JP2018087956A - 着色硬化膜の製造方法及びカラーフィルタの画素パターンの形成方法 - Google Patents

着色硬化膜の製造方法及びカラーフィルタの画素パターンの形成方法 Download PDF

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Publication number
JP2018087956A
JP2018087956A JP2017082773A JP2017082773A JP2018087956A JP 2018087956 A JP2018087956 A JP 2018087956A JP 2017082773 A JP2017082773 A JP 2017082773A JP 2017082773 A JP2017082773 A JP 2017082773A JP 2018087956 A JP2018087956 A JP 2018087956A
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JP
Japan
Prior art keywords
radiation
substrate
colored
wavelength
coating film
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Pending
Application number
JP2017082773A
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English (en)
Japanese (ja)
Inventor
政完 柳
zheng wan Liu
政完 柳
杉田　光
Hikari Sugita
光 杉田
孝広 河合
Takahiro Kawai
孝広 河合
田中　圭
Kei Tanaka
圭 田中
光央 佐藤
Mitsuhisa Sato
光央 佐藤
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JSR Corp
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JSR Corp
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Publication of JP2018087956A publication Critical patent/JP2018087956A/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2017082773A 2016-04-26 2017-04-19 着色硬化膜の製造方法及びカラーフィルタの画素パターンの形成方法 Pending JP2018087956A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2016088111 2016-04-26
JP2016088111 2016-04-26
JP2016225177 2016-11-18
JP2016225177 2016-11-18

Publications (1)

Publication Number Publication Date
JP2018087956A true JP2018087956A (ja) 2018-06-07

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JP2017082773A Pending JP2018087956A (ja) 2016-04-26 2017-04-19 着色硬化膜の製造方法及びカラーフィルタの画素パターンの形成方法

Country Status (4)

Country Link
JP (1) JP2018087956A (zh)
KR (1) KR102288090B1 (zh)
CN (1) CN107329366A (zh)
TW (1) TWI733797B (zh)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019142415A1 (ja) * 2018-01-19 2019-07-25 昭和電工株式会社 カラーフィルター用感光性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
JP2019524904A (ja) * 2016-10-10 2019-09-05 エルジー・ケム・リミテッド インクジェット用赤外線透過インク組成物、それを用いたベゼルパターンの形成方法、これにより製造したベゼルパターン及びそれを含むディスプレイ基板
CN112424651A (zh) * 2018-08-31 2021-02-26 Dic株式会社 滤色器
WO2021039841A1 (ja) * 2019-08-27 2021-03-04 富士フイルム株式会社 硬化膜の製造方法、光硬化性樹脂組成物、積層体の製造方法、及び、半導体デバイスの製造方法
EP4063953A4 (en) * 2019-11-21 2023-05-31 FUJIFILM Corporation PATTERN FORMING METHOD, PHOTOCURABLE RESIN COMPOSITION, LAMINATE BODY MANUFACTURING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD
WO2023234094A1 (ja) * 2022-06-01 2023-12-07 富士フイルム株式会社 光検出素子、イメージセンサおよび光検出素子の製造方法
WO2023234095A1 (ja) * 2022-06-01 2023-12-07 富士フイルム株式会社 光検出素子、イメージセンサおよび光検出素子の製造方法

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JPWO2020262270A1 (zh) 2019-06-27 2020-12-30
WO2021199748A1 (ja) 2020-03-30 2021-10-07 富士フイルム株式会社 組成物、膜及び光センサ
EP4266094A1 (en) 2020-12-16 2023-10-25 FUJIFILM Corporation Composition, membrane, optical filter, solid image pickup element, image display apparatus, and infrared ray sensor
EP4266093A1 (en) 2020-12-17 2023-10-25 FUJIFILM Corporation Composition, film, optical filter, solid-state imaging element, image display device, and infrared sensor
EP4310556A1 (en) 2021-03-19 2024-01-24 FUJIFILM Corporation Film and photosensor
JPWO2023054142A1 (zh) 2021-09-29 2023-04-06

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JP2891418B2 (ja) 1988-11-26 1999-05-17 凸版印刷株式会社 カラーフィルターおよびその製造方法
US5429908A (en) * 1993-04-12 1995-07-04 E. I. Du Pont De Nemours And Company Exposure method for reducing distortion in models produced through solid imaging by forming a non-continuous image of a pattern which is then imaged to form a continuous hardened image of the pattern
JP4597590B2 (ja) * 2003-11-21 2010-12-15 富士フイルム株式会社 イメージセンサ用カラーフィルタの製造方法
JP2005172923A (ja) * 2003-12-08 2005-06-30 Nippon Kayaku Co Ltd カラーフィルターの製造方法
JP4689553B2 (ja) * 2006-08-11 2011-05-25 富士フイルム株式会社 光硬化性着色組成物及びそれを用いたカラーフィルタ
JP5609229B2 (ja) * 2009-04-27 2014-10-22 住友化学株式会社 化合物及び該化合物を含む着色感光性樹脂組成物
KR20120086693A (ko) * 2009-09-29 2012-08-03 후지필름 가부시키가이샤 착색 감광성 수지 조성물, 컬러필터, 및 액정표시장치
CN101696339B (zh) * 2009-10-29 2013-05-08 彩虹集团公司 一种电子纸微杯的材料及制备方法
CN102842655B (zh) * 2011-06-24 2015-04-15 深圳市九洲光电科技有限公司 一种大功率白光led荧光粉涂覆方法
JP5743801B2 (ja) * 2011-08-15 2015-07-01 富士フイルム株式会社 着色組成物、着色感放射線性組成物、重合体の製造方法、パターンの形成方法、カラーフィルタ、及びその製造方法、並びに固体撮像素子
JP6008760B2 (ja) * 2013-03-05 2016-10-19 富士フイルム株式会社 着色感光性組成物、カラーフィルタ及びカラーフィルタの製造方法
JP2015125402A (ja) 2013-12-27 2015-07-06 東洋インキＳｃホールディングス株式会社 カラーフィルタ用感光性着色組成物、カラーフィルタ、及びカラーフィルタの製造方法
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JP5986671B2 (ja) * 2015-08-18 2016-09-06 富士フイルム株式会社 着色組成物、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019524904A (ja) * 2016-10-10 2019-09-05 エルジー・ケム・リミテッド インクジェット用赤外線透過インク組成物、それを用いたベゼルパターンの形成方法、これにより製造したベゼルパターン及びそれを含むディスプレイ基板
US11760891B2 (en) 2016-10-10 2023-09-19 Lg Chem, Ltd. Infrared ray transmittance ink composition for inkjet, method for preparing a bezel pattern using the same, the bezel pattern using the same method and display panel comprising the bezel pattern
WO2019142415A1 (ja) * 2018-01-19 2019-07-25 昭和電工株式会社 カラーフィルター用感光性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
JPWO2019142415A1 (ja) * 2018-01-19 2021-01-14 昭和電工株式会社 カラーフィルター用感光性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
JP7318533B2 (ja) 2018-01-19 2023-08-01 株式会社レゾナック カラーフィルター用感光性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
CN112424651A (zh) * 2018-08-31 2021-02-26 Dic株式会社 滤色器
WO2021039841A1 (ja) * 2019-08-27 2021-03-04 富士フイルム株式会社 硬化膜の製造方法、光硬化性樹脂組成物、積層体の製造方法、及び、半導体デバイスの製造方法
JPWO2021039841A1 (zh) * 2019-08-27 2021-03-04
EP4063953A4 (en) * 2019-11-21 2023-05-31 FUJIFILM Corporation PATTERN FORMING METHOD, PHOTOCURABLE RESIN COMPOSITION, LAMINATE BODY MANUFACTURING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD
WO2023234094A1 (ja) * 2022-06-01 2023-12-07 富士フイルム株式会社 光検出素子、イメージセンサおよび光検出素子の製造方法
WO2023234095A1 (ja) * 2022-06-01 2023-12-07 富士フイルム株式会社 光検出素子、イメージセンサおよび光検出素子の製造方法

Also Published As

Publication number Publication date
CN107329366A (zh) 2017-11-07
TWI733797B (zh) 2021-07-21
KR20170122130A (ko) 2017-11-03
KR102288090B1 (ko) 2021-08-09
TW201738589A (zh) 2017-11-01

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