JP2015514304A5 - - Google Patents

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Publication number
JP2015514304A5
JP2015514304A5 JP2014550223A JP2014550223A JP2015514304A5 JP 2015514304 A5 JP2015514304 A5 JP 2015514304A5 JP 2014550223 A JP2014550223 A JP 2014550223A JP 2014550223 A JP2014550223 A JP 2014550223A JP 2015514304 A5 JP2015514304 A5 JP 2015514304A5
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JP
Japan
Prior art keywords
facing
optical
liquid
optical path
immersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2014550223A
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English (en)
Japanese (ja)
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JP2015514304A (ja
JP6447131B2 (ja
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Publication date
Priority claimed from US13/800,448 external-priority patent/US9268231B2/en
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Publication of JP2015514304A publication Critical patent/JP2015514304A/ja
Publication of JP2015514304A5 publication Critical patent/JP2015514304A5/ja
Application granted granted Critical
Publication of JP6447131B2 publication Critical patent/JP6447131B2/ja
Active legal-status Critical Current
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JP2014550223A 2012-04-10 2013-03-22 露光装置、露光方法、及びデバイス製造方法 Active JP6447131B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261622182P 2012-04-10 2012-04-10
US61/622,182 2012-04-10
US13/800,448 2013-03-13
US13/800,448 US9268231B2 (en) 2012-04-10 2013-03-13 Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
PCT/JP2013/059432 WO2013153965A1 (en) 2012-04-10 2013-03-22 Liquid immersion member and exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018109154A Division JP6593493B2 (ja) 2012-04-10 2018-06-07 露光装置、及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2015514304A JP2015514304A (ja) 2015-05-18
JP2015514304A5 true JP2015514304A5 (enExample) 2016-04-14
JP6447131B2 JP6447131B2 (ja) 2019-01-09

Family

ID=49292051

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2014550223A Active JP6447131B2 (ja) 2012-04-10 2013-03-22 露光装置、露光方法、及びデバイス製造方法
JP2018109154A Active JP6593493B2 (ja) 2012-04-10 2018-06-07 露光装置、及びデバイス製造方法
JP2019175377A Pending JP2019215586A (ja) 2012-04-10 2019-09-26 液浸部材、及び、露光装置

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2018109154A Active JP6593493B2 (ja) 2012-04-10 2018-06-07 露光装置、及びデバイス製造方法
JP2019175377A Pending JP2019215586A (ja) 2012-04-10 2019-09-26 液浸部材、及び、露光装置

Country Status (8)

Country Link
US (5) US9268231B2 (enExample)
EP (1) EP2836876B1 (enExample)
JP (3) JP6447131B2 (enExample)
KR (1) KR102147071B1 (enExample)
CN (2) CN108614393A (enExample)
HK (2) HK1205279A1 (enExample)
TW (3) TW201935146A (enExample)
WO (1) WO2013153965A1 (enExample)

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US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
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WO2019115197A1 (en) 2017-12-15 2019-06-20 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure
JP6610726B2 (ja) * 2018-07-11 2019-11-27 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法

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JP2010016166A (ja) * 2008-07-03 2010-01-21 Canon Inc 走査型露光装置および露光方法、ならびにデバイス製造方法
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JP2010157726A (ja) 2008-12-29 2010-07-15 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR20120113238A (ko) 2010-01-08 2012-10-12 가부시키가이샤 니콘 액침 부재, 노광 장치, 노광 방법, 및 디바이스 제조 방법
JP5495948B2 (ja) * 2010-05-27 2014-05-21 キヤノン株式会社 ステージ装置、露光装置及びデバイスの製造方法
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

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