JP2017052855A5 - - Google Patents

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JP2017052855A5
JP2017052855A5 JP2015177099A JP2015177099A JP2017052855A5 JP 2017052855 A5 JP2017052855 A5 JP 2017052855A5 JP 2015177099 A JP2015177099 A JP 2015177099A JP 2015177099 A JP2015177099 A JP 2015177099A JP 2017052855 A5 JP2017052855 A5 JP 2017052855A5
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JP
Japan
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layer
ultraviolet light
deep ultraviolet
generation target
target according
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JP2015177099A
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Japanese (ja)
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JP6620328B2 (ja
JP2017052855A (ja
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JP2015177099A 2015-09-08 2015-09-08 深紫外光発生用ターゲット、深紫外光源および深紫外発光素子 Active JP6620328B2 (ja)

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Application Number Priority Date Filing Date Title
JP2015177099A JP6620328B2 (ja) 2015-09-08 2015-09-08 深紫外光発生用ターゲット、深紫外光源および深紫外発光素子

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015177099A JP6620328B2 (ja) 2015-09-08 2015-09-08 深紫外光発生用ターゲット、深紫外光源および深紫外発光素子

Publications (3)

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JP2017052855A JP2017052855A (ja) 2017-03-16
JP2017052855A5 true JP2017052855A5 (enExample) 2018-10-25
JP6620328B2 JP6620328B2 (ja) 2019-12-18

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JP2015177099A Active JP6620328B2 (ja) 2015-09-08 2015-09-08 深紫外光発生用ターゲット、深紫外光源および深紫外発光素子

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6774592B2 (ja) * 2015-09-08 2020-10-28 株式会社Flosfia 深紫外発光素子
JP6934852B2 (ja) * 2018-12-18 2021-09-15 信越化学工業株式会社 酸化ガリウム膜の製造方法
JP2023055415A (ja) * 2021-10-06 2023-04-18 学校法人 工学院大学 紫外線光源、オゾン発生装置、紫外線の放射方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008303119A (ja) * 2007-06-08 2008-12-18 Nippon Light Metal Co Ltd 高機能性Ｇａ２Ｏ３単結晶膜及びその製造方法
JP6390052B2 (ja) * 2014-08-29 2018-09-19 高知県公立大学法人 量子井戸構造および半導体装置
JP6620921B2 (ja) * 2015-02-25 2019-12-18 株式会社Flosfia 紫外線発光材料およびその製造方法
JP6422159B2 (ja) * 2015-02-25 2018-11-14 国立研究開発法人物質・材料研究機構 α−Ｇａ２Ｏ３単結晶、α−Ｇａ２Ｏ３の製造方法、および、それを用いた半導体素子
JP6774592B2 (ja) * 2015-09-08 2020-10-28 株式会社Flosfia 深紫外発光素子

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