JP2016518674A5 - - Google Patents

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Publication number
JP2016518674A5
JP2016518674A5 JP2016500318A JP2016500318A JP2016518674A5 JP 2016518674 A5 JP2016518674 A5 JP 2016518674A5 JP 2016500318 A JP2016500318 A JP 2016500318A JP 2016500318 A JP2016500318 A JP 2016500318A JP 2016518674 A5 JP2016518674 A5 JP 2016518674A5
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Japan
Prior art keywords
light beam
target material
pieces
amplified light
amplified
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JP2016500318A
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Japanese (ja)
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JP6471142B2 (ja
JP2016518674A (ja
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Priority claimed from US13/830,380 external-priority patent/US8791440B1/en
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JP2016500318A 2013-03-14 2014-02-20 極端紫外光を生成する方法 Active JP6471142B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/830,380 2013-03-14
US13/830,380 US8791440B1 (en) 2013-03-14 2013-03-14 Target for extreme ultraviolet light source
PCT/US2014/017496 WO2014143522A1 (en) 2013-03-14 2014-02-20 Target for extreme ultraviolet light source

Related Child Applications (1)

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JP2019007624A Division JP6685438B2 (ja) 2013-03-14 2019-01-21 極端紫外線光源用のターゲット

Publications (3)

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JP2016518674A JP2016518674A (ja) 2016-06-23
JP2016518674A5 true JP2016518674A5 (enExample) 2017-03-09
JP6471142B2 JP6471142B2 (ja) 2019-02-13

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JP2016500318A Active JP6471142B2 (ja) 2013-03-14 2014-02-20 極端紫外光を生成する方法
JP2019007624A Active JP6685438B2 (ja) 2013-03-14 2019-01-21 極端紫外線光源用のターゲット
JP2020062792A Active JP6944010B2 (ja) 2013-03-14 2020-03-31 極端紫外線光源用のターゲット

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JP2019007624A Active JP6685438B2 (ja) 2013-03-14 2019-01-21 極端紫外線光源用のターゲット
JP2020062792A Active JP6944010B2 (ja) 2013-03-14 2020-03-31 極端紫外線光源用のターゲット

Country Status (6)

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US (4) US8791440B1 (enExample)
JP (3) JP6471142B2 (enExample)
KR (2) KR102216594B1 (enExample)
CN (2) CN105190776B (enExample)
TW (2) TWI603162B (enExample)
WO (1) WO2014143522A1 (enExample)

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CN111490437A (zh) * 2019-04-15 2020-08-04 中国科学院物理研究所 利用激光与天线靶作用诱导频率可控微波辐射的装置和方法
JP7261683B2 (ja) * 2019-07-23 2023-04-20 ギガフォトン株式会社 極端紫外光生成システム及び電子デバイスの製造方法
KR102447685B1 (ko) * 2020-07-22 2022-09-27 포항공과대학교 산학협력단 특정 파장대의 광원을 발생시키기 위한 장치 및 방법
JP7561043B2 (ja) * 2021-01-20 2024-10-03 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法
KR102829791B1 (ko) * 2022-08-29 2025-07-07 주식회사 에프에스티 Euv 빔 최적화 장치
CN116184770B (zh) * 2023-02-01 2025-09-23 广东省智能机器人研究院 极紫外光生成系统、方法、控制装置、控制器和存储介质

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JP5722061B2 (ja) 2010-02-19 2015-05-20 ギガフォトン株式会社 極端紫外光源装置及び極端紫外光の発生方法
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