TWI555712B - 在濕式酸蝕刻中用於污泥控制之方法 - Google Patents
在濕式酸蝕刻中用於污泥控制之方法 Download PDFInfo
- Publication number
- TWI555712B TWI555712B TW102119382A TW102119382A TWI555712B TW I555712 B TWI555712 B TW I555712B TW 102119382 A TW102119382 A TW 102119382A TW 102119382 A TW102119382 A TW 102119382A TW I555712 B TWI555712 B TW I555712B
- Authority
- TW
- Taiwan
- Prior art keywords
- glass
- precipitate
- concentration
- etchant
- sludge
- Prior art date
Links
- 239000010802 sludge Substances 0.000 title claims description 110
- 238000000034 method Methods 0.000 title claims description 69
- 239000002253 acid Substances 0.000 title claims description 58
- 238000005530 etching Methods 0.000 title claims description 41
- 239000011521 glass Substances 0.000 claims description 142
- KRHYYFGTRYWZRS-UHFFFAOYSA-N hydrofluoric acid Substances F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 130
- 239000002244 precipitate Substances 0.000 claims description 118
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 claims description 117
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 90
- 230000008569 process Effects 0.000 claims description 24
- 102000003712 Complement factor B Human genes 0.000 claims description 15
- 108090000056 Complement factor B Proteins 0.000 claims description 15
- 229910052782 aluminium Inorganic materials 0.000 claims description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 6
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 6
- 239000000075 oxide glass Substances 0.000 claims description 6
- 239000005388 borosilicate glass Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 150000001340 alkali metals Chemical class 0.000 claims description 4
- 239000005354 aluminosilicate glass Substances 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 238000001039 wet etching Methods 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000000243 solution Substances 0.000 description 44
- 230000015572 biosynthetic process Effects 0.000 description 40
- -1 H 2 SO 4 Chemical compound 0.000 description 27
- 238000006243 chemical reaction Methods 0.000 description 25
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 23
- 239000013049 sediment Substances 0.000 description 23
- 229910021645 metal ion Inorganic materials 0.000 description 18
- 230000000694 effects Effects 0.000 description 16
- 239000000126 substance Substances 0.000 description 14
- 239000011777 magnesium Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 238000000926 separation method Methods 0.000 description 9
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 8
- 238000002441 X-ray diffraction Methods 0.000 description 8
- 229910052749 magnesium Inorganic materials 0.000 description 8
- 239000011575 calcium Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 6
- 229910052791 calcium Inorganic materials 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000005119 centrifugation Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000009616 inductively coupled plasma Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000000053 physical method Methods 0.000 description 4
- 241000894007 species Species 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 238000010494 dissociation reaction Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910016569 AlF 3 Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229920002274 Nalgene Polymers 0.000 description 2
- 241000047703 Nonion Species 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000005407 aluminoborosilicate glass Substances 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000001311 chemical methods and process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 238000003760 magnetic stirring Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 239000006228 supernatant Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 230000009885 systemic effect Effects 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- SHKFXDSDEYMUDL-UHFFFAOYSA-I O.[Al+3].[F-].[Mg+2].[F-].[F-].[F-].[F-] Chemical group O.[Al+3].[F-].[Mg+2].[F-].[F-].[F-].[F-] SHKFXDSDEYMUDL-UHFFFAOYSA-I 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 230000004520 agglutination Effects 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 208000018459 dissociative disease Diseases 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000013178 mathematical model Methods 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261653705P | 2012-05-31 | 2012-05-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201410629A TW201410629A (zh) | 2014-03-16 |
| TWI555712B true TWI555712B (zh) | 2016-11-01 |
Family
ID=48614160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102119382A TWI555712B (zh) | 2012-05-31 | 2013-05-31 | 在濕式酸蝕刻中用於污泥控制之方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9290410B2 (https=) |
| EP (1) | EP2855385A1 (https=) |
| JP (1) | JP2015523306A (https=) |
| KR (1) | KR101971316B1 (https=) |
| CN (1) | CN104684859B (https=) |
| TW (1) | TWI555712B (https=) |
| WO (1) | WO2013181123A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013181213A1 (en) * | 2012-05-31 | 2013-12-05 | Corning Incorporated | Systems and methods for acid-treating glass articles |
| CN111499210A (zh) | 2014-07-30 | 2020-08-07 | 康宁股份有限公司 | 超声槽和均匀玻璃基板蚀刻方法 |
| WO2021030122A1 (en) | 2019-08-13 | 2021-02-18 | Corning Incorporated | Textured glass articles and methods of making the same |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101295673B (zh) * | 2007-04-27 | 2010-11-03 | 南亚科技股份有限公司 | 一种形成位线接触插塞的方法与晶体管结构 |
| TW201140848A (en) * | 2010-02-18 | 2011-11-16 | Sony Corp | Thin film transistor, electronic machine and manufacturing method thereof |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3917320A1 (de) | 1989-05-27 | 1990-12-20 | Bayer Ag | Harnstoffgruppen enthaltende (meth)-acrylsaeure-derivate von triisocyanaten und ihre verwendung |
| JPH07215736A (ja) * | 1994-01-31 | 1995-08-15 | Hoya Corp | ガラス体表面の化学的研磨法 |
| JP3523239B2 (ja) * | 2001-04-12 | 2004-04-26 | 西山ステンレスケミカル株式会社 | ガラス基板の化学加工方法及びガラス基板 |
| JP4370737B2 (ja) | 2001-06-27 | 2009-11-25 | 三菱化学エンジニアリング株式会社 | フッ酸の供給方法 |
| JP5132859B2 (ja) * | 2001-08-24 | 2013-01-30 | ステラケミファ株式会社 | 多成分を有するガラス基板用の微細加工表面処理液 |
| JP5197902B2 (ja) * | 2001-08-31 | 2013-05-15 | ステラケミファ株式会社 | 多成分を有するガラス基板用の微細加工表面処理液 |
| JP2006326444A (ja) * | 2005-05-25 | 2006-12-07 | Sony Corp | エッチングシステム |
| CN1990402A (zh) * | 2005-12-28 | 2007-07-04 | 庄大建 | 防飓风玻璃生产工艺 |
| KR20080022917A (ko) * | 2006-09-08 | 2008-03-12 | 삼성전자주식회사 | 식각액 공급장치, 식각장치 및 식각방법 |
| CN101868428A (zh) * | 2007-11-19 | 2010-10-20 | 旭硝子株式会社 | 玻璃基板的蚀刻处理方法 |
| KR100943321B1 (ko) | 2008-03-03 | 2010-02-19 | (주)세미로드 | 유리 식각 장치와 유리 기판의 슬러지 제거 방법 |
| CN102076625A (zh) * | 2008-06-25 | 2011-05-25 | 旭硝子株式会社 | 无碱玻璃基板的蚀刻方法及显示装置 |
| KR101093362B1 (ko) | 2009-09-23 | 2011-12-14 | 호서대학교 산학협력단 | 유리 식각액 |
| KR20110056095A (ko) | 2009-11-20 | 2011-05-26 | 타코마테크놀러지 주식회사 | 식각액 조성물 |
| US9309921B2 (en) | 2011-07-29 | 2016-04-12 | Harmonic Drive Systems Inc. | Internally-toothed gear unit with composite roller bearing, and wave gear device |
| US9926225B2 (en) | 2011-12-30 | 2018-03-27 | Corning Incorporated | Media and methods for etching glass |
-
2013
- 2013-05-28 KR KR1020147036499A patent/KR101971316B1/ko not_active Expired - Fee Related
- 2013-05-28 CN CN201380028674.6A patent/CN104684859B/zh not_active Expired - Fee Related
- 2013-05-28 US US14/403,680 patent/US9290410B2/en not_active Expired - Fee Related
- 2013-05-28 EP EP13728610.0A patent/EP2855385A1/en not_active Withdrawn
- 2013-05-28 JP JP2015515104A patent/JP2015523306A/ja active Pending
- 2013-05-28 WO PCT/US2013/042810 patent/WO2013181123A1/en not_active Ceased
- 2013-05-31 TW TW102119382A patent/TWI555712B/zh not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101295673B (zh) * | 2007-04-27 | 2010-11-03 | 南亚科技股份有限公司 | 一种形成位线接触插塞的方法与晶体管结构 |
| TW201140848A (en) * | 2010-02-18 | 2011-11-16 | Sony Corp | Thin film transistor, electronic machine and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2855385A1 (en) | 2015-04-08 |
| CN104684859A (zh) | 2015-06-03 |
| US9290410B2 (en) | 2016-03-22 |
| CN104684859B (zh) | 2019-07-12 |
| WO2013181123A1 (en) | 2013-12-05 |
| KR101971316B1 (ko) | 2019-04-22 |
| JP2015523306A (ja) | 2015-08-13 |
| US20150136736A1 (en) | 2015-05-21 |
| KR20150027133A (ko) | 2015-03-11 |
| TW201410629A (zh) | 2014-03-16 |
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| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |