CN105009691A - 提供等离子体流的装置 - Google Patents
提供等离子体流的装置 Download PDFInfo
- Publication number
- CN105009691A CN105009691A CN201380066424.1A CN201380066424A CN105009691A CN 105009691 A CN105009691 A CN 105009691A CN 201380066424 A CN201380066424 A CN 201380066424A CN 105009691 A CN105009691 A CN 105009691A
- Authority
- CN
- China
- Prior art keywords
- dielectric substrate
- plasma
- electrode
- unit
- plasma unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B18/04—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating
- A61B18/042—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating using additional gas becoming plasma
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Disinfection or sterilisation of materials or objects, in general; Accessories therefor
- A61L2/02—Disinfection or sterilisation of materials or objects, in general; Accessories therefor using physical processes
- A61L2/14—Plasma, i.e. ionised gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32825—Working under atmospheric pressure or higher
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2431—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes using cylindrical electrodes, e.g. rotary drums
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Surgery (AREA)
- Animal Behavior & Ethology (AREA)
- Veterinary Medicine (AREA)
- Public Health (AREA)
- General Health & Medical Sciences (AREA)
- Otolaryngology (AREA)
- Molecular Biology (AREA)
- Medical Informatics (AREA)
- Heart & Thoracic Surgery (AREA)
- Biomedical Technology (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Epidemiology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Fluid Mechanics (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electrotherapy Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1222840.9 | 2012-12-18 | ||
| GB1222840.9A GB2509063A (en) | 2012-12-18 | 2012-12-18 | Plasma device with earth electrode |
| PCT/GB2013/000550 WO2014096755A1 (en) | 2012-12-18 | 2013-12-16 | Device for providing a flow of plasma |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105009691A true CN105009691A (zh) | 2015-10-28 |
Family
ID=47630956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380066424.1A Pending CN105009691A (zh) | 2012-12-18 | 2013-12-16 | 提供等离子体流的装置 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20150340207A1 (https=) |
| EP (1) | EP2936943B1 (https=) |
| JP (1) | JP2016507255A (https=) |
| CN (1) | CN105009691A (https=) |
| BR (1) | BR112015014338A2 (https=) |
| ES (1) | ES2635053T3 (https=) |
| GB (1) | GB2509063A (https=) |
| MX (1) | MX2015007911A (https=) |
| WO (1) | WO2014096755A1 (https=) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106693009A (zh) * | 2016-12-26 | 2017-05-24 | 大连顺达微创科技有限公司 | 一种大气压柔性冷等离子体射流内窥镜灭菌装置及方法 |
| CN107320847A (zh) * | 2017-06-21 | 2017-11-07 | 江苏康易达医疗科技有限公司 | 一种低温等离子体灭菌笔 |
| CN112741704A (zh) * | 2020-12-29 | 2021-05-04 | 江苏容正医药科技有限公司 | 一种用于牙齿清洁和/或美白的等离子体射流装置 |
| CN112804954A (zh) * | 2018-07-31 | 2021-05-14 | 莱雅公司 | 远离皮肤生成冷等离子体以及相关联的系统和方法 |
| CN113491173A (zh) * | 2019-01-16 | 2021-10-08 | 奇诺格有限责任公司 | 等离子体治疗系统和用于使等离子体治疗系统的支承面的尺寸适配于要治疗的表面的尺寸的方法 |
| CN115551427A (zh) * | 2020-03-19 | 2022-12-30 | 卡普斯医疗有限公司 | 使用等离子产生装置对体内空间的处理 |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2656333C1 (ru) * | 2015-01-12 | 2018-06-05 | Гуанчжоу Цин ГУ Медикал Технолоджи Ко., ЛТД | Плазменный прибор со сменной разрядной трубкой |
| JP6513793B2 (ja) * | 2015-04-09 | 2019-05-15 | 株式会社オーラル28 | プラズマ照射装置及びプラズマ照射方法 |
| US11490947B2 (en) | 2015-05-15 | 2022-11-08 | Clear Intradermal Technologies, Inc. | Tattoo removal using a liquid-gas mixture with plasma gas bubbles |
| CA2986031C (en) | 2015-05-15 | 2024-03-19 | ClearIt, LLC | Systems and methods for tattoo removal using cold plasma |
| EP3314988B1 (en) | 2015-06-23 | 2020-06-17 | Aurora Labs Ltd | Plasma driven particle propagation apparatus and pumping method |
| EP3120875B1 (en) * | 2015-07-20 | 2017-07-12 | Hilgenberg GmbH | Ionization device |
| WO2017197071A1 (en) | 2016-05-12 | 2017-11-16 | EP Technologies LLC | Methods and systems for trans-tissue substance delivery using plasmaporation |
| WO2017195345A1 (ja) * | 2016-05-13 | 2017-11-16 | 富士機械製造株式会社 | 医療用プラズマ発生装置、およびプラズマ照射方法 |
| WO2018089577A1 (en) | 2016-11-10 | 2018-05-17 | EP Technologies LLC | Methods and systems for generating plasma activated liquid |
| TWI691237B (zh) * | 2018-02-13 | 2020-04-11 | 國立交通大學 | 常壓電漿束產生裝置 |
| WO2020004247A1 (ja) * | 2018-06-28 | 2020-01-02 | 株式会社Cspアドバンスソリューションズ | 流行性角結膜炎の治療用点眼剤、当該点眼剤を生成するプラズマ活性点眼剤生成装置、及び流行性角結膜炎の治療方法 |
| CA3124411A1 (en) | 2018-12-19 | 2020-06-25 | ClearIt, LLC | Systems and methods for tattoo removal using an applied electric field |
| CN112638471B (zh) * | 2019-06-24 | 2025-07-11 | 永进生物科技股份有限公司 | 包括二进气口的电浆装置 |
| TWI694748B (zh) * | 2019-08-28 | 2020-05-21 | 明志科技大學 | 用以產生大面積電漿之電極元件 |
| GB2595651A (en) * | 2020-05-29 | 2021-12-08 | Univ Southampton | Sterlisation of endoscopes |
| WO2022013229A1 (en) | 2020-07-13 | 2022-01-20 | Freiburger Medizintechnik Gmbh | Electrode arrangement |
| KR20220078855A (ko) | 2020-12-04 | 2022-06-13 | 주식회사 피글 | 세포활성용 플라스마 발생부의 제조방법 및 이를 통해 제조된 플라스마 발생부를 포함하는 세포활성장치 |
| JP7696559B2 (ja) * | 2020-12-24 | 2025-06-23 | 国立大学法人高知大学 | 腫瘍組織への免疫細胞誘導装置 |
| IL315745A (en) * | 2021-12-22 | 2024-11-01 | Inbar Medical Ltd | Devices and methods for treating skin tissue using cold plasma |
| JP7612315B1 (ja) * | 2023-11-01 | 2025-01-14 | 株式会社Tmeic | 活性ガス生成装置 |
| WO2025094419A1 (ja) * | 2023-11-01 | 2025-05-08 | 株式会社Tmeic | 活性ガス生成装置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005125286A2 (de) * | 2004-06-16 | 2005-12-29 | Je Plasmaconsult Gmbh | Vorrichtung zur bearbeitung eines substrates mittels mindestens eines plasma-jets |
| WO2009146432A1 (en) * | 2008-05-30 | 2009-12-03 | Colorado State University Research Foundation | Plasma-based chemical source device and method of use thereof |
| CN101732091A (zh) * | 2008-11-25 | 2010-06-16 | 浦项工科大学校产学协力团 | 使用冷等离子体的凝血装置 |
| WO2011092186A1 (de) * | 2010-01-26 | 2011-08-04 | Leibniz-Institut Für Plasmaforschung Und Technologie E. V. | Vorrichtung und verfahren zur erzeugung einer elektrischen entladung in hohlkörpern |
| WO2012005132A1 (ja) * | 2010-07-07 | 2012-01-12 | 独立行政法人産業技術総合研究所 | プラズマ照射処理装置 |
| US20120064016A1 (en) * | 2010-09-09 | 2012-03-15 | Geoffrey Morgan Lloyd | Active gases and treatment methods |
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| US6673533B1 (en) * | 1995-03-10 | 2004-01-06 | Meso Scale Technologies, Llc. | Multi-array multi-specific electrochemiluminescence testing |
| US5970993A (en) * | 1996-10-04 | 1999-10-26 | Utron Inc. | Pulsed plasma jet paint removal |
| US6652069B2 (en) * | 2000-11-22 | 2003-11-25 | Konica Corporation | Method of surface treatment, device of surface treatment, and head for use in ink jet printer |
| JP2003229299A (ja) * | 2002-02-06 | 2003-08-15 | Konica Corp | 大気圧プラズマ処理装置、該大気圧プラズマ処理装置を用いて製造した膜、製膜方法及び該製膜方法を用いて製造した膜 |
| JP2005322416A (ja) * | 2003-05-01 | 2005-11-17 | Gunma Univ | 大気圧低温プラズマ装置と表面処理方法 |
| US7022402B2 (en) * | 2003-07-14 | 2006-04-04 | E. I. Du Pont De Nemours And Company | Dielectric substrates comprising a polymide core layer and a high temperature fluoropolymer bonding layer, and methods relating thereto |
| JP4658506B2 (ja) * | 2004-03-31 | 2011-03-23 | 浩史 滝川 | パルスアークプラズマ生成用電源回路及びパルスアークプラズマ処理装置 |
| WO2006001455A1 (ja) * | 2004-06-28 | 2006-01-05 | The University Of Tokyo | プラズマ発生装置並びにこれを使用した生体内プラズマ処理装置及び表面処理装置 |
| US7608839B2 (en) * | 2005-08-05 | 2009-10-27 | Mcgill University | Plasma source and applications thereof |
| WO2007105428A1 (ja) * | 2006-02-13 | 2007-09-20 | National University Corporation Gunma University | プラズマ発生装置用ノズル、プラズマ発生装置、プラズマ表面処理装置、プラズマ発生方法およびプラズマ表面処理方法 |
| JP2009119356A (ja) * | 2007-11-14 | 2009-06-04 | Toshiba Corp | 放電表面処理装置及び放電表面処理方法 |
| DE102008008614A1 (de) * | 2008-02-12 | 2009-08-13 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Plama-Gerät zur selektiven Behandlung elektroporierter Zellen |
| KR101158800B1 (ko) * | 2008-11-14 | 2012-06-26 | 주식회사 피에스엠 | 의료용 플라즈마 건 |
| DE202009011521U1 (de) * | 2009-08-25 | 2010-12-30 | INP Greifswald Leibniz-Institut für Plasmaforschung und Technologie e. V. | Plasma-Manschette |
| GB201110282D0 (en) * | 2011-06-17 | 2011-08-03 | Linde Ag | Device for providing a flow of plasma |
-
2012
- 2012-12-18 GB GB1222840.9A patent/GB2509063A/en not_active Withdrawn
-
2013
- 2013-12-16 CN CN201380066424.1A patent/CN105009691A/zh active Pending
- 2013-12-16 EP EP13815796.1A patent/EP2936943B1/en not_active Not-in-force
- 2013-12-16 BR BR112015014338A patent/BR112015014338A2/pt not_active Application Discontinuation
- 2013-12-16 WO PCT/GB2013/000550 patent/WO2014096755A1/en not_active Ceased
- 2013-12-16 ES ES13815796.1T patent/ES2635053T3/es active Active
- 2013-12-16 JP JP2015547134A patent/JP2016507255A/ja active Pending
- 2013-12-16 US US14/650,960 patent/US20150340207A1/en not_active Abandoned
- 2013-12-16 MX MX2015007911A patent/MX2015007911A/es unknown
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005125286A2 (de) * | 2004-06-16 | 2005-12-29 | Je Plasmaconsult Gmbh | Vorrichtung zur bearbeitung eines substrates mittels mindestens eines plasma-jets |
| WO2009146432A1 (en) * | 2008-05-30 | 2009-12-03 | Colorado State University Research Foundation | Plasma-based chemical source device and method of use thereof |
| CN101732091A (zh) * | 2008-11-25 | 2010-06-16 | 浦项工科大学校产学协力团 | 使用冷等离子体的凝血装置 |
| WO2011092186A1 (de) * | 2010-01-26 | 2011-08-04 | Leibniz-Institut Für Plasmaforschung Und Technologie E. V. | Vorrichtung und verfahren zur erzeugung einer elektrischen entladung in hohlkörpern |
| WO2012005132A1 (ja) * | 2010-07-07 | 2012-01-12 | 独立行政法人産業技術総合研究所 | プラズマ照射処理装置 |
| US20120064016A1 (en) * | 2010-09-09 | 2012-03-15 | Geoffrey Morgan Lloyd | Active gases and treatment methods |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106693009B (zh) * | 2016-12-26 | 2023-06-27 | 大连顺达微创科技有限公司 | 一种大气压柔性冷等离子体射流内窥镜灭菌装置及方法 |
| CN106693009A (zh) * | 2016-12-26 | 2017-05-24 | 大连顺达微创科技有限公司 | 一种大气压柔性冷等离子体射流内窥镜灭菌装置及方法 |
| CN107320847A (zh) * | 2017-06-21 | 2017-11-07 | 江苏康易达医疗科技有限公司 | 一种低温等离子体灭菌笔 |
| CN107320847B (zh) * | 2017-06-21 | 2020-08-07 | 江苏春申堂药业有限公司 | 一种低温等离子体灭菌笔 |
| CN112804954A (zh) * | 2018-07-31 | 2021-05-14 | 莱雅公司 | 远离皮肤生成冷等离子体以及相关联的系统和方法 |
| US12042574B2 (en) | 2018-07-31 | 2024-07-23 | L'oreal | Generating cold plasma away from skin, and associated systems and methods preliminary class |
| CN112804954B (zh) * | 2018-07-31 | 2024-06-07 | 莱雅公司 | 远离皮肤生成冷等离子体以及相关联的系统 |
| CN113491173B (zh) * | 2019-01-16 | 2024-03-22 | 奇诺格有限责任公司 | 等离子体治疗系统和使其支承面尺寸适配的方法 |
| US12457678B2 (en) | 2019-01-16 | 2025-10-28 | Cinogy Gmbh | Plasma treatment arrangement and method for adapting the size of a support area of the plasma treatment arrangement to the size of the surface to be treated |
| CN113491173A (zh) * | 2019-01-16 | 2021-10-08 | 奇诺格有限责任公司 | 等离子体治疗系统和用于使等离子体治疗系统的支承面的尺寸适配于要治疗的表面的尺寸的方法 |
| CN115551427A (zh) * | 2020-03-19 | 2022-12-30 | 卡普斯医疗有限公司 | 使用等离子产生装置对体内空间的处理 |
| US12564725B2 (en) | 2020-03-19 | 2026-03-03 | Caps Medical Ltd. | Treatment of internal spaces using plasma generating device |
| CN115551427B (zh) * | 2020-03-19 | 2025-08-01 | 卡普斯医疗有限公司 | 使用等离子产生装置对体内空间的处理 |
| CN112741704A (zh) * | 2020-12-29 | 2021-05-04 | 江苏容正医药科技有限公司 | 一种用于牙齿清洁和/或美白的等离子体射流装置 |
| CN112741704B (zh) * | 2020-12-29 | 2022-06-24 | 江苏容正医药科技有限公司 | 一种用于牙齿清洁和/或美白的等离子体射流装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| ES2635053T3 (es) | 2017-10-02 |
| WO2014096755A1 (en) | 2014-06-26 |
| JP2016507255A (ja) | 2016-03-10 |
| EP2936943A1 (en) | 2015-10-28 |
| GB201222840D0 (en) | 2013-01-30 |
| US20150340207A1 (en) | 2015-11-26 |
| BR112015014338A2 (pt) | 2017-07-11 |
| GB2509063A (en) | 2014-06-25 |
| EP2936943B1 (en) | 2017-06-14 |
| MX2015007911A (es) | 2015-10-05 |
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Application publication date: 20151028 |