JP2015521579A - ガラスセラミック物品及び製造方法 - Google Patents
ガラスセラミック物品及び製造方法 Download PDFInfo
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- JP2015521579A JP2015521579A JP2015517827A JP2015517827A JP2015521579A JP 2015521579 A JP2015521579 A JP 2015521579A JP 2015517827 A JP2015517827 A JP 2015517827A JP 2015517827 A JP2015517827 A JP 2015517827A JP 2015521579 A JP2015521579 A JP 2015521579A
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
- H05B3/74—Non-metallic plates, e.g. vitroceramic, ceramic or glassceramic hobs, also including power or control circuits
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
- C03C17/009—Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
- H05B3/688—Fabrication of the plates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/77—Coatings having a rough surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/335—Reverse coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Composite Materials (AREA)
- Surface Treatment Of Glass (AREA)
- Induction Heating Cooking Devices (AREA)
- Cookers (AREA)
Abstract
Description
Claims (13)
- 例えば少なくとも1つの加熱素子を覆い又は収容することを意図した、少なくとも1つのガラスセラミック基材、特にプレート、を含む物品であって、当該基材が少なくとも1つのゾーンにおいて、表面粗さを形成するパターンの特性寸法が2μmと100μmの間であるような表面粗さを示す、少なくとも1つのガラスセラミック基材を含む物品。
- 前記粗さがパターンの、特に幾何学的パターンのネットワークで形成されていて、当該パターンのおのおのもののより大きな長手方向の断面の外周が、一方は直径が2μmそして他方は直径が100μmの2つの同心円の間に収まることを特徴とする、請求項1記載の物品。
- 前記パターンの高さHが2μmと50μmの間であり、パターンのおのおののものの間の間隔が50μm以下であることを特徴とする、請求項1又は2記載の物品。
- 前記パターンが、高さ、長さ及び幅のそれぞれが2μmと15μmの間、好ましくは2μmと10μmの間の、正方形又は長方形の長手方向及び/又は横断方向の断面を有するとともに、50μm以下、特に1μmと50μmの間、とりわけ30μm未満の間隔を有すること、及び/又は、前記パターンが高さが20μm未満及び間隔が30μm未満の、三角形又はピラミッド形の横断方向の断面を有することを特徴とする、請求項1〜3の1つに記載の物品。
- 前記基材が、少なくとも1つの面の少なくとも1つのゾーンに、前記粗さを示す少なくとも1つの層を含むことを特徴とする、請求項1〜4の1つに記載の物品。
- 前記層がゾル−ゲル層であることを特徴とする、請求項1〜5の1つに記載の物品。
- 1以上の加熱素子を含む、請求項1〜6の1つに記載の物品、又は請求項1〜6の1つに記載の物品を含む調理するため及び/又は高温に保持するための装置。
- 目標の粗さの輪郭に成形されたパッド又はマスクを用いて、基材上に被着した層に当該粗さを複写する、少なくとも1つのガラスセラミック基材を含む物品を製造するための、特に請求項1〜7の1つに記載の物品を製造するための方法。
- 前記ガラスセラミック基材の上に変形させることができる層を被着し、次いで、前記目標の粗さの輪郭に前もって成形したパッド又はマスクの構造化した面を前記層に当て、そして当該粗さを変形させることができる前記層へ、特に高温条件下且つ加圧下で、転写することを特徴とする、請求項8記載の方法。
- 変形させることができる前記層がゾル−ゲル層であり、前記マスクの前記構造化した面の材料がエラストマータイプのポリマーであることを特徴とする、請求項8又は9記載の方法。
- ポリマー材料又はその前駆物質を前記目標の粗さを有する表面に適用し又は前記目標の粗さを有する表面の上に流延して前記マスクを得、そして次に、所望の硬化したプロフィールを有するエラストマー製のマスクを得るため前記マスクを、場合に応じ冷却、加熱及び/又は架橋により、固化することを特徴とする、請求項8〜10の1つに記載の方法。
- 前記構造化した層を緻密化及び/又は固化するために、そして場合により有機基を除去するために、その後の熱処理の段階を含むことを特徴とする、請求項8〜11の1つに記載の方法。
- 100μm未満の粗さを示すことを特徴とする、請求項8〜12の1つに記載の方法により得られたガラスセラミック物品。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1255823A FR2992313B1 (fr) | 2012-06-21 | 2012-06-21 | Article vitroceramique et procede de fabrication |
FR1255823 | 2012-06-21 | ||
PCT/FR2013/051419 WO2013190230A1 (fr) | 2012-06-21 | 2013-06-18 | Article vitroceramique et procede de fabrication |
Publications (2)
Publication Number | Publication Date |
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JP2015521579A true JP2015521579A (ja) | 2015-07-30 |
JP6466834B2 JP6466834B2 (ja) | 2019-02-06 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015517827A Active JP6466834B2 (ja) | 2012-06-21 | 2013-06-18 | ガラスセラミック物品及び製造方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US11419187B2 (ja) |
EP (1) | EP2864266B1 (ja) |
JP (1) | JP6466834B2 (ja) |
KR (1) | KR102079537B1 (ja) |
CN (1) | CN104379529B (ja) |
DE (1) | DE202013012143U1 (ja) |
ES (1) | ES2773952T3 (ja) |
FR (1) | FR2992313B1 (ja) |
WO (1) | WO2013190230A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102550616B1 (ko) * | 2022-01-18 | 2023-07-04 | 삼성전자주식회사 | 세라믹 글라스 및 이를 적용한 쿡탑 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102014101140B4 (de) * | 2014-01-30 | 2019-05-23 | Schott Ag | Mit einer glasflussbasierten Beschichtung versehenes Substrat, Glasflussmaterial sowie Verfahren zur Beschichtung eines Glas- oder Glaskeramiksubstrats |
EP3155335A4 (en) * | 2014-06-12 | 2018-01-24 | Elad Mor | Methods and apparatus for creating photonic structured ice cube |
US10239782B2 (en) * | 2015-02-26 | 2019-03-26 | Corning Incorporated | Method for controlling surface features on glass-ceramic articles and articles formed therefrom |
ES2629062B1 (es) * | 2015-12-22 | 2018-06-08 | Bsh Electrodomésticos España, S.A. | Proceso para fabricar un componente de aparato doméstico |
CN106448473B (zh) * | 2016-12-16 | 2017-11-10 | 京东方科技集团股份有限公司 | 显示面板母板以及显示面板制作方法 |
DE102018215789A1 (de) * | 2018-09-18 | 2020-03-19 | BSH Hausgeräte GmbH | Haushaltsgerät mit einem Rauheitsreduzierungselement in einer Vertiefung einer Komponente aus einem transparenten Material, sowie Verfahren zum Herstellen eines Haushaltsgeräts |
FR3089215B1 (fr) * | 2018-12-03 | 2021-06-18 | Eurokera | Article vitrocéramique |
TW202106647A (zh) * | 2019-05-15 | 2021-02-16 | 美商康寧公司 | 在高溫下用高濃度鹼金屬氫氧化物減少紋理化玻璃、玻璃陶瓷以及陶瓷製品之厚度的方法 |
CN110518080B (zh) * | 2019-08-29 | 2021-03-23 | 无锡尚德太阳能电力有限公司 | 一种酸制绒多晶电池的返工方法 |
US20230358410A1 (en) * | 2019-11-15 | 2023-11-09 | Electrolux Appliances Aktiebolag | Component, in particular a top plate and/or a burner cap of a gas hob having a non-stick and/or non-wetting coating, gas hob comprising such a component and method for manufacturing a component |
FR3105210B1 (fr) | 2019-12-19 | 2022-08-12 | Eurokera | Procédé de fabrication d’un article vitrocéramique |
CN112979322B (zh) * | 2021-02-20 | 2023-09-08 | 北京北方华创微电子装备有限公司 | 陶瓷件及其制作方法 |
WO2023234555A1 (ko) * | 2022-06-02 | 2023-12-07 | 삼성전자주식회사 | 쿡탑용 투명 세라믹 글라스 및 이를 포함하는 쿡탑 |
FR3140623A1 (fr) | 2022-10-05 | 2024-04-12 | Eurokera S.N.C. | Article vitrocéramique et procédé de fabrication d’un tel article |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62179424A (ja) * | 1986-01-04 | 1987-08-06 | カ−ル・ツワイス・ステイフツング | ガラスセラミツク等から形成された調理表面構造 |
JPH0848587A (ja) * | 1994-07-23 | 1996-02-20 | Carl Zeiss:Fa | セラミック着色剤で装飾されたガラスセラミック物品およびその製造方法 |
JP2002206756A (ja) * | 2000-11-11 | 2002-07-26 | Carl Zeiss:Fa | 透明無色材料から作られ、赤外線透過性無地着色底面コーティングを施したガラスセラミック又はガラスパネルを備えた調理ユニット |
JP2009518797A (ja) * | 2005-12-05 | 2009-05-07 | ユーロケラ ソシエテ オン ノーム コレクティフ | 透明または半透明なガラスセラミックプレートおよびその製造方法 |
WO2011085997A1 (de) * | 2010-01-14 | 2011-07-21 | Schott Ag | Verfahren zur herstellung einer scheibe mit strukturierter oberfläche sowie scheibe mit strukturierter oberfläche |
JP2011530403A (ja) * | 2008-08-07 | 2011-12-22 | ユニ−ピクセル・ディスプレイズ・インコーポレーテッド | 表面上における指紋の出現を低減する微細構造 |
Family Cites Families (76)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2668783A (en) * | 1949-10-21 | 1954-02-09 | Anchor Hocking Glass Corp | Process of surface finishing glass and article produced thereby |
US3208874A (en) * | 1964-12-03 | 1965-09-28 | Allegheny Ludlum Steel | Surface finishing of stainless steel |
US5504646A (en) * | 1989-10-13 | 1996-04-02 | Hitachi, Ltd. | Magnetic disk including protective layer having surface with protusions and magnetic disk apparatus including the magnetic disk |
US5750230A (en) * | 1992-11-20 | 1998-05-12 | Hitachi, Ltd. | Magnetic recording media and magnetic recording system using the same |
DE4417405A1 (de) * | 1994-05-18 | 1995-11-23 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung von strukturierten anorganischen Schichten |
DE69526129T2 (de) * | 1994-05-23 | 2002-08-22 | Sumitomo Electric Industries, Ltd. | Verfahren und Vorrichtung zum Herstellen eines mit hartem Material bedeckten Halbleiters durch Polieren |
JPH08139230A (ja) * | 1994-11-11 | 1996-05-31 | Sumitomo Kinzoku Ceramics:Kk | セラミック回路基板とその製造方法 |
FR2766816B1 (fr) | 1997-08-01 | 1999-08-27 | Eurokera | Plaque vitroceramique et son procede de fabrication |
JPH11335158A (ja) * | 1998-03-24 | 1999-12-07 | Sumitomo Electric Ind Ltd | セラミックス基板及びその研磨方法 |
DE19840525A1 (de) * | 1998-09-06 | 2000-03-09 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung optischer Schichten von gleichmäßiger Schichtdicke |
US6553788B1 (en) * | 1999-02-23 | 2003-04-29 | Nippon Sheet Glass Co., Ltd. | Glass substrate for magnetic disk and method for manufacturing |
JP4165014B2 (ja) * | 1999-03-09 | 2008-10-15 | Toto株式会社 | 親水性部材、その製造方法、その製造のためのコーティング剤および装置 |
JP2001118664A (ja) * | 1999-08-09 | 2001-04-27 | Ibiden Co Ltd | セラミックヒータ |
US6835916B2 (en) * | 1999-08-09 | 2004-12-28 | Ibiden, Co., Ltd | Ceramic heater |
DE10016485A1 (de) * | 2000-04-01 | 2001-10-11 | Dmc2 Degussa Metals Catalysts | Glas-, Keramik- und Metall-Substrate mit selbstreinigender Oberfläche, Verfahren zu deren Herstellung und deren Verwendung |
DE10017698B9 (de) * | 2000-04-08 | 2007-11-29 | Schott Ag | Reinigungsfreundlicher Glaskeramikkörper |
US6897414B2 (en) * | 2000-07-03 | 2005-05-24 | Ibiden Co., Ltd. | Ceramic heater for semiconductor manufacturing/testing apparatus |
WO2002003435A1 (fr) * | 2000-07-04 | 2002-01-10 | Ibiden Co., Ltd. | Plaque chaude destinee a la fabrication et aux essais de semiconducteurs |
US6967312B2 (en) * | 2000-07-19 | 2005-11-22 | Ibiden Co., Ltd. | Semiconductor manufacturing/testing ceramic heater, production method for the ceramic heater and production system for the ceramic heater |
US6866883B2 (en) * | 2000-07-25 | 2005-03-15 | Seagate Technology Llc | Mechanical texturing of sol-gel—coated substrates for magnetic recording media |
DE60221973T2 (de) * | 2001-03-09 | 2008-05-15 | Datec Coating Corp., Mississauga | Im sol-gel-verfahren hergestellte widerstands- und leitfähige beschichtung |
US6723198B1 (en) * | 2001-05-24 | 2004-04-20 | Seagate Technology Llc | Servo pattern formation via transfer of sol-gel layer and magnetic media obtained thereby |
US7157031B2 (en) * | 2002-08-26 | 2007-01-02 | Seagate Technology Llc | Method of replicating a textured surface |
JP4506070B2 (ja) * | 2002-11-01 | 2010-07-21 | コニカミノルタホールディングス株式会社 | 防眩層の形成方法、防眩フィルムの製造方法及び防眩層形成用のインクジェット装置 |
JP4475016B2 (ja) * | 2003-06-30 | 2010-06-09 | 東レ株式会社 | ハードコートフィルム、反射防止フィルムおよび画像表示装置 |
US8974590B2 (en) * | 2003-12-18 | 2015-03-10 | The Armor All/Stp Products Company | Treatments and kits for creating renewable surface protective coatings |
US20050205548A1 (en) * | 2004-01-29 | 2005-09-22 | Tim Olding | Integrated thin high temperature heaters |
PL1580299T5 (pl) * | 2004-03-25 | 2020-12-28 | Whirlpool Corporation | Powłoka ochronna dla sprzętu gospodarstwa domowego |
US7553519B2 (en) * | 2004-03-26 | 2009-06-30 | Eurokera | Glass-ceramic and glass plates, heating plates, and preparation |
DE602005014102D1 (de) * | 2004-05-19 | 2009-06-04 | Koninkl Philips Electronics Nv | Film zum gebrauch in haushaltsgeräten |
JP4140593B2 (ja) * | 2004-09-21 | 2008-08-27 | 住友電気工業株式会社 | メタライズ基板 |
US20060088692A1 (en) * | 2004-10-22 | 2006-04-27 | Ibiden Co., Ltd. | Ceramic plate for a semiconductor producing/examining device |
TW200639851A (en) * | 2005-02-18 | 2006-11-16 | Fuji Photo Film Co Ltd | Optical recording medium and method of manufacturing the same, substrate and method of using the same, and stamper and method of manufacturing the same |
DE102005018246A1 (de) * | 2005-04-19 | 2006-10-26 | Schott Ag | Glas- oder Glaskeramik-Artikel mit dekorativer Beschichtung |
US20060292345A1 (en) * | 2005-06-14 | 2006-12-28 | Dave Bakul C | Micropatterned superhydrophobic silica based sol-gel surfaces |
DE102005041242A1 (de) * | 2005-08-31 | 2007-03-01 | Merck Patent Gmbh | Verfahren zur Strukturierung von Oberflächen von Substraten |
WO2007049462A1 (ja) * | 2005-10-25 | 2007-05-03 | Nitto Denko Corporation | クリーニングシート、クリーニング機能付搬送部材および基板処理装置のクリーニング方法 |
US7878644B2 (en) * | 2005-11-16 | 2011-02-01 | Gerber Scientific International, Inc. | Light cure of cationic ink on acidic substrates |
CN101213643A (zh) * | 2006-01-31 | 2008-07-02 | 东京毅力科创株式会社 | 微波等离子体处理装置 |
EP1873126A1 (en) * | 2006-02-22 | 2008-01-02 | Central Glass Co., Ltd. | Anti-Glare Glass Substrate |
US20120040160A1 (en) * | 2007-01-29 | 2012-02-16 | Guardian Industries Corp. | Method of making heat treated and ion-beam etched/milled coated article using diamond-like carbon (dlc) protective film |
US20120015196A1 (en) * | 2007-01-29 | 2012-01-19 | Guardian Industries Corp. | Method of making heat treated coated article using diamond-like carbon (dlc) coating and protective film on acid-etched surface |
US20120015195A1 (en) * | 2007-01-29 | 2012-01-19 | Guardian Industries Corp. and C.R.V.C. | Method of making heat treated and ion-beam etched/milled coated article using diamond-like carbon (dlc) coating and protective film |
KR101187172B1 (ko) * | 2007-03-07 | 2012-09-28 | 도다 고교 가부시끼가이샤 | 페라이트 성형 시트, 소결 페라이트 기판 및 안테나 모듈 |
FR2914630B3 (fr) * | 2007-04-04 | 2009-02-06 | Saint Gobain | Procede de structuration de surface d'un produit a couche sol-gel, produit a couche sol-gel structuree |
US8259299B2 (en) * | 2007-06-21 | 2012-09-04 | Rf Science & Technology Inc. | Gas scanning and analysis |
WO2009023169A1 (en) * | 2007-08-10 | 2009-02-19 | Nano Terra Inc. | Structured smudge-resistant coatings and methods of making and using the same |
KR101021141B1 (ko) * | 2007-08-22 | 2011-03-14 | 한국세라믹기술원 | 습기제거용 불소 함유 산화주석(fto) 투명전도막 유리및 이의 제조방법 |
US20090197048A1 (en) * | 2008-02-05 | 2009-08-06 | Jaymin Amin | Damage resistant glass article for use as a cover plate in electronic devices |
DE102008031426B4 (de) * | 2008-07-04 | 2014-07-31 | Schott Ag | Verfahren zur Herstellung einer Versiegelungsschicht für Dekorschichten, Glas- oder Glaskeramik-Artikel und dessen Verwendung |
DE102008031428A1 (de) * | 2008-07-04 | 2010-01-07 | Schott Ag | Dekorative Beschichtung von Glas- oder Glaskeramik-Artikeln |
US20100028604A1 (en) * | 2008-08-01 | 2010-02-04 | The Ohio State University | Hierarchical structures for superhydrophobic surfaces and methods of making |
US8187987B2 (en) * | 2008-08-21 | 2012-05-29 | Corning Incorporated | Durable glass housings/enclosures for electronic devices |
JP5299429B2 (ja) * | 2008-09-05 | 2013-09-25 | 住友金属鉱山株式会社 | 黒色被覆膜とその製造方法、黒色遮光板、及び、それを用いた絞り、光量調整用絞り装置、シャッター、並びに耐熱遮光テープ |
US20100279068A1 (en) * | 2009-05-04 | 2010-11-04 | Glen Bennett Cook | Embossed glass articles for anti-fingerprinting applications and methods of making |
US8697228B2 (en) * | 2009-05-06 | 2014-04-15 | Corning Incorporated | Carrier for glass substrates |
US20100285272A1 (en) * | 2009-05-06 | 2010-11-11 | Shari Elizabeth Koval | Multi-length scale textured glass substrates for anti-fingerprinting |
HRP20090259A2 (hr) * | 2009-05-11 | 2010-12-31 | Institut Ru�er Bo�kovi� | Sredstvo za kemijsku obradu staklenih, keramičkih i kamenih površina |
US8062733B2 (en) * | 2009-05-15 | 2011-11-22 | Corning Incorporated | Roll-to-roll glass material attributes and fingerprint |
US20100304086A1 (en) * | 2009-05-29 | 2010-12-02 | Alain Robert Emile Carre | Super non-wetting, anti-fingerprinting coatings for glass |
GB0922285D0 (en) * | 2009-12-22 | 2010-02-03 | Rolls Royce Plc | Hydrophobic surface |
DE102010028488A1 (de) * | 2010-05-03 | 2011-11-03 | Carl Zeiss Smt Gmbh | Substrate für Spiegel für die EUV-Lithographie und deren Herstellung |
FR2960233B1 (fr) * | 2010-05-19 | 2012-08-10 | Eurokera | Preparation d'un article en un verre ou en une vitroceramique avec revetement ameliore et ledit article |
US20120003426A1 (en) * | 2010-07-01 | 2012-01-05 | Sipix Chemical Inc. | Decoration device and method for fabricating decoration device |
US8563116B2 (en) * | 2010-09-02 | 2013-10-22 | Xerox Corporation | Fuser manufacture and apparatus |
DE102010045149A1 (de) * | 2010-09-11 | 2012-03-15 | Bayer Material Science Ag | Beschichtung auf Polyurethanbasis für Anzeigebereiche |
US8216661B2 (en) * | 2010-10-19 | 2012-07-10 | Xerox Corporation | Variable gloss fuser coating material comprised of a polymer matrix with the addition of alumina nano fibers |
US8742022B2 (en) * | 2010-12-20 | 2014-06-03 | 3M Innovative Properties Company | Coating compositions comprising non-ionic surfactant exhibiting reduced fingerprint visibility |
US9296904B2 (en) * | 2010-12-20 | 2016-03-29 | 3M Innovative Properties Company | Coating compositions comprising non-ionic surfactant exhibiting reduced fingerprint visibility |
CN102560349A (zh) * | 2010-12-29 | 2012-07-11 | 鸿富锦精密工业(深圳)有限公司 | 镀膜件及其制备方法 |
CN102899610A (zh) * | 2011-07-29 | 2013-01-30 | 鸿富锦精密工业(深圳)有限公司 | 镀膜件及其制造方法 |
US9676649B2 (en) * | 2011-08-26 | 2017-06-13 | Corning Incorporated | Glass substrates with strategically imprinted B-side features and methods for manufacturing the same |
DE102011115379B4 (de) * | 2011-10-10 | 2018-09-27 | Schott Ag | Beschichtetes Glas- oder Glaskeramik-Substrat mit haptischen Eigenschaften und Glaskeramik-Kochfeld |
US8968831B2 (en) * | 2011-12-06 | 2015-03-03 | Guardian Industries Corp. | Coated articles including anti-fingerprint and/or smudge-reducing coatings, and/or methods of making the same |
JP5800728B2 (ja) * | 2012-02-16 | 2015-10-28 | 日東電工株式会社 | 耐指紋性粘着テープ |
TW201336796A (zh) * | 2012-03-06 | 2013-09-16 | Liefco Optical Ltd | 於霧面玻璃局部形成光滑表面之方法 |
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2012
- 2012-06-21 FR FR1255823A patent/FR2992313B1/fr not_active Expired - Fee Related
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- 2013-06-18 ES ES13741806T patent/ES2773952T3/es active Active
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- 2013-06-18 DE DE202013012143.2U patent/DE202013012143U1/de not_active Expired - Lifetime
- 2013-06-18 US US14/404,677 patent/US11419187B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62179424A (ja) * | 1986-01-04 | 1987-08-06 | カ−ル・ツワイス・ステイフツング | ガラスセラミツク等から形成された調理表面構造 |
JPH0848587A (ja) * | 1994-07-23 | 1996-02-20 | Carl Zeiss:Fa | セラミック着色剤で装飾されたガラスセラミック物品およびその製造方法 |
JP2002206756A (ja) * | 2000-11-11 | 2002-07-26 | Carl Zeiss:Fa | 透明無色材料から作られ、赤外線透過性無地着色底面コーティングを施したガラスセラミック又はガラスパネルを備えた調理ユニット |
JP2009518797A (ja) * | 2005-12-05 | 2009-05-07 | ユーロケラ ソシエテ オン ノーム コレクティフ | 透明または半透明なガラスセラミックプレートおよびその製造方法 |
JP2011530403A (ja) * | 2008-08-07 | 2011-12-22 | ユニ−ピクセル・ディスプレイズ・インコーポレーテッド | 表面上における指紋の出現を低減する微細構造 |
WO2011085997A1 (de) * | 2010-01-14 | 2011-07-21 | Schott Ag | Verfahren zur herstellung einer scheibe mit strukturierter oberfläche sowie scheibe mit strukturierter oberfläche |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102550616B1 (ko) * | 2022-01-18 | 2023-07-04 | 삼성전자주식회사 | 세라믹 글라스 및 이를 적용한 쿡탑 |
Also Published As
Publication number | Publication date |
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ES2773952T3 (es) | 2020-07-15 |
DE202013012143U1 (de) | 2015-05-06 |
EP2864266B1 (fr) | 2019-12-11 |
US11419187B2 (en) | 2022-08-16 |
WO2013190230A1 (fr) | 2013-12-27 |
KR102079537B1 (ko) | 2020-04-07 |
CN104379529A (zh) | 2015-02-25 |
KR20150032836A (ko) | 2015-03-30 |
FR2992313B1 (fr) | 2014-11-07 |
JP6466834B2 (ja) | 2019-02-06 |
FR2992313A1 (fr) | 2013-12-27 |
EP2864266A1 (fr) | 2015-04-29 |
CN104379529B (zh) | 2018-07-17 |
US20150144613A1 (en) | 2015-05-28 |
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