JP2017098351A - 半導体装置および半導体装置の製造方法 - Google Patents
半導体装置および半導体装置の製造方法 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 127
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 52
- 230000015556 catabolic process Effects 0.000 claims description 18
- 238000007751 thermal spraying Methods 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 7
- 239000011347 resin Substances 0.000 claims description 7
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 229920002050 silicone resin Polymers 0.000 description 16
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 11
- 230000005684 electric field Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 10
- 229910010271 silicon carbide Inorganic materials 0.000 description 10
- 239000011810 insulating material Substances 0.000 description 8
- 239000012535 impurity Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910002601 GaN Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910004349 Ti-Al Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910004692 Ti—Al Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
[先行技術文献]
[特許文献]
[特許文献1] 特開2013−251338号公報
[特許文献2] 特開2013−080893号公報
[特許文献3] 特開2013−065719号公報
[特許文献4] 特開2008−016726号公報
[特許文献5] 特表2007−503128号公報
Claims (12)
- 耐圧構造を有する半導体装置であって、
半導体基板と、
前記半導体基板上の半導体層と、
前記半導体層の上方の表面電極と、
前記半導体基板の下方の裏面電極と、
前記半導体基板の側面に設けられ、前記半導体基板よりも低い誘電率を有する延長部と、
前記延長部における上面および側面の少なくともいずれかに設けられ、前記表面電極および前記裏面電極と電気的に接続された抵抗部と
を備える
半導体装置。 - 前記抵抗部は、前記延長部の前記側面の全面に設けられている
請求項1に記載の半導体装置。 - 前記延長部の前記上面の全面に前記抵抗部が設けられている
請求項1または2に記載の半導体装置。 - 前記延長部は、
前記半導体基板の前記側面から離間しており、前記側面を囲む外側部と、
前記外側部と前記半導体基板の前記側面との間に位置しており、樹脂を有する内側部と
を含む、請求項1から3のいずれか一項に記載の半導体装置。 - 前記延長部上に設けられ、前記表面電極と前記抵抗部とを電気的に接続する上部導電部材をさらに備える
請求項4に記載の半導体装置。 - 前記上部導電部材の外側端部は、前記延長部の前記内側部の上方に位置する
請求項5に記載の半導体装置。 - 前記上部導電部材の外側端部は、前記延長部の前記外側部の上方に位置する
請求項5に記載の半導体装置。 - 前記延長部の前記外側部の上面は、前記半導体基板と前記半導体層との境界よりも上に位置する
請求項4から7のいずれか一項に記載の半導体装置。 - 前記裏面電極の裏面側に設けられ、前記裏面電極に電気的に接続された導電性板と、
前記延長部の前記側面に設けられた前記抵抗部と前記導電性板とを電気的に接続する下部導電部材と
をさらに備える
請求項1から8のいずれか一項に記載の半導体装置。 - 耐圧構造を有する半導体装置の製造方法であって、
半導体基板の下方に設けられた裏面電極と、前記半導体基板の側面から離間して前記側面を囲んでおり前記半導体基板よりも低い誘電率を有する外側部とを、前記裏面電極に電気的に接続する導電性板上において導電性接着剤を介して固定する段階と、
前記半導体基板と前記外側部との間に樹脂を流し込み、内側部を形成する段階と、
前記内側部を形成する段階の後に、前記外側部および前記内側部を有する延長部における上面および側面の少なくともいずれかに、前記半導体基板の上方の表面電極と前記裏面電極とに電気的に接続された抵抗部を溶射により形成する段階と
を備える、半導体装置の製造方法。 - 前記延長部上に、前記表面電極と前記抵抗部とを電気的に接続する上部導電部材を形成する段階をさらに備える
請求項10に記載の半導体装置の製造方法。 - 前記延長部の前記外側部に設けられた前記抵抗部と前記導電性板とを電気的に接続する下部導電部材を形成する段階をさらに備える
請求項10または11に記載の半導体装置の製造方法。
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