WO2006001455A1 - プラズマ発生装置並びにこれを使用した生体内プラズマ処理装置及び表面処理装置 - Google Patents
プラズマ発生装置並びにこれを使用した生体内プラズマ処理装置及び表面処理装置 Download PDFInfo
- Publication number
- WO2006001455A1 WO2006001455A1 PCT/JP2005/011860 JP2005011860W WO2006001455A1 WO 2006001455 A1 WO2006001455 A1 WO 2006001455A1 JP 2005011860 W JP2005011860 W JP 2005011860W WO 2006001455 A1 WO2006001455 A1 WO 2006001455A1
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- WO
- WIPO (PCT)
- Prior art keywords
- plasma
- plasma generator
- plasma gas
- supplying
- electrode
- Prior art date
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Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B18/04—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating
- A61B18/042—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating using additional gas becoming plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
- H05H1/245—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using internal electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/47—Generating plasma using corona discharges
- H05H1/471—Pointed electrodes
Definitions
- Plasma generating apparatus and in-vivo plasma processing apparatus and surface processing apparatus using the same
- the present invention relates to a plasma generator, and more particularly to a plasma generator for generating non-equilibrium plasma, an in-vivo plasma processing apparatus and a surface processing apparatus using the same.
- the above plasma generator requires a high-pressure vessel and a plasma electrode. Further, in order to set a material to be processed with plasma in the vessel or to take out vessel force, the material is transferred into the vessel. Alternatively, a material transport mechanism that takes out the material in the container is also required. For this reason, there has been a problem that the plasma generator itself including the container is increased in size and complexity, and the cost of the apparatus is increased.
- Japanese Patent Application Laid-Open No. 2003-173898 discloses that a material can be processed by moving it to the vicinity of a material to be processed at a low cost and easily operated by a human hand.
- a new inductively coupled ICP plasma generator has been proposed that has extremely excellent characteristics in terms of operability.
- the present invention has been made in view of the above-described conventional problems, and an object of the present invention is to generate a low-temperature plasma, which is simple and small in size and low in apparatus cost, and uses a plasma generating apparatus and the same. Another object of the present invention is to provide an in vivo plasma processing apparatus and a surface processing apparatus. Means for solving the problem
- the present invention provides a plasma generator, a flexible cylindrical dielectric, and a plasma gas supply means for supplying a plasma gas into the cylindrical dielectric.
- a high-frequency electrode for exciting the plasma gas, a high-frequency power source for supplying high-frequency power to the high-frequency electrode, and a vicinity of the tip of the cylindrical dielectric And a ground electrode provided on the outside.
- the present invention is a plasma generator, comprising: a flexible cylindrical dielectric; plasma gas supply means for supplying a plasma gas into the cylindrical dielectric; and the cylindrical dielectric A high-frequency electrode provided inside the vicinity of the tip and for exciting the plasma gas, and a high-frequency power source for supplying high-frequency power to the high-frequency electrode are provided.
- an in-vivo plasma processing apparatus and a material synthesis apparatus using the plasma generator are provided.
- FIG. 1 is a diagram showing a configuration example of Embodiment 1 of a plasma generator according to the present invention.
- FIG. 2 is a view showing a modified example of the plasma generator that works on this embodiment.
- FIG. 3 is a diagram showing a configuration example of Embodiment 2 of the plasma generator according to the present invention.
- FIG. 1 shows a configuration example of Embodiment 1 of the plasma generator according to the present invention.
- the plasma generator is provided with a dielectric cylindrical plasma torch 10 having an inner diameter of 10 mm to 5 m.
- the cylindrical dielectric constituting the plasma torch 10 has flexibility and corresponds to the cylindrical dielectric of the present invention.
- Plasma gas is supplied to the plasma torch 10 from a plasma gas supply unit 12 via a flexible (flexible) tube 14.
- the material of the plasma torch 10 is not limited as long as the dielectric is flexible and is not damaged by plasma.
- Teflon registered trademark
- silicone silicone, or the like can be used. Quartz glass can be used as long as it is thin and thin enough to exhibit flexibility.
- a high-frequency electrode 16 made of tungsten wire or the like is disposed inside the vicinity of the front end portion of the plasma torch 10, that is, in the vicinity of the plasma generation region, or near the front end portion of the plasma torch 10.
- a ground electrode 18 is disposed outside.
- the ground electrode 18 is formed as an island-shaped electrode having a small area at a predetermined position of the plasma torch 10.
- An example of an island-shaped electrode is an electrode formed of a conductive paste or the like.
- High frequency power is supplied from the high frequency power source 20 between the high frequency electrode 16 and the ground electrode 18.
- the cable 22 that connects the high-frequency power source 20 and the high-frequency electrode 16 and the cable 24 that connects the ground electrode 18 and the ground pass outside the force tube 14 that passes through the tube 14. Also good.
- the cable 22 and the cable 24 may be fixed to the tube 14 with an adhesive 24 at a position where the cable 22 and the cable 24 are inserted into the tube 14.
- non-equilibrium plasma refers to plasma that is thermally non-equilibrium with a gas temperature of several K to several hundred K and an electron temperature of about several tens of thousands of kilometres.
- the characteristics of this nonequilibrium plasma are that the temperature of the plasma gas can be lowered, and that the plasma parameters can be controlled relatively easily and electrons, ions, and radicals, which are difficult to achieve with normal chemical changes, can be selectively used. It is in.
- the temperature of the plasma gas supplied from the plasma gas supply unit 12 in a temperature range of several K to several hundred K. is there.
- the plasma is generated by both the corona discharge and the dielectric barrier discharge in which the temperature of the plasma gas is difficult to rise. Therefore, by reducing the temperature of the plasma gas, A plasma with a corresponding low gas temperature can be obtained.
- the plasma gas can be cooled with liquid nitrogen to generate plasma in the temperature range of 77K to 300K.
- the plasma generator according to this embodiment can generate non-equilibrium plasma in a minute space by using both dielectric barrier discharge and corona discharge.
- the plasma torch 10 and the plasma gas supply unit 12 can be easily brought into any environment by connecting them with a flexible tube 14.
- the inner diameter of the plasma torch 10 is extremely small, from 10 mm to 5 m, and since it has flexibility, it can be bent in any direction. For this reason, it can be used for medical purposes such as an in-vivo plasma processing apparatus that is incorporated into a gastric camera, a force tail, a medical scalpel, and the like to remove tissue in the living body.
- the plasma torch 10 When the plasma generating apparatus that is effective in the present embodiment is incorporated into a gastric camera and a catheter, the plasma torch 10 is passed through each in-vivo introduction tube, and the tip of the plasma torch 10 that generates non-equilibrium plasma 26 is used. It is constructed so that the tip of the in-vivo introduction tube can be used to irradiate the living body with plasma.
- the plasma generator according to the present embodiment can be used as a medical knife with the configuration shown in FIGS.
- FIG. 2 shows a modification of the plasma generator that works on the present embodiment.
- An example of this electrode is an electrode in which a conductive seal is attached to the plasma torch 10.
- high-frequency power having a sinusoidal waveform and a frequency of 10 kHz is supplied from a high-frequency power source 20 to a high-frequency electrode 16, and a plasma gas is supplied from a plasma gas supply unit 12.
- Helium (He) was supplied as The plasma generated at this time increased as the amount of power supplied increased and the light emission part of the plasma expanded and the light emission changed brightly.
- the power supplied was about lOOmW
- the gas temperature measured by emission spectroscopy was about 300K, confirming that it was a non-equilibrium plasma.
- plasma material processing material processing (material synthesis, deposition, etching, surface treatment process, etc.) using the plasma obtained as described above
- plasma is generated in water at atmospheric pressure
- Material synthesis was attempted by supplying helium and methane as plasma gases.
- stable plasma was generated in water for over an hour, and graphite, carbon nanotubes, etc. could be generated.
- the plasma obtained as described above can be generated not only in space and water but also in soil. This makes it possible to remove pests that live in the soil such as termites and mites, or to directly oxidize toxic heavy metals contained in the soil, thereby detoxifying them without taking them out of the soil.
- FIG. 3 shows a configuration example of Embodiment 2 of the plasma generator according to the present invention.
- the characteristic point is that the ground electrode 18 and the cable 24 therefor are not provided. As a result, the structure becomes simpler and can be applied more easily to an in vivo plasma processing apparatus.
- the plasma can be stably generated without the ground electrode 18 in the case of the plasma generator according to the present embodiment as compared with the conventional dielectric barrier discharge type plasma generator. This is because the surface area of the dielectric (plasma torch 10) with respect to the plasma unit volume is very large, so that the charge accumulated in the dielectric easily escapes into the air and the like, and the charge does not accumulate in the dielectric.
- a macroplasma having a plasma diameter of about 10 cm is refined to a microplasma having a plasma diameter of about 100 ⁇ m by about lZlOOO.
- the amount of charge accumulated per unit area is also reduced by about 1Z1000. Due to this effect, the plasma generator according to the present embodiment does not require the ground electrode 18 that is necessary in the conventional plasma generator, and can stably generate plasma for a long time.
- the plasma generator is configured such that "dielectric barrier discharge generated between the high-frequency electrode 16 and the ground electrode 18" and "from the front end of the high-frequency electrode 16".
- the plasma is maintained by both “the generated corona discharge”.
- the diameter of the high-frequency electrode 16 which is an electrode for dielectric barrier discharge, becomes finer, the electric field tends to concentrate on the tip, and corona discharge also occurs.
- the ratio between the dielectric barrier discharge and the corona discharge can be controlled by changing the electrode potential, the electrode shape, the electrode length, the applied voltage, and the like, thereby controlling the plasma characteristics. . Therefore, the plasma generator according to the present invention is a special form in which dielectric barrier discharge and corona discharge are generated simultaneously. Therefore, even if the ground electrode 18 is omitted as in the second embodiment, the corona discharge In addition to dielectric barrier discharge, this also occurs.
- the plasma generator according to the present invention can control the ratio of the dielectric barrier discharge and the corona discharge according to the application, so that it can be applied to a material process or the like. Have an advantage.
Abstract
Description
Claims
Applications Claiming Priority (2)
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JP2004-216572 | 2004-06-28 | ||
JP2004216572 | 2004-06-28 |
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WO2006001455A1 true WO2006001455A1 (ja) | 2006-01-05 |
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PCT/JP2005/011860 WO2006001455A1 (ja) | 2004-06-28 | 2005-06-28 | プラズマ発生装置並びにこれを使用した生体内プラズマ処理装置及び表面処理装置 |
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JP2008034184A (ja) * | 2006-07-27 | 2008-02-14 | National Univ Corp Shizuoka Univ | 細線状大気圧放電プラズマの生成方法および生成装置 |
JP2009032545A (ja) * | 2007-07-27 | 2009-02-12 | Md Luminous Kk | マイクロ波プラズマニードル発生装置 |
JP2009054359A (ja) * | 2007-08-24 | 2009-03-12 | Tohoku Univ | プラズマ発生装置およびプラズマ発生方法 |
JP2009070586A (ja) * | 2007-09-10 | 2009-04-02 | Imagineering Kk | プラズマ生成方法、プラズマ生成装置、プラズマ生成装置用キャビティー及び計測装置 |
JPWO2008072390A1 (ja) * | 2006-12-12 | 2010-03-25 | 財団法人大阪産業振興機構 | プラズマ生成装置およびプラズマ生成方法 |
WO2011023478A1 (de) * | 2009-08-25 | 2011-03-03 | Inp Greifswald Leibniz-Institut Fuer Plasmaforschung Und Technologie E.V. | Vorrichtung zur flächigen behandlung von bereichen menschlicher oder tierischer haut- bzw. schleimhautoberflächen mittels eines kalten atmosphärendruckplasmas |
EP2349044A1 (en) * | 2008-10-21 | 2011-08-03 | Hermes Innovations LLC | Tissue ablation systems |
JP2011210453A (ja) * | 2010-03-29 | 2011-10-20 | Ehime Univ | 液中プラズマ発生装置、これを用いた清掃装置、補修装置、清掃方法および補修方法 |
WO2011144344A3 (en) * | 2010-05-19 | 2012-02-16 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. | Appliance for at least partially sterilizing a contaminated surface |
US8690873B2 (en) | 2008-10-21 | 2014-04-08 | Hermes Innovations Llc | Endometrial ablation devices and systems |
CN103731969A (zh) * | 2013-12-24 | 2014-04-16 | 苏州市奥普斯等离子体科技有限公司 | 一种空心阴极喷枪装置 |
GB2509063A (en) * | 2012-12-18 | 2014-06-25 | Linde Ag | Plasma device with earth electrode |
US8821486B2 (en) | 2009-11-13 | 2014-09-02 | Hermes Innovations, LLC | Tissue ablation systems and methods |
US8998901B2 (en) | 2008-10-21 | 2015-04-07 | Hermes Innovations Llc | Endometrial ablation method |
US9510897B2 (en) | 2010-11-05 | 2016-12-06 | Hermes Innovations Llc | RF-electrode surface and method of fabrication |
US9649125B2 (en) | 2013-10-15 | 2017-05-16 | Hermes Innovations Llc | Laparoscopic device |
US9662163B2 (en) | 2008-10-21 | 2017-05-30 | Hermes Innovations Llc | Endometrial ablation devices and systems |
JP2017168556A (ja) * | 2016-03-15 | 2017-09-21 | 国立研究開発法人産業技術総合研究所 | プラズマエッチング装置 |
US9901394B2 (en) | 2013-04-04 | 2018-02-27 | Hermes Innovations Llc | Medical ablation system and method of making |
WO2018224307A1 (de) * | 2017-06-09 | 2018-12-13 | Leibniz - Institut Für Analytische Wissenschaften -Isas- E.V. | Verfahren zur ionisierung von gasförmigen proben mittels dielektrisch behinderter entladung und zur nachfolgenden analyse der erzeugten probenionen in einem analysegerät |
US10492856B2 (en) | 2015-01-26 | 2019-12-03 | Hermes Innovations Llc | Surgical fluid management system and method of use |
CN110787362A (zh) * | 2019-11-19 | 2020-02-14 | 山东师范大学 | 一种大气压芦荟放电等离子体祛痘装置及其使用方法 |
US10675087B2 (en) | 2015-04-29 | 2020-06-09 | Cirrus Technologies Ltd | Medical ablation device and method of use |
JP2021003487A (ja) * | 2019-06-27 | 2021-01-14 | 日本特殊陶業株式会社 | 先端デバイス |
US11253311B2 (en) | 2016-04-22 | 2022-02-22 | RELIGN Corporation | Arthroscopic devices and methods |
WO2022229515A1 (fr) * | 2021-04-28 | 2022-11-03 | Sorbonne Universite | Outil pour dispositif de traitement medical par plasma et dispositif correspondant |
US11554214B2 (en) | 2019-06-26 | 2023-01-17 | Meditrina, Inc. | Fluid management system |
US11576718B2 (en) | 2016-01-20 | 2023-02-14 | RELIGN Corporation | Arthroscopic devices and methods |
US11766291B2 (en) | 2016-07-01 | 2023-09-26 | RELIGN Corporation | Arthroscopic devices and methods |
US11896282B2 (en) | 2009-11-13 | 2024-02-13 | Hermes Innovations Llc | Tissue ablation systems and method |
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JP2008034184A (ja) * | 2006-07-27 | 2008-02-14 | National Univ Corp Shizuoka Univ | 細線状大気圧放電プラズマの生成方法および生成装置 |
JP4677530B2 (ja) * | 2006-12-12 | 2011-04-27 | 国立大学法人大阪大学 | プラズマ生成装置およびプラズマ生成方法 |
JPWO2008072390A1 (ja) * | 2006-12-12 | 2010-03-25 | 財団法人大阪産業振興機構 | プラズマ生成装置およびプラズマ生成方法 |
US8232729B2 (en) | 2006-12-12 | 2012-07-31 | Osaka University | Plasma producing apparatus and method of plasma production |
JP2009032545A (ja) * | 2007-07-27 | 2009-02-12 | Md Luminous Kk | マイクロ波プラズマニードル発生装置 |
JP2009054359A (ja) * | 2007-08-24 | 2009-03-12 | Tohoku Univ | プラズマ発生装置およびプラズマ発生方法 |
JP2009070586A (ja) * | 2007-09-10 | 2009-04-02 | Imagineering Kk | プラズマ生成方法、プラズマ生成装置、プラズマ生成装置用キャビティー及び計測装置 |
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US8998901B2 (en) | 2008-10-21 | 2015-04-07 | Hermes Innovations Llc | Endometrial ablation method |
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US10265116B2 (en) | 2009-08-25 | 2019-04-23 | Leibniz-Institut Fuer Plasmaforschung Und Technologie E.V | Device for the planar treatment of areas of human or animal skin or mucous membrane surfaces by means of a cold atmospheric pressure plasma |
WO2011023478A1 (de) * | 2009-08-25 | 2011-03-03 | Inp Greifswald Leibniz-Institut Fuer Plasmaforschung Und Technologie E.V. | Vorrichtung zur flächigen behandlung von bereichen menschlicher oder tierischer haut- bzw. schleimhautoberflächen mittels eines kalten atmosphärendruckplasmas |
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JP2011210453A (ja) * | 2010-03-29 | 2011-10-20 | Ehime Univ | 液中プラズマ発生装置、これを用いた清掃装置、補修装置、清掃方法および補修方法 |
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US11043368B2 (en) | 2017-06-09 | 2021-06-22 | Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V. | Method for ionizing gaseous samples by means of a dielectric barrier discharge and for subsequently analyzing the produced sample ions in an analysis appliance |
WO2018224307A1 (de) * | 2017-06-09 | 2018-12-13 | Leibniz - Institut Für Analytische Wissenschaften -Isas- E.V. | Verfahren zur ionisierung von gasförmigen proben mittels dielektrisch behinderter entladung und zur nachfolgenden analyse der erzeugten probenionen in einem analysegerät |
US11554214B2 (en) | 2019-06-26 | 2023-01-17 | Meditrina, Inc. | Fluid management system |
JP7214580B2 (ja) | 2019-06-27 | 2023-01-30 | 日本特殊陶業株式会社 | 先端デバイス |
JP2021003487A (ja) * | 2019-06-27 | 2021-01-14 | 日本特殊陶業株式会社 | 先端デバイス |
CN110787362B (zh) * | 2019-11-19 | 2022-04-15 | 山东师范大学 | 一种大气压芦荟放电等离子体祛痘装置及其使用方法 |
CN110787362A (zh) * | 2019-11-19 | 2020-02-14 | 山东师范大学 | 一种大气压芦荟放电等离子体祛痘装置及其使用方法 |
WO2022229515A1 (fr) * | 2021-04-28 | 2022-11-03 | Sorbonne Universite | Outil pour dispositif de traitement medical par plasma et dispositif correspondant |
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