JP2015515738A5 - - Google Patents

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Publication number
JP2015515738A5
JP2015515738A5 JP2014550210A JP2014550210A JP2015515738A5 JP 2015515738 A5 JP2015515738 A5 JP 2015515738A5 JP 2014550210 A JP2014550210 A JP 2014550210A JP 2014550210 A JP2014550210 A JP 2014550210A JP 2015515738 A5 JP2015515738 A5 JP 2015515738A5
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JP
Japan
Prior art keywords
liquid
optical
immersion
movable below
immersion space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014550210A
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English (en)
Japanese (ja)
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JP2015515738A (ja
JP6245179B2 (ja
Filing date
Publication date
Priority claimed from US13/793,667 external-priority patent/US9323160B2/en
Application filed filed Critical
Publication of JP2015515738A publication Critical patent/JP2015515738A/ja
Publication of JP2015515738A5 publication Critical patent/JP2015515738A5/ja
Application granted granted Critical
Publication of JP6245179B2 publication Critical patent/JP6245179B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014550210A 2012-04-10 2013-03-15 露光装置、露光方法、及びデバイス製造方法 Active JP6245179B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261622235P 2012-04-10 2012-04-10
US61/622,235 2012-04-10
US13/793,667 US9323160B2 (en) 2012-04-10 2013-03-11 Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US13/793,667 2013-03-11
PCT/JP2013/058454 WO2013153939A1 (en) 2012-04-10 2013-03-15 Liquid immersion member and exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017218195A Division JP6569717B2 (ja) 2012-04-10 2017-11-13 液浸部材、露光装置、及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2015515738A JP2015515738A (ja) 2015-05-28
JP2015515738A5 true JP2015515738A5 (enExample) 2016-04-14
JP6245179B2 JP6245179B2 (ja) 2017-12-13

Family

ID=49292050

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2014550210A Active JP6245179B2 (ja) 2012-04-10 2013-03-15 露光装置、露光方法、及びデバイス製造方法
JP2017218195A Active JP6569717B2 (ja) 2012-04-10 2017-11-13 液浸部材、露光装置、及びデバイス製造方法
JP2019145187A Pending JP2019191613A (ja) 2012-04-10 2019-08-07 液浸部材、及び、露光装置

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2017218195A Active JP6569717B2 (ja) 2012-04-10 2017-11-13 液浸部材、露光装置、及びデバイス製造方法
JP2019145187A Pending JP2019191613A (ja) 2012-04-10 2019-08-07 液浸部材、及び、露光装置

Country Status (8)

Country Link
US (4) US9323160B2 (enExample)
EP (1) EP2836875B1 (enExample)
JP (3) JP6245179B2 (enExample)
KR (1) KR102158968B1 (enExample)
CN (2) CN104350425B (enExample)
HK (2) HK1204682A1 (enExample)
TW (3) TWI658335B (enExample)
WO (1) WO2013153939A1 (enExample)

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NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
EP3057122B1 (en) 2013-10-08 2018-11-21 Nikon Corporation Immersion member, exposure apparatus, exposure method, and device manufacturing method
CN109690413B (zh) * 2016-09-12 2021-04-13 Asml荷兰有限公司 用于光刻设备的流体处理结构
WO2018141713A1 (en) * 2017-02-03 2018-08-09 Asml Netherlands B.V. Exposure apparatus
CN109856922B (zh) * 2017-11-30 2020-11-13 上海微电子装备（集团）股份有限公司 浸没流体控制装置、浸没式光刻系统与回收控制方法
KR102446678B1 (ko) 2017-12-15 2022-09-23 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법
JP6575629B2 (ja) * 2018-04-04 2019-09-18 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
CN117742084A (zh) * 2020-12-25 2024-03-22 浙江启尔机电技术有限公司 一种改善浸没流场压力特性的浸液供给回收装置

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US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US8300207B2 (en) * 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
JP2009088037A (ja) 2007-09-28 2009-04-23 Nikon Corp 露光方法及びデバイス製造方法、並びに露光装置
US8451425B2 (en) * 2007-12-28 2013-05-28 Nikon Corporation Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
US8610873B2 (en) 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
JP2011086804A (ja) * 2009-10-16 2011-04-28 Nikon Corp 液浸部材、露光装置、露光方法、及びデバイス製造方法
JP5232901B2 (ja) * 2011-07-22 2013-07-10 株式会社ニコン 露光装置及びデバイス製造方法
NL2009271A (en) 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

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