JP2015076491A5 - - Google Patents

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Publication number
JP2015076491A5
JP2015076491A5 JP2013211430A JP2013211430A JP2015076491A5 JP 2015076491 A5 JP2015076491 A5 JP 2015076491A5 JP 2013211430 A JP2013211430 A JP 2013211430A JP 2013211430 A JP2013211430 A JP 2013211430A JP 2015076491 A5 JP2015076491 A5 JP 2015076491A5
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JP
Japan
Prior art keywords
substrate
light
scope
mark
optical member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013211430A
Other languages
English (en)
Japanese (ja)
Other versions
JP6228420B2 (ja
JP2015076491A (ja
Filing date
Publication date
Priority claimed from JP2013211430A external-priority patent/JP6228420B2/ja
Priority to JP2013211430A priority Critical patent/JP6228420B2/ja
Application filed filed Critical
Priority to TW103126742A priority patent/TWI557517B/zh
Priority to CN201410506206.1A priority patent/CN104516214B/zh
Priority to KR1020140130019A priority patent/KR101783514B1/ko
Publication of JP2015076491A publication Critical patent/JP2015076491A/ja
Priority to KR1020170015116A priority patent/KR101828739B1/ko
Publication of JP2015076491A5 publication Critical patent/JP2015076491A5/ja
Publication of JP6228420B2 publication Critical patent/JP6228420B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013211430A 2013-10-08 2013-10-08 検出装置、リソグラフィ装置、および物品の製造方法 Active JP6228420B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2013211430A JP6228420B2 (ja) 2013-10-08 2013-10-08 検出装置、リソグラフィ装置、および物品の製造方法
TW103126742A TWI557517B (zh) 2013-10-08 2014-08-05 A detection device, a lithographic apparatus, and a manufacturing method of the device
CN201410506206.1A CN104516214B (zh) 2013-10-08 2014-09-28 检测装置、光刻装置以及物品的制造方法
KR1020140130019A KR101783514B1 (ko) 2013-10-08 2014-09-29 검출 장치, 리소그래피 장치 및 물품의 제조 방법
KR1020170015116A KR101828739B1 (ko) 2013-10-08 2017-02-02 검출 장치, 리소그래피 장치 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013211430A JP6228420B2 (ja) 2013-10-08 2013-10-08 検出装置、リソグラフィ装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015076491A JP2015076491A (ja) 2015-04-20
JP2015076491A5 true JP2015076491A5 (enExample) 2017-06-29
JP6228420B2 JP6228420B2 (ja) 2017-11-08

Family

ID=52791741

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013211430A Active JP6228420B2 (ja) 2013-10-08 2013-10-08 検出装置、リソグラフィ装置、および物品の製造方法

Country Status (4)

Country Link
JP (1) JP6228420B2 (enExample)
KR (2) KR101783514B1 (enExample)
CN (1) CN104516214B (enExample)
TW (1) TWI557517B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6926596B2 (ja) * 2017-03-31 2021-08-25 ウシオ電機株式会社 露光装置および露光方法
JP7143526B2 (ja) * 2018-12-20 2022-09-28 エーエスエムエル ホールディング エヌ．ブイ． 並列アライメントマークを同時に獲得するための装置及びその方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0721586B2 (ja) * 1985-09-30 1995-03-08 株式会社ニコン 像形成光学装置
JPS62262426A (ja) * 1986-05-09 1987-11-14 Canon Inc 露光装置
US5148214A (en) * 1986-05-09 1992-09-15 Canon Kabushiki Kaisha Alignment and exposure apparatus
JP3074579B2 (ja) * 1992-01-31 2000-08-07 キヤノン株式会社 位置ずれ補正方法
KR100464854B1 (ko) * 2002-06-26 2005-01-06 삼성전자주식회사 반도체 기판의 정렬 방법 및 정렬 장치
US7388663B2 (en) * 2004-10-28 2008-06-17 Asml Netherlands B.V. Optical position assessment apparatus and method
WO2007094407A1 (ja) * 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
KR101763546B1 (ko) * 2006-08-31 2017-07-31 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
CN101526750B (zh) * 2009-01-13 2011-06-29 上海微电子装备有限公司 用于光刻设备的对准系统及应用其的光刻设备
CN101950132A (zh) * 2010-08-17 2011-01-19 中国科学院光电技术研究所 纳米光刻掩模硅片间隙测量及调平装置
KR101215094B1 (ko) * 2010-10-25 2012-12-24 삼성전자주식회사 피측정체 정렬장치
CN102141738B (zh) * 2011-04-02 2012-09-19 中国科学院光电技术研究所 一种用于投影光刻纳米量级自动调焦系统
US8842294B2 (en) * 2011-06-21 2014-09-23 Canon Kabushiki Kaisha Position detection apparatus, imprint apparatus, and position detection method

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