CN104681382B - 具有增强的电子检测的带电粒子显微术 - Google Patents

具有增强的电子检测的带电粒子显微术 Download PDF

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Publication number
CN104681382B
CN104681382B CN201410718566.8A CN201410718566A CN104681382B CN 104681382 B CN104681382 B CN 104681382B CN 201410718566 A CN201410718566 A CN 201410718566A CN 104681382 B CN104681382 B CN 104681382B
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sample
electronics
produce
image
detector
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CN104681382A (zh
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A.A.S.斯鲁伊特曼恩
E.G.T.博世
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FEI Co
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/418—Imaging electron microscope
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2441—Semiconductor detectors, e.g. diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2804—Scattered primary beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Image Processing (AREA)
CN201410718566.8A 2013-12-02 2014-12-02 具有增强的电子检测的带电粒子显微术 Active CN104681382B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP13195289.7A EP2879156A1 (en) 2013-12-02 2013-12-02 Charged-particle microscopy with enhanced electron detection
EP13195289.7 2013-12-02

Publications (2)

Publication Number Publication Date
CN104681382A CN104681382A (zh) 2015-06-03
CN104681382B true CN104681382B (zh) 2017-07-07

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Country Link
US (1) US9208993B2 (enExample)
EP (2) EP2879156A1 (enExample)
JP (1) JP6294216B2 (enExample)
CN (1) CN104681382B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3040714A1 (en) 2014-12-30 2016-07-06 Fei Company Charged Particle Microscope with improved spectroscopic functionality
EP3106862B1 (en) 2015-06-18 2019-01-16 FEI Company Method of ptychographic imaging
US10122946B2 (en) 2015-11-11 2018-11-06 Fei Company Method for detecting particulate radiation
US10685759B2 (en) * 2017-01-16 2020-06-16 Fei Company Statistical analysis in X-ray imaging
JP6796616B2 (ja) * 2018-05-24 2020-12-09 日本電子株式会社 荷電粒子線装置および画像取得方法
JP7072457B2 (ja) * 2018-07-12 2022-05-20 株式会社堀場製作所 試料分析装置、電子顕微鏡、及び集光ミラーユニット
EP3726206B1 (en) * 2019-03-26 2022-11-02 FEI Company Methods and systems for inclusion analysis
US10928336B1 (en) * 2019-07-29 2021-02-23 Applied Materials Israel Ltd. X-ray based evaluation of a status of a structure of a substrate

Citations (4)

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WO2000070646A1 (en) * 1999-05-14 2000-11-23 Applied Materials, Inc. Secondary electron spectroscopy method and system
WO2003003402A1 (en) * 2001-06-29 2003-01-09 Kla-Tencor Corporation Energy filter multiplexing
JP2005134181A (ja) * 2003-10-29 2005-05-26 Jeol Ltd データ処理方法及び分析装置
WO2009079195A1 (en) * 2007-12-17 2009-06-25 Alis Corporation Ion beam imaging

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JP2004214060A (ja) * 2003-01-06 2004-07-29 Hitachi High-Technologies Corp 走査電子顕微鏡及びそれを用いた試料観察方法
CN1553466A (zh) 2003-12-19 2004-12-08 �й���ѧԺ�Ϻ���ѧ���ܻ�е�о��� 大功率复合功能石英玻璃管脉冲氙灯
US7601045B2 (en) 2004-07-16 2009-10-13 Tangle, Inc. Therapeutic hand toys
WO2006109564A1 (ja) * 2005-04-11 2006-10-19 Shimadzu Corporation 走査ビーム装置のデータ処理方法
JP2007220317A (ja) * 2006-02-14 2007-08-30 Jeol Ltd 電子ビーム検査方法および装置
TWI435361B (zh) * 2007-04-16 2014-04-21 Ebara Corp 電子射線裝置及使用該電子射線裝置之試料觀察方法
JP5065516B2 (ja) * 2010-08-04 2012-11-07 エフ イー アイ カンパニ 薄い電子検出器における後方散乱の減少
CZ303228B6 (cs) * 2011-03-23 2012-06-06 Tescan A.S. Zpusob analýzy materiálu fokusovaným elektronovým svazkem s využitím charakteristického rentgenového zárení a zpetne odražených elektronu a zarízení k jeho provádení
JP5995773B2 (ja) * 2012-04-05 2016-09-21 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 検査方法及び荷電粒子顕微鏡
US9041793B2 (en) * 2012-05-17 2015-05-26 Fei Company Scanning microscope having an adaptive scan

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000070646A1 (en) * 1999-05-14 2000-11-23 Applied Materials, Inc. Secondary electron spectroscopy method and system
WO2003003402A1 (en) * 2001-06-29 2003-01-09 Kla-Tencor Corporation Energy filter multiplexing
JP2005134181A (ja) * 2003-10-29 2005-05-26 Jeol Ltd データ処理方法及び分析装置
WO2009079195A1 (en) * 2007-12-17 2009-06-25 Alis Corporation Ion beam imaging

Also Published As

Publication number Publication date
EP2879156A1 (en) 2015-06-03
JP6294216B2 (ja) 2018-03-14
EP2879157A1 (en) 2015-06-03
US9208993B2 (en) 2015-12-08
JP2015106565A (ja) 2015-06-08
CN104681382A (zh) 2015-06-03
US20150155131A1 (en) 2015-06-04
EP2879157B1 (en) 2016-01-13

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