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Abstract
【選択図】図5
Description
・RTA単独:図4にプロファイルが示された急速熱処理
・RTA+TTH:前述のRTA処理と同じ急速熱処理の後における保護酸化後のアルゴン下での950℃で1時間の熱処理
・RTA+:1200℃での定常処理後の950℃での回復処理を含む、図5にプロファイルが示された急速熱処理
Claims (12)
- 半導体素子の製造方法であって、
前記方法は、電荷トラップ層(3)を含む基板(1)に対する、前記基板(1)のRF特性を損なうことが可能な急速熱処理工程を含み、
前記急速熱処理工程に追随して、700℃〜1100℃で少なくとも15秒間の前記基板の回復熱処理を行うことを特徴とする、方法。 - 中性又は還元性雰囲気下で前記回復熱処理を実施する、先行する請求項に記載の製造方法。
- 前記回復熱処理は、950℃で1時間のアニーリングからなる、先行する請求項のいずれかに記載の製造方法。
- 急速アニーリングオーブン又はフラッシュアニーリング装置などの急速熱処理装置で前記急速熱処理工程を実施する、先行する請求項のうちの1項に記載の製造方法。
- 前記急速熱処理装置でそのまま前記回復熱処理を実施する、先行する請求項に記載の製造方法。
- 前記回復熱処理は、950℃で15秒〜2分間のアニーリングからなる、先行する請求項に記載の製造方法。
- 前記急速熱処理が完了してから、温度低下を40℃/s未満に制御することによって、前記回復熱処理を実施する、請求項5に記載の製造方法。
- 前記急速熱処理は、1125℃〜1250℃の間の定常温度で、最大2分間、前記基板(1)を処理雰囲気に露出することを含む、先行する請求項のうちの1項に記載の製造方法。
- 前記半導体素子がRF装置である、先行する請求項のうちの1項に記載の製造方法。
- 前記半導体素子は、200又は300mmの直径を有するシリコン・オン・インシュレータウェハである、先行する請求項のうちの1項に記載の製造方法。
- 前記電荷トラップ層(3)が多結晶シリコン層である、先行する請求項のうちの1項に記載の製造方法。
- 前記基板(1)の前記RF特性を第二高調波歪み測定によって評価する、先行する請求項のうちの1項に記載の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1555248A FR3037438B1 (fr) | 2015-06-09 | 2015-06-09 | Procede de fabrication d'un element semi-conducteur comprenant une couche de piegeage de charges |
FR1555248 | 2015-06-09 | ||
PCT/EP2016/062334 WO2016198298A1 (en) | 2015-06-09 | 2016-06-01 | Process for the manufacture of a semiconductor element comprising a layer for trapping charges |
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JP2018523300A true JP2018523300A (ja) | 2018-08-16 |
JP6799015B2 JP6799015B2 (ja) | 2020-12-09 |
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US (1) | US10297464B2 (ja) |
EP (1) | EP3308391B1 (ja) |
JP (1) | JP6799015B2 (ja) |
KR (1) | KR102484156B1 (ja) |
CN (1) | CN107690695B (ja) |
FR (1) | FR3037438B1 (ja) |
TW (1) | TWI683367B (ja) |
WO (1) | WO2016198298A1 (ja) |
Cited By (1)
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JP2021531645A (ja) * | 2018-07-13 | 2021-11-18 | グローバルウェーハズ カンパニー リミテッドGlobalWafers Co., Ltd. | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ・ウエハ・プラットフォーム |
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Publication number | Priority date | Publication date | Assignee | Title |
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FR3037438B1 (fr) | 2015-06-09 | 2017-06-16 | Soitec Silicon On Insulator | Procede de fabrication d'un element semi-conducteur comprenant une couche de piegeage de charges |
FR3058561B1 (fr) * | 2016-11-04 | 2018-11-02 | Soitec | Procede de fabrication d'un element semi-conducteur comprenant un substrat hautement resistif |
FR3062238A1 (fr) * | 2017-01-26 | 2018-07-27 | Soitec | Support pour une structure semi-conductrice |
JP6859964B2 (ja) * | 2018-01-23 | 2021-04-14 | 信越半導体株式会社 | 高周波用soiウェーハの製造方法 |
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JP2021531645A (ja) * | 2018-07-13 | 2021-11-18 | グローバルウェーハズ カンパニー リミテッドGlobalWafers Co., Ltd. | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ・ウエハ・プラットフォーム |
JP2021532570A (ja) * | 2018-07-13 | 2021-11-25 | グローバルウェーハズ カンパニー リミテッドGlobalWafers Co., Ltd. | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ構造 |
JP7248711B2 (ja) | 2018-07-13 | 2023-03-29 | グローバルウェーハズ カンパニー リミテッド | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ構造 |
JP7275172B2 (ja) | 2018-07-13 | 2023-05-17 | グローバルウェーハズ カンパニー リミテッド | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ・ウエハ・プラットフォーム |
JP7470233B2 (ja) | 2018-07-13 | 2024-04-17 | グローバルウェーハズ カンパニー リミテッド | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ・ウエハ・プラットフォーム |
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Publication number | Publication date |
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TWI683367B (zh) | 2020-01-21 |
CN107690695A (zh) | 2018-02-13 |
EP3308391A1 (en) | 2018-04-18 |
US20180182640A1 (en) | 2018-06-28 |
FR3037438A1 (fr) | 2016-12-16 |
JP6799015B2 (ja) | 2020-12-09 |
WO2016198298A1 (en) | 2016-12-15 |
KR20180015159A (ko) | 2018-02-12 |
CN107690695B (zh) | 2021-05-11 |
KR102484156B1 (ko) | 2023-01-03 |
FR3037438B1 (fr) | 2017-06-16 |
EP3308391B1 (en) | 2018-12-26 |
US10297464B2 (en) | 2019-05-21 |
TW201711105A (zh) | 2017-03-16 |
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