JP2015076491A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2015076491A5 JP2015076491A5 JP2013211430A JP2013211430A JP2015076491A5 JP 2015076491 A5 JP2015076491 A5 JP 2015076491A5 JP 2013211430 A JP2013211430 A JP 2013211430A JP 2013211430 A JP2013211430 A JP 2013211430A JP 2015076491 A5 JP2015076491 A5 JP 2015076491A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- light
- scope
- mark
- optical member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 35
- 230000003287 optical Effects 0.000 claims description 28
- 238000001514 detection method Methods 0.000 claims description 22
- 238000003384 imaging method Methods 0.000 claims 2
- 238000001459 lithography Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000001678 irradiating Effects 0.000 description 1
Description
上記目的を達成するために、本発明の一側面としての検出装置は、基板に設けられた第1マークおよび前記第1マークとは異なる第2マークを検出する検出装置であって、反射面を有する光学部材と、第1の光を前記基板に照射し、前記基板で反射された前記第1の光を受光する第1スコープと、第2の光を前記反射面で反射させて前記基板に照射し、前記基板で反射され前記反射面で反射された前記第2の光を受光する第2スコープと、前記第1スコープを用いて前記第1マークを検出すると共に前記第2スコープを用いて前記第2マークを検出するために、前記光学部材と前記第1スコープとの前記基板に沿った方向の位置関係を変更する変更手段と、を有することを特徴とする。 In order to achieve the above object, a detection device according to one aspect of the present invention is a detection device that detects a first mark provided on a substrate and a second mark different from the first mark, and includes a reflective surface. an optical member having, a first light irradiating before Symbol substrate, a first scope for receiving the first light reflected by the substrate, the substrate of the second optical is reflected by the reflecting surface A second scope that receives the second light reflected by the substrate and reflected by the reflecting surface, detects the first mark using the first scope, and uses the second scope. to detect the second mark Te, and having a changing means for changing the direction of the positional relationship along the substrate with the previous SL optical member and the first scope, the.
Claims (21)
反射面を有する光学部材と、
第1の光を前記基板に照射し、前記基板で反射された前記第1の光を受光する第1スコープと、
第2の光を前記反射面で反射させて前記基板に照射し、前記基板で反射され前記反射面で反射された前記第2の光を受光する第2スコープと、
前記第1スコープを用いて前記第1マークを検出すると共に前記第2スコープを用いて前記第2マークを検出するために、前記光学部材と前記第1スコープとの前記基板に沿った方向の位置関係を変更する変更手段と、を有することを特徴とする検出装置。 A detection device for detecting a first mark provided on a substrate and a second mark different from the first mark,
An optical member having a reflective surface;
A first scope of the first light irradiated before Symbol substrate, for receiving the first light reflected by the substrate,
A second scope that reflects the second light on the reflecting surface and irradiates the substrate, receives the second light reflected on the substrate and reflected on the reflecting surface;
To detect the second mark by using said second scope and detects the first mark with the first scope, before Symbol optical member and a direction of along the substrate between the first scope And a changing unit that changes the positional relationship.
反射面を有する光学部材と、
第1対物レンズを有する第1光学系と、前記光学部材を通して前記基板に照射され且つ前記基板で反射され再び前記光学部材を通った第1の光を用いて前記第1光学系が形成するマークの像を検出する第1撮像素子と、を有する第1スコープと、
第2対物レンズを有する第2光学系と、前記反射面で反射させて前記基板に照射され且つ前記基板で反射され再び前記反射面で反射された第2の光を用いて前記第2光学系が形成するマークの像を検出する第2撮像素子と、を有する第2スコープと、
前記第1スコープを用いて前記第1マークを検出するとともに前記第2スコープを用いて前記第2マークを検出するために、前記光学部材と前記第1スコープとの前記基板に沿った方向の位置関係を変更する変更手段と、を有することを特徴とする検出装置。 A detection device for detecting a first mark provided on a substrate and a second mark different from the first mark,
An optical member having a reflective surface;
A mark formed by the first optical system using a first optical system having a first objective lens, and first light that is irradiated on the substrate through the optical member, reflected by the substrate, and again passes through the optical member. A first scope having a first imaging device for detecting the image of
A second optical system having a second objective lens, and the second optical system using a second light reflected by the reflecting surface and irradiated on the substrate, reflected by the substrate and reflected again by the reflecting surface. A second imaging device for detecting an image of a mark formed by the second scope,
To detect the second mark by using said second scope and detects the first mark with the first scope, before Symbol optical member and a direction of along the substrate between the first scope And a changing unit that changes the positional relationship.
前記反射面には、入射した光の偏光特性に応じて当該光を反射または透過させる偏光ビームスプリッタ膜が設けられている、ことを特徴とする請求項10に記載の検出装置。 The first light and the second light have different polarization characteristics,
The detection apparatus according to claim 10 , wherein a polarization beam splitter film that reflects or transmits the light according to a polarization characteristic of incident light is provided on the reflection surface.
前記反射面には、入射した光の波長帯域に応じて当該光を反射または透過させるダイクロイック膜が設けられている、ことを特徴とする請求項10に記載の検出装置。 The first light is light in a first wavelength band, and the second light is light in a second wavelength band different from the first wavelength band,
The detection apparatus according to claim 10 , wherein a dichroic film that reflects or transmits the light according to a wavelength band of incident light is provided on the reflection surface.
前記第2スコープは、前記第1スコープの光軸と前記第2スコープの光軸との間の角度が90度未満になるように配置されている、ことを特徴とする請求項1乃至16のうちいずれか1項に記載の検出装置。 The first scope is arranged so that its optical axis is perpendicular to the surface of the substrate,
The said 2nd scope is arrange | positioned so that the angle between the optical axis of the said 1st scope and the optical axis of the said 2nd scope may be less than 90 degree | times, The 1st thru | or 16 characterized by the above-mentioned. The detection apparatus of any one of them.
前記基板に設けられた前記第1マークと前記第2マークとを検出する請求項1乃至19のうちいずれか1項に記載の検出装置を含み、該検出装置による前記第1マークと前記第2マークとの検出結果に応じて前記基板の位置合わせを行うことを特徴とするリソグラフィ装置。 A lithographic apparatus for forming a pattern on a substrate,
Look including a detection device according to any one of claims 1 to 19 for detecting and the second mark and the first mark provided on the substrate, the said first mark by the detection device the 2. A lithography apparatus, comprising: aligning the substrate according to a detection result with two marks .
前記形成工程で前記パターンを形成された前記基板を加工する加工工程と、を有し、
前記加工工程で加工した前記基板の少なくとも一部から物品を製造することを特徴とする物品の製造方法。 Forming a pattern on a substrate using the lithographic apparatus according to claim 20 ;
A processing step of processing the substrate on which the pattern is formed in the forming step,
A method for manufacturing an article, wherein the article is manufactured from at least a part of the substrate processed in the processing step.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013211430A JP6228420B2 (en) | 2013-10-08 | 2013-10-08 | Detection apparatus, lithographic apparatus, and article manufacturing method |
TW103126742A TWI557517B (en) | 2013-10-08 | 2014-08-05 | A detection device, a lithographic apparatus, and a manufacturing method of the device |
CN201410506206.1A CN104516214B (en) | 2013-10-08 | 2014-09-28 | Detection apparatus, lithography apparatus, and method of manufacturing article |
KR1020140130019A KR101783514B1 (en) | 2013-10-08 | 2014-09-29 | Detection apparatus, lithography apparatus, and method of manufacturing article |
KR1020170015116A KR101828739B1 (en) | 2013-10-08 | 2017-02-02 | Detection apparatus, lithography apparatus, and method of manufacturing article |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013211430A JP6228420B2 (en) | 2013-10-08 | 2013-10-08 | Detection apparatus, lithographic apparatus, and article manufacturing method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015076491A JP2015076491A (en) | 2015-04-20 |
JP2015076491A5 true JP2015076491A5 (en) | 2017-06-29 |
JP6228420B2 JP6228420B2 (en) | 2017-11-08 |
Family
ID=52791741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013211430A Active JP6228420B2 (en) | 2013-10-08 | 2013-10-08 | Detection apparatus, lithographic apparatus, and article manufacturing method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6228420B2 (en) |
KR (2) | KR101783514B1 (en) |
CN (1) | CN104516214B (en) |
TW (1) | TWI557517B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6926596B2 (en) * | 2017-03-31 | 2021-08-25 | ウシオ電機株式会社 | Exposure equipment and exposure method |
CN113196180B (en) * | 2018-12-20 | 2024-08-20 | Asml控股股份有限公司 | Apparatus and method for simultaneously acquiring parallel alignment marks |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0721586B2 (en) * | 1985-09-30 | 1995-03-08 | 株式会社ニコン | Image forming optics |
US5148214A (en) * | 1986-05-09 | 1992-09-15 | Canon Kabushiki Kaisha | Alignment and exposure apparatus |
JPS62262426A (en) * | 1986-05-09 | 1987-11-14 | Canon Inc | Exposure device |
JP3074579B2 (en) * | 1992-01-31 | 2000-08-07 | キヤノン株式会社 | Position shift correction method |
KR100464854B1 (en) * | 2002-06-26 | 2005-01-06 | 삼성전자주식회사 | Method for aligning of wafer and apparatus for same |
US7388663B2 (en) * | 2004-10-28 | 2008-06-17 | Asml Netherlands B.V. | Optical position assessment apparatus and method |
EP1986222A4 (en) * | 2006-02-16 | 2010-09-01 | Nikon Corp | Exposure apparatus, exposing method, and device manufacturing method |
KR101634893B1 (en) * | 2006-08-31 | 2016-06-29 | 가부시키가이샤 니콘 | Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
CN101526750B (en) * | 2009-01-13 | 2011-06-29 | 上海微电子装备有限公司 | Alignment system for photolithographic device and photolithographic device applying same |
CN101950132A (en) * | 2010-08-17 | 2011-01-19 | 中国科学院光电技术研究所 | Nano photoetching mask silicon wafer gap measuring and leveling device |
KR101215094B1 (en) * | 2010-10-25 | 2012-12-24 | 삼성전자주식회사 | Work piece alignment device |
CN102141738B (en) * | 2011-04-02 | 2012-09-19 | 中国科学院光电技术研究所 | Nano-scale automatic focusing system for projection lithography |
JP5713961B2 (en) * | 2011-06-21 | 2015-05-07 | キヤノン株式会社 | Position detection apparatus, imprint apparatus, and position detection method |
-
2013
- 2013-10-08 JP JP2013211430A patent/JP6228420B2/en active Active
-
2014
- 2014-08-05 TW TW103126742A patent/TWI557517B/en active
- 2014-09-28 CN CN201410506206.1A patent/CN104516214B/en active Active
- 2014-09-29 KR KR1020140130019A patent/KR101783514B1/en active IP Right Grant
-
2017
- 2017-02-02 KR KR1020170015116A patent/KR101828739B1/en active IP Right Grant
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6712349B2 (en) | Alignment system | |
JP5607392B2 (en) | Optical interference measurement device | |
SG169987A1 (en) | Plane position detecting apparatus, exposure apparatus and device manufacturing method | |
JP2014517505A5 (en) | ||
JP2012530908A5 (en) | ||
TWI498548B (en) | Pattern inspection apparatus | |
JP2012089852A5 (en) | ||
JP2017142370A5 (en) | ||
TW200951646A (en) | Surface position detection device, exposure device, surface position detection method and device production method | |
US8772688B2 (en) | Autofocus device including line image forming unit and rotation unit that rotates line image | |
TWI452262B (en) | Interferometer system for simultaneous measurement of linear displacement and tilt angle | |
JP2017020873A (en) | Measurement device for measuring shape of measurement object | |
JP2015232562A5 (en) | ||
JP2018166039A5 (en) | ||
JP2013105936A5 (en) | ||
JP2010121960A (en) | Measuring device and method of measuring subject | |
JP2016002381A5 (en) | ||
JP6030471B2 (en) | Shape measuring device | |
JP2015076491A5 (en) | ||
JP6273127B2 (en) | Measuring device and article manufacturing method | |
KR102048741B1 (en) | Detection apparatus, measurement apparatus, lithography apparatus, and method of manufacturing article | |
JP2011237732A5 (en) | ||
JP2016211894A5 (en) | Detection apparatus, measurement apparatus, lithography apparatus, article manufacturing method, and detection method | |
US9976850B2 (en) | Optical surface roughness measurement | |
US11221565B2 (en) | Level sensor and lithographic apparatus |