JP2015510502A5 - - Google Patents
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- Publication number
- JP2015510502A5 JP2015510502A5 JP2014554752A JP2014554752A JP2015510502A5 JP 2015510502 A5 JP2015510502 A5 JP 2015510502A5 JP 2014554752 A JP2014554752 A JP 2014554752A JP 2014554752 A JP2014554752 A JP 2014554752A JP 2015510502 A5 JP2015510502 A5 JP 2015510502A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- vapor deposition
- present
- independently
- organometallic complex
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 23
- 125000000217 alkyl group Chemical group 0.000 claims 12
- 125000002524 organometallic group Chemical group 0.000 claims 10
- 238000005229 chemical vapour deposition Methods 0.000 claims 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims 4
- 238000000231 atomic layer deposition Methods 0.000 claims 4
- 230000008016 vaporization Effects 0.000 claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- 238000007740 vapor deposition Methods 0.000 claims 3
- RHUYHJGZWVXEHW-UHFFFAOYSA-N 1,1-Dimethyhydrazine Chemical compound CN(C)N RHUYHJGZWVXEHW-UHFFFAOYSA-N 0.000 claims 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 125000000304 alkynyl group Chemical group 0.000 claims 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 238000002347 injection Methods 0.000 claims 2
- 239000007924 injection Substances 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 229910044991 metal oxide Inorganic materials 0.000 claims 2
- 150000004706 metal oxides Chemical class 0.000 claims 2
- 239000000376 reactant Substances 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- 239000003570 air Substances 0.000 claims 1
- 229910021529 ammonia Inorganic materials 0.000 claims 1
- 229910000085 borane Inorganic materials 0.000 claims 1
- 150000004696 coordination complex Chemical class 0.000 claims 1
- NOVHEGOWZNFVGT-UHFFFAOYSA-N hydrazine Chemical compound NN.NN NOVHEGOWZNFVGT-UHFFFAOYSA-N 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261591002P | 2012-01-26 | 2012-01-26 | |
| US61/591,002 | 2012-01-26 | ||
| US201261711770P | 2012-10-10 | 2012-10-10 | |
| US61/711,770 | 2012-10-10 | ||
| PCT/US2013/022260 WO2013112383A1 (en) | 2012-01-26 | 2013-01-18 | Molybdenum allyl complexes and use thereof in thin film deposition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015510502A JP2015510502A (ja) | 2015-04-09 |
| JP2015510502A5 true JP2015510502A5 (https=) | 2016-03-03 |
| JP6209168B2 JP6209168B2 (ja) | 2017-10-04 |
Family
ID=47722546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014554752A Active JP6209168B2 (ja) | 2012-01-26 | 2013-01-18 | モリブデンアリル錯体及び薄膜堆積におけるその使用 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US9175023B2 (https=) |
| EP (1) | EP2807174B1 (https=) |
| JP (1) | JP6209168B2 (https=) |
| KR (1) | KR101532995B1 (https=) |
| CN (1) | CN104136448B (https=) |
| IL (1) | IL233786A (https=) |
| SG (1) | SG11201404375PA (https=) |
| TW (1) | TWI563112B (https=) |
| WO (1) | WO2013112383A1 (https=) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2201149B1 (en) | 2007-09-14 | 2013-03-13 | Sigma-Aldrich Co. | Methods of preparing titanium containing thin films by atomic layer deposition using monocyclopentadienyl titanium-based precursors |
| WO2011017068A1 (en) | 2009-08-07 | 2011-02-10 | Sigma-Aldrich Co. | High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films |
| JP5873494B2 (ja) | 2010-08-27 | 2016-03-01 | シグマ−アルドリッチ・カンパニー、エルエルシー | モリブデン（ｉｖ）アミド前駆体及び原子層堆積法におけるそれらの使用 |
| US8927748B2 (en) | 2011-08-12 | 2015-01-06 | Sigma-Aldrich Co. Llc | Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films |
| KR101532995B1 (ko) | 2012-01-26 | 2015-07-01 | 시그마-알드리치 컴퍼니., 엘엘씨 | 몰리브덴 알릴 착체 및 박막 증착에서의 이의 용도 |
| SG11201607587YA (en) * | 2014-03-13 | 2016-10-28 | Sigma Aldrich Co Llc | Molybdenum silylcyclopentadienyl and silylallyl complexes and use thereof in thin film deposition |
| JP6346115B2 (ja) * | 2015-03-24 | 2018-06-20 | 東芝メモリ株式会社 | パターン形成方法 |
| EP3417087A1 (en) * | 2016-02-19 | 2018-12-26 | Merck Patent GmbH | Deposition of molybdenum thin films using a molybdenum carbonyl precursor |
| US10573522B2 (en) | 2016-08-16 | 2020-02-25 | Lam Research Corporation | Method for preventing line bending during metal fill process |
| KR102727616B1 (ko) | 2016-10-07 | 2024-11-07 | 삼성전자주식회사 | 유기 금속 전구체, 이를 이용한 막 형성 방법 및 이를 이용한 반도체 장치의 제조 방법 |
| JP2022031988A (ja) * | 2018-11-08 | 2022-02-24 | 株式会社Adeka | 原子層堆積法による金属ルテニウム薄膜の製造方法 |
| KR102355507B1 (ko) * | 2018-11-14 | 2022-01-27 | (주)디엔에프 | 몰리브덴 함유 박막의 제조방법 및 이로부터 제조된 몰리브덴함유 박막 |
| KR20210081436A (ko) | 2018-11-19 | 2021-07-01 | 램 리써치 코포레이션 | 텅스텐을 위한 몰리브덴 템플릿들 |
| SG11202108217UA (en) | 2019-01-28 | 2021-08-30 | Lam Res Corp | Deposition of metal films |
| WO2020185618A1 (en) | 2019-03-11 | 2020-09-17 | Lam Research Corporation | Precursors for deposition of molybdenum-containing films |
| WO2021046058A1 (en) | 2019-09-03 | 2021-03-11 | Lam Research Corporation | Molybdenum deposition |
| CN114667600A (zh) | 2019-10-15 | 2022-06-24 | 朗姆研究公司 | 钼填充 |
| JP7117336B2 (ja) | 2020-01-30 | 2022-08-12 | 株式会社Kokusai Electric | 半導体装置の製造方法、プログラム及び基板処理装置 |
| KR102793252B1 (ko) | 2020-03-25 | 2025-04-08 | 삼성전자주식회사 | 몰리브덴 화합물과 이를 이용한 집적회로 소자의 제조 방법 |
| JP7433132B2 (ja) * | 2020-05-19 | 2024-02-19 | 東京エレクトロン株式会社 | 成膜方法及び成膜装置 |
| US11434254B2 (en) | 2021-01-12 | 2022-09-06 | Applied Materials, Inc. | Dinuclear molybdenum precursors for deposition of molybdenum-containing films |
| US11584768B2 (en) * | 2021-01-12 | 2023-02-21 | Applied Materials, Inc. | Arene molybdenum (0) precursors for deposition of molybdenum films |
| US11390638B1 (en) | 2021-01-12 | 2022-07-19 | Applied Materials, Inc. | Molybdenum(VI) precursors for deposition of molybdenum films |
| US11459347B2 (en) | 2021-01-12 | 2022-10-04 | Applied Materials, Inc. | Molybdenum(IV) and molybdenum(III) precursors for deposition of molybdenum films |
| JP7686761B2 (ja) | 2021-02-23 | 2025-06-02 | ラム リサーチ コーポレーション | ３ｄ－ｎａｎｄ用の酸化物表面上へのモリブデン膜の堆積 |
| WO2022221210A1 (en) | 2021-04-14 | 2022-10-20 | Lam Research Corporation | Deposition of molybdenum |
| US11760768B2 (en) | 2021-04-21 | 2023-09-19 | Applied Materials, Inc. | Molybdenum(0) precursors for deposition of molybdenum films |
| US12588475B2 (en) | 2021-05-14 | 2026-03-24 | Lam Research Corporation | High selectivity doped hardmask films |
| CN118318063A (zh) * | 2021-11-10 | 2024-07-09 | 恩特格里斯公司 | 钼前驱物化合物 |
| KR102731418B1 (ko) * | 2021-12-13 | 2024-11-19 | (주)디엔에프 | 몰리브데넘 화합물, 이의 제조방법 및 이를 포함하는 박막의 제조방법 |
| US12595556B2 (en) | 2023-03-02 | 2026-04-07 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Molybdenum imido alkyl/allyl complexes for deposition of molybdenum-containing films |
| KR20260030908A (ko) * | 2023-08-24 | 2026-03-06 | 다이킨 고교 가부시키가이샤 | 금속 착체 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5089536A (en) * | 1982-11-22 | 1992-02-18 | Minnesota Mining And Manufacturing Company | Energy polmerizable compositions containing organometallic initiators |
| JPH07107190B2 (ja) | 1984-03-30 | 1995-11-15 | キヤノン株式会社 | 光化学気相成長方法 |
| US5064686A (en) | 1990-10-29 | 1991-11-12 | Olin Corporation | Sub-valent molybdenum, tungsten, and chromium amides as sources for thermal chemical vapor deposition of metal-containing films |
| GB9929279D0 (en) | 1999-12-11 | 2000-02-02 | Epichem Ltd | An improved method of and apparatus for the delivery of precursors in the vapour phase to a plurality of epitaxial reactor sites |
| GB0017968D0 (en) | 2000-07-22 | 2000-09-13 | Epichem Ltd | An improved process and apparatus for the isolation of pure,or substantially pure,organometallic compounds |
| AU2002337310A1 (en) | 2001-10-26 | 2003-05-06 | Epichem Limited | Improved precursors for chemical vapour deposition |
| US7927661B2 (en) | 2003-03-17 | 2011-04-19 | Sigma-Aldrich Co. | Methods of depositing a metal oxide layer or film using a rare earth metal precursor |
| WO2005087783A1 (en) * | 2004-03-18 | 2005-09-22 | Ibet-Instituto De Biologia Experimental E Tecnológica | Compositions comprising organometallic molybdenum compounds for treating cancer |
| GB0412790D0 (en) | 2004-06-08 | 2004-07-14 | Epichem Ltd | Precursors for deposition of silicon nitride,silicon oxynitride and metal silicon oxynitrides |
| GB2432363B (en) | 2005-11-16 | 2010-06-23 | Epichem Ltd | Hafnocene and zirconocene precursors, and use thereof in atomic layer deposition |
| DE102006000823A1 (de) * | 2006-01-05 | 2007-07-12 | H. C. Starck Gmbh & Co. Kg | Wolfram- und Molybdän-Verbindungen und ihre Verwendung für die Chemical Vapour Deposition (CVD) |
| JP5108319B2 (ja) * | 2007-02-01 | 2012-12-26 | 昭和シェル石油株式会社 | 有機モリブデン化合物よりなる摩擦調整剤およびそれを含む潤滑組成物 |
| JP5108318B2 (ja) * | 2007-02-01 | 2012-12-26 | 昭和シェル石油株式会社 | 新規な有機モリブデン化合物 |
| TWI382987B (zh) | 2007-07-24 | 2013-01-21 | Sigma Aldrich Co | 應用於化學相沉積製程的有機金屬前驅物 |
| TWI425110B (zh) | 2007-07-24 | 2014-02-01 | 辛格瑪艾瑞契公司 | 以化學相沉積法製造含金屬薄膜之方法 |
| EP2201149B1 (en) | 2007-09-14 | 2013-03-13 | Sigma-Aldrich Co. | Methods of preparing titanium containing thin films by atomic layer deposition using monocyclopentadienyl titanium-based precursors |
| WO2009036046A1 (en) | 2007-09-14 | 2009-03-19 | Sigma-Aldrich Co. | Methods of preparing thin films by atomic layer deposition using monocyclopentadienyl trialkoxy hafnium and zirconium precursors |
| TW200944535A (en) | 2008-03-20 | 2009-11-01 | Sigma Aldrich Co | Purification and preparation of phosphorus-containing compounds |
| TWI467045B (zh) | 2008-05-23 | 2015-01-01 | Sigma Aldrich Co | 高介電常數電介質薄膜與使用鈰基前驅物製造高介電常數電介質薄膜之方法 |
| WO2009143452A1 (en) | 2008-05-23 | 2009-11-26 | Sigma-Aldrich Co. | High-k dielectric films and methods of producing using cerium-based precursors |
| TW200949939A (en) | 2008-05-23 | 2009-12-01 | Sigma Aldrich Co | High-k dielectric films and methods of producing using titanium-based β -diketonate precursors |
| TW200949006A (en) | 2008-05-23 | 2009-12-01 | Sigma Aldrich Co | High-k dielectric films and methods of producing using titanium-based precursors |
| TW200951241A (en) | 2008-05-30 | 2009-12-16 | Sigma Aldrich Co | Methods of forming ruthenium-containing films by atomic layer deposition |
| TW201014925A (en) | 2008-06-20 | 2010-04-16 | Sigma Aldrich Co | Titanium pyrrolyl-based organometallic precursors and use thereof for preparing dielectric thin films |
| WO2011011299A1 (en) | 2009-07-21 | 2011-01-27 | Sigma-Aldrich Co. | Compositions and methods of use for forming titanium- containing thin films |
| WO2011017068A1 (en) | 2009-08-07 | 2011-02-10 | Sigma-Aldrich Co. | High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films |
| US20130052368A1 (en) | 2010-03-19 | 2013-02-28 | Sigma-Aldrich Co. Llc | Methods for preparing thin films by atomic layer deposition using hydrazines |
| JP5873494B2 (ja) | 2010-08-27 | 2016-03-01 | シグマ−アルドリッチ・カンパニー、エルエルシー | モリブデン（ｉｖ）アミド前駆体及び原子層堆積法におけるそれらの使用 |
| US8927748B2 (en) | 2011-08-12 | 2015-01-06 | Sigma-Aldrich Co. Llc | Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films |
| KR101532995B1 (ko) | 2012-01-26 | 2015-07-01 | 시그마-알드리치 컴퍼니., 엘엘씨 | 몰리브덴 알릴 착체 및 박막 증착에서의 이의 용도 |
-
2013
- 2013-01-18 KR KR1020147023665A patent/KR101532995B1/ko active Active
- 2013-01-18 JP JP2014554752A patent/JP6209168B2/ja active Active
- 2013-01-18 WO PCT/US2013/022260 patent/WO2013112383A1/en not_active Ceased
- 2013-01-18 CN CN201380010800.5A patent/CN104136448B/zh active Active
- 2013-01-18 SG SG11201404375PA patent/SG11201404375PA/en unknown
- 2013-01-18 US US14/374,289 patent/US9175023B2/en active Active
- 2013-01-18 EP EP13704845.0A patent/EP2807174B1/en not_active Not-in-force
- 2013-01-24 TW TW102102711A patent/TWI563112B/zh active
-
2014
- 2014-07-24 IL IL233786A patent/IL233786A/en active IP Right Grant
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