JP2016507255A - プラズマの流れを提供する装置 - Google Patents

プラズマの流れを提供する装置 Download PDF

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Publication number
JP2016507255A
JP2016507255A JP2015547134A JP2015547134A JP2016507255A JP 2016507255 A JP2016507255 A JP 2016507255A JP 2015547134 A JP2015547134 A JP 2015547134A JP 2015547134 A JP2015547134 A JP 2015547134A JP 2016507255 A JP2016507255 A JP 2016507255A
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JP
Japan
Prior art keywords
dielectric substrate
plasma cell
plasma
gas
cell
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Pending
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JP2015547134A
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Japanese (ja)
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JP2016507255A5 (https=
Inventor
ホルベッチ,トーマス・ビックフォード
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Linde GmbH
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Linde GmbH
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Application filed by Linde GmbH filed Critical Linde GmbH
Publication of JP2016507255A publication Critical patent/JP2016507255A/ja
Publication of JP2016507255A5 publication Critical patent/JP2016507255A5/ja
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B18/00Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
    • A61B18/04Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating
    • A61B18/042Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating using additional gas becoming plasma
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00Disinfection or sterilisation of materials or objects, in general; Accessories therefor
    • A61L2/02Disinfection or sterilisation of materials or objects, in general; Accessories therefor using physical processes
    • A61L2/14Plasma, i.e. ionised gases
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348Dielectric barrier discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816Pressure
    • H01J37/32825Working under atmospheric pressure or higher
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2431Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes using cylindrical electrodes, e.g. rotary drums
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • Veterinary Medicine (AREA)
  • Public Health (AREA)
  • General Health & Medical Sciences (AREA)
  • Otolaryngology (AREA)
  • Molecular Biology (AREA)
  • Medical Informatics (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Biomedical Technology (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epidemiology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Fluid Mechanics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electrotherapy Devices (AREA)
JP2015547134A 2012-12-18 2013-12-16 プラズマの流れを提供する装置 Pending JP2016507255A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB1222840.9 2012-12-18
GB1222840.9A GB2509063A (en) 2012-12-18 2012-12-18 Plasma device with earth electrode
PCT/GB2013/000550 WO2014096755A1 (en) 2012-12-18 2013-12-16 Device for providing a flow of plasma

Publications (2)

Publication Number Publication Date
JP2016507255A true JP2016507255A (ja) 2016-03-10
JP2016507255A5 JP2016507255A5 (https=) 2018-04-19

Family

ID=47630956

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015547134A Pending JP2016507255A (ja) 2012-12-18 2013-12-16 プラズマの流れを提供する装置

Country Status (9)

Country Link
US (1) US20150340207A1 (https=)
EP (1) EP2936943B1 (https=)
JP (1) JP2016507255A (https=)
CN (1) CN105009691A (https=)
BR (1) BR112015014338A2 (https=)
ES (1) ES2635053T3 (https=)
GB (1) GB2509063A (https=)
MX (1) MX2015007911A (https=)
WO (1) WO2014096755A1 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220078855A (ko) 2020-12-04 2022-06-13 주식회사 피글 세포활성용 플라스마 발생부의 제조방법 및 이를 통해 제조된 플라스마 발생부를 포함하는 세포활성장치
JP2022100448A (ja) * 2020-12-24 2022-07-06 国立大学法人高知大学 腫瘍組織への免疫細胞誘導装置
JP7612315B1 (ja) * 2023-11-01 2025-01-14 株式会社Tmeic 活性ガス生成装置
WO2025094419A1 (ja) * 2023-11-01 2025-05-08 株式会社Tmeic 活性ガス生成装置

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2656333C1 (ru) * 2015-01-12 2018-06-05 Гуанчжоу Цин ГУ Медикал Технолоджи Ко., ЛТД Плазменный прибор со сменной разрядной трубкой
JP6513793B2 (ja) * 2015-04-09 2019-05-15 株式会社オーラル28 プラズマ照射装置及びプラズマ照射方法
US11490947B2 (en) 2015-05-15 2022-11-08 Clear Intradermal Technologies, Inc. Tattoo removal using a liquid-gas mixture with plasma gas bubbles
CA2986031C (en) 2015-05-15 2024-03-19 ClearIt, LLC Systems and methods for tattoo removal using cold plasma
EP3314988B1 (en) 2015-06-23 2020-06-17 Aurora Labs Ltd Plasma driven particle propagation apparatus and pumping method
EP3120875B1 (en) * 2015-07-20 2017-07-12 Hilgenberg GmbH Ionization device
WO2017197071A1 (en) 2016-05-12 2017-11-16 EP Technologies LLC Methods and systems for trans-tissue substance delivery using plasmaporation
WO2017195345A1 (ja) * 2016-05-13 2017-11-16 富士機械製造株式会社 医療用プラズマ発生装置、およびプラズマ照射方法
WO2018089577A1 (en) 2016-11-10 2018-05-17 EP Technologies LLC Methods and systems for generating plasma activated liquid
CN106693009B (zh) * 2016-12-26 2023-06-27 大连顺达微创科技有限公司 一种大气压柔性冷等离子体射流内窥镜灭菌装置及方法
CN107320847B (zh) * 2017-06-21 2020-08-07 江苏春申堂药业有限公司 一种低温等离子体灭菌笔
TWI691237B (zh) * 2018-02-13 2020-04-11 國立交通大學 常壓電漿束產生裝置
WO2020004247A1 (ja) * 2018-06-28 2020-01-02 株式会社Cspアドバンスソリューションズ 流行性角結膜炎の治療用点眼剤、当該点眼剤を生成するプラズマ活性点眼剤生成装置、及び流行性角結膜炎の治療方法
ES2974157T3 (es) * 2018-07-31 2024-06-26 Oreal Generación de plasma frío lejos de la piel, y sistemas asociados
CA3124411A1 (en) 2018-12-19 2020-06-25 ClearIt, LLC Systems and methods for tattoo removal using an applied electric field
DE102019101063B4 (de) 2019-01-16 2021-02-25 Cinogy Gmbh Plasma-Behandlungsanordnung und Verfahren zur Anpassung der Größe einer Auflagefläche der Plasma-Behandlungsanordnung an die Größe der zu behandelnden Oberfläche
CN112638471B (zh) * 2019-06-24 2025-07-11 永进生物科技股份有限公司 包括二进气口的电浆装置
TWI694748B (zh) * 2019-08-28 2020-05-21 明志科技大學 用以產生大面積電漿之電極元件
US12564725B2 (en) 2020-03-19 2026-03-03 Caps Medical Ltd. Treatment of internal spaces using plasma generating device
GB2595651A (en) * 2020-05-29 2021-12-08 Univ Southampton Sterlisation of endoscopes
WO2022013229A1 (en) 2020-07-13 2022-01-20 Freiburger Medizintechnik Gmbh Electrode arrangement
CN112741704B (zh) * 2020-12-29 2022-06-24 江苏容正医药科技有限公司 一种用于牙齿清洁和/或美白的等离子体射流装置
IL315745A (en) * 2021-12-22 2024-11-01 Inbar Medical Ltd Devices and methods for treating skin tissue using cold plasma

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003229299A (ja) * 2002-02-06 2003-08-15 Konica Corp 大気圧プラズマ処理装置、該大気圧プラズマ処理装置を用いて製造した膜、製膜方法及び該製膜方法を用いて製造した膜
JP2005293854A (ja) * 2004-03-31 2005-10-20 Hiroshi Takigawa プラズマ生成用電源回路、プラズマ生成装置、プラズマ処理装置及び目的物
JP2005322416A (ja) * 2003-05-01 2005-11-17 Gunma Univ 大気圧低温プラズマ装置と表面処理方法
WO2007105428A1 (ja) * 2006-02-13 2007-09-20 National University Corporation Gunma University プラズマ発生装置用ノズル、プラズマ発生装置、プラズマ表面処理装置、プラズマ発生方法およびプラズマ表面処理方法
JP2011522381A (ja) * 2008-05-30 2011-07-28 コロラド ステート ユニバーシティ リサーチ ファンデーション プラズマに基づく化学源装置およびその使用方法
WO2012005132A1 (ja) * 2010-07-07 2012-01-12 独立行政法人産業技術総合研究所 プラズマ照射処理装置
US20120064016A1 (en) * 2010-09-09 2012-03-15 Geoffrey Morgan Lloyd Active gases and treatment methods

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6673533B1 (en) * 1995-03-10 2004-01-06 Meso Scale Technologies, Llc. Multi-array multi-specific electrochemiluminescence testing
US5970993A (en) * 1996-10-04 1999-10-26 Utron Inc. Pulsed plasma jet paint removal
US6652069B2 (en) * 2000-11-22 2003-11-25 Konica Corporation Method of surface treatment, device of surface treatment, and head for use in ink jet printer
US7022402B2 (en) * 2003-07-14 2006-04-04 E. I. Du Pont De Nemours And Company Dielectric substrates comprising a polymide core layer and a high temperature fluoropolymer bonding layer, and methods relating thereto
DE102004029081A1 (de) * 2004-06-16 2006-01-05 Je Plasmaconsult Gmbh Vorrichtung zur Bearbeitung eines Substrates mittels mindestens eines Plasma-Jets
WO2006001455A1 (ja) * 2004-06-28 2006-01-05 The University Of Tokyo プラズマ発生装置並びにこれを使用した生体内プラズマ処理装置及び表面処理装置
US7608839B2 (en) * 2005-08-05 2009-10-27 Mcgill University Plasma source and applications thereof
JP2009119356A (ja) * 2007-11-14 2009-06-04 Toshiba Corp 放電表面処理装置及び放電表面処理方法
DE102008008614A1 (de) * 2008-02-12 2009-08-13 Leibniz-Institut für Plasmaforschung und Technologie e.V. Plama-Gerät zur selektiven Behandlung elektroporierter Zellen
KR101158800B1 (ko) * 2008-11-14 2012-06-26 주식회사 피에스엠 의료용 플라즈마 건
KR101044314B1 (ko) * 2008-11-25 2011-06-29 포항공과대학교 산학협력단 저온 플라즈마를 이용한 지혈장치
DE202009011521U1 (de) * 2009-08-25 2010-12-30 INP Greifswald Leibniz-Institut für Plasmaforschung und Technologie e. V. Plasma-Manschette
WO2011092186A1 (de) * 2010-01-26 2011-08-04 Leibniz-Institut Für Plasmaforschung Und Technologie E. V. Vorrichtung und verfahren zur erzeugung einer elektrischen entladung in hohlkörpern
GB201110282D0 (en) * 2011-06-17 2011-08-03 Linde Ag Device for providing a flow of plasma

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003229299A (ja) * 2002-02-06 2003-08-15 Konica Corp 大気圧プラズマ処理装置、該大気圧プラズマ処理装置を用いて製造した膜、製膜方法及び該製膜方法を用いて製造した膜
JP2005322416A (ja) * 2003-05-01 2005-11-17 Gunma Univ 大気圧低温プラズマ装置と表面処理方法
JP2005293854A (ja) * 2004-03-31 2005-10-20 Hiroshi Takigawa プラズマ生成用電源回路、プラズマ生成装置、プラズマ処理装置及び目的物
WO2007105428A1 (ja) * 2006-02-13 2007-09-20 National University Corporation Gunma University プラズマ発生装置用ノズル、プラズマ発生装置、プラズマ表面処理装置、プラズマ発生方法およびプラズマ表面処理方法
JP2011522381A (ja) * 2008-05-30 2011-07-28 コロラド ステート ユニバーシティ リサーチ ファンデーション プラズマに基づく化学源装置およびその使用方法
WO2012005132A1 (ja) * 2010-07-07 2012-01-12 独立行政法人産業技術総合研究所 プラズマ照射処理装置
US20120064016A1 (en) * 2010-09-09 2012-03-15 Geoffrey Morgan Lloyd Active gases and treatment methods

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220078855A (ko) 2020-12-04 2022-06-13 주식회사 피글 세포활성용 플라스마 발생부의 제조방법 및 이를 통해 제조된 플라스마 발생부를 포함하는 세포활성장치
JP2022100448A (ja) * 2020-12-24 2022-07-06 国立大学法人高知大学 腫瘍組織への免疫細胞誘導装置
JP7696559B2 (ja) 2020-12-24 2025-06-23 国立大学法人高知大学 腫瘍組織への免疫細胞誘導装置
JP7612315B1 (ja) * 2023-11-01 2025-01-14 株式会社Tmeic 活性ガス生成装置
WO2025094419A1 (ja) * 2023-11-01 2025-05-08 株式会社Tmeic 活性ガス生成装置

Also Published As

Publication number Publication date
ES2635053T3 (es) 2017-10-02
WO2014096755A1 (en) 2014-06-26
EP2936943A1 (en) 2015-10-28
GB201222840D0 (en) 2013-01-30
US20150340207A1 (en) 2015-11-26
BR112015014338A2 (pt) 2017-07-11
GB2509063A (en) 2014-06-25
EP2936943B1 (en) 2017-06-14
MX2015007911A (es) 2015-10-05
CN105009691A (zh) 2015-10-28

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