JP2018178188A - シール装置 - Google Patents
シール装置 Download PDFInfo
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- JP2018178188A JP2018178188A JP2017079497A JP2017079497A JP2018178188A JP 2018178188 A JP2018178188 A JP 2018178188A JP 2017079497 A JP2017079497 A JP 2017079497A JP 2017079497 A JP2017079497 A JP 2017079497A JP 2018178188 A JP2018178188 A JP 2018178188A
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/52—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
- C21D9/54—Furnaces for treating strips or wire
- C21D9/56—Continuous furnaces for strip or wire
- C21D9/562—Details
- C21D9/565—Sealing arrangements
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
- C21D1/76—Adjusting the composition of the atmosphere
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/46—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for sheet metals
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/52—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
- C21D9/54—Furnaces for treating strips or wire
- C21D9/56—Continuous furnaces for strip or wire
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/52—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
- C21D9/54—Furnaces for treating strips or wire
- C21D9/56—Continuous furnaces for strip or wire
- C21D9/561—Continuous furnaces for strip or wire with a controlled atmosphere or vacuum
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45559—Diffusion of reactive gas to substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
- F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/28—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity for treating continuous lengths of work
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
- F27D99/0073—Seals
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Heat Treatment Of Strip Materials And Filament Materials (AREA)
- Chemical Vapour Deposition (AREA)
- Furnace Details (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
Abstract
Description
このような、シール装置によるシール性の向上については、例えば特許文献2に、硬質材の回転ダンパ及びロールと、前記回転ダンパの上方に接触して炉内をシールする昇降ダンパとを備え、回転ダンパとロールの軸間距離を固定し、回転ダンパとロールの半径の合計が回転ダンパとロールの軸間距離よりも小さくなる部分を回転ダンパに設けたシール装置が記載されている。これにより、鋼板などの鋼帯との隙間を極めて微小なものとし、高シール性が得られるとしている。
[1]鋼帯が通板する熱処理設備内において、前記鋼帯の上側に配置され、前記鋼帯に接触可能な回転ダンパと、前記回転ダンパに対向する位置で、前記鋼帯の下側に配置されるロールとを備え、前記回転ダンパと前記ロールとの対向部間に鋼帯を通板させるシール装置において、一対の回転ダンパおよびロールが2つ前記熱処理設備内に通板方向に直列に配置され、前記直列に配置された前記一対の回転ダンパおよびロール同士で仕切られる空間内に、不活性ガスが供給されることを特徴とするシール装置。
[2]前記回転ダンパは、前記鋼帯に向けて不活性ガスを噴出させる穴を鋼帯幅方向に有することを特徴とする[1]に記載のシール装置。
[3]前記不活性ガスの圧力は、前記空間内の圧力が5mmH2O〜100mmH2Oになるように設定されることを特徴とする[1]または[2]に記載のシール装置。
[4]前記シール装置は、前記熱処理設備内におけるCVD処理炉内に設けられることを特徴とする[1]〜[3]のいずれかに記載のシール装置。
[5]前記シール装置は、前記熱処理設備内の鋼帯通板方向上流側および下流側にそれぞれ設けられることを特徴とする[1]〜[4]のいずれかに記載のシール装置。
<欠陥発生率>
欠陥が発生した場合、その欠陥部の前後1mを欠陥長とし、1コイル内におけるこの欠陥長の累計をこのコイルの長さで除したものを欠陥発生率とし、コイル毎の欠陥発生率を10コイル分で平均した結果で、比較を行った。
2 ロール
3 吹き付けノズル
4 シール装置
5 回転ダンパ
6 ロール
7 昇降ダンパ
8 仕切板
9 空間
10 穴
100 浸珪処理設備
A 加熱炉
B CVD処理炉
C 拡散処理炉
D 冷却炉
S 鋼帯(鋼板)
Claims (5)
- 鋼帯が通板する熱処理設備内において、
前記鋼帯の上側に配置され、前記鋼帯に接触可能な回転ダンパと、
前記回転ダンパに対向する位置で、前記鋼帯の下側に配置されるロールと
を備え、前記回転ダンパと前記ロールとの対向部間に鋼帯を通板させるシール装置において、
一対の回転ダンパおよびロールが2つ前記熱処理設備内に通板方向に直列に配置され、前記直列に配置された前記一対の回転ダンパおよびロール同士で仕切られる空間内に、不活性ガスが供給されることを特徴とするシール装置。 - 前記回転ダンパは、前記鋼帯に向けて不活性ガスを噴出させる穴を鋼帯幅方向に有することを特徴とする請求項1に記載のシール装置。
- 前記不活性ガスの圧力は、前記空間内の圧力が5mmH2O〜100mmH2Oになるように設定されることを特徴とする請求項1または2に記載のシール装置。
- 前記シール装置は、前記熱処理設備内におけるCVD処理炉内に設けられることを特徴とする請求項1〜3のいずれかに記載のシール装置。
- 前記シール装置は、前記熱処理設備内の鋼帯通板方向上流側および下流側にそれぞれ設けられることを特徴とする請求項1〜4のいずれかに記載のシール装置。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017079497A JP6756295B2 (ja) | 2017-04-13 | 2017-04-13 | シール装置 |
CN201880024755.1A CN110494572B (zh) | 2017-04-13 | 2018-03-29 | 密封装置 |
PCT/JP2018/013172 WO2018190140A1 (ja) | 2017-04-13 | 2018-03-29 | シール装置 |
EP18785136.5A EP3611275B1 (en) | 2017-04-13 | 2018-03-29 | Sealing device |
KR1020197029970A KR102328963B1 (ko) | 2017-04-13 | 2018-03-29 | 시일 장치 |
US16/603,905 US11401575B2 (en) | 2017-04-13 | 2018-03-29 | Sealing device |
TW107112129A TWI666328B (zh) | 2017-04-13 | 2018-04-09 | Sealing means |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017079497A JP6756295B2 (ja) | 2017-04-13 | 2017-04-13 | シール装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018178188A true JP2018178188A (ja) | 2018-11-15 |
JP6756295B2 JP6756295B2 (ja) | 2020-09-16 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017079497A Active JP6756295B2 (ja) | 2017-04-13 | 2017-04-13 | シール装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US11401575B2 (ja) |
EP (1) | EP3611275B1 (ja) |
JP (1) | JP6756295B2 (ja) |
KR (1) | KR102328963B1 (ja) |
CN (1) | CN110494572B (ja) |
TW (1) | TWI666328B (ja) |
WO (1) | WO2018190140A1 (ja) |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59133330A (ja) * | 1983-01-19 | 1984-07-31 | Nippon Steel Corp | 鋼帯連続熱処理設備におけるシ−ル方法および装置 |
JPS6324038A (ja) | 1986-07-17 | 1988-02-01 | Nippon Kokan Kk <Nkk> | シ−ル装置 |
JPH086147B2 (ja) * | 1988-07-15 | 1996-01-24 | 日新製鋼株式会社 | 光輝焼鈍炉出入口のシール方法 |
JP2827753B2 (ja) * | 1992-09-08 | 1998-11-25 | 日本鋼管株式会社 | 連続処理炉における異種炉内雰囲気ガスの混合防止装置 |
JP2765400B2 (ja) * | 1992-09-08 | 1998-06-11 | 日本鋼管株式会社 | 連続走行体とのギャップ調整が可能な装置 |
JP2804221B2 (ja) * | 1993-09-28 | 1998-09-24 | 株式会社ノリタケカンパニーリミテド | 熱処理炉におけるシール装置 |
JP3071114B2 (ja) * | 1993-12-15 | 2000-07-31 | 日新製鋼株式会社 | 連続焼鈍炉,連続塗装設備等の区画出入口のシール装置 |
JP2876981B2 (ja) | 1994-03-29 | 1999-03-31 | 日本鋼管株式会社 | 炉内シール装置 |
JP2726242B2 (ja) * | 1994-06-07 | 1998-03-11 | 日新製鋼株式会社 | 雰囲気設備の入口または出口のシール装置 |
FR2760077B1 (fr) | 1997-02-27 | 1999-04-30 | Stein Heurtey | Dispositif pour assurer le remplacement d'un rouleau support de bande dans un four de traitement thermique |
JPH10265855A (ja) * | 1997-03-27 | 1998-10-06 | Chugai Ro Co Ltd | 金属ストリップ支持装置のシール機構 |
JPH11106833A (ja) * | 1997-10-07 | 1999-04-20 | Daido Steel Co Ltd | 連続熱処理炉 |
CN1094521C (zh) * | 1998-03-26 | 2002-11-20 | 川崎制铁株式会社 | 连续热处理炉及连续热处理炉的氛围控制方法和冷却方法 |
US6341955B1 (en) * | 1998-10-23 | 2002-01-29 | Kawasaki Steel Corporation | Sealing apparatus in continuous heat-treatment furnace and sealing method |
JP5928214B2 (ja) * | 2012-07-18 | 2016-06-01 | Jfeスチール株式会社 | 軸受装置および連続焼鈍炉 |
JP5884748B2 (ja) * | 2013-02-25 | 2016-03-15 | Jfeスチール株式会社 | 鋼帯の連続焼鈍装置および連続溶融亜鉛めっき装置 |
CN107429309B (zh) * | 2015-04-02 | 2021-06-18 | 考克利尔维修工程 | 退火炉、用于控制在钢带上的表面反应的方法及钢带 |
CN205856547U (zh) * | 2016-08-11 | 2017-01-04 | 武汉山力板带技术工程有限公司 | 一种卧式退火炉入口密封装置 |
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2017
- 2017-04-13 JP JP2017079497A patent/JP6756295B2/ja active Active
-
2018
- 2018-03-29 CN CN201880024755.1A patent/CN110494572B/zh active Active
- 2018-03-29 EP EP18785136.5A patent/EP3611275B1/en active Active
- 2018-03-29 WO PCT/JP2018/013172 patent/WO2018190140A1/ja unknown
- 2018-03-29 KR KR1020197029970A patent/KR102328963B1/ko active IP Right Grant
- 2018-03-29 US US16/603,905 patent/US11401575B2/en active Active
- 2018-04-09 TW TW107112129A patent/TWI666328B/zh active
Also Published As
Publication number | Publication date |
---|---|
EP3611275B1 (en) | 2024-03-20 |
US20200040425A1 (en) | 2020-02-06 |
EP3611275A4 (en) | 2020-02-19 |
WO2018190140A1 (ja) | 2018-10-18 |
EP3611275A1 (en) | 2020-02-19 |
US11401575B2 (en) | 2022-08-02 |
KR102328963B1 (ko) | 2021-11-18 |
JP6756295B2 (ja) | 2020-09-16 |
TW201842195A (zh) | 2018-12-01 |
CN110494572B (zh) | 2022-02-08 |
TWI666328B (zh) | 2019-07-21 |
CN110494572A (zh) | 2019-11-22 |
KR20190126866A (ko) | 2019-11-12 |
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