JP2016103632A5 - - Google Patents
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- JP2016103632A5 JP2016103632A5 JP2015220973A JP2015220973A JP2016103632A5 JP 2016103632 A5 JP2016103632 A5 JP 2016103632A5 JP 2015220973 A JP2015220973 A JP 2015220973A JP 2015220973 A JP2015220973 A JP 2015220973A JP 2016103632 A5 JP2016103632 A5 JP 2016103632A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- neon
- processing chamber
- helium
- etchant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/539,121 | 2014-11-12 | ||
| US14/539,121 US9609730B2 (en) | 2014-11-12 | 2014-11-12 | Adjustment of VUV emission of a plasma via collisional resonant energy transfer to an energy absorber gas |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016103632A JP2016103632A (ja) | 2016-06-02 |
| JP2016103632A5 true JP2016103632A5 (enExample) | 2018-12-20 |
| JP6758818B2 JP6758818B2 (ja) | 2020-09-23 |
Family
ID=55913372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015220973A Active JP6758818B2 (ja) | 2014-11-12 | 2015-11-11 | エネルギー吸収体ガスへの衝突共鳴エネルギー伝達によるプラズマのｖｕｖ放出の調節 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9609730B2 (enExample) |
| JP (1) | JP6758818B2 (enExample) |
| KR (1) | KR20160056839A (enExample) |
| CN (1) | CN105590826B (enExample) |
| TW (1) | TWI690241B (enExample) |
Families Citing this family (49)
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|---|---|---|---|---|
| US12444651B2 (en) | 2009-08-04 | 2025-10-14 | Novellus Systems, Inc. | Tungsten feature fill with nucleation inhibition |
| US8617411B2 (en) * | 2011-07-20 | 2013-12-31 | Lam Research Corporation | Methods and apparatus for atomic layer etching |
| JP6495025B2 (ja) | 2014-01-31 | 2019-04-03 | ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ | 真空統合ハードマスク処理および装置 |
| CN112366128B (zh) * | 2014-04-09 | 2024-03-08 | 应用材料公司 | 用于在处理腔室中提供对称的流动路径的流动模块 |
| US9870899B2 (en) * | 2015-04-24 | 2018-01-16 | Lam Research Corporation | Cobalt etch back |
| US10020264B2 (en) * | 2015-04-28 | 2018-07-10 | Infineon Technologies Ag | Integrated circuit substrate and method for manufacturing the same |
| US9972504B2 (en) | 2015-08-07 | 2018-05-15 | Lam Research Corporation | Atomic layer etching of tungsten for enhanced tungsten deposition fill |
| WO2017052905A1 (en) * | 2015-09-22 | 2017-03-30 | Applied Materials, Inc. | Apparatus and method for selective deposition |
| US10727073B2 (en) | 2016-02-04 | 2020-07-28 | Lam Research Corporation | Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces |
| KR20170122910A (ko) * | 2016-04-27 | 2017-11-07 | 성균관대학교산학협력단 | 원자층 식각방법 |
| US10269566B2 (en) | 2016-04-29 | 2019-04-23 | Lam Research Corporation | Etching substrates using ale and selective deposition |
| US10566212B2 (en) | 2016-12-19 | 2020-02-18 | Lam Research Corporation | Designer atomic layer etching |
| US10559461B2 (en) | 2017-04-19 | 2020-02-11 | Lam Research Corporation | Selective deposition with atomic layer etch reset |
| US10832909B2 (en) | 2017-04-24 | 2020-11-10 | Lam Research Corporation | Atomic layer etch, reactive precursors and energetic sources for patterning applications |
| US10494715B2 (en) | 2017-04-28 | 2019-12-03 | Lam Research Corporation | Atomic layer clean for removal of photoresist patterning scum |
| US10796912B2 (en) * | 2017-05-16 | 2020-10-06 | Lam Research Corporation | Eliminating yield impact of stochastics in lithography |
| US9991129B1 (en) * | 2017-05-23 | 2018-06-05 | Applied Materials, Inc. | Selective etching of amorphous silicon over epitaxial silicon |
| US11120999B2 (en) | 2017-12-15 | 2021-09-14 | Tokyo Electron Limited | Plasma etching method |
| EP3776636B1 (en) | 2018-03-30 | 2025-05-07 | Lam Research Corporation | Atomic layer etching and smoothing of refractory metals and other high surface binding energy materials |
| US11062887B2 (en) * | 2018-09-17 | 2021-07-13 | Applied Materials, Inc. | High temperature RF heater pedestals |
| KR102955829B1 (ko) | 2018-11-14 | 2026-04-23 | 램 리써치 코포레이션 | 차세대 리소그래피에서 유용한 하드 마스크들을 제조하기 위한 방법들 |
| WO2020100227A1 (ja) * | 2018-11-14 | 2020-05-22 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置及びそれを用いた被処理試料の処理方法 |
| KR102942164B1 (ko) * | 2018-11-15 | 2026-03-19 | 램 리써치 코포레이션 | 할로겐 기반 화합물들을 사용하여 선택적으로 에칭하기 위한 원자 층 에칭 시스템들 |
| CN120762258A (zh) | 2018-12-20 | 2025-10-10 | 朗姆研究公司 | 抗蚀剂的干式显影 |
| US12125711B2 (en) | 2019-03-18 | 2024-10-22 | Lam Research Corporation | Reducing roughness of extreme ultraviolet lithography resists |
| KR102809999B1 (ko) * | 2019-04-01 | 2025-05-19 | 에이에스엠 아이피 홀딩 비.브이. | 반도체 소자를 제조하는 방법 |
| WO2020223011A1 (en) | 2019-04-30 | 2020-11-05 | Lam Research Corporation | Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement |
| TWI910974B (zh) | 2019-06-26 | 2026-01-01 | 美商蘭姆研究公司 | 利用鹵化物化學品的光阻顯影 |
| TWI849159B (zh) | 2019-06-28 | 2024-07-21 | 美商蘭姆研究公司 | 光阻膜的乾式腔室清潔 |
| DE102019214074A1 (de) * | 2019-09-16 | 2021-03-18 | Robert Bosch Gmbh | Verfahren und Vorrichtung zum lokalen Entfernen und/oder Modifizieren eines Polymermaterials auf einer Oberfläche |
| CN114200776A (zh) | 2020-01-15 | 2022-03-18 | 朗姆研究公司 | 用于光刻胶粘附和剂量减少的底层 |
| CN111370308B (zh) * | 2020-02-18 | 2023-03-21 | 中国科学院微电子研究所 | 一种刻蚀方法及系统、刻蚀控制装置、电子器件及设备 |
| CN115244664A (zh) | 2020-02-28 | 2022-10-25 | 朗姆研究公司 | 用于减少euv图案化缺陷的多层硬掩模 |
| CN115244666A (zh) | 2020-03-06 | 2022-10-25 | 朗姆研究公司 | 钼的原子层蚀刻 |
| CN115362414A (zh) | 2020-04-03 | 2022-11-18 | 朗姆研究公司 | 用于增强euv光刻性能的暴露前光致抗蚀剂固化 |
| US11538714B2 (en) | 2020-05-21 | 2022-12-27 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
| US11875967B2 (en) | 2020-05-21 | 2024-01-16 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
| US11315819B2 (en) * | 2020-05-21 | 2022-04-26 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
| KR102601038B1 (ko) | 2020-07-07 | 2023-11-09 | 램 리써치 코포레이션 | 방사선 포토레지스트 패터닝을 패터닝하기 위한 통합된 건식 프로세스 |
| CN111994868B (zh) * | 2020-08-12 | 2022-05-17 | 天津大学 | 极紫外光与等离子体复合原子尺度加工方法 |
| KR102673863B1 (ko) | 2020-11-13 | 2024-06-11 | 램 리써치 코포레이션 | 포토레지스트의 건식 제거를 위한 프로세스 툴 |
| CN112509901B (zh) * | 2020-11-19 | 2022-03-22 | 北京北方华创微电子装备有限公司 | 工艺腔室及半导体工艺设备 |
| KR20250142946A (ko) | 2020-12-08 | 2025-09-30 | 램 리써치 코포레이션 | 유기 증기를 사용한 포토레지스트 현상 |
| CN114843164A (zh) * | 2021-02-02 | 2022-08-02 | 中微半导体设备(上海)股份有限公司 | 升降销固定器、升降销组件及等离子体处理装置 |
| US12532546B2 (en) * | 2021-03-11 | 2026-01-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods for reduction of photoresist defect |
| US11619594B2 (en) | 2021-04-28 | 2023-04-04 | Applied Materials, Inc. | Multiple reflectometry for measuring etch parameters |
| US11502217B1 (en) * | 2021-05-24 | 2022-11-15 | Gautam Ganguly | Methods and apparatus for reducing as-deposited and metastable defects in Amorphousilicon |
| KR102730643B1 (ko) * | 2021-12-17 | 2024-11-14 | 세메스 주식회사 | 공정 가스 공급 유닛 및 이를 포함하는 기판 처리 장치 |
| CN121306896B (zh) * | 2025-10-16 | 2026-06-30 | 上海稷以科技有限公司 | 一种离子能量控制筛网装置及半导体刻蚀设备 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0629255A (ja) * | 1992-07-10 | 1994-02-04 | Hitachi Sci Syst:Kk | プラズマエッチング方法及び装置 |
| US5948704A (en) | 1996-06-05 | 1999-09-07 | Lam Research Corporation | High flow vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support |
| US6461529B1 (en) * | 1999-04-26 | 2002-10-08 | International Business Machines Corporation | Anisotropic nitride etch process with high selectivity to oxide and photoresist layers in a damascene etch scheme |
| US7160671B2 (en) * | 2001-06-27 | 2007-01-09 | Lam Research Corporation | Method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity |
| US7517814B2 (en) * | 2005-03-30 | 2009-04-14 | Tokyo Electron, Ltd. | Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently |
| US7740736B2 (en) | 2006-06-08 | 2010-06-22 | Lam Research Corporation | Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber |
| US7732728B2 (en) | 2007-01-17 | 2010-06-08 | Lam Research Corporation | Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor |
| CN102084468B (zh) * | 2008-02-08 | 2014-10-29 | 朗姆研究公司 | 包括横向波纹管和非接触颗粒密封的可调节间隙电容耦合rf等离子反应器 |
| KR101353012B1 (ko) * | 2009-11-17 | 2014-01-22 | 가부시키가이샤 히다치 하이테크놀로지즈 | 시료 처리 장치, 시료 처리 시스템 및 시료의 처리 방법 |
| US20110139748A1 (en) * | 2009-12-15 | 2011-06-16 | University Of Houston | Atomic layer etching with pulsed plasmas |
| US8877080B2 (en) * | 2010-10-18 | 2014-11-04 | Tokyo Electron Limited | Using vacuum ultra-violet (VUV) data in microwave sources |
| JP2012149278A (ja) * | 2011-01-17 | 2012-08-09 | Mitsui Chemicals Inc | シリコン含有膜の製造方法 |
| US8617411B2 (en) * | 2011-07-20 | 2013-12-31 | Lam Research Corporation | Methods and apparatus for atomic layer etching |
| US9362133B2 (en) | 2012-12-14 | 2016-06-07 | Lam Research Corporation | Method for forming a mask by etching conformal film on patterned ashable hardmask |
-
2014
- 2014-11-12 US US14/539,121 patent/US9609730B2/en active Active
-
2015
- 2015-11-11 JP JP2015220973A patent/JP6758818B2/ja active Active
- 2015-11-11 TW TW104137092A patent/TWI690241B/zh active
- 2015-11-12 CN CN201510776969.2A patent/CN105590826B/zh active Active
- 2015-11-12 KR KR1020150158854A patent/KR20160056839A/ko not_active Withdrawn
-
2017
- 2017-02-14 US US15/432,689 patent/US20170170036A1/en not_active Abandoned
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