JP2015512765A - コールドガススプレー方法 - Google Patents
コールドガススプレー方法 Download PDFInfo
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- JP2015512765A JP2015512765A JP2014553658A JP2014553658A JP2015512765A JP 2015512765 A JP2015512765 A JP 2015512765A JP 2014553658 A JP2014553658 A JP 2014553658A JP 2014553658 A JP2014553658 A JP 2014553658A JP 2015512765 A JP2015512765 A JP 2015512765A
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- 239000007921 spray Substances 0.000 title claims abstract description 88
- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000000576 coating method Methods 0.000 claims abstract description 61
- 239000011248 coating agent Substances 0.000 claims abstract description 55
- 239000007789 gas Substances 0.000 claims abstract description 49
- 239000002245 particle Substances 0.000 claims abstract description 43
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 38
- 239000012159 carrier gas Substances 0.000 claims abstract description 37
- 239000002159 nanocrystal Substances 0.000 claims abstract description 32
- 239000000843 powder Substances 0.000 claims abstract description 29
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 238000005259 measurement Methods 0.000 claims abstract description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 52
- 230000001699 photocatalysis Effects 0.000 claims description 21
- 239000004408 titanium dioxide Substances 0.000 claims description 20
- 239000010410 layer Substances 0.000 claims description 17
- 238000005507 spraying Methods 0.000 claims description 8
- WMCMKBBLRYJDNO-UHFFFAOYSA-N indium(3+) oxygen(2-) tantalum(5+) Chemical compound [O--].[O--].[O--].[O--].[In+3].[Ta+5] WMCMKBBLRYJDNO-UHFFFAOYSA-N 0.000 claims description 5
- JZQOJFLIJNRDHK-CMDGGOBGSA-N alpha-irone Chemical compound CC1CC=C(C)C(\C=C\C(C)=O)C1(C)C JZQOJFLIJNRDHK-CMDGGOBGSA-N 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- 239000001307 helium Substances 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 4
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 claims description 4
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
- 239000000853 adhesive Substances 0.000 claims description 3
- 230000001070 adhesive effect Effects 0.000 claims description 3
- 239000012790 adhesive layer Substances 0.000 claims description 3
- 229910000859 α-Fe Inorganic materials 0.000 claims description 3
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- KVDJFAANUSOHTB-UHFFFAOYSA-N sodium;oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[Na+].[Ta+5] KVDJFAANUSOHTB-UHFFFAOYSA-N 0.000 claims description 2
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 claims description 2
- HRKGKQTZHPOCTK-UHFFFAOYSA-N [Nb+4] Chemical compound [Nb+4] HRKGKQTZHPOCTK-UHFFFAOYSA-N 0.000 claims 1
- 229910003437 indium oxide Inorganic materials 0.000 claims 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000001954 sterilising effect Effects 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010288 cold spraying Methods 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- NJDGWMLMQLGHPA-UHFFFAOYSA-N [O--].[O--].[O--].[O--].[Nb+5].[In+3] Chemical compound [O--].[O--].[O--].[O--].[Nb+5].[In+3] NJDGWMLMQLGHPA-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 230000000840 anti-viral effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229940127554 medical product Drugs 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0221—Coating of particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
- B05B7/1606—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed the spraying of the material involving the use of an atomising fluid, e.g. air
- B05B7/1613—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed the spraying of the material involving the use of an atomising fluid, e.g. air comprising means for heating the atomising fluid before mixing with the material to be sprayed
- B05B7/162—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed the spraying of the material involving the use of an atomising fluid, e.g. air comprising means for heating the atomising fluid before mixing with the material to be sprayed and heat being transferred from the atomising fluid to the material to be sprayed
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/082—Coating starting from inorganic powder by application of heat or pressure and heat without intermediate formation of a liquid in the layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00743—Feeding or discharging of solids
- B01J2208/00761—Discharging
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Catalysts (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
Description
Claims (15)
- 光触媒活性スプレー粒子を含むスプレー粉末を、キャリアガスによりノズル内で加速し、前記スプレー粉末が、基板への衝突時にコーティングを形成する、コールドガススプレー方法であって、
前記光触媒活性スプレー粒子の少なくとも一部が、ナノ結晶凝集体からなり、該ナノ結晶凝集体は、200〜800m2/gの多孔率を有し、該多孔率を、窒素を用いたBET測定により決定することを特徴とする、コールドガススプレー方法。 - 前記キャリアガスは、ノズルスロート部の上流側で、400℃より高い、好ましくは800℃より高い、特に好ましくは900℃より高い温度を有することを特徴とする、請求項1に記載の方法。
- 窒素若しくはヘリウム又はこれらから成る混合物を、キャリアガスとして使用することを特徴とする、請求項1又は2に記載の方法。
- 前記ナノ結晶凝集体は、二酸化チタン(TiO2)、三酸化タングステン(WO3)、チタン酸ストロンチウム(SrTiO3)、二酸化スズ(SnO2)、炭化ケイ素(SiC)、酸化ナトリウムタンタル(NaTaO)、酸化亜鉛(ZnO)、α酸化鉄(III)(α−FeO3)、バナジン酸ビスマス(BiVO4)、酸窒化タンタル(TaON)、窒化三タンタル(V)(Ta3N5)、酸化インジウムタンタル(IV)(InTaO4)及び/又は酸化インジウムニオブ(IV)(InNbO4)を含有する、特にアナターゼである二酸化チタンを含有することを特徴とする、請求項1から3までのいずれか1項に記載の方法。
- 前記ナノ結晶凝集体は、250〜600m2/g、好ましくは280〜450m2/gの多孔率を有することを特徴とする、請求項1から4までのいずれか1項に記載の方法。
- 前記ナノ結晶凝集体は、0.1〜4GPa、好ましくは0.2〜2GPaの硬さを有し、該硬さをナノインデンタによって決定することを特徴とする、請求項1から5までのいずれか1項に記載の方法。
- ナノ結晶凝集体からなる少なくとも前記光触媒活性スプレー粒子を、プレチャンバ又は延長された収束領域においてキャリアガスにより加熱することを特徴とする、請求項1から6までのいずれか1項に記載の方法。
- 可視光において光触媒活性を有するコーティングを製造することを特徴とする、請求項1から7までのいずれか1項に記載の方法。
- 前記コーティングは、少なくとも80μm、好ましくは少なくとも100μmの厚さであることを特徴とする、請求項1から8までのいずれか1項に記載の方法。
- 請求項1から9までの少なくともいずれか1項に記載の方法によって製造したコーティング。
- 可視光において光触媒活性を有する、請求項10に記載のコーティング。
- 二酸化チタンからなる、請求項10又は11に記載のコーティング。
- スプレー粒子の層よりも大きな、特に少なくとも80μm、好ましくは少なくとも100μmの厚さを有する、請求項10から12までのいずれか1項に記載のコーティング。
- 請求項10から13までの少なくともいずれか1項に記載のコーティングを有する物。
- 被コーティング物におけるコーティングの下に、前記被コーティング物体と、コーティングとの間で接着剤を供給する接着層が付与されていることを特徴とする、請求項14に記載の物。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012001361.2 | 2012-01-24 | ||
DE102012001361A DE102012001361A1 (de) | 2012-01-24 | 2012-01-24 | Verfahren zum Kaltgasspritzen |
EP12002885.7 | 2012-04-24 | ||
EP12002885.7A EP2620525A1 (de) | 2012-01-24 | 2012-04-24 | Verfahren zum Kaltgasspritzen |
PCT/EP2013/000121 WO2013110441A1 (de) | 2012-01-24 | 2013-01-17 | Verfahren zum kaltgasspritzen |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015512765A true JP2015512765A (ja) | 2015-04-30 |
JP2015512765A5 JP2015512765A5 (ja) | 2015-10-15 |
JP6104281B2 JP6104281B2 (ja) | 2017-03-29 |
Family
ID=46146507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014553658A Expired - Fee Related JP6104281B2 (ja) | 2012-01-24 | 2013-01-17 | コールドガススプレー方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US9527069B2 (ja) |
EP (2) | EP2620525A1 (ja) |
JP (1) | JP6104281B2 (ja) |
AU (1) | AU2013212183B2 (ja) |
BR (1) | BR112014018034A8 (ja) |
CA (1) | CA2860720A1 (ja) |
DE (1) | DE102012001361A1 (ja) |
WO (1) | WO2013110441A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2017531736A (ja) * | 2014-07-03 | 2017-10-26 | プランゼー エスエー | 層の製造方法 |
JP2019007060A (ja) * | 2017-06-27 | 2019-01-17 | 地方独立行政法人 岩手県工業技術センター | 被覆用粉末の製造方法,被覆用粉末及び被覆用粉末の被覆方法 |
JP2021038469A (ja) * | 2017-06-27 | 2021-03-11 | 地方独立行政法人 岩手県工業技術センター | 皮膜付き基材 |
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WO2015047995A1 (en) * | 2013-09-25 | 2015-04-02 | United Technologies Corporation | Simplified cold spray nozzle and gun |
US9850579B2 (en) | 2015-09-30 | 2017-12-26 | Delavan, Inc. | Feedstock and methods of making feedstock for cold spray techniques |
WO2018047098A1 (en) * | 2016-09-07 | 2018-03-15 | Tessonics, Inc | Hopper with microreactor and cartridge for low pressure cold spraying |
GB2577522B (en) * | 2018-09-27 | 2022-12-28 | 2D Heat Ltd | A heating device, and applications therefore |
CN109908712B (zh) * | 2019-04-24 | 2024-04-02 | 攀钢集团钛业有限责任公司 | 用于四氯化钛吸收的气液混合器 |
DE102020103232A1 (de) | 2020-02-07 | 2021-08-12 | Fachhochschule Münster | Verfahren zum Aufbringen von Partikel auf ein Substrat |
CN112295768B (zh) * | 2020-10-27 | 2021-07-27 | 景德镇学院 | 一种用于陶瓷彩绘工艺的多彩喷绘装置 |
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- 2013-01-17 US US14/369,002 patent/US9527069B2/en not_active Expired - Fee Related
- 2013-01-17 WO PCT/EP2013/000121 patent/WO2013110441A1/de active Application Filing
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JP2017531736A (ja) * | 2014-07-03 | 2017-10-26 | プランゼー エスエー | 層の製造方法 |
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JP2021038469A (ja) * | 2017-06-27 | 2021-03-11 | 地方独立行政法人 岩手県工業技術センター | 皮膜付き基材 |
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US9527069B2 (en) | 2016-12-27 |
WO2013110441A1 (de) | 2013-08-01 |
US20140336046A1 (en) | 2014-11-13 |
AU2013212183B2 (en) | 2017-04-06 |
EP2620525A1 (de) | 2013-07-31 |
CA2860720A1 (en) | 2013-08-01 |
AU2013212183A1 (en) | 2014-07-10 |
EP2807287A1 (de) | 2014-12-03 |
DE102012001361A1 (de) | 2013-07-25 |
BR112014018034A2 (ja) | 2017-06-20 |
BR112014018034A8 (pt) | 2017-07-11 |
JP6104281B2 (ja) | 2017-03-29 |
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