JP2016048710A5 - - Google Patents
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- Publication number
- JP2016048710A5 JP2016048710A5 JP2014172680A JP2014172680A JP2016048710A5 JP 2016048710 A5 JP2016048710 A5 JP 2016048710A5 JP 2014172680 A JP2014172680 A JP 2014172680A JP 2014172680 A JP2014172680 A JP 2014172680A JP 2016048710 A5 JP2016048710 A5 JP 2016048710A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- manufacturing
- semiconductor device
- film
- insulating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 56
- 238000004519 manufacturing process Methods 0.000 claims 37
- 239000004020 conductor Substances 0.000 claims 19
- 238000003860 storage Methods 0.000 claims 15
- 238000000034 method Methods 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 12
- 230000005669 field effect Effects 0.000 claims 7
- 239000012535 impurity Substances 0.000 claims 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 4
- 230000015572 biosynthetic process Effects 0.000 claims 4
- 238000000059 patterning Methods 0.000 claims 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 3
- 229920005591 polysilicon Polymers 0.000 claims 3
- 238000001039 wet etching Methods 0.000 claims 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- 230000003915 cell function Effects 0.000 claims 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 230000006870 function Effects 0.000 claims 1
- 238000005468 ion implantation Methods 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 125000006850 spacer group Chemical group 0.000 claims 1
- 238000009966 trimming Methods 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014172680A JP6401974B2 (ja) | 2014-08-27 | 2014-08-27 | 半導体装置の製造方法 |
| TW104126403A TWI654718B (zh) | 2014-08-27 | 2015-08-13 | 半導體裝置的製造方法 |
| US14/828,046 US20160064533A1 (en) | 2014-08-27 | 2015-08-17 | Method of manufacturing semiconductor device |
| CN201510535778.7A CN105390448B (zh) | 2014-08-27 | 2015-08-27 | 制造半导体器件的方法 |
| US15/201,609 US9685453B2 (en) | 2014-08-27 | 2016-07-04 | Method of manufacturing a nonvolatile memory cell and a field effect transistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014172680A JP6401974B2 (ja) | 2014-08-27 | 2014-08-27 | 半導体装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016048710A JP2016048710A (ja) | 2016-04-07 |
| JP2016048710A5 true JP2016048710A5 (enExample) | 2017-06-29 |
| JP6401974B2 JP6401974B2 (ja) | 2018-10-10 |
Family
ID=55403483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014172680A Active JP6401974B2 (ja) | 2014-08-27 | 2014-08-27 | 半導体装置の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US20160064533A1 (enExample) |
| JP (1) | JP6401974B2 (enExample) |
| CN (1) | CN105390448B (enExample) |
| TW (1) | TWI654718B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9659953B2 (en) | 2014-07-07 | 2017-05-23 | Taiwan Semiconductor Manufacturing Co., Ltd. | HKMG high voltage CMOS for embedded non-volatile memory |
| JP6594261B2 (ja) * | 2016-05-24 | 2019-10-23 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| KR102607749B1 (ko) * | 2016-08-02 | 2023-11-29 | 에스케이하이닉스 주식회사 | 3차원 구조의 반도체 메모리 장치 |
| JP6889001B2 (ja) | 2017-03-30 | 2021-06-18 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
| DE102018107908B4 (de) * | 2017-07-28 | 2023-01-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Verfahren zum Bilden eines integrierten Schaltkreises mit einer Versiegelungsschicht zum Bilden einer Speicherzellenstruktur in Logik- oder BCD-Technologie sowie ein integrierter Schaltkreis mit einer Dummy-Struktur an einer Grenze einer Vorrichtungsregion |
| US10504912B2 (en) * | 2017-07-28 | 2019-12-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Seal method to integrate non-volatile memory (NVM) into logic or bipolar CMOS DMOS (BCD) technology |
| JP2019102520A (ja) * | 2017-11-29 | 2019-06-24 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
| JP7439136B2 (ja) * | 2019-10-14 | 2024-02-27 | 長江存儲科技有限責任公司 | ３次元ｎａｎｄのためのビットラインドライバーのアイソレーションのための構造および方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3941517B2 (ja) * | 2001-02-07 | 2007-07-04 | ソニー株式会社 | 半導体装置およびその製造方法 |
| KR100418928B1 (ko) * | 2001-10-24 | 2004-02-14 | 주식회사 하이닉스반도체 | 엠디엘 반도체 소자의 제조 방법 |
| JP2004039866A (ja) * | 2002-07-03 | 2004-02-05 | Toshiba Corp | 半導体装置及びその製造方法 |
| JP2006210718A (ja) * | 2005-01-28 | 2006-08-10 | Renesas Technology Corp | 半導体装置の製造方法および半導体装置 |
| JP2007005646A (ja) * | 2005-06-24 | 2007-01-11 | Sony Corp | 半導体集積回路 |
| JP2007234861A (ja) | 2006-03-01 | 2007-09-13 | Renesas Technology Corp | 半導体装置の製造方法 |
| US8344446B2 (en) * | 2006-12-15 | 2013-01-01 | Nec Corporation | Nonvolatile storage device and method for manufacturing the same in which insulating film is located between first and second impurity diffusion regions but absent on first impurity diffusion region |
| US8361863B2 (en) * | 2008-11-13 | 2013-01-29 | Mosys, Inc. | Embedded DRAM with multiple gate oxide thicknesses |
| JP2010245160A (ja) * | 2009-04-02 | 2010-10-28 | Renesas Electronics Corp | 半導体装置の製造方法 |
| CN102593179A (zh) * | 2012-03-09 | 2012-07-18 | 上海宏力半导体制造有限公司 | Mos晶体管及其制造方法 |
| JP2015118974A (ja) * | 2013-12-17 | 2015-06-25 | シナプティクス・ディスプレイ・デバイス合同会社 | 半導体装置の製造方法 |
| JP6297860B2 (ja) * | 2014-02-28 | 2018-03-20 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
-
2014
- 2014-08-27 JP JP2014172680A patent/JP6401974B2/ja active Active
-
2015
- 2015-08-13 TW TW104126403A patent/TWI654718B/zh active
- 2015-08-17 US US14/828,046 patent/US20160064533A1/en not_active Abandoned
- 2015-08-27 CN CN201510535778.7A patent/CN105390448B/zh active Active
-
2016
- 2016-07-04 US US15/201,609 patent/US9685453B2/en not_active Expired - Fee Related
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