JP2017515885A5 - - Google Patents
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- Publication number
- JP2017515885A5 JP2017515885A5 JP2016575311A JP2016575311A JP2017515885A5 JP 2017515885 A5 JP2017515885 A5 JP 2017515885A5 JP 2016575311 A JP2016575311 A JP 2016575311A JP 2016575311 A JP2016575311 A JP 2016575311A JP 2017515885 A5 JP2017515885 A5 JP 2017515885A5
- Authority
- JP
- Japan
- Prior art keywords
- butyl
- hydrogen
- trimethylsilyl
- group
- tert
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201461952633P | 2014-03-13 | 2014-03-13 | |
| US61/952,633 | 2014-03-13 | ||
| PCT/US2015/019604 WO2015138390A1 (en) | 2014-03-13 | 2015-03-10 | Molybdenum silylcyclopentadienyl and silylallyl complexes and use thereof in thin film deposition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017515885A JP2017515885A (ja) | 2017-06-15 |
| JP2017515885A5 true JP2017515885A5 (enExample) | 2018-04-26 |
| JP6471371B2 JP6471371B2 (ja) | 2019-02-20 |
Family
ID=52829313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016575311A Active JP6471371B2 (ja) | 2014-03-13 | 2015-03-10 | モリブデンシルシクロペンタジエニル錯体、シリルアリル錯体、及び、薄膜堆積におけるその使用 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10745430B2 (enExample) |
| EP (1) | EP3116884B1 (enExample) |
| JP (1) | JP6471371B2 (enExample) |
| KR (1) | KR101819482B1 (enExample) |
| CN (1) | CN106460170B (enExample) |
| IL (1) | IL247719A (enExample) |
| SG (1) | SG11201607587YA (enExample) |
| TW (1) | TWI660958B (enExample) |
| WO (1) | WO2015138390A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10155783B2 (en) | 2013-05-28 | 2018-12-18 | Merck Patent Gmbh | Manganese complexes and use thereof for preparing thin films |
| WO2018046391A1 (en) * | 2016-09-09 | 2018-03-15 | Merck Patent Gmbh | Metal complexes containing allyl ligands |
| KR102727616B1 (ko) * | 2016-10-07 | 2024-11-07 | 삼성전자주식회사 | 유기 금속 전구체, 이를 이용한 막 형성 방법 및 이를 이용한 반도체 장치의 제조 방법 |
| US10453744B2 (en) | 2016-11-23 | 2019-10-22 | Entegris, Inc. | Low temperature molybdenum film deposition utilizing boron nucleation layers |
| US20180142345A1 (en) * | 2016-11-23 | 2018-05-24 | Entegris, Inc. | Low temperature molybdenum film deposition utilizing boron nucleation layers |
| WO2019166318A1 (en) * | 2018-03-02 | 2019-09-06 | Asml Netherlands B.V. | Method and apparatus for forming a patterned layer of material |
| KR102355507B1 (ko) | 2018-11-14 | 2022-01-27 | (주)디엔에프 | 몰리브덴 함유 박막의 제조방법 및 이로부터 제조된 몰리브덴함유 박막 |
| WO2021144334A1 (en) * | 2020-01-16 | 2021-07-22 | Merck Patent Gmbh | Ruthenium-containing films deposited on ruthenium-titanium nitride films and methods of forming the same |
| JP7433132B2 (ja) * | 2020-05-19 | 2024-02-19 | 東京エレクトロン株式会社 | 成膜方法及び成膜装置 |
| CN111777649A (zh) * | 2020-07-16 | 2020-10-16 | 苏州欣溪源新材料科技有限公司 | 二烷基二茂钼类配合物及其制备方法与应用 |
| KR20220011092A (ko) | 2020-07-20 | 2022-01-27 | 에이에스엠 아이피 홀딩 비.브이. | 전이 금속층을 포함하는 구조체를 형성하기 위한 방법 및 시스템 |
| TWI878570B (zh) * | 2020-07-20 | 2025-04-01 | 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 | 用於沉積鉬層之方法及系統 |
| US11434254B2 (en) | 2021-01-12 | 2022-09-06 | Applied Materials, Inc. | Dinuclear molybdenum precursors for deposition of molybdenum-containing films |
| US11390638B1 (en) | 2021-01-12 | 2022-07-19 | Applied Materials, Inc. | Molybdenum(VI) precursors for deposition of molybdenum films |
| US11459347B2 (en) | 2021-01-12 | 2022-10-04 | Applied Materials, Inc. | Molybdenum(IV) and molybdenum(III) precursors for deposition of molybdenum films |
| US11760768B2 (en) | 2021-04-21 | 2023-09-19 | Applied Materials, Inc. | Molybdenum(0) precursors for deposition of molybdenum films |
| WO2025041856A1 (ja) * | 2023-08-24 | 2025-02-27 | ダイキン工業株式会社 | 金属錯体 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE613119A (enExample) * | 1961-01-25 | |||
| JPH07107190B2 (ja) | 1984-03-30 | 1995-11-15 | キヤノン株式会社 | 光化学気相成長方法 |
| JPS63196243A (ja) | 1987-02-09 | 1988-08-15 | Hiroyuki Hamano | 肉の削り節及びその製造方法 |
| US5352488A (en) * | 1993-05-14 | 1994-10-04 | Syracuse University | Chemical vapor deposition process employing metal pentadienyl complexes |
| US6491978B1 (en) * | 2000-07-10 | 2002-12-10 | Applied Materials, Inc. | Deposition of CVD layers for copper metallization using novel metal organic chemical vapor deposition (MOCVD) precursors |
| TWI425110B (zh) * | 2007-07-24 | 2014-02-01 | 辛格瑪艾瑞契公司 | 以化學相沉積法製造含金屬薄膜之方法 |
| US20090203928A1 (en) * | 2008-01-24 | 2009-08-13 | Thompson David M | Organometallic compounds, processes for the preparation thereof and methods of use thereof |
| US20090199739A1 (en) * | 2008-01-24 | 2009-08-13 | Thompson David M | Organometallic compounds, processes for the preparation thereof and methods of use thereof |
| US20090205538A1 (en) | 2008-01-24 | 2009-08-20 | Thompson David M | Organometallic compounds, processes for the preparation thereof and methods of use thereof |
| DE102008036247A1 (de) | 2008-08-04 | 2010-02-11 | Merck Patent Gmbh | Elektronische Vorrichtungen enthaltend Metallkomplexe |
| SG178267A1 (en) * | 2009-08-07 | 2012-03-29 | Sigma Aldrich Co Llc | High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films |
| EP2609102B1 (en) | 2010-08-27 | 2014-12-31 | Sigma-Aldrich Co. LLC | Molybdenum (iv) amide precursors and use thereof in atomic layer deposition |
| US9175023B2 (en) | 2012-01-26 | 2015-11-03 | Sigma-Aldrich Co. Llc | Molybdenum allyl complexes and use thereof in thin film deposition |
| US8530348B1 (en) * | 2012-05-29 | 2013-09-10 | Intermolecular, Inc. | Integration of non-noble DRAM electrode |
| US9194040B2 (en) * | 2012-07-25 | 2015-11-24 | Applied Materials, Inc. | Methods for producing nickel-containing films |
| US10155783B2 (en) | 2013-05-28 | 2018-12-18 | Merck Patent Gmbh | Manganese complexes and use thereof for preparing thin films |
| GB201318595D0 (en) | 2013-10-21 | 2013-12-04 | Zephyros Inc | Improvements in or relating to laminates |
| JP6596737B2 (ja) | 2013-10-28 | 2019-10-30 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | アミドイミン配位子を含む金属複合体 |
-
2015
- 2015-03-10 WO PCT/US2015/019604 patent/WO2015138390A1/en not_active Ceased
- 2015-03-10 CN CN201580024681.8A patent/CN106460170B/zh active Active
- 2015-03-10 US US15/124,783 patent/US10745430B2/en active Active
- 2015-03-10 JP JP2016575311A patent/JP6471371B2/ja active Active
- 2015-03-10 EP EP15716201.7A patent/EP3116884B1/en active Active
- 2015-03-10 KR KR1020167028173A patent/KR101819482B1/ko not_active Expired - Fee Related
- 2015-03-10 SG SG11201607587YA patent/SG11201607587YA/en unknown
- 2015-03-13 TW TW104108214A patent/TWI660958B/zh active
-
2016
- 2016-09-08 IL IL247719A patent/IL247719A/en active IP Right Grant