JP2016084471A5 - - Google Patents

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Publication number
JP2016084471A5
JP2016084471A5 JP2015209376A JP2015209376A JP2016084471A5 JP 2016084471 A5 JP2016084471 A5 JP 2016084471A5 JP 2015209376 A JP2015209376 A JP 2015209376A JP 2015209376 A JP2015209376 A JP 2015209376A JP 2016084471 A5 JP2016084471 A5 JP 2016084471A5
Authority
JP
Japan
Prior art keywords
film
embossed film
embossed
recesses
fine solids
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015209376A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016084471A (ja
JP6967832B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to CN201580055670.6A priority Critical patent/CN107073806B/zh
Priority to CN201910739177.6A priority patent/CN110435125B/zh
Priority to KR1020187030061A priority patent/KR20180117209A/ko
Priority to TW109126311A priority patent/TWI819231B/zh
Priority to KR1020247024907A priority patent/KR20240118899A/ko
Priority to KR1020177006077A priority patent/KR20170038913A/ko
Priority to CN201910280138.4A priority patent/CN109940865B/zh
Priority to TW104135448A priority patent/TWI704046B/zh
Priority to PCT/JP2015/080331 priority patent/WO2016068166A1/ja
Priority to US15/523,182 priority patent/US10245780B2/en
Priority to KR1020227013960A priority patent/KR102688697B1/ko
Publication of JP2016084471A publication Critical patent/JP2016084471A/ja
Publication of JP2016084471A5 publication Critical patent/JP2016084471A5/ja
Priority to US16/288,430 priority patent/US10890844B2/en
Priority to US17/144,670 priority patent/US11543746B2/en
Application granted granted Critical
Publication of JP6967832B2 publication Critical patent/JP6967832B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015209376A 2014-10-28 2015-10-23 エンボスフィルム、枚葉フィルム、転写物、およびエンボスフィルムの製造方法 Active JP6967832B2 (ja)

Priority Applications (13)

Application Number Priority Date Filing Date Title
PCT/JP2015/080331 WO2016068166A1 (ja) 2014-10-28 2015-10-28 エンボスフィルム、枚葉フィルム、転写物、およびエンボスフィルムの製造方法
KR1020187030061A KR20180117209A (ko) 2014-10-28 2015-10-28 엠보스 필름, 매엽 필름, 전사물, 및 엠보스 필름의 제조 방법
KR1020227013960A KR102688697B1 (ko) 2014-10-28 2015-10-28 엠보스 필름, 매엽 필름, 전사물, 및 엠보스 필름의 제조 방법
KR1020247024907A KR20240118899A (ko) 2014-10-28 2015-10-28 엠보스 필름, 매엽 필름, 전사물, 및 엠보스 필름의 제조 방법
KR1020177006077A KR20170038913A (ko) 2014-10-28 2015-10-28 엠보스 필름, 매엽 필름, 전사물, 및 엠보스 필름의 제조 방법
CN201910280138.4A CN109940865B (zh) 2014-10-28 2015-10-28 转印物、层叠膜、片状转印物、其应用和使用其的设备
TW104135448A TWI704046B (zh) 2014-10-28 2015-10-28 壓紋膜、單張膜、轉寫物、及壓紋膜之製造方法
US15/523,182 US10245780B2 (en) 2014-10-28 2015-10-28 Embossed film, sheet film, transfer copy, and method for producing embossed film
CN201580055670.6A CN107073806B (zh) 2014-10-28 2015-10-28 压花膜、片状膜、转印物以及压花膜的制造方法
CN201910739177.6A CN110435125B (zh) 2014-10-28 2015-10-28 转印物、层叠膜、片状转印物、其应用和使用其的设备
TW109126311A TWI819231B (zh) 2014-10-28 2015-10-28 壓紋膜、單張膜、轉寫物、及壓紋膜之製造方法
US16/288,430 US10890844B2 (en) 2014-10-28 2019-02-28 Embossed film, sheet film, transfer copy, and method for producing embossed film
US17/144,670 US11543746B2 (en) 2014-10-28 2021-01-08 Embossed film, sheet film, transfer copy, and method for producing embossed film

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014219753 2014-10-28
JP2014219753 2014-10-28

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2020071716A Division JP7237040B2 (ja) 2014-10-28 2020-04-13 エンボスフィルム、枚葉フィルム、転写物、およびエンボスフィルムの製造方法

Publications (3)

Publication Number Publication Date
JP2016084471A JP2016084471A (ja) 2016-05-19
JP2016084471A5 true JP2016084471A5 (enExample) 2018-11-29
JP6967832B2 JP6967832B2 (ja) 2021-11-17

Family

ID=55973300

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2015209376A Active JP6967832B2 (ja) 2014-10-28 2015-10-23 エンボスフィルム、枚葉フィルム、転写物、およびエンボスフィルムの製造方法
JP2020071716A Active JP7237040B2 (ja) 2014-10-28 2020-04-13 エンボスフィルム、枚葉フィルム、転写物、およびエンボスフィルムの製造方法
JP2022017813A Pending JP2022060302A (ja) 2014-10-28 2022-02-08 エンボスフィルム、枚葉フィルム、転写物、およびエンボスフィルムの製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2020071716A Active JP7237040B2 (ja) 2014-10-28 2020-04-13 エンボスフィルム、枚葉フィルム、転写物、およびエンボスフィルムの製造方法
JP2022017813A Pending JP2022060302A (ja) 2014-10-28 2022-02-08 エンボスフィルム、枚葉フィルム、転写物、およびエンボスフィルムの製造方法

Country Status (5)

Country Link
US (3) US10245780B2 (enExample)
JP (3) JP6967832B2 (enExample)
KR (2) KR20180117209A (enExample)
CN (2) CN107073806B (enExample)
TW (2) TWI819231B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113710377B (zh) * 2019-04-30 2024-01-09 迪睿合株式会社 滑动处理物相对于滑动对象物的表面的供给或排除方法
WO2022024854A1 (ja) * 2020-07-31 2022-02-03 日本ゼオン株式会社 長尺フィルム
CN116273802A (zh) * 2023-03-13 2023-06-23 深圳市长松科技有限公司 压花膜的制作方法、压花膜和压花设备

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5711021A (en) * 1980-06-25 1982-01-20 Diafoil Co Ltd Embossing of film or sheet
US6930818B1 (en) * 2000-03-03 2005-08-16 Sipix Imaging, Inc. Electrophoretic display and novel process for its manufacture
US6858253B2 (en) * 2001-05-31 2005-02-22 3M Innovative Properties Company Method of making dimensionally stable composite article
US7995871B2 (en) 2002-05-07 2011-08-09 Nanoptek Corporation Stress-induced bandgap-shifted semiconductor photoelectrolytic/photocatalytic/photovoltaic surface and method for making same
TWI248859B (en) * 2004-11-24 2006-02-11 Ind Tech Res Inst Manufacture of mold core used in nanoimprint
JP4747769B2 (ja) 2005-10-04 2011-08-17 コニカミノルタオプト株式会社 凹凸パターンフイルムの製造方法
JP2007136680A (ja) * 2005-11-14 2007-06-07 Asia Genshi Kk 感熱孔版用版材
JP2010137358A (ja) * 2007-04-12 2010-06-24 Kyowa Hakko Chemical Co Ltd パターン形成方法およびパターン形成装置
KR20100116523A (ko) * 2008-02-27 2010-11-01 소니 가부시끼가이샤 반사 방지용 광학 소자 및 원반의 제조 방법
JP2010033793A (ja) * 2008-07-28 2010-02-12 Tokai Rubber Ind Ltd 粒子転写膜の製造方法
JP2010132762A (ja) * 2008-12-04 2010-06-17 Nippon Paint Co Ltd 光硬化性樹脂組成物および凹凸フィルムの製造方法
JP2011098443A (ja) * 2009-11-04 2011-05-19 Hitachi Maxell Ltd 賦型フィルム用の金型ロールおよびそれを用いた賦型フィルムの製造方法
SG10201506124TA (en) 2010-08-06 2015-09-29 Soken Kagaku Kk Resin Mold For Nanoimprinting And Production Method Thereof
JP2012103315A (ja) 2010-11-08 2012-05-31 Three M Innovative Properties Co 浮いている合成画像を提供可能なマイクロレンズ積層体
JP5463279B2 (ja) * 2010-12-21 2014-04-09 チェイル インダストリーズ インコーポレイテッド 防眩フィルム
CN102376484B (zh) * 2011-07-18 2014-02-12 健雄职业技术学院 一种膜基点电极及其制备方法
KR102208591B1 (ko) 2012-08-24 2021-01-27 데쿠세리아루즈 가부시키가이샤 이방성 도전 필름의 제조 방법 및 이방성 도전 필름
US10412837B2 (en) * 2012-08-29 2019-09-10 Dexerials Corporation Anisotropic conductive film and method of producing the same
CN104097431A (zh) * 2013-04-10 2014-10-15 日本联合化工股份有限公司 具有图形的感压转写带
CN103770492B (zh) * 2014-01-14 2015-05-20 汕头市龙湖昌丰化工有限公司 转移膜及转移镀铝纸的制作方法

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