JP2018133433A5 - - Google Patents

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Publication number
JP2018133433A5
JP2018133433A5 JP2017025929A JP2017025929A JP2018133433A5 JP 2018133433 A5 JP2018133433 A5 JP 2018133433A5 JP 2017025929 A JP2017025929 A JP 2017025929A JP 2017025929 A JP2017025929 A JP 2017025929A JP 2018133433 A5 JP2018133433 A5 JP 2018133433A5
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JP
Japan
Prior art keywords
resistance
region
sense element
semiconductor device
set high
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Application number
JP2017025929A
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English (en)
Japanese (ja)
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JP6693438B2 (ja
JP2018133433A (ja
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Priority claimed from JP2017025929A external-priority patent/JP6693438B2/ja
Priority to JP2017025929A priority Critical patent/JP6693438B2/ja
Application filed filed Critical
Priority to CN201780086349.3A priority patent/CN110291643A/zh
Priority to DE112017007068.6T priority patent/DE112017007068T8/de
Priority to PCT/JP2017/045324 priority patent/WO2018150713A1/ja
Publication of JP2018133433A publication Critical patent/JP2018133433A/ja
Publication of JP2018133433A5 publication Critical patent/JP2018133433A5/ja
Priority to US16/513,047 priority patent/US20190341483A1/en
Publication of JP6693438B2 publication Critical patent/JP6693438B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017025929A 2017-02-15 2017-02-15 半導体装置 Active JP6693438B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2017025929A JP6693438B2 (ja) 2017-02-15 2017-02-15 半導体装置
CN201780086349.3A CN110291643A (zh) 2017-02-15 2017-12-18 半导体装置
DE112017007068.6T DE112017007068T8 (de) 2017-02-15 2017-12-18 Halbleitervorrichtung
PCT/JP2017/045324 WO2018150713A1 (ja) 2017-02-15 2017-12-18 半導体装置
US16/513,047 US20190341483A1 (en) 2017-02-15 2019-07-16 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017025929A JP6693438B2 (ja) 2017-02-15 2017-02-15 半導体装置

Publications (3)

Publication Number Publication Date
JP2018133433A JP2018133433A (ja) 2018-08-23
JP2018133433A5 true JP2018133433A5 (enExample) 2019-05-30
JP6693438B2 JP6693438B2 (ja) 2020-05-13

Family

ID=63169271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017025929A Active JP6693438B2 (ja) 2017-02-15 2017-02-15 半導体装置

Country Status (5)

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US (1) US20190341483A1 (enExample)
JP (1) JP6693438B2 (enExample)
CN (1) CN110291643A (enExample)
DE (1) DE112017007068T8 (enExample)
WO (1) WO2018150713A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11063146B2 (en) * 2019-01-10 2021-07-13 Texas Instruments Incorporated Back-to-back power field-effect transistors with associated current sensors
JP7092044B2 (ja) 2019-01-16 2022-06-28 株式会社デンソー 半導体装置
US10931272B2 (en) 2019-03-22 2021-02-23 Infineon Technologies Ag Transistor arrangement with a load transistor and a sense transistor
CN113661576B (zh) * 2019-04-10 2024-03-08 三菱电机株式会社 半导体装置
JP7363079B2 (ja) * 2019-04-15 2023-10-18 富士電機株式会社 半導体装置
US11004970B2 (en) 2019-05-20 2021-05-11 Nxp Usa, Inc. Mirror device structure for power MOSFET and method of manufacture
JP7099404B2 (ja) * 2019-05-27 2022-07-12 株式会社デンソー 負荷駆動装置
JP7310343B2 (ja) * 2019-06-14 2023-07-19 富士電機株式会社 半導体装置
JP7425943B2 (ja) * 2019-12-12 2024-02-01 株式会社デンソー 炭化珪素半導体装置
US12068408B2 (en) * 2020-07-15 2024-08-20 Semiconductor Components Industries, Llc High electron mobility transistor
US11410990B1 (en) * 2020-08-25 2022-08-09 Semiq Incorporated Silicon carbide MOSFET with optional asymmetric gate clamp
US11495680B2 (en) * 2020-11-25 2022-11-08 Infineon Technologies Austria Ag Semiconductor device with integrated current sensor
JP7571560B2 (ja) * 2021-01-15 2024-10-23 株式会社デンソー 半導体装置
EP4181212A1 (en) * 2021-11-11 2023-05-17 Infineon Technologies Dresden GmbH & Co . KG Semiconductor device
JP2023146998A (ja) 2022-03-29 2023-10-12 富士電機株式会社 半導体装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3515298B2 (ja) * 1995-12-07 2004-04-05 株式会社東芝 半導体装置
JP3450650B2 (ja) * 1997-06-24 2003-09-29 株式会社東芝 半導体装置
JP2008235788A (ja) * 2007-03-23 2008-10-02 Sanyo Electric Co Ltd 絶縁ゲート型半導体装置
JP4748149B2 (ja) * 2007-12-24 2011-08-17 株式会社デンソー 半導体装置
WO2009096412A1 (ja) * 2008-01-29 2009-08-06 Fuji Electric Device Technology Co., Ltd. 半導体装置
DE112009004595B4 (de) * 2009-03-24 2015-04-09 Toyota Jidosha Kabushiki Kaisha Halbleitervorrichtung
DE112009004805B4 (de) * 2009-05-28 2019-03-28 Toyota Jidosha Kabushiki Kaisha Halbleitervorrichtung
CN104471710A (zh) * 2012-07-20 2015-03-25 三菱电机株式会社 半导体装置及其制造方法
JP5758365B2 (ja) * 2012-09-21 2015-08-05 株式会社東芝 電力用半導体素子
CN107710401B (zh) * 2015-07-02 2021-04-20 三菱电机株式会社 半导体装置

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