JP2017506205A - 二酸化ケイ素粒子の製造方法 - Google Patents
二酸化ケイ素粒子の製造方法 Download PDFInfo
- Publication number
- JP2017506205A JP2017506205A JP2016551273A JP2016551273A JP2017506205A JP 2017506205 A JP2017506205 A JP 2017506205A JP 2016551273 A JP2016551273 A JP 2016551273A JP 2016551273 A JP2016551273 A JP 2016551273A JP 2017506205 A JP2017506205 A JP 2017506205A
- Authority
- JP
- Japan
- Prior art keywords
- silicon dioxide
- particles
- zirconium oxide
- amorphous silicon
- submicron particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 73
- 239000002245 particle Substances 0.000 title claims abstract description 46
- 235000012239 silicon dioxide Nutrition 0.000 title claims abstract description 30
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 26
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 21
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 14
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 12
- 238000006243 chemical reaction Methods 0.000 claims abstract description 7
- 238000005338 heat storage Methods 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 8
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 5
- 230000008018 melting Effects 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910021487 silica fume Inorganic materials 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 239000004567 concrete Substances 0.000 description 4
- 229910000519 Ferrosilicon Inorganic materials 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004570 mortar (masonry) Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 239000002912 waste gas Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 239000011398 Portland cement Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/182—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by reduction of a siliceous material, e.g. with a carbonaceous reducing agent and subsequent oxidation of the silicon monoxide formed
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/02—Amorphous compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/30—Particle morphology extending in three dimensions
- C01P2004/32—Spheres
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
Description
本発明は、非晶質二酸化ケイ素の球状サブミクロン粒子の製造方法を包含する。さらには、本発明は、それによって製造された非晶質二酸化ケイ素の球状サブミクロン粒子をも包含する。
従来技術によれば、サブミクロンの非晶質二酸化ケイ素粒子は、ケイ素−及びフェロシリコン炉のような炉からの廃ガスから製造される。エルケムAS(Elkem AS)は何年もの間、種々の炉からの廃ガスに関する技術及び微細な非晶質二酸化ケイ素粒子(マイクロシリカ)の製造を開発してきた。
マイクロシリカ粒子は一般に、およそ0.15ミクロンの粒径及び20乃至30m2/gの表面積(BET)を有している。比較的大きな比表面積は、コンクリートのような幾つかの用途となる場合、マイクロシリカ粒子の低いフロー特性に起因する欠点となる。
本発明の目的は、現存の技術の欠点を克服し、そして、サブミクロンの非晶質二酸化ケイ素の安定した且つ加速された製造方法を提供することである。
本発明の方法はまた、非晶質二酸化ケイ素SiO2のマイクロシリカ又は球状サブミクロン粒子の製造をも包含し得、それにより、二酸化ケイ素と還元剤炭素との混合物が、容器中の酸化ジルコニウムをベースとした溶融プールに添加される。
SiO2+C=SiO(g)+CO(g)
このように、本発明の方法は、カーボサーミック(carbothermic)プロセスである。
Claims (10)
- 非晶質二酸化ケイ素の球状サブミクロン粒子の製造方法であって、二酸化ケイ素及び還元剤を、酸化ジルコニウムをベースとした材料の溶融プールを含む反応容器中に注入し、ここで前記酸化ジルコニウムをベースとしたプールは蓄熱体としての役割を果たし、そして二酸化ケイ素を還元剤と反応させて亜酸化ケイ素蒸気SiOを生成させ、前記亜酸化ケイ素蒸気を前記非晶質二酸化ケイ素の球状サブミクロン粒子へと酸化させる、製造方法。
- 容器中の酸化ジルコニウムをベースとした材料の温度が、少なくとも前記材料の融点である、請求項1に記載の方法。
- 前記酸化ジルコニウムをベースとした溶融プールの温度は、下記範囲:2650乃至2800℃、2700乃至2710℃、2710乃至2720℃、2720乃至2800℃、2800乃至2900℃、2900乃至3000℃の1つより選択される、請求項1又は2に記載の方法。
- 前記得られた球状二酸化ケイ素粒子が、下記範囲:10−9乃至10−6m、10−9乃至10−8m、10−8乃至10−7m、10−7乃至10−6mの1つより選択される寸法を有する、請求項1乃至3のうちいずれか1項に記載の方法。
- 還元剤が炭素である、請求項1に記載の方法。
- 前記ガスを酸化ジルコニウムに注入する、請求項1乃至5のうちいずれか1項に記載の方法。
- 前記ガスが、不活性ガス及び窒素から成る群より選択される、請求項6に記載の方法。
- 請求項1乃至7のうちいずれか1項によって製造された非晶質二酸化ケイ素の球状サブミクロン粒子。
- 前記粒子は、5乃至15m2/gの比表面積を有する、請求項8に記載の非晶質二酸化ケイ素の球状サブミクロン粒子。
- 前記粒子は、10乃至12m2/gの比表面積を有する、請求項9に記載の非晶質二酸化ケイ素の球状サブミクロン粒子。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NO20140237A NO337545B1 (no) | 2014-02-24 | 2014-02-24 | Fremgangsmåte for fremstilling av silisiumdioksidpartikler |
NO20140237 | 2014-02-24 | ||
PCT/NO2015/050039 WO2015126262A1 (en) | 2014-02-24 | 2015-02-23 | Process for the production of silicon dioxide particles |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017506205A true JP2017506205A (ja) | 2017-03-02 |
JP6286573B2 JP6286573B2 (ja) | 2018-02-28 |
Family
ID=53878644
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016551273A Active JP6286573B2 (ja) | 2014-02-24 | 2015-02-23 | 二酸化ケイ素粒子の製造方法 |
Country Status (10)
Country | Link |
---|---|
US (1) | US10011496B2 (ja) |
EP (1) | EP3110757B1 (ja) |
JP (1) | JP6286573B2 (ja) |
CN (1) | CN106103345B (ja) |
AU (1) | AU2015219582B2 (ja) |
BR (1) | BR112016017801B1 (ja) |
CA (1) | CA2935056C (ja) |
MX (1) | MX2016008843A (ja) |
NO (1) | NO337545B1 (ja) |
WO (1) | WO2015126262A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114288948B (zh) * | 2021-12-26 | 2022-09-30 | 江苏中腾石英材料科技股份有限公司 | 一种火焰法制备纳米高纯二氧化硅的装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002154820A (ja) * | 2000-11-15 | 2002-05-28 | Nippon Aerosil Co Ltd | 非晶質微細シリカ粒子とその用途 |
JP2002362919A (ja) * | 2001-06-06 | 2002-12-18 | Denki Kagaku Kogyo Kk | シリカ超微粉の製造方法 |
JP2009215088A (ja) * | 2008-03-07 | 2009-09-24 | Nihon Yamamura Glass Co Ltd | 球状シリカガラス微粒子及びその製法 |
JP2010215485A (ja) * | 2009-03-13 | 2010-09-30 | Padiant Technology Co | 高純度シリコン材料の製造方法 |
JP2012227449A (ja) * | 2011-04-21 | 2012-11-15 | Nippon Shokubai Co Ltd | 非晶質シリカ粒子 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2573057A (en) * | 1947-09-11 | 1951-10-30 | Kaiser Aluminium Chem Corp | Process of preparing white finely divided amorphous silica |
NL197592A (ja) * | 1954-05-28 | 1900-01-01 | ||
NL261314A (ja) * | 1960-02-26 | |||
FR2243153A1 (en) * | 1973-09-10 | 1975-04-04 | Electricity Council | Ultrafine particles of silica or alumina - prepd by arc reducing coarse particles and reoxidising metal vapour |
EP0024456B1 (en) * | 1977-08-11 | 1983-12-07 | Elkem A/S | Thermoplastic resin compositions containing a filler and artifacts formed therefrom |
KR950001660B1 (ko) * | 1989-04-07 | 1995-02-28 | 니혼 쇼꾸바이 가가꾸 고오교 가부시기가이샤 | 무기산화물 입자의 제조법 |
EP0703188B1 (en) | 1994-09-22 | 1999-03-31 | Asea Brown Boveri Ag | Method of producing a mixed metal oxide powder and mixed metal oxide powder produced according to the method |
NO310142B1 (no) | 1999-03-29 | 2001-05-28 | Elkem Materials | Fremgangsmåte for fremstilling av amorft silica fra silisium og fra silisiumholdige materialer |
US6495114B1 (en) * | 1999-07-22 | 2002-12-17 | Fina Research, S.A. | Production of silica particles |
DE60133416T2 (de) * | 2000-06-20 | 2009-04-02 | Nippon Aerosil Co., Ltd. | Amorphe feinpartikel aus siliziumdioxid, verfahren zu ihrer herstellung und verwendung. |
EP1474361B1 (de) | 2002-01-18 | 2006-08-02 | Wacker Chemie AG | Verfahren zur herstellung von organohalogensilanen aus amorphem silizium |
CN102249240A (zh) | 2011-06-08 | 2011-11-23 | 浙江大学 | 利用硅藻土制备高纯单质硅的制备方法 |
-
2014
- 2014-02-24 NO NO20140237A patent/NO337545B1/no unknown
-
2015
- 2015-02-23 EP EP15751855.6A patent/EP3110757B1/en active Active
- 2015-02-23 CN CN201580007950.XA patent/CN106103345B/zh active Active
- 2015-02-23 US US15/107,769 patent/US10011496B2/en active Active
- 2015-02-23 AU AU2015219582A patent/AU2015219582B2/en active Active
- 2015-02-23 CA CA2935056A patent/CA2935056C/en active Active
- 2015-02-23 JP JP2016551273A patent/JP6286573B2/ja active Active
- 2015-02-23 BR BR112016017801-7A patent/BR112016017801B1/pt active IP Right Grant
- 2015-02-23 MX MX2016008843A patent/MX2016008843A/es unknown
- 2015-02-23 WO PCT/NO2015/050039 patent/WO2015126262A1/en active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002154820A (ja) * | 2000-11-15 | 2002-05-28 | Nippon Aerosil Co Ltd | 非晶質微細シリカ粒子とその用途 |
JP2002362919A (ja) * | 2001-06-06 | 2002-12-18 | Denki Kagaku Kogyo Kk | シリカ超微粉の製造方法 |
JP2009215088A (ja) * | 2008-03-07 | 2009-09-24 | Nihon Yamamura Glass Co Ltd | 球状シリカガラス微粒子及びその製法 |
JP2010215485A (ja) * | 2009-03-13 | 2010-09-30 | Padiant Technology Co | 高純度シリコン材料の製造方法 |
JP2012227449A (ja) * | 2011-04-21 | 2012-11-15 | Nippon Shokubai Co Ltd | 非晶質シリカ粒子 |
Also Published As
Publication number | Publication date |
---|---|
EP3110757B1 (en) | 2019-07-03 |
CN106103345A (zh) | 2016-11-09 |
JP6286573B2 (ja) | 2018-02-28 |
MX2016008843A (es) | 2017-04-13 |
NO20140237A1 (no) | 2015-08-25 |
US20160318769A1 (en) | 2016-11-03 |
CA2935056C (en) | 2019-03-05 |
BR112016017801A2 (ja) | 2017-08-08 |
AU2015219582A1 (en) | 2016-10-06 |
US10011496B2 (en) | 2018-07-03 |
EP3110757A1 (en) | 2017-01-04 |
BR112016017801B1 (pt) | 2022-03-22 |
CA2935056A1 (en) | 2015-08-27 |
CN106103345B (zh) | 2018-01-02 |
AU2015219582B2 (en) | 2017-04-20 |
EP3110757A4 (en) | 2017-10-11 |
NO337545B1 (no) | 2016-05-02 |
WO2015126262A1 (en) | 2015-08-27 |
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