JP2015212827A5 - - Google Patents

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Publication number
JP2015212827A5
JP2015212827A5 JP2015111587A JP2015111587A JP2015212827A5 JP 2015212827 A5 JP2015212827 A5 JP 2015212827A5 JP 2015111587 A JP2015111587 A JP 2015111587A JP 2015111587 A JP2015111587 A JP 2015111587A JP 2015212827 A5 JP2015212827 A5 JP 2015212827A5
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temperature
liquid
gas
supply port
substrate
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JP2015111587A
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Japanese (ja)
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JP6119798B2 (ja
JP2015212827A (ja
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JP2015111587A 2005-03-23 2015-06-01 露光装置及び露光方法、並びにデバイス製造方法 Active JP6119798B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015111587A JP6119798B2 (ja) 2005-03-23 2015-06-01 露光装置及び露光方法、並びにデバイス製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005083756 2005-03-23
JP2005083756 2005-03-23
JP2015111587A JP6119798B2 (ja) 2005-03-23 2015-06-01 露光装置及び露光方法、並びにデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2014103745A Division JP5962704B2 (ja) 2005-03-23 2014-05-19 露光装置及び露光方法、並びにデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016107452A Division JP6330853B2 (ja) 2005-03-23 2016-05-30 露光装置及び露光方法、並びにデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2015212827A JP2015212827A (ja) 2015-11-26
JP2015212827A5 true JP2015212827A5 (enrdf_load_stackoverflow) 2016-07-14
JP6119798B2 JP6119798B2 (ja) 2017-04-26

Family

ID=37023780

Family Applications (7)

Application Number Title Priority Date Filing Date
JP2007509296A Expired - Fee Related JP5040646B2 (ja) 2005-03-23 2006-03-22 露光装置及び露光方法、並びにデバイス製造方法
JP2011273400A Pending JP2012064974A (ja) 2005-03-23 2011-12-14 露光装置及び露光方法、並びにデバイス製造方法
JP2014103745A Expired - Fee Related JP5962704B2 (ja) 2005-03-23 2014-05-19 露光装置及び露光方法、並びにデバイス製造方法
JP2015111587A Active JP6119798B2 (ja) 2005-03-23 2015-06-01 露光装置及び露光方法、並びにデバイス製造方法
JP2016107452A Expired - Fee Related JP6330853B2 (ja) 2005-03-23 2016-05-30 露光装置及び露光方法、並びにデバイス製造方法
JP2017127246A Ceased JP2017199020A (ja) 2005-03-23 2017-06-29 露光装置及び露光方法、並びにデバイス製造方法
JP2018188172A Ceased JP2018205781A (ja) 2005-03-23 2018-10-03 露光装置及び露光方法、並びにデバイス製造方法

Family Applications Before (3)

Application Number Title Priority Date Filing Date
JP2007509296A Expired - Fee Related JP5040646B2 (ja) 2005-03-23 2006-03-22 露光装置及び露光方法、並びにデバイス製造方法
JP2011273400A Pending JP2012064974A (ja) 2005-03-23 2011-12-14 露光装置及び露光方法、並びにデバイス製造方法
JP2014103745A Expired - Fee Related JP5962704B2 (ja) 2005-03-23 2014-05-19 露光装置及び露光方法、並びにデバイス製造方法

Family Applications After (3)

Application Number Title Priority Date Filing Date
JP2016107452A Expired - Fee Related JP6330853B2 (ja) 2005-03-23 2016-05-30 露光装置及び露光方法、並びにデバイス製造方法
JP2017127246A Ceased JP2017199020A (ja) 2005-03-23 2017-06-29 露光装置及び露光方法、並びにデバイス製造方法
JP2018188172A Ceased JP2018205781A (ja) 2005-03-23 2018-10-03 露光装置及び露光方法、並びにデバイス製造方法

Country Status (2)

Country Link
JP (7) JP5040646B2 (enrdf_load_stackoverflow)
WO (1) WO2006101120A1 (enrdf_load_stackoverflow)

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US7533068B2 (en) 2004-12-23 2009-05-12 D-Wave Systems, Inc. Analog processor comprising quantum devices
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US7652746B2 (en) * 2005-06-21 2010-01-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7468779B2 (en) * 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007142366A (ja) * 2005-10-18 2007-06-07 Canon Inc 露光装置及びデバイス製造方法
KR20180091963A (ko) * 2006-01-19 2018-08-16 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 패턴 형성 장치, 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법
US8144305B2 (en) * 2006-05-18 2012-03-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4758977B2 (ja) * 2006-12-07 2011-08-31 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ投影装置、デバイス製造方法
US9632425B2 (en) 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US20080137055A1 (en) * 2006-12-08 2008-06-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008147577A (ja) * 2006-12-13 2008-06-26 Canon Inc 露光装置及びデバイス製造方法
WO2008122128A1 (en) 2007-04-05 2008-10-16 D-Wave Systems Inc. Physical realizations of a universal adiabatic quantum computer
US9025126B2 (en) 2007-07-31 2015-05-05 Nikon Corporation Exposure apparatus adjusting method, exposure apparatus, and device fabricating method
EP2131241B1 (en) 2008-05-08 2019-07-31 ASML Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
EP2249205B1 (en) * 2008-05-08 2012-03-07 ASML Netherlands BV Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method
US8421993B2 (en) 2008-05-08 2013-04-16 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
JP5157637B2 (ja) * 2008-05-21 2013-03-06 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
JP5195022B2 (ja) * 2008-05-23 2013-05-08 株式会社ニコン 位置計測装置及び位置計測方法、パターン形成装置及びパターン形成方法、露光装置及び露光方法、並びにデバイス製造方法
EP2136250A1 (en) 2008-06-18 2009-12-23 ASML Netherlands B.V. Lithographic apparatus and method
NL2003225A1 (nl) 2008-07-25 2010-01-26 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
JP2010080861A (ja) * 2008-09-29 2010-04-08 Nikon Corp 転写装置及びデバイス製造方法
NL2004808A (en) 2009-06-30 2011-01-12 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2005207A (en) 2009-09-28 2011-03-29 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method.
NL2009139A (en) * 2011-08-05 2013-02-06 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
CN102621818B (zh) * 2012-04-10 2013-12-04 中国科学院光电技术研究所 一种用于光刻机的浸没控制装置
US10002107B2 (en) 2014-03-12 2018-06-19 D-Wave Systems Inc. Systems and methods for removing unwanted interactions in quantum devices
JP6384252B2 (ja) * 2014-10-07 2018-09-05 株式会社ニコン パターン露光装置
KR102288916B1 (ko) * 2014-12-19 2021-08-12 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치 및 디바이스 제조 방법
JP6384372B2 (ja) * 2015-03-20 2018-09-05 株式会社ニコン 湿式処理装置
WO2016169758A1 (en) 2015-04-21 2016-10-27 Asml Netherlands B.V. Lithographic apparatus
JP6707964B2 (ja) * 2016-04-12 2020-06-10 日本精工株式会社 位置決め装置及び回転機構
US11494683B2 (en) 2017-12-20 2022-11-08 D-Wave Systems Inc. Systems and methods for coupling qubits in a quantum processor

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JPH0821911A (ja) * 1994-07-05 1996-01-23 Toppan Printing Co Ltd 露光方法
JP2000021725A (ja) * 1998-06-30 2000-01-21 Seiko Epson Corp 半導体製造装置
JP2002083756A (ja) * 2000-09-06 2002-03-22 Canon Inc 基板温調装置
JP2003115451A (ja) * 2001-07-30 2003-04-18 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
JP4273421B2 (ja) * 2002-08-29 2009-06-03 株式会社ニコン 温度制御方法及び装置、並びに露光方法及び装置
SG121818A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR20050085235A (ko) * 2002-12-10 2005-08-29 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4608876B2 (ja) * 2002-12-10 2011-01-12 株式会社ニコン 露光装置及びデバイス製造方法
WO2004086470A1 (ja) * 2003-03-25 2004-10-07 Nikon Corporation 露光装置及びデバイス製造方法
JP4307130B2 (ja) * 2003-04-08 2009-08-05 キヤノン株式会社 露光装置
KR20110104084A (ko) * 2003-04-09 2011-09-21 가부시키가이샤 니콘 액침 리소그래피 유체 제어 시스템
WO2004112108A1 (ja) * 2003-06-13 2004-12-23 Nikon Corporation 露光方法、基板ステージ、露光装置、及びデバイス製造方法
JP3862678B2 (ja) * 2003-06-27 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
EP1498778A1 (en) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7738074B2 (en) * 2003-07-16 2010-06-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI424464B (zh) * 2003-08-29 2014-01-21 尼康股份有限公司 A liquid recovery device, an exposure device, an exposure method, and an element manufacturing method
JP5167572B2 (ja) * 2004-02-04 2013-03-21 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US7304715B2 (en) * 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI436403B (zh) * 2004-10-26 2014-05-01 尼康股份有限公司 A cleaning method, a substrate processing method, an exposure apparatus, and an element manufacturing method
JP5040646B2 (ja) * 2005-03-23 2012-10-03 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法

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