JP2017036493A5 - - Google Patents

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Publication number
JP2017036493A5
JP2017036493A5 JP2016135523A JP2016135523A JP2017036493A5 JP 2017036493 A5 JP2017036493 A5 JP 2017036493A5 JP 2016135523 A JP2016135523 A JP 2016135523A JP 2016135523 A JP2016135523 A JP 2016135523A JP 2017036493 A5 JP2017036493 A5 JP 2017036493A5
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JP
Japan
Prior art keywords
gas
valve
channel
gas source
delivery system
Prior art date
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Application number
JP2016135523A
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English (en)
Japanese (ja)
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JP6976043B2 (ja
JP2017036493A (ja
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Priority claimed from US14/805,852 external-priority patent/US9631276B2/en
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Publication of JP2017036493A publication Critical patent/JP2017036493A/ja
Publication of JP2017036493A5 publication Critical patent/JP2017036493A5/ja
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Publication of JP6976043B2 publication Critical patent/JP6976043B2/ja
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JP2016135523A 2015-07-15 2016-07-08 原子層堆積中における化学物質の制御された分離および送出により低欠陥処理を可能にするシステムおよび方法 Active JP6976043B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201562192844P 2015-07-15 2015-07-15
US62/192,844 2015-07-15
US14/805,852 2015-07-22
US14/805,852 US9631276B2 (en) 2014-11-26 2015-07-22 Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition

Publications (3)

Publication Number Publication Date
JP2017036493A JP2017036493A (ja) 2017-02-16
JP2017036493A5 true JP2017036493A5 (enrdf_load_stackoverflow) 2019-08-15
JP6976043B2 JP6976043B2 (ja) 2021-12-01

Family

ID=57843186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016135523A Active JP6976043B2 (ja) 2015-07-15 2016-07-08 原子層堆積中における化学物質の制御された分離および送出により低欠陥処理を可能にするシステムおよび方法

Country Status (5)

Country Link
JP (1) JP6976043B2 (enrdf_load_stackoverflow)
KR (2) KR102620610B1 (enrdf_load_stackoverflow)
CN (1) CN106356285B (enrdf_load_stackoverflow)
SG (1) SG10201605682QA (enrdf_load_stackoverflow)
TW (1) TWI705153B (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6803815B2 (ja) * 2017-07-25 2020-12-23 東京エレクトロン株式会社 基板処理装置、及び、基板処理装置の運用方法
US10529543B2 (en) * 2017-11-15 2020-01-07 Taiwan Semiconductor Manufacturing Co., Ltd. Etch process with rotatable shower head
JP6902991B2 (ja) * 2017-12-19 2021-07-14 株式会社日立ハイテク プラズマ処理装置
WO2019195292A1 (en) * 2018-04-03 2019-10-10 Lam Research Corporation Mems coriolis gas flow controller
US11021792B2 (en) * 2018-08-17 2021-06-01 Lam Research Corporation Symmetric precursor delivery
CN113767453B (zh) 2020-04-03 2023-12-12 株式会社日立高新技术 等离子处理装置以及等离子处理方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62136871A (ja) * 1985-12-11 1987-06-19 Canon Inc 光センサ−、その製造方法及びその製造装置
US4660598A (en) * 1986-01-13 1987-04-28 Spraying Systems Co. Diaphragm-type antidrip valve
AU734902B2 (en) * 1996-08-21 2001-06-28 Fisher Controls International Llc Elastomeric element valve
US5939831A (en) * 1996-11-13 1999-08-17 Applied Materials, Inc. Methods and apparatus for pre-stabilized plasma generation for microwave clean applications
US7389792B2 (en) * 1998-12-24 2008-06-24 Nl Technologies, Ltd. Dip tube valve assembly
JP3736322B2 (ja) * 2000-04-26 2006-01-18 昭和電工株式会社 気相成長装置
JP2009267345A (ja) * 2008-04-01 2009-11-12 Hitachi Kokusai Electric Inc 基板処理装置
JP5270476B2 (ja) * 2009-07-07 2013-08-21 株式会社日立国際電気 半導体装置の製造方法及び基板処理装置
US8945317B2 (en) * 2011-12-07 2015-02-03 Lam Research Corporation System and method for cleaning gas injectors

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