JP2015091935A5 - - Google Patents
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- Publication number
- JP2015091935A5 JP2015091935A5 JP2014197477A JP2014197477A JP2015091935A5 JP 2015091935 A5 JP2015091935 A5 JP 2015091935A5 JP 2014197477 A JP2014197477 A JP 2014197477A JP 2014197477 A JP2014197477 A JP 2014197477A JP 2015091935 A5 JP2015091935 A5 JP 2015091935A5
- Authority
- JP
- Japan
- Prior art keywords
- optionally substituted
- hydrogen
- group
- hydrogen substituent
- substituent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 18
- 239000001257 hydrogen Substances 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 125000001072 heteroaryl group Chemical group 0.000 claims description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- 229910052717 sulfur Inorganic materials 0.000 claims description 7
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 150000001450 anions Chemical class 0.000 claims description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 4
- 229910052740 iodine Chemical group 0.000 claims description 4
- 239000011630 iodine Chemical group 0.000 claims description 4
- 239000011593 sulfur Substances 0.000 claims description 4
- 125000004450 alkenylene group Chemical group 0.000 claims description 2
- 125000004419 alkynylene group Chemical group 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000004404 heteroalkyl group Chemical group 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 125000000547 substituted alkyl group Chemical group 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 3
- 125000005842 heteroatom Chemical group 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 150000002390 heteroarenes Chemical class 0.000 description 2
- 230000000269 nucleophilic effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 2
- 229940124530 sulfonamide Drugs 0.000 description 2
- -1 sulfonamide anion Chemical class 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 125000006668 (C1-C30) aliphatic hydrocarbon group Chemical group 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 150000005690 diesters Chemical group 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/040,587 | 2013-09-27 | ||
| US14/040,587 US10179778B2 (en) | 2013-09-27 | 2013-09-27 | Substituted aryl onium materials |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015091935A JP2015091935A (ja) | 2015-05-14 |
| JP2015091935A5 true JP2015091935A5 (enExample) | 2019-03-14 |
| JP6598445B2 JP6598445B2 (ja) | 2019-10-30 |
Family
ID=52740497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014197477A Active JP6598445B2 (ja) | 2013-09-27 | 2014-09-26 | 置換アリールオニウム材料 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10179778B2 (enExample) |
| JP (1) | JP6598445B2 (enExample) |
| KR (1) | KR102294584B1 (enExample) |
| CN (1) | CN104570602B (enExample) |
| TW (1) | TWI671283B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9304394B2 (en) * | 2013-09-27 | 2016-04-05 | Rohm And Haas Electronic Materials, Llc | Aryl acetate onium materials |
| US9606434B2 (en) * | 2014-10-10 | 2017-03-28 | Rohm And Haas Electronic Materials, Llc | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method |
| US9551930B2 (en) | 2014-10-10 | 2017-01-24 | Rohm And Haas Electronic Materials Llc | Photoresist composition and associated method of forming an electronic device |
| KR101944290B1 (ko) | 2014-12-05 | 2019-04-17 | 도요 고세이 고교 가부시키가이샤 | 설폰산 유도체, 그것을 사용한 광산발생제, 레지스트 조성물 및 디바이스의 제조 방법 |
| JP7204343B2 (ja) | 2017-06-06 | 2023-01-16 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP7556709B2 (ja) * | 2019-07-01 | 2024-09-26 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7618398B2 (ja) * | 2019-07-01 | 2025-01-21 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7556708B2 (ja) * | 2019-07-01 | 2024-09-26 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP2021008455A (ja) * | 2019-07-01 | 2021-01-28 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7627551B2 (ja) * | 2019-07-01 | 2025-02-06 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| US12140866B2 (en) | 2020-12-31 | 2024-11-12 | Rohm And Haas Electronic Materials Llc | Photoacid generators, photoresist compositions, and pattern formation methods |
| WO2025197401A1 (ja) * | 2024-03-22 | 2025-09-25 | Jsr株式会社 | 感放射線性組成物及びレジストパターン形成方法 |
| WO2025234401A1 (ja) * | 2024-05-08 | 2025-11-13 | Jsr株式会社 | 感放射線性組成物及びレジストパターン形成方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4287355A (en) | 1979-10-26 | 1981-09-01 | Sandoz, Inc. | Carboxyl-(phenyl or tolyl)-sulfonium salts |
| JPH11279213A (ja) * | 1998-03-30 | 1999-10-12 | Nippon Soda Co Ltd | オニウム塩化合物およびそれを含有する光硬化性組成物 |
| US7214465B2 (en) * | 2002-01-10 | 2007-05-08 | Fujifilm Corporation | Positive photosensitive composition |
| JP4083053B2 (ja) * | 2003-03-31 | 2008-04-30 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4399192B2 (ja) * | 2003-06-03 | 2010-01-13 | 富士フイルム株式会社 | 感光性組成物 |
| JP2005274647A (ja) * | 2004-03-23 | 2005-10-06 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP4866605B2 (ja) * | 2005-12-28 | 2012-02-01 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物 |
| JP2007293250A (ja) * | 2006-03-27 | 2007-11-08 | Fujifilm Corp | ポジ型レジスト組成物およびそれを用いたパターン形成方法 |
| WO2008056795A1 (en) * | 2006-11-10 | 2008-05-15 | Jsr Corporation | Polymerizable sulfonic acid onium salt and resin |
| TWI471298B (zh) | 2009-05-28 | 2015-02-01 | Sumitomo Chemical Co | 鹽及含有該鹽之光阻組成物 |
| JP5618877B2 (ja) | 2010-07-15 | 2014-11-05 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、新規な化合物及び酸発生剤 |
| JP5449276B2 (ja) * | 2011-09-02 | 2014-03-19 | 富士フイルム株式会社 | 感光性組成物に用いられる化合物 |
| TWI545118B (zh) | 2012-09-15 | 2016-08-11 | 羅門哈斯電子材料有限公司 | 酸產生劑化合物及包含該化合物之光阻劑 |
| JP6144164B2 (ja) | 2012-09-15 | 2017-06-07 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | オニウム化合物およびその合成方法 |
| US9304394B2 (en) * | 2013-09-27 | 2016-04-05 | Rohm And Haas Electronic Materials, Llc | Aryl acetate onium materials |
-
2013
- 2013-09-27 US US14/040,587 patent/US10179778B2/en active Active
-
2014
- 2014-09-26 TW TW103133462A patent/TWI671283B/zh active
- 2014-09-26 JP JP2014197477A patent/JP6598445B2/ja active Active
- 2014-09-26 KR KR1020140129438A patent/KR102294584B1/ko active Active
- 2014-09-29 CN CN201410755977.4A patent/CN104570602B/zh active Active
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