CN106170730A - 光波分离网格与形成光波分离网格的方法 - Google Patents

光波分离网格与形成光波分离网格的方法 Download PDF

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Publication number
CN106170730A
CN106170730A CN201580018587.1A CN201580018587A CN106170730A CN 106170730 A CN106170730 A CN 106170730A CN 201580018587 A CN201580018587 A CN 201580018587A CN 106170730 A CN106170730 A CN 106170730A
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China
Prior art keywords
layer
substrate
vapor deposition
chamber
physical vapor
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CN201580018587.1A
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English (en)
Chinese (zh)
Inventor
丹尼尔·李·迪尔
曹勇
朱鸣伟
陈台周
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Applied Materials Inc
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Applied Materials Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • G02B27/1013—Beam splitting or combining systems for splitting or combining different wavelengths for colour or multispectral image sensors, e.g. splitting an image into monochromatic image components on respective sensors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Laminated Bodies (AREA)
CN201580018587.1A 2014-04-11 2015-03-24 光波分离网格与形成光波分离网格的方法 Pending CN106170730A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201461978803P 2014-04-11 2014-04-11
US61/978,803 2014-04-11
US14/291,712 US9746678B2 (en) 2014-04-11 2014-05-30 Light wave separation lattices and methods of forming light wave separation lattices
US14/291,712 2014-05-30
PCT/US2015/022119 WO2015156991A1 (en) 2014-04-11 2015-03-24 Light wave separation lattices and methods of forming light wave separation lattices

Publications (1)

Publication Number Publication Date
CN106170730A true CN106170730A (zh) 2016-11-30

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CN201580018587.1A Pending CN106170730A (zh) 2014-04-11 2015-03-24 光波分离网格与形成光波分离网格的方法

Country Status (7)

Country Link
US (2) US9746678B2 (enExample)
EP (1) EP3129823A4 (enExample)
JP (1) JP2017516914A (enExample)
CN (1) CN106170730A (enExample)
SG (2) SG10201809273VA (enExample)
TW (2) TWI667501B (enExample)
WO (1) WO2015156991A1 (enExample)

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CN108666328A (zh) * 2017-04-01 2018-10-16 奇景光电股份有限公司 影像感测器
CN112384831A (zh) * 2018-06-29 2021-02-19 应用材料公司 使用可流动cvd对用于光学部件的微米/纳米结构所进行的间隙填充
CN113568081A (zh) * 2020-04-28 2021-10-29 唯亚威通讯技术有限公司 利用氢化硅和银的感应透射滤波器

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US11935771B2 (en) 2021-02-17 2024-03-19 Applied Materials, Inc. Modular mainframe layout for supporting multiple semiconductor process modules or chambers
US11935770B2 (en) 2021-02-17 2024-03-19 Applied Materials, Inc. Modular mainframe layout for supporting multiple semiconductor process modules or chambers
US12338527B2 (en) * 2021-09-03 2025-06-24 Applied Materials, Inc. Shutter disk for physical vapor deposition (PVD) chamber

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Cited By (5)

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Publication number Priority date Publication date Assignee Title
CN108666328A (zh) * 2017-04-01 2018-10-16 奇景光电股份有限公司 影像感测器
CN108666328B (zh) * 2017-04-01 2020-05-05 奇景光电股份有限公司 影像感测器
CN112384831A (zh) * 2018-06-29 2021-02-19 应用材料公司 使用可流动cvd对用于光学部件的微米/纳米结构所进行的间隙填充
CN113568081A (zh) * 2020-04-28 2021-10-29 唯亚威通讯技术有限公司 利用氢化硅和银的感应透射滤波器
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Also Published As

Publication number Publication date
US20180011331A1 (en) 2018-01-11
SG11201607119UA (en) 2016-10-28
TW201939074A (zh) 2019-10-01
US20150293363A1 (en) 2015-10-15
JP2017516914A (ja) 2017-06-22
TW201602650A (zh) 2016-01-16
TWI667501B (zh) 2019-08-01
EP3129823A1 (en) 2017-02-15
SG10201809273VA (en) 2018-11-29
US9746678B2 (en) 2017-08-29
WO2015156991A1 (en) 2015-10-15
EP3129823A4 (en) 2017-11-22

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