JP2015523306A5 - - Google Patents

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Publication number
JP2015523306A5
JP2015523306A5 JP2015515104A JP2015515104A JP2015523306A5 JP 2015523306 A5 JP2015523306 A5 JP 2015523306A5 JP 2015515104 A JP2015515104 A JP 2015515104A JP 2015515104 A JP2015515104 A JP 2015515104A JP 2015523306 A5 JP2015523306 A5 JP 2015523306A5
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JP
Japan
Prior art keywords
glass
factor
range
concentration
etchant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015515104A
Other languages
English (en)
Japanese (ja)
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JP2015523306A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2013/042810 external-priority patent/WO2013181123A1/en
Publication of JP2015523306A publication Critical patent/JP2015523306A/ja
Publication of JP2015523306A5 publication Critical patent/JP2015523306A5/ja
Pending legal-status Critical Current

Links

JP2015515104A 2012-05-31 2013-05-28 ウエット酸エッチングにおけるスラッジ制御のための方法 Pending JP2015523306A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261653705P 2012-05-31 2012-05-31
US61/653,705 2012-05-31
PCT/US2013/042810 WO2013181123A1 (en) 2012-05-31 2013-05-28 Method for sludge control in wet acid etching

Publications (2)

Publication Number Publication Date
JP2015523306A JP2015523306A (ja) 2015-08-13
JP2015523306A5 true JP2015523306A5 (https=) 2016-07-14

Family

ID=48614160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015515104A Pending JP2015523306A (ja) 2012-05-31 2013-05-28 ウエット酸エッチングにおけるスラッジ制御のための方法

Country Status (7)

Country Link
US (1) US9290410B2 (https=)
EP (1) EP2855385A1 (https=)
JP (1) JP2015523306A (https=)
KR (1) KR101971316B1 (https=)
CN (1) CN104684859B (https=)
TW (1) TWI555712B (https=)
WO (1) WO2013181123A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013181213A1 (en) * 2012-05-31 2013-12-05 Corning Incorporated Systems and methods for acid-treating glass articles
CN111499210A (zh) 2014-07-30 2020-08-07 康宁股份有限公司 超声槽和均匀玻璃基板蚀刻方法
WO2021030122A1 (en) 2019-08-13 2021-02-18 Corning Incorporated Textured glass articles and methods of making the same

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3917320A1 (de) 1989-05-27 1990-12-20 Bayer Ag Harnstoffgruppen enthaltende (meth)-acrylsaeure-derivate von triisocyanaten und ihre verwendung
JPH07215736A (ja) * 1994-01-31 1995-08-15 Hoya Corp ガラス体表面の化学的研磨法
JP3523239B2 (ja) * 2001-04-12 2004-04-26 西山ステンレスケミカル株式会社 ガラス基板の化学加工方法及びガラス基板
JP4370737B2 (ja) 2001-06-27 2009-11-25 三菱化学エンジニアリング株式会社 フッ酸の供給方法
JP5132859B2 (ja) * 2001-08-24 2013-01-30 ステラケミファ株式会社 多成分を有するガラス基板用の微細加工表面処理液
JP5197902B2 (ja) * 2001-08-31 2013-05-15 ステラケミファ株式会社 多成分を有するガラス基板用の微細加工表面処理液
JP2006326444A (ja) * 2005-05-25 2006-12-07 Sony Corp エッチングシステム
CN1990402A (zh) * 2005-12-28 2007-07-04 庄大建 防飓风玻璃生产工艺
KR20080022917A (ko) * 2006-09-08 2008-03-12 삼성전자주식회사 식각액 공급장치, 식각장치 및 식각방법
CN101295673B (zh) * 2007-04-27 2010-11-03 南亚科技股份有限公司 一种形成位线接触插塞的方法与晶体管结构
CN101868428A (zh) * 2007-11-19 2010-10-20 旭硝子株式会社 玻璃基板的蚀刻处理方法
KR100943321B1 (ko) 2008-03-03 2010-02-19 (주)세미로드 유리 식각 장치와 유리 기판의 슬러지 제거 방법
CN102076625A (zh) * 2008-06-25 2011-05-25 旭硝子株式会社 无碱玻璃基板的蚀刻方法及显示装置
KR101093362B1 (ko) 2009-09-23 2011-12-14 호서대학교 산학협력단 유리 식각액
KR20110056095A (ko) 2009-11-20 2011-05-26 타코마테크놀러지 주식회사 식각액 조성물
JP5573219B2 (ja) * 2010-02-18 2014-08-20 ソニー株式会社 薄膜トランジスタ、ならびに電子機器およびその製造方法
US9309921B2 (en) 2011-07-29 2016-04-12 Harmonic Drive Systems Inc. Internally-toothed gear unit with composite roller bearing, and wave gear device
US9926225B2 (en) 2011-12-30 2018-03-27 Corning Incorporated Media and methods for etching glass

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