CN110232982B - 用于极紫外光源的标靶 - Google Patents
用于极紫外光源的标靶 Download PDFInfo
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- CN110232982B CN110232982B CN201910265448.9A CN201910265448A CN110232982B CN 110232982 B CN110232982 B CN 110232982B CN 201910265448 A CN201910265448 A CN 201910265448A CN 110232982 B CN110232982 B CN 110232982B
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- 230000036278 prepulse Effects 0.000 description 73
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 20
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 8
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- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
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- 229910001868 water Inorganic materials 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 229910000846 In alloy Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
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Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/02—Irradiation devices having no beam-forming means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
- H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
- H05G2/0088—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam for preconditioning the plasma generating material
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Plasma Technology (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910265448.9A CN110232982B (zh) | 2013-03-14 | 2014-02-20 | 用于极紫外光源的标靶 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/830,380 US8791440B1 (en) | 2013-03-14 | 2013-03-14 | Target for extreme ultraviolet light source |
| US13/830,380 | 2013-03-14 | ||
| PCT/US2014/017496 WO2014143522A1 (en) | 2013-03-14 | 2014-02-20 | Target for extreme ultraviolet light source |
| CN201480014220.8A CN105190776B (zh) | 2013-03-14 | 2014-02-20 | 用于极紫外光源的标靶 |
| CN201910265448.9A CN110232982B (zh) | 2013-03-14 | 2014-02-20 | 用于极紫外光源的标靶 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480014220.8A Division CN105190776B (zh) | 2013-03-14 | 2014-02-20 | 用于极紫外光源的标靶 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110232982A CN110232982A (zh) | 2019-09-13 |
| CN110232982B true CN110232982B (zh) | 2023-10-17 |
Family
ID=51212095
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910265448.9A Active CN110232982B (zh) | 2013-03-14 | 2014-02-20 | 用于极紫外光源的标靶 |
| CN201480014220.8A Active CN105190776B (zh) | 2013-03-14 | 2014-02-20 | 用于极紫外光源的标靶 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480014220.8A Active CN105190776B (zh) | 2013-03-14 | 2014-02-20 | 用于极紫外光源的标靶 |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US8791440B1 (enExample) |
| JP (3) | JP6471142B2 (enExample) |
| KR (2) | KR102341104B1 (enExample) |
| CN (2) | CN110232982B (enExample) |
| TW (2) | TWI603162B (enExample) |
| WO (1) | WO2014143522A1 (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013004258A (ja) * | 2011-06-15 | 2013-01-07 | Gigaphoton Inc | 極端紫外光生成装置及び極端紫外光の生成方法 |
| WO2014019803A1 (en) * | 2012-08-01 | 2014-02-06 | Asml Netherlands B.V. | Method and apparatus for generating radiation |
| WO2014120985A1 (en) * | 2013-01-30 | 2014-08-07 | Kla-Tencor Corporation | Euv light source using cryogenic droplet targets in mask inspection |
| US8791440B1 (en) * | 2013-03-14 | 2014-07-29 | Asml Netherlands B.V. | Target for extreme ultraviolet light source |
| JP6513025B2 (ja) | 2013-09-17 | 2019-05-15 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| US9338870B2 (en) * | 2013-12-30 | 2016-05-10 | Asml Netherlands B.V. | Extreme ultraviolet light source |
| KR102314640B1 (ko) * | 2014-01-27 | 2021-10-20 | 에이에스엠엘 네델란즈 비.브이. | 방사선 소스 |
| US9451683B1 (en) * | 2015-07-14 | 2016-09-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Solution for EUV power increment at wafer level |
| US9820368B2 (en) | 2015-08-12 | 2017-11-14 | Asml Netherlands B.V. | Target expansion rate control in an extreme ultraviolet light source |
| US9713240B2 (en) | 2015-08-12 | 2017-07-18 | Asml Netherlands B.V. | Stabilizing EUV light power in an extreme ultraviolet light source |
| US20170311429A1 (en) * | 2016-04-25 | 2017-10-26 | Asml Netherlands B.V. | Reducing the effect of plasma on an object in an extreme ultraviolet light source |
| WO2018029759A1 (ja) * | 2016-08-08 | 2018-02-15 | ギガフォトン株式会社 | 極端紫外光生成方法 |
| US10401704B2 (en) * | 2016-11-11 | 2019-09-03 | Asml Netherlands B.V. | Compensating for a physical effect in an optical system |
| CN106885632B (zh) * | 2017-03-03 | 2019-01-29 | 北京振兴计量测试研究所 | 一种真空紫外光谱辐射计校准方法及装置 |
| US10299361B2 (en) * | 2017-03-24 | 2019-05-21 | Asml Netherlands B.V. | Optical pulse generation for an extreme ultraviolet light source |
| US11153959B2 (en) * | 2018-08-17 | 2021-10-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method for generating extreme ultraviolet radiation |
| JP6822693B2 (ja) | 2019-03-27 | 2021-01-27 | 日本電気株式会社 | 音声出力装置、音声出力方法および音声出力プログラム |
| TWI892982B (zh) * | 2019-04-01 | 2025-08-11 | 荷蘭商Ａｓｍｌ荷蘭公司 | 極紫外（ｅｕｖ）光源、目標供應系統、及控制ｅｕｖ光源中轉換效率的方法 |
| CN111490437A (zh) * | 2019-04-15 | 2020-08-04 | 中国科学院物理研究所 | 利用激光与天线靶作用诱导频率可控微波辐射的装置和方法 |
| JP7261683B2 (ja) * | 2019-07-23 | 2023-04-20 | ギガフォトン株式会社 | 極端紫外光生成システム及び電子デバイスの製造方法 |
| KR102447685B1 (ko) * | 2020-07-22 | 2022-09-27 | 포항공과대학교 산학협력단 | 특정 파장대의 광원을 발생시키기 위한 장치 및 방법 |
| JP7561043B2 (ja) * | 2021-01-20 | 2024-10-03 | ギガフォトン株式会社 | 極端紫外光生成システム、及び電子デバイスの製造方法 |
| KR102829791B1 (ko) * | 2022-08-29 | 2025-07-07 | 주식회사 에프에스티 | Euv 빔 최적화 장치 |
| CN116184770B (zh) * | 2023-02-01 | 2025-09-23 | 广东省智能机器人研究院 | 极紫外光生成系统、方法、控制装置、控制器和存储介质 |
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| WO2012173266A1 (en) * | 2011-06-15 | 2012-12-20 | Gigaphoton Inc. | Extreme ultraviolet light generation system |
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2013
- 2013-03-14 US US13/830,380 patent/US8791440B1/en active Active
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2014
- 2014-02-20 CN CN201910265448.9A patent/CN110232982B/zh active Active
- 2014-02-20 WO PCT/US2014/017496 patent/WO2014143522A1/en not_active Ceased
- 2014-02-20 CN CN201480014220.8A patent/CN105190776B/zh active Active
- 2014-02-20 KR KR1020217004045A patent/KR102341104B1/ko active Active
- 2014-02-20 JP JP2016500318A patent/JP6471142B2/ja active Active
- 2014-02-20 KR KR1020157026388A patent/KR102216594B1/ko active Active
- 2014-03-10 TW TW103108136A patent/TWI603162B/zh active
- 2014-03-10 TW TW106130907A patent/TWI636342B/zh active
- 2014-06-20 US US14/310,972 patent/US8912514B2/en active Active
- 2014-11-21 US US14/550,421 patent/US9155179B2/en active Active
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2015
- 2015-10-02 US US14/874,164 patent/US9462668B2/en active Active
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2019
- 2019-01-21 JP JP2019007624A patent/JP6685438B2/ja active Active
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2020
- 2020-03-31 JP JP2020062792A patent/JP6944010B2/ja active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1663326A (zh) * | 2002-05-13 | 2005-08-31 | 杰特克公司 | 用于产生辐射的方法和装置 |
| EP1492394A2 (en) * | 2003-06-26 | 2004-12-29 | Northrop Grumman Corporation | Laser-produced plasma EUV light source with pre-pulse enhancement |
| JP2006332552A (ja) * | 2005-05-30 | 2006-12-07 | Osaka Univ | 極端紫外光源用ターゲット |
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Also Published As
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| TW201802618A (zh) | 2018-01-16 |
| JP6944010B2 (ja) | 2021-10-06 |
| US8791440B1 (en) | 2014-07-29 |
| US8912514B2 (en) | 2014-12-16 |
| US9155179B2 (en) | 2015-10-06 |
| JP2020106866A (ja) | 2020-07-09 |
| CN110232982A (zh) | 2019-09-13 |
| CN105190776B (zh) | 2019-05-03 |
| KR20150129750A (ko) | 2015-11-20 |
| KR102216594B1 (ko) | 2021-02-17 |
| US9462668B2 (en) | 2016-10-04 |
| US20160029471A1 (en) | 2016-01-28 |
| JP6685438B2 (ja) | 2020-04-22 |
| JP2016518674A (ja) | 2016-06-23 |
| KR20210018977A (ko) | 2021-02-18 |
| CN105190776A (zh) | 2015-12-23 |
| TWI603162B (zh) | 2017-10-21 |
| TW201441770A (zh) | 2014-11-01 |
| US20150076374A1 (en) | 2015-03-19 |
| JP6471142B2 (ja) | 2019-02-13 |
| JP2019061289A (ja) | 2019-04-18 |
| KR102341104B1 (ko) | 2021-12-20 |
| WO2014143522A1 (en) | 2014-09-18 |
| US20140299791A1 (en) | 2014-10-09 |
| TWI636342B (zh) | 2018-09-21 |
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