JP2017110219A - 研磨液、研磨液セット及び基体の研磨方法 - Google Patents
研磨液、研磨液セット及び基体の研磨方法 Download PDFInfo
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- JP2017110219A JP2017110219A JP2016242138A JP2016242138A JP2017110219A JP 2017110219 A JP2017110219 A JP 2017110219A JP 2016242138 A JP2016242138 A JP 2016242138A JP 2016242138 A JP2016242138 A JP 2016242138A JP 2017110219 A JP2017110219 A JP 2017110219A
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Abstract
Description
本明細書において、「工程」との語は、独立した工程だけではなく、他の工程と明確に区別できない場合であってもその工程の所期の作用が達成されれば、本用語に含まれる。「〜」を用いて示された数値範囲は、「〜」の前後に記載される数値をそれぞれ最小値及び最大値として含む範囲を示す。組成物中の各成分の量は、組成物中に各成分に該当する物質が複数存在する場合、特に断らない限り、組成物中に存在する当該複数の物質の合計量を意味する。「研磨速度(Polishing Rate)」とは、単位時間当たりに材料が除去される速度(除去速度=Removal Rate)を意味する。「被研磨材料」とは、被研磨面に露出している材料を意味する。「研磨対象材料」とは、高い研磨速度で積極的に研磨して除去すべき材料を意味する。「A又はB」とは、A及びBのどちらか一方を含んでいればよく、両方とも含んでいてもよい。数値範囲の「A以上」とは、A、及び、Aを超える範囲を意味する。数値範囲の「A以下」とは、A、及び、A未満の範囲を意味する。
本実施形態に係る研磨液(SiOC研磨用研磨液)は、研磨時に被研磨面に触れる組成物であり、例えばCMP用研磨液である。本実施形態に係る研磨液は、砥粒と、特定の多糖類と、水とを少なくとも含有し、研磨液のpHが6.0以上である。以下、必須成分、及び、任意に添加できる成分について説明する。
本実施形態において、砥粒は、SiOCに対する研磨作用が得られる観点から、セリウムを含む。セリウムを含む砥粒の構成成分としては、酸化セリウム(セリア)、セリウム水酸化物、硝酸アンモニウムセリウム、酢酸セリウム、硫酸セリウム水和物、臭素酸セリウム、臭化セリウム、塩化セリウム、シュウ酸セリウム、硝酸セリウム、炭酸セリウム、セリウム変性物等が挙げられる。セリウム変性物としては、酸化セリウム、セリウム水酸化物等を含む粒子の表面をアルキル基で変性したもの、セリウムを含む粒子の表面にその他の粒子を付着させた複合粒子などが挙げられる。砥粒は、SiOCの研磨速度が安定する観点から、酸化セリウム及びセリウム水酸化物からなる群より選ばれる少なくとも一種を含むことが好ましく、酸化セリウムを含むことがより好ましい。セリウムを含む砥粒としては、酸化セリウムを含む粒子(以下、「酸化セリウム粒子」という)、セリウム水酸化物を含む粒子(セリウム水酸化物粒子)等を用いることができる。
本実施形態に係る研磨液は、添加剤を含有する。ここで、「添加剤」とは、研磨速度、研磨選択性等の研磨特性;砥粒の分散性、保存安定性等の研磨液特性などを調整するために、砥粒及び水以外に研磨液が含有する物質を指す。
本実施形態に係る研磨液は、添加剤として、下記式(I−A)で表される構造単位、及び、下記式(I−B)で表される構造単位からなる群より選ばれる少なくとも一種を有する多糖類を含有する。このような多糖類を用いることで、SiOCの研磨速度を向上させる効果が得られる。このような効果が得られる要因は明らかではないが、例えば下記の要因が挙げられる。すなわち、多糖類のエーテル結合部位がSiOCに作用し、SiOCの表面が親水化する。その結果、砥粒がSiOCへ付着しやすくなり、研磨速度が向上すると考えられる。一方、多糖類以外の、エーテル結合を有する高分子もSiOCに作用すると考えられるが、エーテル結合以外の部分が砥粒と立体反発することでSiOCの研磨速度の向上効果が低い場合、SiOCの研磨速度を低下させる場合等があると考えられる。
使用機器:LC−20AD(株式会社島津製作所製)
カラム:Gelpack GL−W540+550
溶離液:0.1M NaCl水溶液
測定温度:40℃
カラムサイズ:10.7mmI.D.×300mm
流量:1.0mL/min(Lはリットルを表す。以下同じ)
試料濃度:0.2質量%
検出器:RID−10A(株式会社島津製作所製)
本実施形態に係る研磨液は、カルボン酸基及びカルボン酸塩基からなる群より選ばれる少なくとも一種を有する高分子化合物Aを含有してもよい。これにより、ストッパ材料(窒化珪素、ポリシリコン等)の研磨速度を更に低減することが可能であり、ストッパ材料(窒化珪素、ポリシリコン等)に対するSiOCの研磨速度比を更に大きくすることができる。高分子化合物Aは、一種類単独で又は二種類以上を組み合わせて使用できる。高分子化合物Aとしては、アクリル酸及びメタクリル酸からなる群より選ばれる少なくとも一種を含む単量体を重合させて得られる重合体又はその塩(以下、これらを「(メタ)アクリル酸系重合体」と総称する)であることが好ましい。前記単量体は、アクリル酸又はメタクリル酸と共重合可能な他の単量体(アクリル酸及びメタクリル酸を除く)を含んでいてもよい。
{測定条件}
使用機器(検出器):株式会社日立製作所製、「L−3300型」液体クロマトグラフ用示差屈折率計
ポンプ:株式会社日立製作所製、液体クロマトグラフ用「L−7100」
デガス装置:なし
データ処理:株式会社日立製作所製、GPCインテグレーター「D−2520」
カラム:昭和電工株式会社製、「Shodex Asahipak GF−710HQ」、内径7.6mm×300mm
溶離液:50mM−Na2HPO4水溶液/アセトニトリル=90/10(v/v)
測定温度:25℃
流量:0.6mL/分
測定時間:30分
試料:樹脂分濃度2質量%になるように溶離液と同じ組成の溶液で濃度を調整し、0.45μmのポリテトラフルオロエチレンフィルターでろ過して調製した試料
注入量:0.4μL
標準物質:Polymer Laboratories製、狭分子量ポリアクリル酸ナトリウム
本実施形態に係る研磨液は、有機酸及び有機酸塩からなる群より選ばれる少なくとも一種の有機酸成分Bを含有してもよい。これにより、研磨終了後の被研磨材料(例えば、SiOC等の酸化珪素)の平坦性を向上させやすくなる。より詳細には、凹凸を有する被研磨面を研磨した場合に、研磨時間を短縮できることに加え、一部が過剰に研磨されて皿のように凹む現象(いわゆるディッシング)が生じることを抑制しやすくなる。また、オーバー研磨耐性が顕著に向上する。
o−アミノフェノール、m−アミノフェノール、p−アミノフェノール等のフェノール類;
メタンスルホン酸、エタンスルホン酸、プロパンスルホン酸、ブタンスルホン酸、ペンタンスルホン酸、ヘキサンスルホン酸、ヘプタンスルホン酸、オクタンスルホン酸、ノナンスルホン酸、デカンスルホン酸、ウンデカンスルホン酸、ドデカンスルホン酸、トリデカンスルホン酸、テトラデカンスルホン酸、ペンタデカンスルホン酸、ヘキサデカンスルホン酸、ヘプタデカンスルホン酸、オクタデカンスルホン酸、ベンゼンスルホン酸、ナフタレンスルホン酸、トルエンスルホン酸(例えばp−トルエンスルホン酸)、ヒドロキシエタンスルホン酸、ヒドロキシフェノールスルホン酸、アントラセンスルホン酸等のスルホン酸;
デシルホスホン酸、フェニルホスホン酸等のホスホン酸が好ましい。カルボン酸は、砥粒の分散性を向上させる等の効果が期待される。
本実施形態に係る研磨液は、非イオン性高分子(前記高分子化合物Aを除く)を含有することができる。これにより、ストッパ材料(窒化珪素、ポリシリコン等)の研磨速度を低減することが可能であり、ストッパ材料(窒化珪素、ポリシリコン等)に対するSiOCの研磨速度比を大きくすることができる。
本実施形態に係る研磨液は、分散剤(前記高分子化合物A及び非イオン性高分子を除く)を含有することができる。分散剤の含有量は、砥粒の全質量を基準として0.001〜4質量%が好ましい。分散剤としては、例えば、水溶性陰イオン性分散剤、水溶性非イオン性分散剤、水溶性陽イオン性分散剤、及び、水溶性両性分散剤が挙げられる。中でも、静電反発力が大きく分散性が良好である観点から、水溶性陰イオン性分散剤又は水溶性陽イオン性分散剤が好ましい。なお、砥粒の分散のために前記高分子化合物A又は前記非イオン性界面活性剤を用いることもできる。
研磨液は、pH調整剤を含有してもよい。ただし、pH調整剤を含まなくても研磨液が所定のpH範囲にある場合は、pH調整剤は特に添加しなくてもよい。
本実施形態に係る研磨液は、研磨速度等の研磨特性;砥粒の分散性などの特性を調整する目的で、その他の添加剤を更に含有していてもよい。その他の添加剤は、一種類単独で又は二種類以上を組み合わせて使用できる。
研磨液の媒体である水としては、特に制限されないが、脱イオン水、イオン交換水、超純水等が好ましい。
本実施形態に係る研磨液のpHは、SiOCの研磨速度が向上する効果を得る観点から、6.0以上である。本実施形態に係る研磨液のpHは、SiOCの研磨速度が向上する効果が得られやすい観点から、6.5以上が好ましく、7.0以上がより好ましく、7.5以上が更に好ましく、8.0以上が特に好ましい。本実施形態に係る研磨液のpHは、安全性の観点から、12以下が好ましく、11以下がより好ましく、10以下が更に好ましく、9.5以下が特に好ましい。pHは、液温25℃におけるpHと定義する。
本実施形態に係る研磨液は、砥粒、前記多糖類及び水を少なくとも含む一液式研磨液として保存してもよく、スラリ(第一の液)と添加液(第二の液)とを混合して前記研磨液となるように前記研磨液の構成成分をスラリと添加液とに分けた二液式の研磨液セット(例えばCMP用研磨液セット)として保存してもよい。スラリは、例えば、砥粒及び水を少なくとも含む。添加液は、例えば、前記多糖類及び水を少なくとも含む。前記多糖類、及び、その他の添加剤は、スラリ及び添加液のうち添加液に含まれることが好ましい。ただし、砥粒の分散性を向上させる効果のある添加剤については、スラリ及び添加液のうちスラリに含まれることが好ましい。例えば、研磨液セットは、前記研磨液の構成成分がスラリ(第一の液)と添加液(第二の液)とに分けて保存され、前記スラリが砥粒及び水を含み、前記添加液が前記多糖類及び水を含む態様であってもよい。なお、前記研磨液の構成成分は、三液以上に分けた研磨液セットとして保存してもよい。
本実施形態に係る研磨液の製造方法は、SiOCの少なくとも一部をCMPによって除去するための研磨液の製造方法である。本実施形態に係る研磨液の製造方法は、少なくとも、砥粒と、多糖類と、水と、を混合して研磨液を得る研磨液製造工程を備える。研磨液製造工程において、各成分が同時に混合されてもよく、各成分が順次混合されてもよい。本実施形態に係る研磨液の製造方法は、研磨液製造工程の前に、セリウムを含む砥粒を得る工程を備えていてもよい。
本実施形態に係る研磨方法は、研磨液を用いて、SiOCを含む被研磨面を研磨する工程を備える。本実施形態に係る基体の研磨方法は、前記一液式研磨液を用いて基体の被研磨面を研磨する研磨工程を備えていてもよく、前記研磨液セットにおけるスラリと添加液とを混合して得られる研磨液を用いて基体の被研磨面を研磨する研磨工程を備えていてもよい。また、本実施形態に係る基体の研磨方法は、単独又は複数の被研磨材料を有する基体の研磨方法であってもよく、例えば、前記一液式研磨液、又は、前記研磨液セットにおけるスラリと添加液とを混合して得られる研磨液を用いて、SiOCをストッパ材料に対して選択的に研磨する研磨工程を備えていてもよい。この場合、基体は、例えば、SiOCを含む部材と、ストッパ材料を含む部材(ストッパ)とを有していてもよい。ストッパ材料としては、窒化珪素、ポリシリコン等の材料が好ましく、窒化珪素がより好ましい。
市販の炭酸セリウム水和物40kgをアルミナ製容器に入れ、830℃、空気中で2時間焼成することにより黄白色の粉末を20kg得た。この粉末の相同定をX線回折法で行ったところ、酸化セリウムであることを確認した。得られた酸化セリウム粉末20kgを、ジェットミルを用いて乾式粉砕し、酸化セリウム粒子を含む酸化セリウム粉末を得た。
(実施例1)
前記で作製した酸化セリウム粉末200.0gと、脱イオン水795.0gとを混合した後、ポリアクリル酸アンモニウム水溶液(重量平均分子量:8000、40質量%)5gを添加した。攪拌しながら超音波分散を行い、酸化セリウム分散液を得た。超音波分散は、超音波周波数400kHz、分散時間20分で行った。
実施例1と同様の手順で混合し、表1〜表3に示すCMP用研磨液を調製した。添加剤としては、粉末還元澱粉分解物(A2、三菱商事フードテック株式会社、商品名:PO−10)、高度分岐環状デキストリン(A3、グリコ栄養食品株式会社製、商品名:Cluster Dexirin)、デキストラン(A4、和光純薬工業株式会社製、和光一級、平均分子量:32000〜45000、商品名:デキストラン40000)、D(+)−グルコース(A5、和光純薬工業株式会社製、分子量:180.16)、N−アセチルグルコサミン(A6、富山薬品工業株式会社製)を用いた。実施例12では、多糖類とポリアクリル酸とを含有する研磨液を調製した。実施例13では、多糖類とポリアクリル酸とポリグリセリン(非イオン性高分子、阪本薬品工業株式会社製、商品名:PGL#750)とを含有する研磨液を調製した。比較例1では、添加剤を含有しない研磨液を調製した。
水、表3の添加剤(A1、スクロース、和光純薬工業株式会社製、和光一級、分子量:342.30)、pH調整剤、及び、シリカ粒子を含む水分散液の順にこれらを同一容器内に配合した後に混合して、シリカ粒子10.00質量%及び添加剤1.00質量%を含有するCMP用研磨液を調製した。なお、シリカ粒子として、平均粒径(平均二次粒径)が70nmであるコロイダルシリカを用いた。
前記CMP用研磨液のpHをpHメータ(電気化学計器株式会社製の型番PHL−40)で測定した。フタル酸塩pH緩衝液(pH4.01)と中性リン酸塩pH緩衝液(pH6.86)とホウ酸塩pH緩衝液(pH9.18)とを標準緩衝液として用いてpHメータを3点校正した後、pHメータの電極を研磨液に入れて、2分以上経過して安定した後の値を測定した。測定結果を表1〜表3に示す。
CMP評価用試験ウエハとして、パターンが形成されていない以下のブランケット基板(Blanketウェハ)(a)〜(c)のそれぞれを使用した。
ブランケット基板(a):SiOC膜(Lam Research社製)をシリコン(Si)基板(直径:300mm)上に有する基板。
ブランケット基板(b):窒化珪素膜をシリコン(Si)基板(直径:300mm)上に有する基板。
ブランケット基板(c):ポリシリコン膜をシリコン(Si)基板(直径:300mm)上に有する基板。
A1:スクロース
A2:PO−10(粉末還元澱粉分解物)
A3:Cluster Dexirin(高度分岐環状デキストリン)
A4:デキストラン40000(デキストラン)
A5:D(+)−グルコース
A6:N−アセチルグルコサミン
Claims (11)
- 前記砥粒が、酸化セリウム及びセリウム水酸化物からなる群より選ばれる少なくとも一種を含む、請求項1に記載の研磨液。
- pH調整剤を更に含有する、請求項1又は2に記載の研磨液。
- カルボン酸基及びカルボン酸塩基からなる群より選ばれる少なくとも一種を有する高分子化合物を更に含有する、請求項1〜3のいずれか一項に記載の研磨液。
- 前記高分子化合物の含有量が、当該研磨液の全質量を基準として0.001〜2質量%である、請求項4に記載の研磨液。
- 非イオン性高分子を更に含有する、請求項1〜5のいずれか一項に記載の研磨液。
- 有機酸を更に含有する、請求項1〜6のいずれか一項に記載の研磨液。
- SiOCを含む被研磨面を研磨するために使用される、請求項1〜7のいずれか一項に記載の研磨液。
- 請求項1〜8のいずれか一項に記載の研磨液の構成成分が第一の液と第二の液とに分けて保存され、前記第一の液が前記砥粒及び水を含み、前記第二の液が前記多糖類及び水を含む、研磨液セット。
- 請求項1〜8のいずれか一項に記載の研磨液を用いて基体の被研磨面を研磨する工程を備える、基体の研磨方法。
- 請求項9に記載の研磨液セットにおける前記第一の液と前記第二の液とを混合して得られる研磨液を用いて基体の被研磨面を研磨する工程を備える、基体の研磨方法。
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