HK1204090A1 - Liquid immersion member and exposure apparatus - Google Patents

Liquid immersion member and exposure apparatus

Info

Publication number
HK1204090A1
HK1204090A1 HK15104439.4A HK15104439A HK1204090A1 HK 1204090 A1 HK1204090 A1 HK 1204090A1 HK 15104439 A HK15104439 A HK 15104439A HK 1204090 A1 HK1204090 A1 HK 1204090A1
Authority
HK
Hong Kong
Prior art keywords
exposure apparatus
liquid immersion
immersion member
liquid
exposure
Prior art date
Application number
HK15104439.4A
Other languages
Chinese (zh)
Inventor
柴崎祐
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1204090A1 publication Critical patent/HK1204090A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
HK15104439.4A 2012-04-10 2015-05-11 Liquid immersion member and exposure apparatus HK1204090A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261622235P 2012-04-10 2012-04-10
US13/793,667 US9323160B2 (en) 2012-04-10 2013-03-11 Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
PCT/JP2013/058454 WO2013153939A1 (en) 2012-04-10 2013-03-15 Liquid immersion member and exposure apparatus

Publications (1)

Publication Number Publication Date
HK1204090A1 true HK1204090A1 (en) 2015-11-06

Family

ID=49292050

Family Applications (3)

Application Number Title Priority Date Filing Date
HK15104439.4A HK1204090A1 (en) 2012-04-10 2015-05-11 Liquid immersion member and exposure apparatus
HK18105176.5A HK1245901A1 (en) 2012-04-10 2015-05-11 Liquid immersion member and exposure apparatus
HK15105266.9A HK1204682A1 (en) 2012-04-10 2015-06-03 Liquid immersion member and exposure apparatus

Family Applications After (2)

Application Number Title Priority Date Filing Date
HK18105176.5A HK1245901A1 (en) 2012-04-10 2015-05-11 Liquid immersion member and exposure apparatus
HK15105266.9A HK1204682A1 (en) 2012-04-10 2015-06-03 Liquid immersion member and exposure apparatus

Country Status (8)

Country Link
US (4) US9323160B2 (en)
EP (1) EP2836875B1 (en)
JP (3) JP6245179B2 (en)
KR (1) KR102158968B1 (en)
CN (2) CN107728434B (en)
HK (3) HK1204090A1 (en)
TW (3) TWI698720B (en)
WO (1) WO2013153939A1 (en)

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NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) * 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6369472B2 (en) 2013-10-08 2018-08-08 株式会社ニコン Immersion member, exposure apparatus and exposure method, and device manufacturing method
CN113156772A (en) 2016-09-12 2021-07-23 Asml荷兰有限公司 Fluid handling structure for a lithographic apparatus and immersion lithographic apparatus
EP3577525A1 (en) 2017-02-03 2019-12-11 ASML Netherlands B.V. Exposure apparatus
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WO2019115197A1 (en) 2017-12-15 2019-06-20 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure
JP6575629B2 (en) * 2018-04-04 2019-09-18 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
CN112650028B (en) * 2020-12-25 2024-02-09 浙江启尔机电技术有限公司 Immersion liquid supply recovery device for improving pressure characteristic of immersion flow field

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US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) * 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
JP2009088037A (en) * 2007-09-28 2009-04-23 Nikon Corp Exposure method and device manufacturing method, and exposure apparatus
US8451425B2 (en) * 2007-12-28 2013-05-28 Nikon Corporation Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
US8610873B2 (en) 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US8233139B2 (en) 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
JP2011086804A (en) * 2009-10-16 2011-04-28 Nikon Corp Immersion member, exposure device, exposure method, and method for manufacturing device
JP5232901B2 (en) * 2011-07-22 2013-07-10 株式会社ニコン Exposure apparatus and device manufacturing method
NL2009271A (en) 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
WO2013153939A1 (en) 2013-10-17
US9323160B2 (en) 2016-04-26
TWI698720B (en) 2020-07-11
TWI611270B (en) 2018-01-11
HK1245901A1 (en) 2018-08-31
EP2836875A1 (en) 2015-02-18
US9810999B2 (en) 2017-11-07
JP2015515738A (en) 2015-05-28
KR20150005603A (en) 2015-01-14
US20180039186A1 (en) 2018-02-08
TW201344376A (en) 2013-11-01
TW201928530A (en) 2019-07-16
US10139736B2 (en) 2018-11-27
TWI658335B (en) 2019-05-01
US20160223915A1 (en) 2016-08-04
CN104350425B (en) 2017-11-28
JP6245179B2 (en) 2017-12-13
HK1204682A1 (en) 2015-11-27
JP2019191613A (en) 2019-10-31
TW201804261A (en) 2018-02-01
JP2018022198A (en) 2018-02-08
CN107728434A (en) 2018-02-23
CN104350425A (en) 2015-02-11
CN107728434B (en) 2020-04-03
US20130265555A1 (en) 2013-10-10
JP6569717B2 (en) 2019-09-04
US10520828B2 (en) 2019-12-31
EP2836875B1 (en) 2020-11-18
KR102158968B1 (en) 2020-09-23
US20190056672A1 (en) 2019-02-21

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20230321