JP2015528132A5 - - Google Patents

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Publication number
JP2015528132A5
JP2015528132A5 JP2015522464A JP2015522464A JP2015528132A5 JP 2015528132 A5 JP2015528132 A5 JP 2015528132A5 JP 2015522464 A JP2015522464 A JP 2015522464A JP 2015522464 A JP2015522464 A JP 2015522464A JP 2015528132 A5 JP2015528132 A5 JP 2015528132A5
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JP
Japan
Prior art keywords
liquid
immersion
space
optical
disposed
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Granted
Application number
JP2015522464A
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English (en)
Japanese (ja)
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JP2015528132A (ja
JP6406250B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/JP2013/069959 external-priority patent/WO2014014123A1/en
Publication of JP2015528132A publication Critical patent/JP2015528132A/ja
Publication of JP2015528132A5 publication Critical patent/JP2015528132A5/ja
Application granted granted Critical
Publication of JP6406250B2 publication Critical patent/JP6406250B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015522464A 2012-07-20 2013-07-16 液浸部材、露光装置及びデバイス製造方法 Expired - Fee Related JP6406250B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261674078P 2012-07-20 2012-07-20
US61/674,078 2012-07-20
US201361790328P 2013-03-15 2013-03-15
US61/790,328 2013-03-15
PCT/JP2013/069959 WO2014014123A1 (en) 2012-07-20 2013-07-16 Liquid immersion member and exposure apparatus

Publications (3)

Publication Number Publication Date
JP2015528132A JP2015528132A (ja) 2015-09-24
JP2015528132A5 true JP2015528132A5 (enExample) 2016-07-28
JP6406250B2 JP6406250B2 (ja) 2018-10-17

Family

ID=48951526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015522464A Expired - Fee Related JP6406250B2 (ja) 2012-07-20 2013-07-16 液浸部材、露光装置及びデバイス製造方法

Country Status (8)

Country Link
US (3) US9823580B2 (enExample)
EP (1) EP2875405B1 (enExample)
JP (1) JP6406250B2 (enExample)
KR (1) KR102139033B1 (enExample)
CN (2) CN104487897B (enExample)
HK (1) HK1208914A1 (enExample)
TW (3) TWI700557B (enExample)
WO (1) WO2014014123A1 (enExample)

Families Citing this family (14)

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NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) * 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6119242B2 (ja) * 2012-12-27 2017-04-26 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
CN105229774B (zh) 2013-10-08 2019-01-11 株式会社尼康 液浸部件、曝光装置及曝光方法、以及器件制造方法
CN118584764A (zh) 2017-12-15 2024-09-03 Asml荷兰有限公司 流体处置结构、光刻设备、以及使用流体处置结构的方法
CN112286012A (zh) * 2020-10-29 2021-01-29 浙江启尔机电技术有限公司 一种浸液回收系统及采用该系统的浸液回收方法

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EP0900412B1 (en) 1997-03-10 2005-04-06 ASML Netherlands B.V. Lithographic apparatus comprising a positioning device having two object holders
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US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
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US6452292B1 (en) 2000-06-26 2002-09-17 Nikon Corporation Planar motor with linear coil arrays
KR100815222B1 (ko) 2001-02-27 2008-03-19 에이에스엠엘 유에스, 인크. 리소그래피 장치 및 적어도 하나의 레티클 상에 형성된 적어도 두 개의 패턴으로부터의 이미지로 기판 스테이지 상의 필드를 노출시키는 방법
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US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
CN102290364B (zh) 2004-06-09 2016-01-13 尼康股份有限公司 基板保持装置、具备其之曝光装置、元件制造方法
TWI610340B (zh) 2004-09-17 2018-01-01 尼康股份有限公司 曝光裝置、曝光方法及元件製造方法
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EP2963498B8 (en) 2006-01-19 2017-07-26 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
TWI439813B (zh) 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
JP2007335662A (ja) * 2006-06-15 2007-12-27 Canon Inc 露光装置
US8004651B2 (en) * 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8068209B2 (en) * 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
JP2009099939A (ja) * 2007-09-25 2009-05-07 Dainippon Screen Mfg Co Ltd アライメントマーク形成装置
US8610873B2 (en) * 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US8233139B2 (en) 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
JP2010135794A (ja) 2008-12-04 2010-06-17 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
US20100328637A1 (en) 2008-12-04 2010-12-30 Nikon Corporation Exposure apparatus, exposing method and device fabricating method
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US9223225B2 (en) * 2010-01-08 2015-12-29 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, and device manufacturing method
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

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