JP2017174873A - 発光素子 - Google Patents
発光素子 Download PDFInfo
- Publication number
- JP2017174873A JP2017174873A JP2016056443A JP2016056443A JP2017174873A JP 2017174873 A JP2017174873 A JP 2017174873A JP 2016056443 A JP2016056443 A JP 2016056443A JP 2016056443 A JP2016056443 A JP 2016056443A JP 2017174873 A JP2017174873 A JP 2017174873A
- Authority
- JP
- Japan
- Prior art keywords
- region
- protective film
- upper electrode
- electrode
- stacked body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 112
- 230000001681 protective effect Effects 0.000 claims abstract description 90
- 238000001579 optical reflectometry Methods 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 238000000605 extraction Methods 0.000 abstract description 19
- 230000006866 deterioration Effects 0.000 description 10
- 239000000758 substrate Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910017750 AgSn Inorganic materials 0.000 description 1
- 229910005887 NiSn Inorganic materials 0.000 description 1
- 229910004541 SiN Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000009545 invasion Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12041—LED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0016—Processes relating to electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0066—Processes relating to semiconductor body packages relating to arrangements for conducting electric current to or from the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Led Devices (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
図1は、本実施形態に係る発光素子100の上面視を示す図である。図2は、発光素子100の構成を説明するための部分断面図である。図3は、発光素子100において半導体積層体10の上面及び下面に設けられている部材が配置された領域を説明するための上面図である。図4は、実施形態2に係る発光素子200の構成を説明するための部分断面図である。なお、図3において、ハッチングで示す領域は、上面視において下部電極12が設けられた領域を示すものであり、断面を示すものではない。
本実施形態に係る発光素子200について、図4を参照して説明する。
10n n側半導体層
10a 活性層
10p p側半導体層
11 上部電極
11a 外部接続部
11b 延伸部
111 第1上部電極
112 第2上部電極
12 下部電極
13 保護膜
14 絶縁部材
15 接合部材
16 基板
100、200 発光素子
Claims (9)
- 半導体積層体と、
前記半導体積層体の上面の一部に設けられた上部電極と、
前記半導体積層体の下面のうち前記上部電極の直下領域から離間した領域に設けられた光反射性を有する下部電極と、
前記上部電極の表面と、前記半導体積層体の上面と、に連続して設けられた保護膜と、を有し、
前記下部電極の直上領域に設けられた前記保護膜の厚みは、前記上部電極の表面と、前記上部電極が設けられた領域の近傍領域における前記半導体積層体の上面と、に連続して設けられた前記保護膜の厚みよりも薄い発光素子。 - 前記保護膜は、上面視において、前記下部電極の直上領域だけが薄く形成されている請求項1に記載の発光素子。
- 前記下部電極の直上領域に設けられた前記保護膜の厚みは、前記上部電極の表面と、前記近傍領域における前記半導体積層体の上面と、に設けられた前記保護膜の厚みの40%以下である請求項1又は2に記載の発光素子。
- 半導体積層体と、
前記半導体積層体の上面の一部に設けられた上部電極と、
前記半導体積層体の下面のうち前記上部電極の直下領域から離間して設けられた光反射性を有する下部電極と、
前記上部電極の表面と、前記半導体積層体の上面と、に連続して設けられた保護膜と、を有し、
前記下部電極の直上領域には、前記保護膜が設けられていない発光素子。 - 前記半導体積層体の下面のうち前記上部電極の直下領域を含む領域には、絶縁部材が設けられている請求項1から4のいずれか一項に記載の発光素子。
- 前記上部電極は、外部と接続するための外部接続部と、前記外部接続部から延伸して設けられた延伸部を有し、
前記保護膜は、前記延伸部の表面と、前記延伸部が設けられた領域の近傍領域における前記半導体積層体の上面と、に連続して設けられ、
前記延伸部の表面と、前記延伸部が設けられた領域の近傍領域における前記半導体積層体の上面と、に設けられた前記保護膜の厚みは、前記下部電極の直上領域に設けられた前記保護膜の厚みよりも厚い請求項1から5のいずれか一項に記載の発光素子。 - 前記上部電極は、半導体積層体の上面の一部に設けられた第1上部電極と、前記第1上部電極上に設けられた第2上部電極と、を有し、
前記保護膜の端部は、前記第1上部電極と前記第2上部電極との間に介在している請求項1から6のいずれか一項に記載の発光素子。 - 前記下部電極は、AgまたはAgを主成分とする合金からなる請求項1から7のいずれか一項に記載の発光素子。
- 上面視において、前記近傍領域の外縁は、前記上部電極の端部から15μm以上30μm以下の距離にある請求項1から8のいずれか一項に記載の発光素子。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016056443A JP6668863B2 (ja) | 2016-03-22 | 2016-03-22 | 発光素子 |
KR1020170026707A KR20170110005A (ko) | 2016-03-22 | 2017-02-28 | 발광 소자 |
CN201710152765.0A CN107221592B (zh) | 2016-03-22 | 2017-03-15 | 发光元件 |
US15/462,362 US9947832B2 (en) | 2016-03-22 | 2017-03-17 | Light-emitting device |
EP17161739.2A EP3223321B1 (en) | 2016-03-22 | 2017-03-20 | Light-emitting device |
US15/918,776 US10403795B2 (en) | 2016-03-22 | 2018-03-12 | Light-emitting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016056443A JP6668863B2 (ja) | 2016-03-22 | 2016-03-22 | 発光素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017174873A true JP2017174873A (ja) | 2017-09-28 |
JP6668863B2 JP6668863B2 (ja) | 2020-03-18 |
Family
ID=58360935
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016056443A Active JP6668863B2 (ja) | 2016-03-22 | 2016-03-22 | 発光素子 |
Country Status (5)
Country | Link |
---|---|
US (2) | US9947832B2 (ja) |
EP (1) | EP3223321B1 (ja) |
JP (1) | JP6668863B2 (ja) |
KR (1) | KR20170110005A (ja) |
CN (1) | CN107221592B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10217895B2 (en) * | 2017-06-22 | 2019-02-26 | Epistar Corporation | Method of forming a light-emitting device |
Citations (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003168823A (ja) * | 2001-09-18 | 2003-06-13 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体発光素子 |
WO2003065464A1 (fr) * | 2002-01-28 | 2003-08-07 | Nichia Corporation | Dispositif a semi-conducteur a base de nitrure comprenant un substrat de support, et son procede de realisation |
JP2005033197A (ja) * | 2003-06-20 | 2005-02-03 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
JP2006041403A (ja) * | 2004-07-29 | 2006-02-09 | Nichia Chem Ind Ltd | 半導体発光素子 |
JP2006351596A (ja) * | 2005-06-13 | 2006-12-28 | Sumitomo Electric Ind Ltd | 発光装置 |
JP2008192782A (ja) * | 2007-02-05 | 2008-08-21 | Toyota Central R&D Labs Inc | 電極及びそれを有するiii族窒化物系化合物半導体発光素子 |
JP2008282851A (ja) * | 2007-05-08 | 2008-11-20 | Hitachi Cable Ltd | 半導体発光素子 |
JP2010050318A (ja) * | 2008-08-22 | 2010-03-04 | Stanley Electric Co Ltd | 半導体発光装置の製造方法及び半導体発光装置 |
JP2010272724A (ja) * | 2009-05-22 | 2010-12-02 | Showa Denko Kk | 発光ダイオード及び発光ダイオードランプ、並びに照明装置 |
JP2011035017A (ja) * | 2009-07-30 | 2011-02-17 | Hitachi Cable Ltd | 発光素子 |
JP2011198992A (ja) * | 2010-03-19 | 2011-10-06 | Hitachi Cable Ltd | 半導体発光素子 |
JP2011243956A (ja) * | 2010-05-18 | 2011-12-01 | Seoul Opto Devices Co Ltd | 高効率発光ダイオード及びその製造方法 |
JP2011249510A (ja) * | 2010-05-26 | 2011-12-08 | Toshiba Corp | 発光素子 |
JP2012138479A (ja) * | 2010-12-27 | 2012-07-19 | Toshiba Corp | 発光素子およびその製造方法 |
WO2012141031A1 (ja) * | 2011-04-11 | 2012-10-18 | 日亜化学工業株式会社 | 半導体発光素子及びその製造方法 |
JP2013229598A (ja) * | 2012-04-26 | 2013-11-07 | Lg Innotek Co Ltd | 発光素子及び発光素子パッケージ |
WO2014072254A1 (de) * | 2012-11-12 | 2014-05-15 | Osram Opto Semiconductors Gmbh | Optoelektronischer halbleiterchip und verfahren zur herstellung von optoelektronischen halbleiterchips |
US20140252390A1 (en) * | 2013-03-11 | 2014-09-11 | Samsung Electronics Co., Ltd. | Semiconductor light-emitting device |
JP2014236070A (ja) * | 2013-05-31 | 2014-12-15 | ウシオ電機株式会社 | 窒化物半導体発光素子 |
US20140367722A1 (en) * | 2011-12-23 | 2014-12-18 | Seoul Viosys Co., Ltd. | Light emitting diode and method for manufacturing same |
JP2015079953A (ja) * | 2013-09-13 | 2015-04-23 | 日亜化学工業株式会社 | 発光素子 |
JP2015177132A (ja) * | 2014-03-17 | 2015-10-05 | ウシオ電機株式会社 | 半導体発光素子及びその製造方法 |
JP2015228497A (ja) * | 2014-05-30 | 2015-12-17 | エルジー イノテック カンパニー リミテッド | 発光素子 |
KR20150142412A (ko) * | 2014-06-12 | 2015-12-22 | 엘지이노텍 주식회사 | 발광소자 |
JP2016018974A (ja) * | 2014-07-11 | 2016-02-01 | ウシオ電機株式会社 | 半導体発光素子 |
JP2017108005A (ja) * | 2015-12-10 | 2017-06-15 | ウシオ電機株式会社 | 半導体発光素子及びその製造方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19517697A1 (de) * | 1995-05-13 | 1996-11-14 | Telefunken Microelectron | Strahlungsemittierende Diode |
JP2006253298A (ja) | 2005-03-09 | 2006-09-21 | Toshiba Corp | 半導体発光素子及び半導体発光装置 |
US7675670B2 (en) * | 2005-10-28 | 2010-03-09 | Miradia Inc. | Fabrication of a high fill ratio silicon spatial light modulator |
US8115222B2 (en) * | 2008-01-16 | 2012-02-14 | Rohm Co., Ltd. | Semiconductor light emitting device and fabrication method for the semiconductor light emitting device |
CN102067336B (zh) * | 2008-08-19 | 2012-11-28 | 晶能光电(江西)有限公司 | 基于应力可调InGaAlN薄膜的发光器件 |
JP5282503B2 (ja) * | 2008-09-19 | 2013-09-04 | 日亜化学工業株式会社 | 半導体発光素子 |
KR101072034B1 (ko) | 2009-10-15 | 2011-10-10 | 엘지이노텍 주식회사 | 반도체 발광소자 및 그 제조방법 |
KR101654340B1 (ko) * | 2009-12-28 | 2016-09-06 | 서울바이오시스 주식회사 | 발광 다이오드 |
US9136436B2 (en) * | 2010-02-09 | 2015-09-15 | Epistar Corporation | Optoelectronic device and the manufacturing method thereof |
KR101014155B1 (ko) * | 2010-03-10 | 2011-02-10 | 엘지이노텍 주식회사 | 발광 소자, 발광 소자 제조방법 및 발광 소자 패키지 |
JP4997304B2 (ja) | 2010-03-11 | 2012-08-08 | 株式会社東芝 | 半導体発光素子及びその製造方法 |
JP2011192708A (ja) | 2010-03-12 | 2011-09-29 | Hitachi Cable Ltd | 半導体発光素子および半導体発光素子の製造方法 |
JP5737066B2 (ja) * | 2010-08-26 | 2015-06-17 | 日亜化学工業株式会社 | 半導体発光素子 |
KR101707118B1 (ko) * | 2010-10-19 | 2017-02-15 | 엘지이노텍 주식회사 | 발광소자 및 그 발광 소자의 제조 방법 |
CN103283045B (zh) * | 2010-12-28 | 2016-08-17 | 首尔伟傲世有限公司 | 高效发光二极管 |
JP2012142508A (ja) | 2011-01-06 | 2012-07-26 | Hitachi Cable Ltd | 半導体素子用ウェハ |
JP2014060294A (ja) | 2012-09-18 | 2014-04-03 | Ushio Inc | Led素子及びその製造方法 |
JP2014170815A (ja) | 2013-03-01 | 2014-09-18 | Ushio Inc | Led素子 |
TWI637534B (zh) * | 2013-11-29 | 2018-10-01 | 晶元光電股份有限公司 | 發光裝置 |
KR102142711B1 (ko) * | 2013-12-30 | 2020-08-07 | 엘지이노텍 주식회사 | 발광소자 |
US10126831B2 (en) * | 2015-10-16 | 2018-11-13 | Seoul Viosys Co., Ltd. | Compact light emitting diode chip, light emitting device and electronic device including the same |
-
2016
- 2016-03-22 JP JP2016056443A patent/JP6668863B2/ja active Active
-
2017
- 2017-02-28 KR KR1020170026707A patent/KR20170110005A/ko active IP Right Grant
- 2017-03-15 CN CN201710152765.0A patent/CN107221592B/zh active Active
- 2017-03-17 US US15/462,362 patent/US9947832B2/en active Active
- 2017-03-20 EP EP17161739.2A patent/EP3223321B1/en active Active
-
2018
- 2018-03-12 US US15/918,776 patent/US10403795B2/en active Active
Patent Citations (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003168823A (ja) * | 2001-09-18 | 2003-06-13 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体発光素子 |
WO2003065464A1 (fr) * | 2002-01-28 | 2003-08-07 | Nichia Corporation | Dispositif a semi-conducteur a base de nitrure comprenant un substrat de support, et son procede de realisation |
JP2005033197A (ja) * | 2003-06-20 | 2005-02-03 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
JP2006041403A (ja) * | 2004-07-29 | 2006-02-09 | Nichia Chem Ind Ltd | 半導体発光素子 |
JP2006351596A (ja) * | 2005-06-13 | 2006-12-28 | Sumitomo Electric Ind Ltd | 発光装置 |
JP2008192782A (ja) * | 2007-02-05 | 2008-08-21 | Toyota Central R&D Labs Inc | 電極及びそれを有するiii族窒化物系化合物半導体発光素子 |
JP2008282851A (ja) * | 2007-05-08 | 2008-11-20 | Hitachi Cable Ltd | 半導体発光素子 |
JP2010050318A (ja) * | 2008-08-22 | 2010-03-04 | Stanley Electric Co Ltd | 半導体発光装置の製造方法及び半導体発光装置 |
JP2010272724A (ja) * | 2009-05-22 | 2010-12-02 | Showa Denko Kk | 発光ダイオード及び発光ダイオードランプ、並びに照明装置 |
JP2011035017A (ja) * | 2009-07-30 | 2011-02-17 | Hitachi Cable Ltd | 発光素子 |
JP2011198992A (ja) * | 2010-03-19 | 2011-10-06 | Hitachi Cable Ltd | 半導体発光素子 |
JP2011243956A (ja) * | 2010-05-18 | 2011-12-01 | Seoul Opto Devices Co Ltd | 高効率発光ダイオード及びその製造方法 |
JP2011249510A (ja) * | 2010-05-26 | 2011-12-08 | Toshiba Corp | 発光素子 |
JP2012138479A (ja) * | 2010-12-27 | 2012-07-19 | Toshiba Corp | 発光素子およびその製造方法 |
WO2012141031A1 (ja) * | 2011-04-11 | 2012-10-18 | 日亜化学工業株式会社 | 半導体発光素子及びその製造方法 |
US20140367722A1 (en) * | 2011-12-23 | 2014-12-18 | Seoul Viosys Co., Ltd. | Light emitting diode and method for manufacturing same |
JP2013229598A (ja) * | 2012-04-26 | 2013-11-07 | Lg Innotek Co Ltd | 発光素子及び発光素子パッケージ |
WO2014072254A1 (de) * | 2012-11-12 | 2014-05-15 | Osram Opto Semiconductors Gmbh | Optoelektronischer halbleiterchip und verfahren zur herstellung von optoelektronischen halbleiterchips |
US20140252390A1 (en) * | 2013-03-11 | 2014-09-11 | Samsung Electronics Co., Ltd. | Semiconductor light-emitting device |
JP2014236070A (ja) * | 2013-05-31 | 2014-12-15 | ウシオ電機株式会社 | 窒化物半導体発光素子 |
JP2015079953A (ja) * | 2013-09-13 | 2015-04-23 | 日亜化学工業株式会社 | 発光素子 |
JP2015177132A (ja) * | 2014-03-17 | 2015-10-05 | ウシオ電機株式会社 | 半導体発光素子及びその製造方法 |
JP2015228497A (ja) * | 2014-05-30 | 2015-12-17 | エルジー イノテック カンパニー リミテッド | 発光素子 |
KR20150142412A (ko) * | 2014-06-12 | 2015-12-22 | 엘지이노텍 주식회사 | 발광소자 |
JP2016018974A (ja) * | 2014-07-11 | 2016-02-01 | ウシオ電機株式会社 | 半導体発光素子 |
JP2017108005A (ja) * | 2015-12-10 | 2017-06-15 | ウシオ電機株式会社 | 半導体発光素子及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP3223321A1 (en) | 2017-09-27 |
CN107221592A (zh) | 2017-09-29 |
CN107221592B (zh) | 2021-07-27 |
JP6668863B2 (ja) | 2020-03-18 |
KR20170110005A (ko) | 2017-10-10 |
EP3223321B1 (en) | 2024-05-01 |
US10403795B2 (en) | 2019-09-03 |
US20170279007A1 (en) | 2017-09-28 |
US9947832B2 (en) | 2018-04-17 |
US20180204981A1 (en) | 2018-07-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5676396B2 (ja) | 高光抽出led用の基板除去方法 | |
US9123865B2 (en) | Semiconductor light emitting element | |
JP2010171376A (ja) | Iii族窒化物系化合物半導体発光素子 | |
JP5659728B2 (ja) | 発光素子 | |
TWI613837B (zh) | 半導體發光裝置 | |
JP5945736B2 (ja) | 発光素子 | |
TW201637241A (zh) | 半導體發光元件、發光裝置及半導體發光元件之製造方法 | |
JP6668863B2 (ja) | 発光素子 | |
JP4868833B2 (ja) | 半導体発光素子及び発光装置 | |
JP6332301B2 (ja) | 発光素子 | |
TWI688117B (zh) | 半導體發光裝置 | |
JP6432280B2 (ja) | 発光装置の製造方法 | |
JP7135482B2 (ja) | 半導体発光装置 | |
KR101611480B1 (ko) | 반도체 발광소자 | |
JP2023113378A (ja) | 発光素子 | |
JP6183235B2 (ja) | 窒化物半導体発光素子 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20170221 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20180801 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20190424 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190514 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20190708 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190911 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20191008 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191120 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200128 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200210 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6668863 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |