JP2017045869A - プラズマ処理方法 - Google Patents
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- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
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- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
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- 230000004913 activation Effects 0.000 description 2
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- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
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Abstract
Description
図1は、プラズマ処理装置100の一例を示す断面図である。プラズマ処理装置100は、気密に構成され、電気的に接地電位とされたチャンバ1を有する。チャンバ1は、例えば表面に陽極酸化処理が施されたアルミニウム等により、略円筒状に形成される。チャンバ1の上部の開口には、シャワーヘッド16が設けられ、その上には、円筒状の接地導体1aが設けられている。チャンバ1内には、被処理体の一例である半導体ウエハWを水平に支持する載置台2が設けられている。
本実施例において処理される半導体ウエハWは、例えば図2に示すような構造である。図2は、半導体ウエハWの一例を示す断面図である。半導体ウエハWは、絶縁膜20上に、有機膜21、マスク膜22、およびフォトレジスト(PR)23が、この順に積層されて形成される。絶縁膜20は、例えばSiO2等の酸化膜である。有機膜21は、例えばスピンオンカーボン膜等の有機誘電体層(ODL:Organic Dielectric Layer)である。マスク膜22は、例えばシリコン含有反射防止膜(SiARC)である。なお、他の例として、マスク膜22は、有機膜21上にSiON膜が積層され、その上に有機反射防止膜(BARC)が積層された2層構造であってもよい。フォトレジスト23は、例えば、EUV光を用いて所定のパターンが形成されたEUVレジストである。フォトレジスト23は、レジスト膜の一例である。
次に、図2に示した半導体ウエハWに対して行われるプラズマ処理について説明する。図3は、実施例1におけるプラズマ処理方法の一例を示すフローチャートである。
図8は、実施例2におけるプラズマ処理方法の一例を示すフローチャートである。なお、図8において、図3と同一の符号を付した処理は、図3において説明した処理と同様であるため、詳細な説明を省略する。
図13は、実施例3におけるプラズマ処理方法の一例を示すフローチャートである。なお、図13において、図3または図8と同一の符号を付した処理は、図3または図8において説明した処理と同様であるため、詳細な説明を省略する。
図17は、実施例4におけるプラズマ処理方法の一例を示すフローチャートである。まず、第1のプラズマ処理装置100において、ゲートバルブGが開かれ、半導体ウエハWが搬送ロボット等により、開口部74からチャンバ1内に搬入され、静電チャック6上に載置される(S200)。そして、ゲートバルブGが閉じられ、半導体ウエハWが静電チャック6に吸着保持される。そして、排気装置73の真空ポンプによりチャンバ1内が所定の真空度まで排気される。
100 プラズマ処理装置
1 チャンバ
2 載置台
16 シャワーヘッド
20 絶縁膜
21 有機膜
22 マスク膜
23 フォトレジスト
Claims (6)
- 有機膜、マスク膜、およびレジスト膜が順に積層された被処理体をプラズマにより処理するプラズマ処理方法であって、
前記レジスト膜に所定のパターンが形成された前記被処理体が搬入されたチャンバ内にH2ガス、ハロゲン化水素ガス、または、希ガスとH2ガスまたはハロゲン化水素ガスとを含む混合ガスである改質ガスを供給する工程と、
−20℃以下の処理温度で、前記改質ガスのプラズマにより前記被処理体の前記レジスト膜を改質する改質工程と
を有することを特徴とするプラズマ処理方法。 - 前記チャンバ内にエッチング用の第1の処理ガスを供給する工程と、
0℃以上40℃以下の範囲内の処理温度で、前記第1の処理ガスのプラズマにより、前記改質工程で改質された前記レジスト膜をマスクとして、前記マスク膜をエッチングする第1のエッチング工程と
を有することを特徴とする請求項1に記載のプラズマ処理方法。 - 前記第1の処理ガスには、
ハロゲン化化合物ガスであって、CF結合またはSF結合を含むガスが含まれることを特徴とする請求項2に記載のプラズマ処理方法。 - 前記チャンバ内にエッチング用の第2の処理ガスを供給する工程と、
−20℃以下の処理温度で、前記第2の処理ガスのプラズマにより、前記第1のエッチング工程でエッチングされた前記マスク膜をマスクとして、前記有機膜をエッチングする第2のエッチング工程と
を有することを特徴とする請求項2または3に記載のプラズマ処理方法。 - 前記チャンバ内にエッチング用の第2の処理ガスを供給する工程と、
−20℃以下の処理温度で、前記第2の処理ガスのプラズマにより、前記改質工程で改質された前記レジスト膜のパターンが転写された前記マスク膜をマスクとして、前記有機膜をエッチングする第2のエッチング工程と
を有することを特徴とする請求項1に記載のプラズマ処理方法。 - 前記第2の処理ガスには、
希ガスと酸素原子を含むガスとの混合ガスが含まれることを特徴とする請求項4または5に記載のプラズマ処理方法。
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