JP2016157778A5 - - Google Patents

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Publication number
JP2016157778A5
JP2016157778A5 JP2015033910A JP2015033910A JP2016157778A5 JP 2016157778 A5 JP2016157778 A5 JP 2016157778A5 JP 2015033910 A JP2015033910 A JP 2015033910A JP 2015033910 A JP2015033910 A JP 2015033910A JP 2016157778 A5 JP2016157778 A5 JP 2016157778A5
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JP
Japan
Prior art keywords
load
cleaning tool
roll cleaning
substrate
waterproof
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015033910A
Other languages
English (en)
Japanese (ja)
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JP2016157778A (ja
JP6328577B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2015033910A external-priority patent/JP6328577B2/ja
Priority to JP2015033910A priority Critical patent/JP6328577B2/ja
Priority to US15/045,643 priority patent/US9719869B2/en
Priority to KR1020160019058A priority patent/KR102238958B1/ko
Priority to CN201610092048.9A priority patent/CN105914166B/zh
Priority to SG10201601246RA priority patent/SG10201601246RA/en
Priority to TW105105095A priority patent/TWI666712B/zh
Publication of JP2016157778A publication Critical patent/JP2016157778A/ja
Publication of JP2016157778A5 publication Critical patent/JP2016157778A5/ja
Publication of JP6328577B2 publication Critical patent/JP6328577B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015033910A 2015-02-24 2015-02-24 荷重測定装置および荷重測定方法 Active JP6328577B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2015033910A JP6328577B2 (ja) 2015-02-24 2015-02-24 荷重測定装置および荷重測定方法
US15/045,643 US9719869B2 (en) 2015-02-24 2016-02-17 Load measuring apparatus and load measuring method
KR1020160019058A KR102238958B1 (ko) 2015-02-24 2016-02-18 하중 측정 장치 및 하중 측정 방법
SG10201601246RA SG10201601246RA (en) 2015-02-24 2016-02-19 Load measuring apparatus and load measuring method
CN201610092048.9A CN105914166B (zh) 2015-02-24 2016-02-19 载荷测定装置以及载荷测定方法
TW105105095A TWI666712B (zh) 2015-02-24 2016-02-22 負荷測定裝置以及負荷測定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015033910A JP6328577B2 (ja) 2015-02-24 2015-02-24 荷重測定装置および荷重測定方法

Publications (3)

Publication Number Publication Date
JP2016157778A JP2016157778A (ja) 2016-09-01
JP2016157778A5 true JP2016157778A5 (https=) 2017-12-21
JP6328577B2 JP6328577B2 (ja) 2018-05-23

Family

ID=56690215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015033910A Active JP6328577B2 (ja) 2015-02-24 2015-02-24 荷重測定装置および荷重測定方法

Country Status (6)

Country Link
US (1) US9719869B2 (https=)
JP (1) JP6328577B2 (https=)
KR (1) KR102238958B1 (https=)
CN (1) CN105914166B (https=)
SG (1) SG10201601246RA (https=)
TW (1) TWI666712B (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6767834B2 (ja) 2016-09-29 2020-10-14 株式会社荏原製作所 基板洗浄装置及び基板処理装置
JP6792512B2 (ja) 2017-05-16 2020-11-25 株式会社荏原製作所 基板洗浄装置および基板処理装置
JP6823541B2 (ja) * 2017-05-30 2021-02-03 株式会社荏原製作所 キャリブレーション方法およびキャリブレーションプログラム
JP7079164B2 (ja) 2018-07-06 2022-06-01 株式会社荏原製作所 基板洗浄装置および基板洗浄方法
CN108955846A (zh) * 2018-08-14 2018-12-07 安徽中联九通机械设备有限公司 一种配料机控制系统
DE102020133121B4 (de) 2019-12-12 2024-06-20 Alfred Schöpf Verfahren und Vorrichtung zur Überlaufmessung einer Flüssigkeit über eine Überlaufkante eines Beckens
WO2022054605A1 (ja) * 2020-09-10 2022-03-17 東京エレクトロン株式会社 厚み測定装置及び厚み測定方法
JP7093390B2 (ja) * 2020-10-15 2022-06-29 株式会社荏原製作所 基板洗浄装置
CN117772662A (zh) * 2023-12-25 2024-03-29 北京晶亦精微科技股份有限公司 一种基板清洗装置以及清洗方法

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US4248317A (en) * 1979-09-10 1981-02-03 Cardinal Scale Manufacturing Company Load cell apparatus
US4425808A (en) * 1982-02-26 1984-01-17 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Thin film strain transducer
JPS61278724A (ja) * 1985-06-04 1986-12-09 Nippon Kokan Kk <Nkk> 脱水機圧力測定装置
JP3341872B2 (ja) * 1995-04-03 2002-11-05 大日本スクリーン製造株式会社 回転式基板洗浄装置
KR19980022571A (ko) * 1996-09-23 1998-07-06 김광호 반도체 스크러버(Scrubber)장비
JP3540524B2 (ja) * 1996-10-28 2004-07-07 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JPH10189512A (ja) * 1996-12-26 1998-07-21 Sony Corp 基板洗浄装置
JP2000228382A (ja) * 1999-02-05 2000-08-15 Sony Corp ウエハ洗浄装置
US6579797B1 (en) * 2000-01-25 2003-06-17 Agere Systems Inc. Cleaning brush conditioning apparatus
JP2002051497A (ja) * 2000-07-28 2002-02-15 Mitsumi Electric Co Ltd モータ駆動軸の側圧機構及び側圧機構を備えたモータ
US7743449B2 (en) * 2002-06-28 2010-06-29 Lam Research Corporation System and method for a combined contact and non-contact wafer cleaning module
KR20080044825A (ko) * 2005-09-15 2008-05-21 가부시키가이샤 에바라 세이사꾸쇼 세정부재, 기판세정장치 및 기판처리장치
FR2931550B1 (fr) * 2008-05-20 2012-12-07 Commissariat Energie Atomique Dispositif pour la detection gravimetrique de particules en milieu fluide comprenant un oscillateur entre deux canaux fluidiques, procede de realisation et methode de mise en oeuvre du dispositif
US9312159B2 (en) * 2009-06-09 2016-04-12 Nikon Corporation Transport apparatus and exposure apparatus
US9254510B2 (en) * 2012-02-03 2016-02-09 Stmicroelectronics, Inc. Drying apparatus with exhaust control cap for semiconductor wafers and associated methods
JP5878441B2 (ja) * 2012-08-20 2016-03-08 株式会社荏原製作所 基板洗浄装置及び基板処理装置
JP6262983B2 (ja) * 2012-10-25 2018-01-17 株式会社荏原製作所 基板洗浄装置及び基板洗浄方法
JP6279276B2 (ja) * 2013-10-03 2018-02-14 株式会社荏原製作所 基板洗浄装置及び基板処理装置
US9127968B2 (en) * 2013-11-18 2015-09-08 Ford Global Technologies, Llc Flexible optical impact detection sensor for front rail mounted airbag
SG10201601095UA (en) * 2015-02-18 2016-09-29 Ebara Corp Substrate cleaning apparatus, substrate cleaning method, and substrate processing apparatus

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