JP2015106565A5 - - Google Patents

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JP2015106565A5
JP2015106565A5 JP2014243188A JP2014243188A JP2015106565A5 JP 2015106565 A5 JP2015106565 A5 JP 2015106565A5 JP 2014243188 A JP2014243188 A JP 2014243188A JP 2014243188 A JP2014243188 A JP 2014243188A JP 2015106565 A5 JP2015106565 A5 JP 2015106565A5
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JP2015106565A (ja
JP6294216B2 (ja
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Priority claimed from EP13195289.7A external-priority patent/EP2879156A1/en
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JP2014243188A 2013-12-02 2014-12-01 電子検出が改善された荷電粒子顕微鏡 Active JP6294216B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP13195289.7A EP2879156A1 (en) 2013-12-02 2013-12-02 Charged-particle microscopy with enhanced electron detection
EP13195289.7 2013-12-02

Publications (3)

Publication Number Publication Date
JP2015106565A JP2015106565A (ja) 2015-06-08
JP2015106565A5 true JP2015106565A5 (enExample) 2017-09-28
JP6294216B2 JP6294216B2 (ja) 2018-03-14

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JP2014243188A Active JP6294216B2 (ja) 2013-12-02 2014-12-01 電子検出が改善された荷電粒子顕微鏡

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US (1) US9208993B2 (enExample)
EP (2) EP2879156A1 (enExample)
JP (1) JP6294216B2 (enExample)
CN (1) CN104681382B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3040714A1 (en) 2014-12-30 2016-07-06 Fei Company Charged Particle Microscope with improved spectroscopic functionality
EP3106862B1 (en) 2015-06-18 2019-01-16 FEI Company Method of ptychographic imaging
US10122946B2 (en) 2015-11-11 2018-11-06 Fei Company Method for detecting particulate radiation
US10685759B2 (en) * 2017-01-16 2020-06-16 Fei Company Statistical analysis in X-ray imaging
JP6796616B2 (ja) * 2018-05-24 2020-12-09 日本電子株式会社 荷電粒子線装置および画像取得方法
JP7072457B2 (ja) * 2018-07-12 2022-05-20 株式会社堀場製作所 試料分析装置、電子顕微鏡、及び集光ミラーユニット
EP3726206B1 (en) * 2019-03-26 2022-11-02 FEI Company Methods and systems for inclusion analysis
US10928336B1 (en) * 2019-07-29 2021-02-23 Applied Materials Israel Ltd. X-ray based evaluation of a status of a structure of a substrate

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6627886B1 (en) * 1999-05-14 2003-09-30 Applied Materials, Inc. Secondary electron spectroscopy method and system
US6784425B1 (en) * 2001-06-29 2004-08-31 Kla-Tencor Technologies Corporation Energy filter multiplexing
JP2004214060A (ja) * 2003-01-06 2004-07-29 Hitachi High-Technologies Corp 走査電子顕微鏡及びそれを用いた試料観察方法
JP2005134181A (ja) * 2003-10-29 2005-05-26 Jeol Ltd データ処理方法及び分析装置
CN1553466A (zh) 2003-12-19 2004-12-08 �й���ѧԺ�Ϻ���ѧ���ܻ�е�о��� 大功率复合功能石英玻璃管脉冲氙灯
US7601045B2 (en) 2004-07-16 2009-10-13 Tangle, Inc. Therapeutic hand toys
WO2006109564A1 (ja) * 2005-04-11 2006-10-19 Shimadzu Corporation 走査ビーム装置のデータ処理方法
JP2007220317A (ja) * 2006-02-14 2007-08-30 Jeol Ltd 電子ビーム検査方法および装置
TWI435361B (zh) * 2007-04-16 2014-04-21 Ebara Corp 電子射線裝置及使用該電子射線裝置之試料觀察方法
WO2009079195A1 (en) * 2007-12-17 2009-06-25 Alis Corporation Ion beam imaging
JP5065516B2 (ja) * 2010-08-04 2012-11-07 エフ イー アイ カンパニ 薄い電子検出器における後方散乱の減少
CZ2011154A3 (cs) * 2011-03-23 2012-06-06 Tescan A.S. Zpusob analýzy materiálu fokusovaným elektronovým svazkem s využitím charakteristického rentgenového zárení a zpetne odražených elektronu a zarízení k jeho provádení
EP2648208B1 (en) * 2012-04-05 2017-08-09 Fei Company Charged-particle microscope providing depth-resolved imagery
US9041793B2 (en) * 2012-05-17 2015-05-26 Fei Company Scanning microscope having an adaptive scan

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