JP2015521151A5 - - Google Patents

Download PDF

Info

Publication number
JP2015521151A5
JP2015521151A5 JP2015511657A JP2015511657A JP2015521151A5 JP 2015521151 A5 JP2015521151 A5 JP 2015521151A5 JP 2015511657 A JP2015511657 A JP 2015511657A JP 2015511657 A JP2015511657 A JP 2015511657A JP 2015521151 A5 JP2015521151 A5 JP 2015521151A5
Authority
JP
Japan
Prior art keywords
medium
molecular weight
etching
ethylene oxide
concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015511657A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015521151A (ja
JP6325528B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2013/040110 external-priority patent/WO2013169884A1/en
Publication of JP2015521151A publication Critical patent/JP2015521151A/ja
Publication of JP2015521151A5 publication Critical patent/JP2015521151A5/ja
Application granted granted Critical
Publication of JP6325528B2 publication Critical patent/JP6325528B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2015511657A 2012-05-10 2013-05-08 ガラスエッチング媒体及び方法 Expired - Fee Related JP6325528B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261645195P 2012-05-10 2012-05-10
US61/645,195 2012-05-10
PCT/US2013/040110 WO2013169884A1 (en) 2012-05-10 2013-05-08 Glass etching media and methods

Publications (3)

Publication Number Publication Date
JP2015521151A JP2015521151A (ja) 2015-07-27
JP2015521151A5 true JP2015521151A5 (https=) 2016-06-30
JP6325528B2 JP6325528B2 (ja) 2018-05-16

Family

ID=48468824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015511657A Expired - Fee Related JP6325528B2 (ja) 2012-05-10 2013-05-08 ガラスエッチング媒体及び方法

Country Status (6)

Country Link
US (1) US8951434B2 (https=)
JP (1) JP6325528B2 (https=)
KR (1) KR102078293B1 (https=)
CN (1) CN104603077B (https=)
TW (1) TWI573860B (https=)
WO (1) WO2013169884A1 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103980905B (zh) * 2014-05-07 2017-04-05 佛山市中山大学研究院 一种用于氧化物材料体系的蚀刻液及其蚀刻方法和应用
CN107074629B (zh) * 2014-09-08 2021-07-06 康宁股份有限公司 具有低闪光、doi和透射雾度的防眩光基材
EP3210058A1 (en) 2014-10-23 2017-08-30 Corning Incorporated A light diffusing component and a method of manufacturing a light diffusing component
KR20170089905A (ko) * 2014-11-26 2017-08-04 코닝 인코포레이티드 강화된 및 내구성 있는 유리 용기의 생산 방법
TWI649285B (zh) * 2016-06-07 2019-02-01 全鴻精研股份有限公司 水平式玻璃蝕刻的方法
CN106242307A (zh) * 2016-08-11 2016-12-21 京东方科技集团股份有限公司 用于强化制品的边缘的方法、玻璃及显示装置
CN106630659B (zh) * 2017-01-09 2019-09-20 天津美泰真空技术有限公司 一种tft玻璃基板薄化工艺预处理液
CN110234615A (zh) * 2017-01-31 2019-09-13 康宁股份有限公司 用于减少玻璃片边缘颗粒的方法
WO2018144527A1 (en) * 2017-01-31 2018-08-09 Corning Incorporated Methods for reducing glass sheet edge particles
KR102255285B1 (ko) * 2018-12-10 2021-05-28 신한대학교 산학협력단 판유리용 에칭액 슬라이딩 코팅장치
TW202106647A (zh) * 2019-05-15 2021-02-16 美商康寧公司 在高溫下用高濃度鹼金屬氫氧化物減少紋理化玻璃、玻璃陶瓷以及陶瓷製品之厚度的方法
WO2021030122A1 (en) 2019-08-13 2021-02-18 Corning Incorporated Textured glass articles and methods of making the same
CN113087405A (zh) * 2021-04-07 2021-07-09 惠州市清洋实业有限公司 一种钢化玻璃小r角深度刻蚀液及其刻蚀方法
CN113087404A (zh) * 2021-04-07 2021-07-09 惠州市清洋实业有限公司 一种钢化玻璃大r角深度刻蚀液及其刻蚀方法
CN118005296A (zh) * 2023-12-15 2024-05-10 咸宁南玻光电玻璃有限公司 玻璃强化用组合物、玻璃强化方法、浮法高铝电子玻璃

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US541573A (en) 1895-06-25 Johannes selwig
DE1276261C2 (de) * 1965-05-17 1974-09-19 Hoechst Ag Pasten zum beizen von edelstahloberflaechen
DE3240231C1 (de) 1982-10-29 1984-03-01 Ranco Inc., 43201 Columbus, Ohio Pressostat
IT1177081B (it) * 1984-10-30 1987-08-26 Vitreal Specchi Spa Apparecchiatura per l'incisione in continuo all'acido su una faccia di lastre di vetro
US4781792A (en) * 1985-05-07 1988-11-01 Hogan James V Method for permanently marking glass
US5246540A (en) 1992-04-01 1993-09-21 Tru Vue, Inc. Apparatus and method for etching glass
US5688366A (en) 1994-04-28 1997-11-18 Canon Kabushiki Kaisha Etching method, method of producing a semiconductor device, and etchant therefor
US6670281B2 (en) * 1998-12-30 2003-12-30 Honeywell International Inc. HF etching and oxide scale removal
US6337029B1 (en) 1999-01-21 2002-01-08 Xim Products Method and composition for etching glass ceramic and porcelain surfaces
US6807824B1 (en) 1999-04-27 2004-10-26 Hiroshi Miwa Glass etching composition and method for frosting using the same
DE10101926A1 (de) * 2000-04-28 2001-10-31 Merck Patent Gmbh Ätzpasten für anorganische Oberflächen
RU2274615C2 (ru) 2000-04-28 2006-04-20 Мерк Патент Гмбх Гравировальные пасты для неорганических поверхностей
FR2809722B1 (fr) * 2000-05-31 2003-01-03 Seppic Sa Nouveau procede de depolissage chimique du verre comprenant un rincage avec une solution saline et objets depolis obtenus par ce procede
JPWO2002053508A1 (ja) * 2000-12-27 2004-04-30 三輪　博 ガラスエッチング組成物を用いた装飾ガラスの製造法
JP4019656B2 (ja) * 2001-06-18 2007-12-12 株式会社日立製作所 板状基板の流体処理方法および処理装置
JP4520075B2 (ja) * 2001-06-25 2010-08-04 博 三輪 サンドブラスト加工を施したガラス製品の表面加工法
BRPI0313080B1 (pt) * 2002-07-30 2018-03-13 Danisco Us Inc. Produto de limpeza, seus método de produção e uso
DE10239656A1 (de) 2002-08-26 2004-03-11 Merck Patent Gmbh Ätzpasten für Titanoxid-Oberflächen
DE102005007743A1 (de) 2005-01-11 2006-07-20 Merck Patent Gmbh Druckfähiges Medium zur Ätzung von Siliziumdioxid- und Siliziumnitridschichten
US7273813B2 (en) * 2005-02-08 2007-09-25 Applied Materials, Inc. Wafer cleaning solution for cobalt electroless application
ATE422066T1 (de) * 2005-11-18 2009-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
DE102006051952A1 (de) 2006-11-01 2008-05-08 Merck Patent Gmbh Partikelhaltige Ätzpasten für Siliziumoberflächen und -schichten
JP2012504871A (ja) * 2008-10-02 2012-02-23 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 高度な金属負荷及びシリコン基板の表面パッシベーションのための界面活性剤／消泡剤混合物の使用
TWI509865B (zh) * 2009-01-12 2015-11-21 A123 Systems Llc 層疊電池單元及其製造方法
US9085484B2 (en) 2010-04-30 2015-07-21 Corning Incorporated Anti-glare surface treatment method and articles thereof
US8992786B2 (en) 2010-04-30 2015-03-31 Corning Incorporated Anti-glare surface and method of making
JP5721348B2 (ja) * 2010-06-01 2015-05-20 キヤノン株式会社 ガラスの製造方法
US20120122271A1 (en) * 2010-11-17 2012-05-17 E. I. Du Pont De Nemours And Company Etching method to increase light transmission in thin-film photovoltaic panels
US8592248B2 (en) * 2010-11-17 2013-11-26 E I Du Pont De Nemours And Company Etching method for use with thin-film photovoltaic panel
US20120180852A1 (en) * 2011-01-13 2012-07-19 E.I. Du Pont De Nemours And Company Etching composition
JP5677903B2 (ja) * 2011-07-01 2015-02-25 ステラケミファ株式会社 ガラス基板の表面を防眩化するための表面処理液

Similar Documents

Publication Publication Date Title
JP2015521151A5 (https=)
JP2010034509A5 (https=)
WO2012030752A3 (en) Silicon polishing compositions with high rate and low defectivity
JP2009538382A5 (https=)
JP2014063186A5 (https=)
JP2013525253A5 (https=)
KR101679711B1 (ko) 중성화된 전도성 수분산액 조성물 및 그 제조방법
JP6101869B2 (ja) 表面処理された透明導電性高分子薄膜の製造方法およびこれを用いて製造した透明電極
CN107235641A (zh) 一种玻璃减薄蚀刻液及其制备方法
JP2009179860A (ja) 素地調整工法
JP2018017888A5 (https=)
CN104529178A (zh) 磷酸盐激光玻璃表面增强的处理方法
CN108060024A (zh) 玻璃基板水基清洗液及使用该清洗液清洗玻璃基板的方法
CN104152279A (zh) 一种智能手机玻璃水性清洗剂及其制备方法
JP2018041982A5 (https=)
JP5700784B2 (ja) エッチング液組成物
WO2015146250A1 (ja) 配線形成方法及びエッチング液
PL411839A1 (pl) Polimerowa membrana inkluzyjna oraz sposób jej otrzymywania
JP2013143404A5 (ja) シリコン基板のエッチング方法及び太陽光発電装置の製造方法
CN102994284B (zh) 除蜡清洗剂
JP2015523306A5 (https=)
KR102245660B1 (ko) 몰리브덴 합금막 및 인듐 산화막 식각액 조성물 및 그 조성물을 사용하는 액정표시장치용 어레이 기판의 제조방법
WO2015179425A3 (en) Jettable inks for solar cell and semiconductor fabrication
KR20160038236A (ko) 은 나노 와이어의 식각액 조성물
CN104560423A (zh) 一种led陶瓷底座清洗剂