JP2017143153A - 超格子メモリ及びクロスポイント型メモリ装置 - Google Patents
超格子メモリ及びクロスポイント型メモリ装置 Download PDFInfo
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- 230000015654 memory Effects 0.000 title claims abstract description 64
- 239000004065 semiconductor Substances 0.000 claims abstract description 31
- 150000001786 chalcogen compounds Chemical class 0.000 claims abstract description 25
- 238000010030 laminating Methods 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims abstract description 5
- 229910005900 GeTe Inorganic materials 0.000 claims description 19
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 87
- 239000013078 crystal Substances 0.000 description 9
- 230000008859 change Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 4
- 230000006870 function Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 229910052798 chalcogen Inorganic materials 0.000 description 2
- 150000001787 chalcogens Chemical class 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000012782 phase change material Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/20—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/15—Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
- H01L29/151—Compositional structures
- H01L29/152—Compositional structures with quantum effects only in vertical direction, i.e. layered structures with quantum effects solely resulting from vertical potential variation
- H01L29/155—Comprising only semiconductor materials
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
- H10N70/235—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect between different crystalline phases, e.g. cubic and hexagonal
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/24—Multistable switching devices, e.g. memristors based on migration or redistribution of ionic species, e.g. anions, vacancies
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
- H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
- H10N70/8828—Tellurides, e.g. GeSbTe
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Abstract
Description
図1及び図2は、第1の実施形態に係わるクロスポイント型メモリ装置の概略構成を説明するためのもので、図1は斜視図、図2は等価回路図である。
図5及び図6は、第2の実施形態に係わるクロスポイント型メモリ装置を説明するためのもので、図5はクロスポイント型メモリ装置の概略構成を示す斜視図、図6は超格子メモリの素子構造を示す断面図である。なお、図1及び図3と同一部分には同一符号を付して、その詳しい説明は省略する。
図7及び図8は、第3の実施形態に係わるクロスポイント型メモリ装置を説明するためもので、図7はクロスポイント型メモリ装置の概略構成を示す斜視図、図8は超格子メモリの素子構造を示す断面図である。なお、図1及び図3と同一部分には同一符号を付して、その詳しい説明は省略する。
なお、本発明は上述した各実施形態に限定されるものではない。
WL…ワード線
10…基板
11…下部電極
12…埋め込み絶縁膜
13…n型Si層(半導体層)
14…上部電極
15…層間絶縁膜
20…超格子メモリセル
21…Sb2Te3 層(第1のカルコゲン化合物層)
22…GeTe層(第2のカルコゲン化合物層)
30…ダイオード
40…超格子構造部
51…Sb2Te3 層
52…Ge2Sb2Te5 合金セル
53…非晶質ドーム
Claims (8)
- 第1のカルコゲン化合物層と該層とは組成の異なる第2のカルコゲン化合物層とを交互に積層してなる超格子構造部と、
前記超格子構造部と電極との間に設けられた第1導電型の半導体層と、
を具備したことを特徴とする超格子メモリ。 - 前記第1のカルコゲン化合物層はSbをむ第2導電型であり、前記第2のカルコゲン化合物層はGeを含み、前記第1のカルコゲン化合物層は前記半導体層上に設けられていることを特徴とする請求項1に記載の超格子メモリ。
- 前記第1のカルコゲン化合物層はSb2Te3 層であり、前記第2のカルコゲン化合物層はGeTe層であり、前記Sb2Te3 層は前記半導体層上に設けられていることを特徴とする請求項1に記載の超格子メモリ。
- 前記半導体層は、アモルファスSi、ポリGe、又はInGaZnOであることを特徴とする請求項1〜3の何れかに記載の超格子メモリ。
- 互いに平行配置された複数のビット線と、
前記ビット線に交差するように、互いに平行配置された複数のワード線と、
前記ビット線と前記ワード線との各交差部にそれぞれ配置され、第1のカルコゲン化合物層と該層とは組成の異なる第2のカルコゲン化合物層とを交互に積層してなる超格子メモリセルと、
前記ビット線又は前記ワード線と前記超格子メモリセルとの間に設けられた第1導電型の半導体層と、
を具備したことを特徴とするクロスポイント型メモリ装置。 - 前記第1のカルコゲン化合物層はSbを含む第2導電型であり、前記第2のカルコゲン化合物層はGeを含み、前記第1のカルコゲン化合物層は前記半導体層上に設けられていることを特徴とする請求項5に記載のクロスポイント型メモリ装置。
- 前記第1のカルコゲン化合物層はSb2Te3 層であり、前記第2のカルコゲン化合物層はGeTe層であり、前記Sb2Te3 層は前記半導体層上に設けられていることを特徴とする請求項5に記載のクロスポイント型メモリ装置。
- 前記半導体層は、アモルファスSi、ポリGe、又はInGaZnOであることを特徴とする請求項5〜7の何れかに記載のクロスポイント型メモリ装置。
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JP2016022984A JP6505619B2 (ja) | 2016-02-09 | 2016-02-09 | 超格子メモリ及びクロスポイント型メモリ装置 |
US15/427,402 US10026780B2 (en) | 2016-02-09 | 2017-02-08 | Superlattice memory and crosspoint memory device |
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Cited By (2)
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WO2020012916A1 (ja) * | 2018-07-10 | 2020-01-16 | 国立研究開発法人産業技術総合研究所 | 積層構造体及びその製造方法並びに半導体デバイス |
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US10832753B2 (en) * | 2017-07-31 | 2020-11-10 | General Electric Company | Components including structures having decoupled load paths |
KR20210081783A (ko) | 2019-12-24 | 2021-07-02 | 삼성전자주식회사 | 가변 저항 메모리 장치 |
KR20240030817A (ko) * | 2022-08-31 | 2024-03-07 | 삼성전자주식회사 | 메모리 소자 및 이를 포함하는 메모리 장치 |
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