JP2015527285A - 粒状の官能化シリカ、その製造方法及びその使用 - Google Patents
粒状の官能化シリカ、その製造方法及びその使用 Download PDFInfo
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- JP2015527285A JP2015527285A JP2015518959A JP2015518959A JP2015527285A JP 2015527285 A JP2015527285 A JP 2015527285A JP 2015518959 A JP2015518959 A JP 2015518959A JP 2015518959 A JP2015518959 A JP 2015518959A JP 2015527285 A JP2015527285 A JP 2015527285A
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- silica
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- functionalized silica
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- UTAZCRNOSWWEFR-ZDUSSCGKSA-N zolmitriptan Chemical compound C=1[C]2C(CCN(C)C)=CN=C2C=CC=1C[C@H]1COC(=O)N1 UTAZCRNOSWWEFR-ZDUSSCGKSA-N 0.000 description 1
- 229960001475 zolpidem Drugs 0.000 description 1
- ZAFYATHCZYHLPB-UHFFFAOYSA-N zolpidem Chemical compound N1=C2C=CC(C)=CN2C(CC(=O)N(C)C)=C1C1=CC=C(C)C=C1 ZAFYATHCZYHLPB-UHFFFAOYSA-N 0.000 description 1
- 229960000820 zopiclone Drugs 0.000 description 1
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Abstract
Description
− Hg細孔容積(4μm未満)が0.80ml/g超、好ましくは0.85ml/g超、特に好ましくは0.90ml/g超、極めて特に好ましくは0.95ml/g超、殊に好ましくは1.00ml/g超であり、
− dQ3=10%値が400μm超であり、
− dQ3=90%値が3000μm未満であり、
− 3分間の超音波作用後のd50値に対する超音波作用なしでのd50値の比が4.00未満、好ましくは3.00未満、特に好ましくは2.60未満、極めて好ましくは2.10未満、殊に好ましくは1.60未満であり、その際、前記測定は400〜500μmの粒子の分級物で行われるものとし、かつ
− C含有率が1.0〜15.0質量%、好ましくは2.0〜14.0質量%、特に好ましくは3.0〜12.0質量%である
ことを特徴とする、粒状の官能化シリカである。
Si[(CH2)m−R']、(R'')xSi[(CH2)m−R']、Si[(CH2)m−R']、(R'')xSi[(CH2)m−R']、Si[(CH2)m−OOC(CH3)C=CH2]、Si[(CH2)m−OOC(CH3)C=CH2]、(R'')(3-x)Si[(CH2)m−OOC(CH3)C=CH2]、又は(R'')xSi[(CH2)m−OOC(CH3)C=CH2]
を含んでよく、ここで、
mは、0.1〜20であり、
R'は、−NH2、−NH−CH2−CH2−NH2、−N−(CH2−CH2−NH2)2、−NH−CO−N−CO−(CH2)5、−NH−COO−CH3、−NH−COO−CH2−CH3、−NH−(CH2)3Si(OR)3、−NH−(CH2)3−CH3、又は−NH−CH2−CH2−NH−CH2−CH2−NH2であり、
R''は、アルキル、シクロアルキルであり、
xは、1又は2である。
(−O−)3Si[(CH2)m−R']、(−O−)(3-x)(R'')xSi[(CH2)m−R']、(−O−)3Si[(CH2)m−R']、(−O−)3-x(R'')xSi[(CH2)m−R']、(−O−)3Si[(CH2)m−OOC(CH3)C=CH2]、(−O−)3Si[(CH2)m−OOC(CH3)C=CH2]、(−O−)x(R'')(3-x)Si[(CH2)m−OOC(CH3)C=CH2]、又は(−O−)3-x(R'')xSi[(CH2)m−OOC(CH3)C=CH2]。
a)0.1〜350μmの超音波処理なしでの平均粒子径d50、好ましくは30〜800m2/gのBET表面積、及び好ましくは140〜400g/100gのDBP数を有する沈降法若しくは高熱法シリカを準備する工程、
b)工程a)からの前記シリカを、30〜80質量%の乾燥減量に給湿する工程、
c)工程b)からの前記シリカを、押出、造粒、コンパクティング又は打錠により成形する工程、
d)前記シリカ成形体を乾燥させて乾燥凝集体にする工程、
e)前記造粒物を3000μmのふるいサイズでスクリーン造粒又はふるい分けし、かつその細粒分を400μmのふるいの目開きでふるい分けする工程、及び
f)工程e)からの前記造粒物を表面改質剤と反応させる工程
を含む、本発明による粒状シリカの第一の製造方法である。
i)30質量%未満の乾燥減量、及び0.1〜350μmの超音波処理なしでの平均粒子径d50、好ましくは30〜800m2/gのBET表面積、及び好ましくは140〜400g/100gのDBP数を有する沈降法若しくは高熱法シリカを準備する工程、
ii)工程i)からの前記シリカを、乾式コンパクティングにより、好ましくは2本の回転するロール間で、0.5kN/cmロール幅〜12kN/cmロール幅の比接触圧で、スラッグに成形する工程、
iii)前記スラッグを3000μmのふるいサイズでスクリーン造粒又はふるい分けし、かつその細粒分を400μmのふるいの目開きでふるい分けする工程、及び
iv)工程iii)からの前記造粒物を、表面改質剤と反応させる工程
を含む、本発明による粒状シリカの第二の製造方法である。
a)以下の式のオルガノシラン(RO)3Si(CH2)m−R'、ここで、
Rは、アルキル、好ましくはメチル、エチル又はプロピルであり、
mは、0.1〜20であり、
R'は、−NH2、−NH−CH2−CH2−NH2、−N−(CH2−CH2−NH2)2、−NH−CO−N−CO−(CH2)5、−NH−COO−CH3、−NH−COO−CH2−CH3、−NH−(CH2)3Si(OR)3、−NH−(CH2)3−CH3、又は−NH−CH2−CH2−NH−CH2−CH2−NH2であるものとする、
b)以下の式のオルガノシラン(R'')x(RO)(3-x)Si(CH2)m−R'、ここで、
R、R'及びmは、上記の意味を有し、かつ、
R''は、アルキル、シクロアルキルであり、
xは、1又は2であるものとする、
c)以下の式のハロゲンオルガノシランX3Si(CH2)m−R'、ここで、
R'及びmは、上記の意味を有し、かつ、
Xは、Cl又はBrであるものとする、
d)以下の式のハロゲンオルガノシラン(R'')xX(3-x)Si(CH2)m−R'、ここで、
R'、R''、X、x及びmは、上記の意味を有するものとする、
e)以下の式のオルガノシラン(RO)3Si(CH2)m−O(O)C(CH3)C=CH2、ここで、
R及びmは、上記の意味を有するものとする、
f)以下の式のハロゲンオルガノシランX3Si(CH2)m−O(O)C(CH3)C=CH2、ここで、
X及びmは、上記の意味を有するものとする、
g)以下の式のオルガノシランXx(R'')(3-x)Si(CH2)m−O(O)C(CH3)C=CH2、ここで、
X、R''、x及びmは、上記の意味を有するものとする、
h)以下の式のオルガノシラン(R'')x(RO)(3-x)Si(CH2)m−O(O)C(CH3)C=CH2、ここで、
R、R''、x及びmは、上記の意味を有するものとする、
並びに前記表面改質剤の混合物が使用されることができる。
1. 0.1〜350μm、好ましくは0.1〜200μm、特に好ましくは0.1〜150μm、極めて特に好ましくは1〜50μmの超音波処理なしでの平均粒子径d50、
2. 30〜800m2/g、好ましくは40〜700m2/g、特に好ましくは50〜600m2/g、極めて特に好ましくは150〜550m2/gのBET表面積、
3. 140〜400g/(100g)、好ましくは140〜350g/(100g)、特に好ましくは190〜350g/(100g)、極めて特に好ましくは290〜350g/(100g)のDBP数
を有することができる。
BET表面積の測定
シリカの窒素比表面積(以下にBET表面積と呼ぶ)を、ISO 9277に従い、多点法表面積として測定する。測定装置として、Micromeritics社製表面積測定装置TriStar 3000を利用する。BET表面積は通常、液体窒素の飽和蒸気圧の0.05〜0.20の分圧領域内で測定される。試料をMicromeritics社製加熱ステーションVacPrep 061中で真空下に160℃で1時間調温することにより、試料調製を行う。
前記シリカの吸収性の基準であるDBP吸収量(DBP数)を、DIN 53601規格に従って以下のように測定する。
DBP:DBP吸収量[g/100g]
V:DBPの消費量[ml]
D:DBPの密度[g/ml](20℃で1.047g/ml)
E:シリカの秤量分[g]
K:水分補正表による補正値[g/100g]。
シリカの水分含量が5.8%である場合には、上記のように分析したDBP吸収量の値に33g/100gの補正値Kを加算する。シリカの水分を、本明細書中の後述の方法「水分の測定」に従って求める。
粉末状固体の粒子径分布を測定するためのレーザー回折の使用は、粒子が、そのサイズに応じて、単光レーザー光線の光を異なる強度パターンで全ての方向へ散乱若しくは回折させるという現象に基づく。照射された粒子の直径が小さければ小さいほど、単光レーザー光線の散乱角若しくは回折角はよりいっそう大きくなる。
前記試料粒子のサイズの一部は、使用される装置の測定範囲を超えており、かつ3分間の超音波作用後のd50U値に対する超音波作用なしでのd50値の比は出発粒子径に依存する(材料のより小さい粒子は、記載されたサイズのより高い比を有する)ため、測定前に400μm〜500μmの粒子分級物を前記試料からふるい分けする。前記処置により、多様な材料の安定性を確実に比較することができ、かつ物質特異的な安定性について言明することができる。前記ふるい分けを、400μm及び500μmふるいを備えているふるい分け機HAVER EML 200 Digital Plus、Haver & Boecker社、59302エルデを用いて行う。出発材料5gを、上方の500μmふるいに投入し、かつ1.0の振幅設定で2分間ふるい分けする。400μm〜500μmの粒子分級物を、さらなる測定に使用する。
レーザー回折装置LS 230(Beckman Coulter社;測定範囲 0.04〜2000μm)及び液体モジュール(Small Volume Module Plus、120ml、Beckman Coulter社、一体化された超音波フィンガーあり)を用いて測定するための試料調製を、親水性シリカの場合には、分散液体としての完全脱塩水中の0.05%m/m二リン酸四ナトリウムを用いて行い、十分に水で湿潤可能でないシリカの場合には、分散液体としてのエタノール/水混合物(体積比1:1)を用いて行う。測定の開始前に、前記レーザー回折装置を2時間ウォームアップしなければならない。その後、前記SVMモジュールを、前記分散液体で3回すすぐ。前記粒子測定に関連した以下のパラメータを設定すべきである:
測定時間:60秒
測定の数:1
ポンプ速度:75%
光学モデル:フラウンホーファ
PIDS機能:非作動
オフセット測定:作動
調整:自動
バックグラウンド測定:作動
試料濃度を設定する:作動。
レーザー回折器LS 230中にあるシリカ懸濁液を、SVMモジュールに一体化された超音波フィンガー(超音波コンバーター CV 181及び6mm超音波チップを有するSonics社製超音波プロセッサVibra Cell VCX 130)を用いて、振幅100%で、かつ同時に液体モジュール中でポンプ循環を行って、180秒間の超音波処理により再度分散させ、かつ前記のように測定する。
動的画像評価の際に、バルク材料の流れは光源とカメラとの間を落ちてくる。前記粒子を投影面積として把握し、デジタル化し、かつコンピュータプログラムにより粒子径に換算する。
前記粒子径の測定のために、Haan在RETSCH Technology GmbH社製CAMSIZERを使用する。前記粒子を、貯蔵ホッパーを備えた計量供給チャネルDR 100-40を用いて前記測定装置に供給する。画像評価のために、付属のバージョン3.12dのソフトウェアを使用することができる。
シリカの水分を、ISO 787-2に従って測定する。このために、1〜4gの量の試料を乾燥棚中で(105±2)℃で2時間乾燥させ、ISOの基準に相応して評価する。この乾燥減量は主に、物理的に結合した水からなる。
シリカのpH値の測定を、水性懸濁液として室温で行う。造粒した試料を、まず最初に乳鉢ですりつぶすか又は粉砕する。シリカ5gに脱イオン水95gを添加する。前記懸濁液を、マグネチックスターラーを用いて5分間撹拌する。その直後に、予測可能な測定範囲内で校正したpH計(Metrohm 780 pH計)を用いて、前記懸濁液のpH値を小数第一位の精度で測定する。
本方法は、DIN 66133による水銀圧入法に基づいており、その際、Micromeritics製AutoPore IV 9520装置を使用する。その方法原理は、適用される圧力に応じた、多孔質の固体へ圧入された水銀体積の測定に基づくものである。その際、適用される圧力(最大414MPa)下で水銀が侵入することができる細孔のみを把握する(Ritter及びDrakeによる方法)。
p:圧力
σ:表面張力(480mN/m*)
θ:水銀の接触角(140°*)
* DIN 66133による。
炭素含有率の測定を、LECO社製元素分析装置(タイプCS 244又はCS 600)を用いて行う。その際、前記酸化物をセラミック坩堝中に量り入れ、燃焼添加物を施与し、かつ誘導炉中で酸素流下に加熱する。存在する炭素はこの際に酸化されてCO2となる。前記ガス量を赤外線検出器により定量化する。本来の測定の前に、前記機器のキャリブレーションを適当な対照材料を用いて実施する。
試料材料から、約50〜150mgを精度1mgでセラミック坩堝に量り入れる。前記試料材料を、Lecocel II(タングステン・錫(10%)合金の粉末)約1g及び鉄屑約0.7gで覆う。次いで、前記坩堝を蓋で閉じる。前記誘導炉を最大出力に設定し、10秒間酸素でパージする。前記坩堝を前記誘導炉内に入れた後、自動測定及び自動評価を開始した。試料1つにつき複数回の測定を実施する。結果を質量%で示す。
タップ密度を、DIN EN ISO 787-11に従って測定する。
灼熱減量を、ISO 3262-1に準拠して測定する。ISO 3262-1とは異なり、
− 白金皿又は磁器皿に代えて、磁器坩堝ないし溶融坩堝を測定に使用し、
− 試験すべきシリカを、約2gに代えて約0.5g(500mg)量り入れ、
− 試験すべき材料を予め乾燥させずに、ISO 787-2に準拠した乾燥減量の別個の測定により水分補正を行う。
Evonik Industries社製SIPERNAT(R)50Sを、ミキサー(Eirich社、R02)中で、シリカ100gにつき220mlの水を添加しながら混合し、かつ圧縮する。その際に、ピン型撹拌機混合具を備えた10リットル混合容器を室温で使用する。前記ミキサーの最適な充填度を得るために、SIPERNAT(R)50S 1kgを装入する。水の添加を、前記撹拌機の周速20m/sで、一定に1分間以内で行う。プレートを、常にレベル1で運転させる。次いで、前記ピン型撹拌機を40m/sで運転する。前記プロセスを、所望のアグロメレートサイズが生じたら直ちに止める。得られた造粒物を乾燥棚中で160℃で恒量まで乾燥させ、引き続き、ふるい分けにより400〜1250μmに分級する。試験の目的で、個々の試験のために400〜500μmのふるい分級物を製造し、これを引き続く硬さ及び多孔度の試験に使用する。
比較例からの造粒物を、プラウシアーミキサー中に装入し、かつ、混合下に、表面改質剤を2成分ノズル(キャリアガス:窒素)を用いて噴霧する。前記噴霧が終了した後に、さらに15分間、後混合する。前記混合物を、引き続き乾燥棚中で熱処理する(調温)。実施例1及び2の製造のための詳細な試験パラメータを、以下の第1表に示す。
1.配合物(吸収質)の製造
シリコーン油DOW DC 200 50cs 8gを、ガラスビーカー中に量り入れ、粒状シリカ10g(乾燥減量6%以下)をこれに添加し、次いで、乾燥しかつ流動性の吸収質が生じるまで、へらを用いて混合する。そのようにして得られた吸収質を、次いで室温(23℃)で14日間貯蔵する。
・比較配合物1:比較例1 5g+シリコーン油DC 200 50cs 4g
・本発明による配合物1:実施例1 5g+シリコーン油DC 200 50cs 4g
・本発明による配合物2:実施例2 5g+シリコーン油DC 200 50cs 4g
2.脱着特性の測定
・Triton X160 10gを完全脱塩水490g中に溶解させることにより、界面活性剤溶液を製造する。
・50mlの遠心分離用小管に界面活性剤溶液20mlを充填し、かつ1.に記載した配合物9gをこれに添加する。
・前記遠心分離用小管を、ひっくり返して10回振り、かつ5分間静置する。
・上澄みを、秤量したガラスシャーレに200μmのふるいを通して傾瀉する。
・保持された量の吸収質を、界面活性剤溶液20ml中に再度分散させ、かつ振盪工程を全部で5回繰り返す(界面活性剤溶液20ml×5)。それぞれ傾瀉した液体量を、ガラスシャーレ中に捕集する。
・傾瀉し、かつ捕集した界面活性剤溶液を、110℃で3時間乾燥させ、かつ残留物を正確に秤量する。
・(シリコーン油なしの残留物量を測定するための)ブランクとして、比較例1 5gを界面活性剤溶液100ml中に分散させ、その後、傾瀉し、かつ乾燥させる。
放出されたシリコーン油のパーセンテージを、それぞれ以下のように算出する:
((残留物−ブランク)×100)/4=放出[%]
結果
・ブランク:残留物1.409g
・比較例1:残留物3.38g→放出49.3%
・実施例1:残留物1.60g→放出4.8%
・実施例2:残留物2.02g→放出15.3%
本発明による実施例は、明らかにより低い放出、ひいてはより高い吸収を示す。
Claims (20)
- 粒状の官能化シリカにおいて、
− Hg細孔容積(4μm未満)が0.80ml/g超であり、
− dQ3=10%値が400μm超であり、
− dQ3=90%値が3000μm未満であり、
− 3分間の超音波作用後のd50値に対する超音波作用なしでのd50値の比が4.00未満であり、その際、前記測定は400〜500μmの粒子の分級物で行われるものとし、かつ
− C含有率が1.0〜15.0質量%である
ことを特徴とする、粒状の官能化シリカ。 - 5.0〜11.0の範囲内のpH値を有する、請求項1に記載の粒状の官能化シリカ。
- 1.00〜3.00の、3分間の超音波作用後のd50値に対する超音波作用なしでのd50値の比を有し、その際、前記測定は400〜500μmの粒子の分級物で行われるものとする、請求項1又は2に記載の粒状の官能化シリカ。
- 0.90ml/g超のHg細孔容積(4μm未満)を有する、請求項1又は2に記載の粒状の官能化シリカ。
- 0.81〜1.50ml/gのHg細孔容積(4μm未満)を有する、請求項1又は2に記載の粒状の官能化シリカ。
- 以下の官能基:
Si(CH2)m−R'、(R'')xSi(CH2)m−R'、Si(CH2)m−R'、(R'')xSi(CH2)m−R'、Si(CH2)m−OOC(CH3)C=CH2、Si(CH2)m−OOC(CH3)C=CH2、(R'')(3-x)Si(CH2)m−OOC(CH3)C=CH2、又は(R'')xSi(CH2)m−OOC(CH3)C=CH2
を含み、ここで、
mは、0.1〜20であり、
R'は、−NH2、−NH−CH2−CH2−NH2、−N−(CH2−CH2−NH2)2、−NH−CO−N−CO−(CH2)5、−NH−COO−CH3、−NH−COO−CH2−CH3、−NH−(CH2)3Si(OR)3、−NH−(CH2)3−CH3、又は−NH−CH2−CH2−NH−CH2−CH2−NH2であり、
R''は、アルキル、シクロアルキルであり、
xは、1又は2であるものとする、請求項1又は2に記載の粒状の官能化シリカ。 - 請求項1から6までのいずれか1項に記載の粒状の官能化シリカの製造方法であって、以下の工程:
a)0.1〜350μmの超音波処理なしでの平均粒子径d50を有する沈降法若しくは高熱法シリカを準備する工程、
b)工程a)からの前記シリカを、30〜80質量%の乾燥減量に給湿する工程、
c)工程b)からの前記シリカを、押出、造粒、コンパクティング又は打錠により成形する工程、
d)前記シリカ成形体を乾燥させて乾燥凝集体にする工程、
e)前記造粒物を3000μmのふるいサイズでスクリーン造粒又はふるい分けし、かつその細粒分を400μmのふるいの目開きでふるい分けする工程、及び
f)工程e)からの前記造粒物を表面改質剤と反応させる工程
を含む、前記方法。 - 30〜80質量%の乾燥減量を有する水含有ろ過ケークを、工程a)のための出発材料として使用する、請求項7に記載の方法。
- 前記シリカを、工程c)において高速インテンシブミキサー中で圧縮し、かつ造粒する、請求項7に記載の方法。
- 請求項1から6までのいずれか1項に記載の粒状の官能化シリカの製造方法であって、以下の工程:
i)30質量%未満の乾燥減量、及び0.1〜350μmの超音波処理なしでの平均粒子径d50を有する沈降法若しくは高熱法シリカを準備する工程、
ii)工程i)からの前記シリカを、乾式コンパクティングにより、好ましくは2本の回転するロール間で、0.5kN/cmロール幅〜12kN/cmロール幅の比接触圧で、スラッグに成形する工程、
iii)前記スラッグを3000μmのふるいサイズでスクリーン造粒又はふるい分けし、かつその細粒分を400μmのふるいの目開きでふるい分けする工程、及び
iv)工程iii)からの前記造粒物を、表面改質剤と反応させる工程
を含む、前記方法。 - 400μm未満の全てのふるい分級物を分離除去する、請求項7から10までのいずれか1項に記載の方法。
- 成形工程c)若しくはii)を、結合剤を供給せずに行う、請求項7又は10に記載の方法。
- 改質剤として、工程f)若しくはiv)において少なくとも1種のオルガノシランを使用する、請求項7又は10に記載の方法。
- 少なくとも1種の以下のオルガノシラン又は該オルガノシランの混合物を改質剤として使用する、請求項13に記載の方法:
a)以下の式のオルガノシラン(RO)3Si(CH2)m−R'、
b)以下の式のオルガノシラン(R'')x(RO)(3-x)Si(CH2)m−R'、
c)以下の式のハロゲンオルガノシランX3Si(CH2)m−R'、
d)以下の式のハロゲンオルガノシラン(R'')xX(3-x)Si(CH2)m−R'、
e)以下の式のオルガノシラン(RO)3Si(CH2)m−OOC(CH3)C=CH2、
f)以下の式のハロゲンオルガノシランX3Si(CH2)m−OOC(CH3)C=CH2、
g)以下の式のオルガノシランXx(R'')(3-x) Si(CH2)m−OOC(CH3)C=CH2、又は
h)以下の式のオルガノシラン(R'')x(RO)(3-x)Si(CH2)m−OOC(CH3)C=CH2、
ここで、
Rは、アルキル、好ましくはメチル、エチル又はプロピルであり、
R'は、−NH2、−NH−CH2−CH2−NH2、−N−(CH2−CH2−NH2)2、−NH−CO−N−CO−(CH2)5、−NH−COO−CH3、−NH−COO−CH2−CH3、−NH−(CH2)3Si(OR)3、−NH−(CH2)3−CH3、又は−NH−CH2−CH2−NH−CH2−CH2−NH2であり、
R''は、アルキル、シクロアルキルであり、
Xは、Cl又はBrであり、
xは、1又は2であり、
mは、0.1〜20であるものとする。 - 配合物を製造するための、請求項1から6までのいずれか1項に記載の粒状シリカの使用。
- 請求項1から6までのいずれか1項に記載の少なくとも1種の粒状シリカ及び添加剤を含有する、配合物。
- 添加剤として、少なくとも1種の触媒活性物質が使用される、請求項16に記載の配合物。
- 前記添加剤を1〜70質量%の割合で含有する、請求項16又は17に記載の配合物。
- 添加剤として、硬化剤又は開始剤、架橋剤、触媒、薬剤学的な作用物質及び助剤、化粧用の作用物質及び助剤、洗浄剤及び/又はケア剤、風味物質、香気物質及び芳香物質、飼料若しくは飼料添加剤、ビタミン、無機質、食品若しくは食品添加剤、染料及び/又は顔料、アミノ酸、酸化剤又は漂白剤、殺微生物作用を有する添加剤、農業及び林業用の化学物質及び/又はコンクリート添加剤が使用される、請求項16に記載の配合物。
- 前記添加剤が酵素である、請求項19に記載の配合物。
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PCT/EP2013/062166 WO2014001088A1 (de) | 2012-06-28 | 2013-06-12 | Granuläre, funktionalisierte kieselsäure, verfahren zu deren herstellung und deren verwendung |
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JP2018530506A (ja) * | 2015-08-28 | 2018-10-18 | ワッカー ケミー アクチエンゲゼルシャフトWacker Chemie AG | 熱伝導率の低いシリカ成形体 |
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ES2549685B2 (es) * | 2015-07-21 | 2016-06-23 | Universitat Politècnica De València | Sistema antimicrobiano |
WO2017122049A1 (en) * | 2016-01-15 | 2017-07-20 | Iį "Macrosorb.Lt" | Method of the compaction of nano-silica |
JP6952764B2 (ja) | 2016-07-29 | 2021-10-20 | エボニック オペレーションズ ゲーエムベーハー | 疎水性の断熱材料の製造方法 |
MX2019008516A (es) | 2017-01-18 | 2019-09-18 | Evonik Degussa Gmbh | Material de aislamiento termico granulado y procedimiento para producirlo. |
EP3585841B1 (de) | 2017-02-27 | 2020-05-27 | Wacker Chemie AG | Verfahren zur herstellung hydrophober silica granulate |
DE102017209782A1 (de) | 2017-06-09 | 2018-12-13 | Evonik Degussa Gmbh | Verfahren zur Wärmedämmung eines evakuierbaren Behälters |
US12060278B2 (en) | 2018-03-05 | 2024-08-13 | Evonik Operations Gmbh | Method for producing an aerogel material |
WO2020011354A1 (de) | 2018-07-11 | 2020-01-16 | Wacker Chemie Ag | Mit wasser anmischbare mischung enthaltend kieselsäure formkörper |
EP3597615A1 (en) | 2018-07-17 | 2020-01-22 | Evonik Operations GmbH | Granular mixed oxide material and thermal insulating composition on its basis |
JP7009673B2 (ja) | 2018-07-17 | 2022-01-25 | エボニック オペレーションズ ゲーエムベーハー | ヒュームドシリカ造粒物に基づく断熱組成物、その製造方法およびその使用 |
US11987528B2 (en) | 2018-07-18 | 2024-05-21 | Kingspan Insulation Limited | Process for hydrophobizing shaped insulation-material bodies based on silica at ambient pressure |
WO2020038582A1 (de) | 2018-08-23 | 2020-02-27 | Wacker Chemie Ag | Mit wasser anmischbare mischung enthaltend hydrophobierte kieselsäure formkörper und benetzungsmittel |
WO2020070257A1 (en) * | 2018-10-05 | 2020-04-09 | Unilever Plc | Detergent compositions |
WO2021009550A1 (en) * | 2019-07-18 | 2021-01-21 | Rhodia Brasil Ltda | Preparation of immobilized enzymes |
CN111100143B (zh) * | 2019-12-26 | 2021-09-17 | 山东新和成精化科技有限公司 | 一种维生素b6中间体的连续化制备方法 |
WO2021228371A1 (de) * | 2020-05-12 | 2021-11-18 | Wacker Chemie Ag | Verfahren zur herstellung von siliciumdioxid-haltigen agglomeraten |
CA3172845A1 (en) | 2020-05-25 | 2021-12-02 | Evonik Operations Gmbh | Silica granules for thermal treatment |
CN113845117B (zh) * | 2020-06-28 | 2023-05-26 | 中国石油天然气股份有限公司 | 一种油水两亲性二氧化硅纳米粒子及其制备方法 |
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CN104508054A (zh) | 2015-04-08 |
BR112014032729A2 (pt) | 2017-06-27 |
KR102023556B1 (ko) | 2019-09-23 |
PT2867310T (pt) | 2018-06-06 |
WO2014001088A1 (de) | 2014-01-03 |
TWI593699B (zh) | 2017-08-01 |
US11458454B2 (en) | 2022-10-04 |
BR112014032729B1 (pt) | 2021-06-29 |
PL2867310T3 (pl) | 2018-09-28 |
ES2671268T3 (es) | 2018-06-05 |
JP6218823B2 (ja) | 2017-10-25 |
CA2878095C (en) | 2020-03-31 |
TW201418269A (zh) | 2014-05-16 |
EP2867310A1 (de) | 2015-05-06 |
MY194070A (en) | 2022-11-10 |
DE102012211121A1 (de) | 2014-01-02 |
MX360032B (es) | 2018-10-19 |
US20160082415A1 (en) | 2016-03-24 |
KR20150032724A (ko) | 2015-03-27 |
CA2878095A1 (en) | 2014-01-03 |
MX2015000130A (es) | 2015-05-07 |
TR201807287T4 (tr) | 2018-06-21 |
HUE038697T2 (hu) | 2018-11-28 |
EP2867310B1 (de) | 2018-04-18 |
CN104508054B (zh) | 2016-08-31 |
AR091614A1 (es) | 2015-02-18 |
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