JP2015528132A5 - - Google Patents
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- Publication number
- JP2015528132A5 JP2015528132A5 JP2015522464A JP2015522464A JP2015528132A5 JP 2015528132 A5 JP2015528132 A5 JP 2015528132A5 JP 2015522464 A JP2015522464 A JP 2015522464A JP 2015522464 A JP2015522464 A JP 2015522464A JP 2015528132 A5 JP2015528132 A5 JP 2015528132A5
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- immersion
- space
- optical
- disposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims 6
- 238000007654 immersion Methods 0.000 claims 4
- 230000003287 optical effect Effects 0.000 claims 4
- 238000011084 recovery Methods 0.000 claims 4
- 239000012530 fluid Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261674078P | 2012-07-20 | 2012-07-20 | |
| US61/674,078 | 2012-07-20 | ||
| US201361790328P | 2013-03-15 | 2013-03-15 | |
| US61/790,328 | 2013-03-15 | ||
| PCT/JP2013/069959 WO2014014123A1 (en) | 2012-07-20 | 2013-07-16 | Liquid immersion member and exposure apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015528132A JP2015528132A (ja) | 2015-09-24 |
| JP2015528132A5 true JP2015528132A5 (enExample) | 2016-07-28 |
| JP6406250B2 JP6406250B2 (ja) | 2018-10-17 |
Family
ID=48951526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015522464A Active JP6406250B2 (ja) | 2012-07-20 | 2013-07-16 | 液浸部材、露光装置及びデバイス製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (3) | US9823580B2 (enExample) |
| EP (1) | EP2875405B1 (enExample) |
| JP (1) | JP6406250B2 (enExample) |
| KR (1) | KR102139033B1 (enExample) |
| CN (2) | CN107422612B (enExample) |
| HK (1) | HK1208914A1 (enExample) |
| TW (3) | TWI661277B (enExample) |
| WO (1) | WO2014014123A1 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2003226A (en) | 2008-08-19 | 2010-03-09 | Asml Netherlands Bv | Lithographic apparatus, drying device, metrology apparatus and device manufacturing method. |
| US9256137B2 (en) * | 2011-08-25 | 2016-02-09 | Nikon Corporation | Exposure apparatus, liquid holding method, and device manufacturing method |
| NL2009692A (en) | 2011-12-07 | 2013-06-10 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
| US9268231B2 (en) | 2012-04-10 | 2016-02-23 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
| US9323160B2 (en) | 2012-04-10 | 2016-04-26 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium |
| US9823580B2 (en) * | 2012-07-20 | 2017-11-21 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
| US9494870B2 (en) | 2012-10-12 | 2016-11-15 | Nikon Corporation | Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
| US9568828B2 (en) | 2012-10-12 | 2017-02-14 | Nikon Corporation | Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
| US9720331B2 (en) | 2012-12-27 | 2017-08-01 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
| JP6119242B2 (ja) * | 2012-12-27 | 2017-04-26 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
| US9651873B2 (en) | 2012-12-27 | 2017-05-16 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
| EP3057122B1 (en) | 2013-10-08 | 2018-11-21 | Nikon Corporation | Immersion member, exposure apparatus, exposure method, and device manufacturing method |
| KR102446678B1 (ko) | 2017-12-15 | 2022-09-23 | 에이에스엠엘 네델란즈 비.브이. | 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법 |
| CN112286012A (zh) * | 2020-10-29 | 2021-01-29 | 浙江启尔机电技术有限公司 | 一种浸液回收系统及采用该系统的浸液回收方法 |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1144263C (zh) | 1996-11-28 | 2004-03-31 | 株式会社尼康 | 曝光装置以及曝光方法 |
| DE69829614T2 (de) | 1997-03-10 | 2006-03-09 | Asml Netherlands B.V. | Lithographiegerät mit einer positioniervorrichtung mit zwei objekthaltern |
| US6897963B1 (en) | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
| US6208407B1 (en) | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
| WO2001035168A1 (en) | 1999-11-10 | 2001-05-17 | Massachusetts Institute Of Technology | Interference lithography utilizing phase-locked scanning beams |
| US6452292B1 (en) | 2000-06-26 | 2002-09-17 | Nikon Corporation | Planar motor with linear coil arrays |
| WO2002069049A2 (en) | 2001-02-27 | 2002-09-06 | Asml Us, Inc. | Simultaneous imaging of two reticles |
| TW529172B (en) | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
| JP2005536775A (ja) | 2002-08-23 | 2005-12-02 | 株式会社ニコン | 投影光学系、フォトリソグラフィ方法および露光装置、並びに露光装置を用いた方法 |
| EP3223053A1 (en) | 2003-09-03 | 2017-09-27 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| CN1965389B (zh) | 2004-06-09 | 2011-08-10 | 尼康股份有限公司 | 基板保持装置、具备其之曝光装置及方法、元件制造方法 |
| EP1796146B1 (en) | 2004-09-17 | 2013-01-16 | Nikon Corporation | Exposure apparatus, exposure method, and method for manufacturing device |
| TW200632576A (en) * | 2004-12-02 | 2006-09-16 | Nikon Corp | Exposure apparatus, exposure method and manufacturing method of device |
| JP4844186B2 (ja) | 2005-03-18 | 2011-12-28 | 株式会社ニコン | プレート部材、基板保持装置、露光装置及び露光方法、並びにデバイス製造方法 |
| TW200644079A (en) * | 2005-03-31 | 2006-12-16 | Nikon Corp | Exposure apparatus, exposure method, and device production method |
| US20100227480A1 (en) * | 2005-06-29 | 2010-09-09 | Nxp B.V. | Apparatus and method for maintaining a near-atmospheric pressure inside a process chamber |
| US7804577B2 (en) * | 2005-11-16 | 2010-09-28 | Asml Netherlands B.V. | Lithographic apparatus |
| US7656501B2 (en) * | 2005-11-16 | 2010-02-02 | Asml Netherlands B.V. | Lithographic apparatus |
| US7864292B2 (en) * | 2005-11-16 | 2011-01-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| SG10201510758QA (en) | 2006-01-19 | 2016-01-28 | Nikon Corp | Movable Body Drive Method, Movable Body Drive System, Pattern Formation Method, Pattern Forming Apparatus, Exposure Method, Exposure Apparatus, and Device Manufacturing Method |
| EP2023378B1 (en) | 2006-05-10 | 2013-03-13 | Nikon Corporation | Exposure apparatus and device manufacturing method |
| JP2007335662A (ja) * | 2006-06-15 | 2007-12-27 | Canon Inc | 露光装置 |
| US8004651B2 (en) | 2007-01-23 | 2011-08-23 | Nikon Corporation | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
| US8237911B2 (en) | 2007-03-15 | 2012-08-07 | Nikon Corporation | Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine |
| US8134685B2 (en) | 2007-03-23 | 2012-03-13 | Nikon Corporation | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
| US8068209B2 (en) * | 2007-03-23 | 2011-11-29 | Nikon Corporation | Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool |
| JP2009099939A (ja) * | 2007-09-25 | 2009-05-07 | Dainippon Screen Mfg Co Ltd | アライメントマーク形成装置 |
| US8610873B2 (en) * | 2008-03-17 | 2013-12-17 | Nikon Corporation | Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate |
| US8289497B2 (en) | 2008-03-18 | 2012-10-16 | Nikon Corporation | Apparatus and methods for recovering fluid in immersion lithography |
| US8233139B2 (en) | 2008-03-27 | 2012-07-31 | Nikon Corporation | Immersion system, exposure apparatus, exposing method, and device fabricating method |
| JP2010135794A (ja) | 2008-12-04 | 2010-06-17 | Nikon Corp | 露光装置、露光方法、及びデバイス製造方法 |
| US20100328637A1 (en) | 2008-12-04 | 2010-12-30 | Nikon Corporation | Exposure apparatus, exposing method and device fabricating method |
| US8896806B2 (en) | 2008-12-29 | 2014-11-25 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| EP2523210A1 (en) * | 2010-01-08 | 2012-11-14 | Nikon Corporation | Liquid-immersion member, exposing device, exposing method, and device manufacturing method |
| US9268231B2 (en) * | 2012-04-10 | 2016-02-23 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
| US9323160B2 (en) * | 2012-04-10 | 2016-04-26 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium |
| US9823580B2 (en) * | 2012-07-20 | 2017-11-21 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
| US9494870B2 (en) | 2012-10-12 | 2016-11-15 | Nikon Corporation | Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
| US9568828B2 (en) | 2012-10-12 | 2017-02-14 | Nikon Corporation | Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
| US9720331B2 (en) | 2012-12-27 | 2017-08-01 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
| US9651873B2 (en) | 2012-12-27 | 2017-05-16 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
-
2013
- 2013-07-12 US US13/940,685 patent/US9823580B2/en active Active
- 2013-07-16 JP JP2015522464A patent/JP6406250B2/ja active Active
- 2013-07-16 TW TW106136500A patent/TWI661277B/zh active
- 2013-07-16 HK HK15109495.4A patent/HK1208914A1/xx unknown
- 2013-07-16 CN CN201710675381.7A patent/CN107422612B/zh active Active
- 2013-07-16 WO PCT/JP2013/069959 patent/WO2014014123A1/en not_active Ceased
- 2013-07-16 CN CN201380038451.8A patent/CN104487897B/zh active Active
- 2013-07-16 KR KR1020157003887A patent/KR102139033B1/ko active Active
- 2013-07-16 EP EP13747704.8A patent/EP2875405B1/en active Active
- 2013-07-16 TW TW108108466A patent/TWI700557B/zh active
- 2013-07-16 TW TW102125369A patent/TWI617894B/zh active
-
2015
- 2015-01-15 US US14/597,536 patent/US10007189B2/en active Active
-
2018
- 2018-06-20 US US16/013,306 patent/US10739683B2/en active Active
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