JP2017516914A - 光波分離格子および光波分離格子を形成する方法 - Google Patents

光波分離格子および光波分離格子を形成する方法 Download PDF

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Publication number
JP2017516914A
JP2017516914A JP2016561631A JP2016561631A JP2017516914A JP 2017516914 A JP2017516914 A JP 2017516914A JP 2016561631 A JP2016561631 A JP 2016561631A JP 2016561631 A JP2016561631 A JP 2016561631A JP 2017516914 A JP2017516914 A JP 2017516914A
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layer
vapor deposition
substrate
physical vapor
chamber
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JP2016561631A
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Japanese (ja)
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JP2017516914A5 (enExample
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ダニエル リー ディール
ダニエル リー ディール
ヨン ツァオ
ヨン ツァオ
ミンウェイ ヂュー
ミンウェイ ヂュー
タイ−チョウ パポ チェン
タイ−チョウ パポ チェン
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Applied Materials Inc
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Applied Materials Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • G02B27/1013—Beam splitting or combining systems for splitting or combining different wavelengths for colour or multispectral image sensors, e.g. splitting an image into monochromatic image components on respective sensors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
JP2016561631A 2014-04-11 2015-03-24 光波分離格子および光波分離格子を形成する方法 Pending JP2017516914A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201461978803P 2014-04-11 2014-04-11
US61/978,803 2014-04-11
US14/291,712 US9746678B2 (en) 2014-04-11 2014-05-30 Light wave separation lattices and methods of forming light wave separation lattices
US14/291,712 2014-05-30
PCT/US2015/022119 WO2015156991A1 (en) 2014-04-11 2015-03-24 Light wave separation lattices and methods of forming light wave separation lattices

Publications (2)

Publication Number Publication Date
JP2017516914A true JP2017516914A (ja) 2017-06-22
JP2017516914A5 JP2017516914A5 (enExample) 2018-05-17

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JP2016561631A Pending JP2017516914A (ja) 2014-04-11 2015-03-24 光波分離格子および光波分離格子を形成する方法

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Country Link
US (2) US9746678B2 (enExample)
EP (1) EP3129823A4 (enExample)
JP (1) JP2017516914A (enExample)
CN (1) CN106170730A (enExample)
SG (2) SG10201809273VA (enExample)
TW (2) TWI667501B (enExample)
WO (1) WO2015156991A1 (enExample)

Cited By (1)

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JP2021174001A (ja) * 2020-04-28 2021-11-01 ヴァイアヴィ・ソリューションズ・インコーポレイテッドViavi Solutions Inc. 水素化シリコン及び銀を備える誘導送信フィルタ

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CN113767187A (zh) * 2019-04-19 2021-12-07 应用材料公司 形成含金属材料的方法
US20210319989A1 (en) * 2020-04-13 2021-10-14 Applied Materials, Inc. Methods and apparatus for processing a substrate
US11935771B2 (en) 2021-02-17 2024-03-19 Applied Materials, Inc. Modular mainframe layout for supporting multiple semiconductor process modules or chambers
US11935770B2 (en) 2021-02-17 2024-03-19 Applied Materials, Inc. Modular mainframe layout for supporting multiple semiconductor process modules or chambers
US12338527B2 (en) * 2021-09-03 2025-06-24 Applied Materials, Inc. Shutter disk for physical vapor deposition (PVD) chamber

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JP2021174001A (ja) * 2020-04-28 2021-11-01 ヴァイアヴィ・ソリューションズ・インコーポレイテッドViavi Solutions Inc. 水素化シリコン及び銀を備える誘導送信フィルタ
US12392945B2 (en) 2020-04-28 2025-08-19 Viavi Solutions Inc. Induced transmission filter with hydrogenated silicon, silver, and silicon dioxide

Also Published As

Publication number Publication date
US20180011331A1 (en) 2018-01-11
SG11201607119UA (en) 2016-10-28
TW201939074A (zh) 2019-10-01
US20150293363A1 (en) 2015-10-15
TW201602650A (zh) 2016-01-16
TWI667501B (zh) 2019-08-01
EP3129823A1 (en) 2017-02-15
SG10201809273VA (en) 2018-11-29
US9746678B2 (en) 2017-08-29
CN106170730A (zh) 2016-11-30
WO2015156991A1 (en) 2015-10-15
EP3129823A4 (en) 2017-11-22

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