JP2016509343A5 - - Google Patents

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Publication number
JP2016509343A5
JP2016509343A5 JP2015553734A JP2015553734A JP2016509343A5 JP 2016509343 A5 JP2016509343 A5 JP 2016509343A5 JP 2015553734 A JP2015553734 A JP 2015553734A JP 2015553734 A JP2015553734 A JP 2015553734A JP 2016509343 A5 JP2016509343 A5 JP 2016509343A5
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JP
Japan
Prior art keywords
temperature
optical element
light beam
amplified light
monitored
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Application number
JP2015553734A
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English (en)
Japanese (ja)
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JP2016509343A (ja
JP6250067B2 (ja
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Priority claimed from US13/747,263 external-priority patent/US9148941B2/en
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Publication of JP2016509343A publication Critical patent/JP2016509343A/ja
Publication of JP2016509343A5 publication Critical patent/JP2016509343A5/ja
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Publication of JP6250067B2 publication Critical patent/JP6250067B2/ja
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JP2015553734A 2013-01-22 2013-12-17 極端紫外線光源内の光学素子に対する増幅光ビームの位置調整方法 Active JP6250067B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/747,263 2013-01-22
US13/747,263 US9148941B2 (en) 2013-01-22 2013-01-22 Thermal monitor for an extreme ultraviolet light source
PCT/US2013/075871 WO2014116371A1 (en) 2013-01-22 2013-12-17 Thermal monitor for an extreme ultraviolet light source

Publications (3)

Publication Number Publication Date
JP2016509343A JP2016509343A (ja) 2016-03-24
JP2016509343A5 true JP2016509343A5 (https=) 2016-12-22
JP6250067B2 JP6250067B2 (ja) 2017-12-20

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ID=51207012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015553734A Active JP6250067B2 (ja) 2013-01-22 2013-12-17 極端紫外線光源内の光学素子に対する増幅光ビームの位置調整方法

Country Status (5)

Country Link
US (1) US9148941B2 (https=)
JP (1) JP6250067B2 (https=)
KR (2) KR102062296B1 (https=)
TW (1) TWI611427B (https=)
WO (1) WO2014116371A1 (https=)

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US10109451B2 (en) * 2017-02-13 2018-10-23 Applied Materials, Inc. Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral radiant flux and system having the apparatus
US10128017B1 (en) * 2017-05-12 2018-11-13 Asml Netherlands B.V. Apparatus for and method of controlling debris in an EUV light source
NL2021083A (en) 2017-06-23 2019-01-02 Asml Netherlands Bv Radiation Source Module and Lithographic Apparatus
US10824083B2 (en) 2017-09-28 2020-11-03 Taiwan Semiconductor Manufacturing Co., Ltd. Light source, EUV lithography system, and method for generating EUV radiation
WO2019162038A1 (en) * 2018-02-20 2019-08-29 Asml Netherlands B.V. Sensor system
WO2019186754A1 (ja) * 2018-03-28 2019-10-03 ギガフォトン株式会社 極端紫外光生成システム及び電子デバイスの製造方法
US20200057376A1 (en) * 2018-08-14 2020-02-20 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and lithography method
WO2020126387A2 (en) 2018-12-18 2020-06-25 Asml Netherlands B.V. Sacrifical device for protecting an optical element in a path of a high-power laser beam
BE1031741B1 (nl) * 2023-06-27 2025-02-04 Newson Nv Lichtrichtapparaat met verbeterd temperatuurbeheer

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