JP2015510272A5 - - Google Patents

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Publication number
JP2015510272A5
JP2015510272A5 JP2014556614A JP2014556614A JP2015510272A5 JP 2015510272 A5 JP2015510272 A5 JP 2015510272A5 JP 2014556614 A JP2014556614 A JP 2014556614A JP 2014556614 A JP2014556614 A JP 2014556614A JP 2015510272 A5 JP2015510272 A5 JP 2015510272A5
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JP
Japan
Prior art keywords
semiconductor device
sic semiconductor
conductivity type
resistance
drift layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2014556614A
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English (en)
Japanese (ja)
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JP2015510272A (ja
JP6335795B2 (ja
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Publication date
Priority claimed from US13/366,658 external-priority patent/US9349797B2/en
Application filed filed Critical
Priority claimed from PCT/US2013/024740 external-priority patent/WO2013119548A1/en
Publication of JP2015510272A publication Critical patent/JP2015510272A/ja
Publication of JP2015510272A5 publication Critical patent/JP2015510272A5/ja
Application granted granted Critical
Publication of JP6335795B2 publication Critical patent/JP6335795B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014556614A 2012-02-06 2013-02-05 負ベベルにより終端した、高い阻止電圧を有するＳｉＣ素子 Active JP6335795B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/366,658 2012-02-06
US13/366,658 US9349797B2 (en) 2011-05-16 2012-02-06 SiC devices with high blocking voltage terminated by a negative bevel
PCT/US2013/024740 WO2013119548A1 (en) 2012-02-06 2013-02-05 Sic devices with high blocking voltage terminated by a negative bevel

Publications (3)

Publication Number Publication Date
JP2015510272A JP2015510272A (ja) 2015-04-02
JP2015510272A5 true JP2015510272A5 (enrdf_load_stackoverflow) 2016-04-28
JP6335795B2 JP6335795B2 (ja) 2018-05-30

Family

ID=47780185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014556614A Active JP6335795B2 (ja) 2012-02-06 2013-02-05 負ベベルにより終端した、高い阻止電圧を有するＳｉＣ素子

Country Status (4)

Country Link
JP (1) JP6335795B2 (enrdf_load_stackoverflow)
CH (1) CH707901B1 (enrdf_load_stackoverflow)
DE (1) DE112013000866B4 (enrdf_load_stackoverflow)
WO (1) WO2013119548A1 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10103540B2 (en) * 2014-04-24 2018-10-16 General Electric Company Method and system for transient voltage suppression devices with active control
US9806157B2 (en) 2014-10-03 2017-10-31 General Electric Company Structure and method for transient voltage suppression devices with a two-region base
JP6483838B2 (ja) * 2015-08-21 2019-03-13 株式会社日立製作所 半導体基板、半導体基板の研削方法および半導体装置の製造方法
CN109830529A (zh) * 2019-01-31 2019-05-31 西安理工大学 一种提升开通速度的超高压碳化硅晶闸管及其制作方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5967795A (en) * 1995-08-30 1999-10-19 Asea Brown Boveri Ab SiC semiconductor device comprising a pn junction with a voltage absorbing edge
JP4011848B2 (ja) * 2000-12-12 2007-11-21 関西電力株式会社 高耐電圧半導体装置
SE525574C2 (sv) 2002-08-30 2005-03-15 Okmetic Oyj Lågdopat kiselkarbidsubstrat och användning därav i högspänningskomponenter
US6974720B2 (en) 2003-10-16 2005-12-13 Cree, Inc. Methods of forming power semiconductor devices using boule-grown silicon carbide drift layers and power semiconductor devices formed thereby
JP4585772B2 (ja) 2004-02-06 2010-11-24 関西電力株式会社 高耐圧ワイドギャップ半導体装置及び電力装置
US7345310B2 (en) * 2005-12-22 2008-03-18 Cree, Inc. Silicon carbide bipolar junction transistors having a silicon carbide passivation layer on the base region thereof
US7372087B2 (en) * 2006-06-01 2008-05-13 Northrop Grumman Corporation Semiconductor structure for use in a static induction transistor having improved gate-to-drain breakdown voltage
JP5140347B2 (ja) * 2007-08-29 2013-02-06 株式会社日立製作所 バイポーラトランジスタ及びその製造方法
JP5358926B2 (ja) * 2007-11-01 2013-12-04 富士電機株式会社 炭化珪素トレンチｍｏｓ型半導体装置
US8097919B2 (en) * 2008-08-11 2012-01-17 Cree, Inc. Mesa termination structures for power semiconductor devices including mesa step buffers
US7759186B2 (en) * 2008-09-03 2010-07-20 The United States Of America As Represented By The Secretary Of The Navy Method for fabricating junction termination extension with formation of photosensitive dopant mask to control doping profile and lateral width for high-voltage electronic devices
SE537101C2 (sv) 2010-03-30 2015-01-07 Fairchild Semiconductor Halvledarkomponent och förfarande för utformning av en struktur i ett målsubstrat för tillverkning av en halvledarkomponent

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