CN104350425B - 液浸构件及曝光装置 - Google Patents

液浸构件及曝光装置 Download PDF

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Publication number
CN104350425B
CN104350425B CN201380029835.3A CN201380029835A CN104350425B CN 104350425 B CN104350425 B CN 104350425B CN 201380029835 A CN201380029835 A CN 201380029835A CN 104350425 B CN104350425 B CN 104350425B
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China
Prior art keywords
liquid immersion
liquid
substrate
optical
path
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CN201380029835.3A
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English (en)
Chinese (zh)
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CN104350425A (zh
Inventor
柴崎祐
柴崎祐一
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Nikon Corp
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Nikon Corp
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Priority to CN201711011972.0A priority Critical patent/CN107728434B/zh
Publication of CN104350425A publication Critical patent/CN104350425A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
CN201380029835.3A 2012-04-10 2013-03-15 液浸构件及曝光装置 Active CN104350425B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201711011972.0A CN107728434B (zh) 2012-04-10 2013-03-15 液浸构件及曝光装置

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261622235P 2012-04-10 2012-04-10
US61/622,235 2012-04-10
US13/793,667 2013-03-11
US13/793,667 US9323160B2 (en) 2012-04-10 2013-03-11 Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
PCT/JP2013/058454 WO2013153939A1 (en) 2012-04-10 2013-03-15 Liquid immersion member and exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201711011972.0A Division CN107728434B (zh) 2012-04-10 2013-03-15 液浸构件及曝光装置

Publications (2)

Publication Number Publication Date
CN104350425A CN104350425A (zh) 2015-02-11
CN104350425B true CN104350425B (zh) 2017-11-28

Family

ID=49292050

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201380029835.3A Active CN104350425B (zh) 2012-04-10 2013-03-15 液浸构件及曝光装置
CN201711011972.0A Active CN107728434B (zh) 2012-04-10 2013-03-15 液浸构件及曝光装置

Family Applications After (1)

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CN201711011972.0A Active CN107728434B (zh) 2012-04-10 2013-03-15 液浸构件及曝光装置

Country Status (8)

Country Link
US (4) US9323160B2 (enExample)
EP (1) EP2836875B1 (enExample)
JP (3) JP6245179B2 (enExample)
KR (1) KR102158968B1 (enExample)
CN (2) CN104350425B (enExample)
HK (2) HK1204682A1 (enExample)
TW (3) TWI658335B (enExample)
WO (1) WO2013153939A1 (enExample)

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JP6575629B2 (ja) * 2018-04-04 2019-09-18 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
CN117742084A (zh) * 2020-12-25 2024-03-22 浙江启尔机电技术有限公司 一种改善浸没流场压力特性的浸液供给回收装置

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US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
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JP2009088037A (ja) * 2007-09-28 2009-04-23 Nikon Corp 露光方法及びデバイス製造方法、並びに露光装置
US8451425B2 (en) * 2007-12-28 2013-05-28 Nikon Corporation Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
US8610873B2 (en) 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US8233139B2 (en) 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
JP2011086804A (ja) * 2009-10-16 2011-04-28 Nikon Corp 液浸部材、露光装置、露光方法、及びデバイス製造方法
JP5232901B2 (ja) * 2011-07-22 2013-07-10 株式会社ニコン 露光装置及びデバイス製造方法
NL2009271A (en) 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
US20190056672A1 (en) 2019-02-21
WO2013153939A1 (en) 2013-10-17
HK1204090A1 (en) 2015-11-06
TWI611270B (zh) 2018-01-11
US10520828B2 (en) 2019-12-31
KR20150005603A (ko) 2015-01-14
TW201928530A (zh) 2019-07-16
CN107728434A (zh) 2018-02-23
JP2018022198A (ja) 2018-02-08
HK1245901A1 (zh) 2018-08-31
JP2015515738A (ja) 2015-05-28
EP2836875B1 (en) 2020-11-18
TWI698720B (zh) 2020-07-11
CN107728434B (zh) 2020-04-03
TW201804261A (zh) 2018-02-01
US9323160B2 (en) 2016-04-26
TW201344376A (zh) 2013-11-01
TWI658335B (zh) 2019-05-01
EP2836875A1 (en) 2015-02-18
HK1204682A1 (en) 2015-11-27
US9810999B2 (en) 2017-11-07
US20180039186A1 (en) 2018-02-08
CN104350425A (zh) 2015-02-11
US20160223915A1 (en) 2016-08-04
JP6245179B2 (ja) 2017-12-13
JP2019191613A (ja) 2019-10-31
US20130265555A1 (en) 2013-10-10
US10139736B2 (en) 2018-11-27
KR102158968B1 (ko) 2020-09-23
JP6569717B2 (ja) 2019-09-04

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