TWI557517B - A detection device, a lithographic apparatus, and a manufacturing method of the device - Google Patents

A detection device, a lithographic apparatus, and a manufacturing method of the device Download PDF

Info

Publication number
TWI557517B
TWI557517B TW103126742A TW103126742A TWI557517B TW I557517 B TWI557517 B TW I557517B TW 103126742 A TW103126742 A TW 103126742A TW 103126742 A TW103126742 A TW 103126742A TW I557517 B TWI557517 B TW I557517B
Authority
TW
Taiwan
Prior art keywords
light
substrate
optical member
indicator
range display
Prior art date
Application number
TW103126742A
Other languages
Chinese (zh)
Other versions
TW201514634A (en
Inventor
Akio Akamatsu
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW201514634A publication Critical patent/TW201514634A/en
Application granted granted Critical
Publication of TWI557517B publication Critical patent/TWI557517B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274Photolithographic processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

檢測裝置、光刻裝置、及裝置之製造方法 Detection device, lithography device, and method of manufacturing the device

本發明,係有關於對於設置在基板之複數個標示進行檢測的檢測裝置、具有其之光刻裝置、及物品之製造方法。 The present invention relates to a detecting device for detecting a plurality of marks provided on a substrate, a lithographic device having the same, and a method of manufacturing the article.

作為在半導體裝置等之製造中所使用的光刻裝置,例如,存在:一邊藉使基板作移動而使狹縫光在基板上作掃描,一邊將遮罩的圖案轉印於基板上之曝光裝置。在如此之曝光裝置中,係要求:高準確度將遮罩的圖案轉印於形成在基板之複數個射擊區域的各者。為此,需要:對於相對於各射擊區域而設之複數個對準標示的各者之位置進行檢測,取得指示各射擊區域的位置和形狀之資訊。 As a lithographic apparatus used for manufacturing a semiconductor device or the like, for example, there is an exposure apparatus that transfers a pattern of a mask onto a substrate while scanning the substrate by moving the slit light by moving the substrate. . In such an exposure apparatus, it is required to transfer the pattern of the mask to each of a plurality of shot regions formed on the substrate with high accuracy. To this end, it is necessary to detect the position of each of the plurality of alignment marks provided for each shot area, and obtain information indicating the position and shape of each shot area.

在日本發明專利公開2010-268005號公報中,係提議一種曝光裝置,其係使對於1個對準標示進行檢測之OFF-AXIS方式的檢測部配列複數個。在記載於日本發明專利公開2010-268005號公報中之曝光裝置中,係可藉複數個檢測部而同時檢測複數個對準標示的位置。 In Japanese Laid-Open Patent Publication No. 2010-268005, an exposure apparatus is proposed which arranges a plurality of detection units of an OFF-AXIS method for detecting one alignment mark. In the exposure apparatus disclosed in Japanese Laid-Open Patent Publication No. 2010-268005, a plurality of detecting portions can simultaneously detect the positions of a plurality of alignment marks.

在記載於日本發明專利公開2010-268005號公報中之 曝光裝置中,係存在以下問題:對準標示的間隔窄於檢測部的寬度時,無法使檢測部彼此接近。亦即,複數個檢測部會干涉,故可藉複數個檢測部而檢測之對準標示的間隔會受限制。 It is described in Japanese Patent Laid-Open Publication No. 2010-268005 In the exposure apparatus, there is a problem that the detection portions cannot be brought close to each other when the interval of the alignment marks is narrower than the width of the detection portion. That is, since a plurality of detecting sections interfere, the interval of the alignment marks detectable by the plurality of detecting sections is limited.

本發明,係例如,提供有利於檢測設在基板的複數個標示的技術。 The present invention is, for example, a technique that facilitates detecting a plurality of indicia provided on a substrate.

為了達成上述目的,作為本發明的一方面之檢測裝置,係對於設置在基板之複數個標示進行檢測,特徵在於:包含:前述複數個標示之中對於第1標示照射光,藉所反射之光而對於前述第1標示進行檢測之第1範圍顯示器;前述複數個標示之中對於與前述第1標示不同的第2標示照射光,藉所反射之光而對於前述第2標示進行檢測之第2範圍顯示器;使從前述第1範圍顯示器所射出之光以入射於前述基板的方式而透射之透射部;以及具有將從前述第2範圍顯示器所射出之光朝向前述基板而反射之面的光學構材;對於入射於前述光學構材的來自前述第1範圍顯示器之光的入射位置與在前述光學構材之前述面被反射的來自前述第2範圍顯示器之光的反射位置之相對位置作改變,使得從前述第1範圍顯示器所射出之光透射於前述透射部而作照射之前述基板上的位置與從前述第2範圍顯示器所射出之光在前述面被反射而作照射之前述基板上的位置之間的距離改變。 In order to achieve the above object, a detecting device according to an aspect of the present invention detects a plurality of marks provided on a substrate, and includes: a light that is reflected by the first indicator light among the plurality of marks And a first range display for detecting the first indicator; wherein the second indicator light different from the first indicator among the plurality of labels is detected by the reflected light and the second indicator is detected a range display; a transmissive portion that transmits light emitted from the first range display to be incident on the substrate; and an optical structure that has a surface that reflects light emitted from the second range display toward the substrate a change in a relative position of an incident position of light from the first range display incident on the optical member and a reflection position of light from the second range display reflected on the surface of the optical member, a position on the substrate on which the light emitted from the first range display is transmitted through the transmissive portion and irradiated The second display range of the emitted light is reflected on the surface as a distance between a position of irradiation of the substrate changes.

本發明的進一步之目的或其他方面,以下,會因參見附圖所說明之較佳實施形態而變明確化。 Further objects and other aspects of the invention will be apparent from the following description of the preferred embodiments.

1‧‧‧曝光裝置 1‧‧‧Exposure device

10‧‧‧遮罩台 10‧‧‧ masking table

11‧‧‧遮罩 11‧‧‧ mask

20‧‧‧基板台 20‧‧‧ substrate table

21‧‧‧基板 21‧‧‧Substrate

22‧‧‧標示 22‧‧‧ marked

22a,b‧‧‧標示 22a, b‧‧‧ marked

22e~l‧‧‧標示 22e~l‧‧‧ marked

23‧‧‧射擊區域 23‧‧‧ Shooting area

23a,b‧‧‧射擊區域 23a, b‧‧‧ shooting area

24a,b‧‧‧間隔 24a, b‧‧‧ interval

24c~e‧‧‧間隔 24c~e‧‧‧ interval

24g‧‧‧間隔 24g‧‧‧ interval

30‧‧‧投影光學系統 30‧‧‧Projection optical system

40‧‧‧照明光學系統 40‧‧‧Lighting optical system

100‧‧‧檢測系統 100‧‧‧Detection system

110‧‧‧檢測系統 110‧‧‧Detection system

200‧‧‧驅動部 200‧‧‧ Drive Department

300‧‧‧檢測部 300‧‧‧Detection Department

300a,b‧‧‧檢測部 300a, b‧‧‧Detection Department

301‧‧‧發光部 301‧‧‧Lighting Department

302‧‧‧光學系統 302‧‧‧Optical system

303‧‧‧分束器 303‧‧‧beam splitter

304‧‧‧孔徑光欄 304‧‧‧ aperture diaphragm

305‧‧‧接物鏡 305‧‧‧ Sight objective

306‧‧‧中繼透鏡 306‧‧‧Relay lens

307‧‧‧攝像元件 307‧‧‧Photographic components

310‧‧‧範圍顯示器 310‧‧‧ range display

311‧‧‧接物鏡 311‧‧‧ Sight objective

312‧‧‧中繼透鏡 312‧‧‧Relay lens

313‧‧‧鏡 313‧‧ Mirror

314‧‧‧正像透鏡 314‧‧‧ Vision lens

315‧‧‧正像透鏡 315‧‧‧ Vision lens

316‧‧‧分束器 316‧‧‧beam splitter

317‧‧‧攝像元件 317‧‧‧Photographic components

320a,b‧‧‧範圍顯示器 320a, b‧‧‧ range display

400‧‧‧檢測部 400‧‧‧Detection Department

500‧‧‧檢測部 500‧‧‧Detection Department

500a‧‧‧檢測部 500a‧‧‧Detection Department

503‧‧‧分束器 503‧‧‧beam splitter

505‧‧‧接物鏡 505‧‧‧ Sightpiece

506‧‧‧中繼透鏡 506‧‧‧Relay lens

507‧‧‧攝像元件 507‧‧‧Photographic components

510a‧‧‧第1範圍顯示器 510a‧‧‧1st range display

510b‧‧‧第2範圍顯示器 510b‧‧‧2nd range display

520‧‧‧範圍顯示器 520‧‧‧ range display

520a~d‧‧‧範圍顯示器 520a~d‧‧‧ range display

523‧‧‧分束器 523‧‧‧beam splitter

525‧‧‧接物鏡 525‧‧‧ Sight objective

526‧‧‧中繼透鏡 526‧‧‧Relay lens

527‧‧‧攝像元件 527‧‧‧Photographic components

550‧‧‧光學構材 550‧‧‧Optical members

550a~c‧‧‧面 550a~c‧‧‧ face

550d‧‧‧透射部 550d‧‧‧Transmission Department

560‧‧‧稜鏡 560‧‧‧稜鏡

560a,b‧‧‧面 560a, b‧‧‧

580‧‧‧光學構材 580‧‧‧Optical members

580a~d‧‧‧面 580a~d‧‧‧ face

600‧‧‧檢測部 600‧‧‧Detection Department

700‧‧‧檢測部 700‧‧‧Detection Department

圖1,係繪示第1實施形態的曝光裝置之圖。 Fig. 1 is a view showing an exposure apparatus according to a first embodiment.

圖2,係從Y方向觀看歷來的檢測系統時之圖。 Fig. 2 is a view showing a conventional detection system viewed from the Y direction.

圖3,係繪示歷來的檢測部之構成例的圖。 FIG. 3 is a view showing a configuration example of a conventional detecting unit.

圖4,係供以說明複數個檢測部之配置的圖。 Fig. 4 is a view for explaining the arrangement of a plurality of detecting sections.

圖5,係繪示對於在X方向上相鄰的2個標示進行檢測時之2個歷來的檢測部之配置的圖。 Fig. 5 is a view showing the arrangement of two conventional detecting units when detecting two adjacent marks in the X direction.

圖6,係繪示為了對於在X方向上相鄰的2個標示同時進行檢測而構成之歷來的檢測部之圖。 Fig. 6 is a view showing a conventional detecting unit configured to simultaneously detect two marks adjacent in the X direction.

圖7,係繪示第1實施形態的檢測部之構成的圖。 Fig. 7 is a view showing the configuration of a detecting unit according to the first embodiment.

圖8,係從Y方向觀看第1實施形態的檢測系統時之圖。 Fig. 8 is a view showing the detection system of the first embodiment viewed from the Y direction.

圖9,係繪示第1實施形態的檢測系統中的複數個檢測部之配置例的圖。 FIG. 9 is a view showing an arrangement example of a plurality of detecting units in the detecting system according to the first embodiment.

圖10,係繪示第1實施形態的檢測系統中的複數個檢測部之配置例的圖。 FIG. 10 is a view showing an arrangement example of a plurality of detecting units in the detecting system according to the first embodiment.

圖11,係從Y方向觀看第1實施形態的檢測系統時之圖。 Fig. 11 is a view showing the detection system of the first embodiment viewed from the Y direction.

圖12,係繪示第2實施形態的檢測部之構成的圖。 Fig. 12 is a view showing the configuration of a detecting unit in the second embodiment.

圖13,係繪示第2實施形態的檢測部之構成的圖。 Fig. 13 is a view showing the configuration of a detecting unit in the second embodiment.

圖14,係從Y方向觀看第3實施形態的檢測部時之 圖。 Fig. 14 is a view of the detecting unit of the third embodiment when viewed from the Y direction. Figure.

圖15,係從Z方向觀看第3實施形態的檢測部時之圖。 Fig. 15 is a view showing a state in which the detecting unit of the third embodiment is viewed from the Z direction.

圖16,係從Y方向觀看第3實施形態的檢測部時之圖。 Fig. 16 is a view showing a state in which the detecting unit of the third embodiment is viewed from the Y direction.

圖17,係從Z方向觀看第3實施形態的檢測部時之圖。 Fig. 17 is a view showing the detection unit of the third embodiment viewed from the Z direction.

以下,參照附圖說明有關於本發明之適合的實施之形態。另外,於各圖中,對於相同的構材或要素係附加相同的參考符號,並省略重複之說明。此外,在以下的實施形態中,係說明關於採用曝光裝置作為光刻裝置的例子,但作為光刻裝置,係例如,亦可包含壓印裝置和描繪裝置等。 Hereinafter, embodiments suitable for the present invention will be described with reference to the drawings. In the drawings, the same reference numerals are attached to the same members or elements, and the description thereof will not be repeated. In the following embodiments, an example in which an exposure device is used as the lithographic apparatus will be described. However, the lithographic apparatus may include, for example, an imprint apparatus and a drawing apparatus.

<第1實施形態> <First embodiment>

針對本發明的第1實施形態之曝光裝置1,一邊參見圖1一邊作說明。圖1,係繪示本發明的第1實施形態之曝光裝置1的圖。第1實施形態的曝光裝置1,係藉狹縫光而對於基板21進行掃描曝光之步進掃描方式的掃描型曝光裝置。然後,曝光裝置1,係可包含:照明光學系統40、遮罩台10、投影光學系統30、基板台20、控制部50。此外,曝光裝置1,係可包含:對於相對於形成在基 板21之複數個射擊區域的各者而設之複數個對準標示(以下,標示)進行檢測之離軸(OFF-AXIS)方式的檢測系統100。於此,控制部50,係具有例如CPU和記憶體等,對於曝光處理進行控制(對於曝光裝置1的各部分進行控制)。 The exposure apparatus 1 according to the first embodiment of the present invention will be described with reference to Fig. 1 . Fig. 1 is a view showing an exposure apparatus 1 according to a first embodiment of the present invention. The exposure apparatus 1 of the first embodiment is a step-and-scan type scanning exposure apparatus that scans and exposes the substrate 21 by slit light. The exposure device 1 may include an illumination optical system 40, a mask stage 10, a projection optical system 30, a substrate stage 20, and a control unit 50. In addition, the exposure device 1 may include: for forming relative to the base An off-axis (OFF-AXIS) detection system 100 that detects a plurality of alignment marks (hereinafter, labeled) of each of a plurality of shot regions of the board 21 is provided. Here, the control unit 50 has, for example, a CPU, a memory, and the like, and controls exposure processing (control of each part of the exposure apparatus 1).

照明光學系統40,係藉含於其中的遮光片等之遮光構材,將從光源(不圖示)所射出之光,例如,整成具有在X方向上長的帶狀或圓弧狀的形狀之狹縫光,以該狹縫光對於遮罩11的一部分進行照明。遮罩11及基板21,係分別藉遮罩台10及基板台20而保持,隔著投影光學系統30而分別配置於光學大致共軛之位置(投影光學系統30的物體面及像面)。投影光學系統30,係具有既定的投影倍率(例如1/2倍和1/4倍),將形成於遮罩11之圖案藉狹縫光而投影至基板上。對於投影了遮罩11的圖案之基板上的區域(狹縫光所照射之區域)在以下係稱作照射區域。然後,遮罩台10及基板台20,係構成為可移動於與投影光學系統30的光軸方向(Z方向)正交之方向(在第1實施形態係Y方向),一邊互相同步一邊被以對應於投影光學系統30的投影倍率之速度比而作相對掃描。藉此,可使照射區域在基板上掃描於Y方向,而將形成於遮罩11之圖案轉印至基板上的射擊區域。然後,可一邊使基板台20移動一邊針對基板上之複數個射擊區域的各者依序重複如此之掃描曝光,以完成在1個基板21之曝光處理。 The illumination optical system 40 is a light-shielding member such as a light-shielding sheet contained therein, and the light emitted from a light source (not shown) is, for example, formed into a strip shape or an arc shape that is long in the X direction. The slit light of the shape illuminates a part of the mask 11 with the slit light. The mask 11 and the substrate 21 are held by the mask stage 10 and the substrate stage 20, respectively, and are disposed at positions substantially optically conjugate (object surface and image plane of the projection optical system 30) via the projection optical system 30. The projection optical system 30 has a predetermined projection magnification (for example, 1/2 times and 1/4 times), and the pattern formed on the mask 11 is projected onto the substrate by slit light. The area on the substrate on which the pattern of the mask 11 is projected (the area irradiated by the slit light) is hereinafter referred to as an irradiation area. Then, the mask stage 10 and the substrate stage 20 are configured to be movable in a direction orthogonal to the optical axis direction (Z direction) of the projection optical system 30 (in the first embodiment, the Y direction), and are synchronized with each other. The relative scanning is performed at a speed ratio corresponding to the projection magnification of the projection optical system 30. Thereby, the irradiation region can be scanned on the substrate in the Y direction, and the pattern formed on the mask 11 can be transferred to the shot region on the substrate. Then, such scanning exposure can be sequentially repeated for each of a plurality of shot regions on the substrate while moving the substrate stage 20 to complete the exposure processing on one substrate 21.

此外,曝光裝置1,係亦可構成為包含:TTL(Through The Lens)方式的對準範圍顯示器(不圖示)、和對於基板21的表面之Z方向之位置進行檢測的面位置檢測部(不圖示)等。TTL方式的對準範圍顯示器,係可將形成於遮罩之對準標示與形成於基板之對準標示透過投影光學系統而重疊作觀察,從而對於遮罩的圖案與各射擊區域之相對位置進行計測。 Further, the exposure apparatus 1 may be configured to include a TTL (Through The Lens) type alignment range display (not shown) and a surface position detecting unit that detects the position of the surface of the substrate 21 in the Z direction ( Not shown) and so on. The TTL type alignment range display can overlap the alignment mark formed on the mask and the alignment mark formed on the substrate through the projection optical system, thereby observing the relative position of the mask pattern and each shot area. Measurement.

於此,針對離軸方式的檢測系統100,一邊與歷來的檢測系統110比較一邊作說明。首先,說明有關於歷來的檢測系統110。圖2,係從Y方向觀看歷來的檢測系統110時之圖。歷來的檢測系統110,係例如,可包含:對於基板上的標示分別進行檢測之複數個檢測部300(檢測裝置)、及對於複數個檢測部300個別進行驅動之驅動部200。複數個檢測部300係沿著X方向而配置,驅動部200係可對於複數個檢測部300沿著X方向而個別進行驅動。然後,歷來的檢測系統110,係依複數個標示的X方向(第2方向)之配置而配置複數個檢測部300,使得可一邊使基板21移動於Y方向(第1方向),一邊對於相對於各射擊區域而設之各標示的位置進行檢測。在以下,說明有關於歷來的檢測部300之構成例、及歷來的複數個檢測部300之配置。 Here, the off-axis detection system 100 will be described in comparison with the conventional detection system 110. First, a description will be given of the conventional detection system 110. FIG. 2 is a view of the conventional detection system 110 viewed from the Y direction. The conventional detection system 110 may include, for example, a plurality of detection units 300 (detection devices) that individually detect the marks on the substrate, and a drive unit 200 that individually drives the plurality of detection units 300. The plurality of detecting units 300 are arranged along the X direction, and the driving unit 200 is individually driven in the X direction with respect to the plurality of detecting units 300. Then, the conventional detection system 110 arranges a plurality of detection units 300 in accordance with the arrangement of the plurality of marked X directions (second directions) so that the substrate 21 can be moved in the Y direction (first direction) while being relatively The position of each mark provided in each shooting area is detected. Hereinafter, a configuration example of the conventional detecting unit 300 and an arrangement of a plurality of conventional detecting units 300 will be described.

圖3,係繪示歷來的檢測部300之構成例的圖。檢測部300,係可對於基板上的標示22照射光,藉所反射之光而對於標示22進行檢測。歷來的檢測部300,係例 如,可包含1個具有發光部301、光學系統302、分束器303、孔徑光欄304、接物鏡305、中繼透鏡306、攝像元件307之範圍顯示器310。發光部301,係例如包含從LED等之光源和將從光源所射出之光作導光之光纖等,將光作射出。從發光部301所射出之光,係透過光學系統302而入射於分束器303,在分束器303被反射。在分束器303所反射之光,係透過接物鏡305,而對於基板上的標示22進行科勒照明。被科勒照明之基板上的標示22之影像,係透過接物鏡305、分束器303、及中繼透鏡306而成像於攝像元件307(例如CCD感測器)。藉對於如此成像在攝像元件307的標示22之影像在控制部50中進行影像處理,可檢測出該標示22的位置。 FIG. 3 is a view showing a configuration example of the conventional detecting unit 300. The detecting unit 300 can illuminate the indicator 22 on the substrate and detect the indicator 22 by the reflected light. The conventional detection unit 300, a series of examples For example, one range display 310 having the light-emitting portion 301, the optical system 302, the beam splitter 303, the aperture stop 304, the objective lens 305, the relay lens 306, and the imaging element 307 may be included. The light-emitting unit 301 includes, for example, an optical fiber that emits light from a light source such as an LED and light emitted from the light source, and emits light. The light emitted from the light-emitting unit 301 is incident on the beam splitter 303 through the optical system 302, and is reflected by the beam splitter 303. The light reflected by the beam splitter 303 is transmitted through the objective lens 305, and Kohler illumination is performed on the mark 22 on the substrate. The image of the mark 22 on the substrate illuminated by Kohler is imaged by the objective lens 305, the beam splitter 303, and the relay lens 306 on the imaging element 307 (for example, a CCD sensor). By performing image processing on the image of the indicator 22 of the imaging element 307 thus imaged in the control unit 50, the position of the marker 22 can be detected.

圖4,係供以說明複數個檢測部300之配置的圖。在基板21,係複數個標示22被相對於形成在基板上之各射擊區域23而設。在示於圖4之例子中,係相對於各射擊區域23設有6個標示22。藉如此設置複數個標示22,可高準確度對於各射擊區域23的位置和變形(包含倍率成分和偏移成分、桶型成分、枕型成分等)進行計測,可高準確度將遮罩11的圖案轉印至各射擊區域23。此外,複數個檢測部300,係依複數個標示22的X方向之配列,而沿著X方向作配置。藉如此配置複數個檢測部300,可對於沿著X方向而配列之複數個標示22以複數個範圍顯示器同時進行檢測。然後,如圖4所示沿著X方向而配列之複數個標示22的列於Y方向具有6列之情況下,藉 基板台20使基板21於Y方向6階段作步進移動,使得可對於設置在基板21之複數個標示22的全部進行檢測。 FIG. 4 is a diagram for explaining the arrangement of a plurality of detecting sections 300. In the substrate 21, a plurality of marks 22 are provided with respect to the respective shot regions 23 formed on the substrate. In the example shown in Fig. 4, six indicia 22 are provided with respect to each shot region 23. By setting a plurality of marks 22 in this way, it is possible to measure the position and deformation (including the magnification component and the offset component, the barrel component, the pillow component, and the like) of each of the shooting regions 23 with high accuracy, and the mask 11 can be highly accurate. The pattern is transferred to each shot area 23. Further, the plurality of detecting units 300 are arranged along the X direction in accordance with the arrangement of the plurality of marks 22 in the X direction. By arranging the plurality of detecting units 300 in this manner, it is possible to simultaneously detect a plurality of ranges of displays 22 for a plurality of ranges 22 arranged along the X direction. Then, as shown in FIG. 4, the column of the plurality of marks 22 arranged along the X direction has six columns in the Y direction, and The substrate stage 20 moves the substrate 21 stepwise in the Y direction so that all of the plurality of marks 22 provided on the substrate 21 can be detected.

於此,著眼於在配置於在X方向上相鄰的2個射擊區域23之間的2個標示22。例如,著眼於配置在射擊區域23a與射擊區域23b之間的標示22a與標示22b。在圖4中,標示22a及標示22b,係在X方向以間隔24a而配置。如此配置之2個標示22的X方向之間隔,係可依射擊區域23的大小,而在例如1mm~40mm的範圍按基板21而改變。此時,配置於在X方向上相鄰的2個射擊區域23之間的2個標示22之X方向的間隔窄於檢測部300的X方向之寬度時,可能產生無法使範圍顯示器彼此接近這個問題。亦即,可能變成無法對於該2個標示22使用2個檢測部300而同時進行計測。檢測部300彼此的間隔,係例如,可能因在各檢測部300的範圍顯示器310中所含之接物鏡305的直徑而受到約束。 Here, attention is paid to the two marks 22 disposed between the two shot regions 23 adjacent in the X direction. For example, attention is paid to the indication 22a and the indication 22b disposed between the shooting area 23a and the shooting area 23b. In Fig. 4, the marks 22a and 22b are arranged at intervals 24a in the X direction. The interval between the two directions 22 arranged in the X direction can be changed by the substrate 21 in the range of, for example, 1 mm to 40 mm depending on the size of the shot region 23. At this time, when the interval between the two directions 22 in the X direction between the two shot regions 23 adjacent in the X direction is narrower than the width in the X direction of the detecting portion 300, the range displays may not be brought close to each other. problem. In other words, it may become impossible to perform measurement simultaneously using the two detecting units 300 for the two markers 22. The interval between the detecting portions 300 may be restricted by, for example, the diameter of the objective lens 305 included in the range display 310 of each detecting unit 300.

圖5,係繪示對於在X方向上相鄰的2個標示22進行檢測時之2個歷來的檢測部300a及300b之配置的圖。在示於圖5之各檢測部300的範圍顯示器310,係將發光部與光學系統的圖示作省略。例如,在各檢測部300的範圍顯示器310方面NA為0.1、焦點距離為20mm之情況下,孔徑光欄303之尺寸係成為4mm。然後,此情況下,接物鏡305的直徑,係例如因對於接物鏡305進行控制之構件而需要2mm的餘裕時,成為對於孔徑光欄303之尺寸加算2mm的餘裕之6mm。亦即,對於在X方向上相鄰 的2個標示22藉2個檢測部300而進行檢測之情況下,若2個標示22的間隔窄於是接物鏡305的直徑之6mm則無法使2個檢測部300接近。因此,可能變成無法對於2個標示22使用2個檢測部300而同時進行計測。於此,檢測部300的X方向之寬度,係因鏡筒等而寬於接物鏡305的直徑,故實際上,係即使2個標示22的間隔為寬於接物鏡305的直徑之間隔,仍存在變得難以使2個範圍顯示器接近之情形。 FIG. 5 is a view showing the arrangement of two conventional detecting units 300a and 300b when two indicia 22 adjacent in the X direction are detected. In the range display 310 of each detecting unit 300 shown in Fig. 5, the illustration of the light emitting unit and the optical system is omitted. For example, when the NA of the range display 310 of each detection unit 300 is 0.1 and the focal length is 20 mm, the size of the aperture stop 303 is 4 mm. Then, in this case, when the diameter of the objective lens 305 is required to be 2 mm, for example, a member for controlling the objective lens 305, a margin of 2 mm is added to the size of the aperture stop 303. That is, for adjacent in the X direction When the two indications 22 are detected by the two detection units 300, if the interval between the two indications 22 is narrower than the diameter of the objective lens 305 by 6 mm, the two detection units 300 cannot be approached. Therefore, it may become impossible to perform measurement simultaneously using the two detection units 300 for the two markers 22. Here, the width of the detecting unit 300 in the X direction is wider than the diameter of the objective lens 305 by the lens barrel or the like. Therefore, even if the interval between the two marks 22 is wider than the diameter of the objective lens 305, There are cases where it becomes difficult to bring the two range displays close.

為了解決上述的問題,存在以可使用1個接物鏡311、1個中繼透鏡312、2個範圍顯示器320a及320b而對於2個標示22a及22b同時進行檢測之方式而構成的檢測部400。圖6,係繪示以對於在X方向上相鄰的2個標示22a及22b同時進行檢測的方式而構成之歷來的檢測部400之圖。在檢測部400,係相對於1個接物鏡311與1個中繼透鏡312,而具備2個包含鏡313、正像透鏡314及315、分束器316、攝像元件317之範圍顯示器320。在示於圖6之各範圍顯示器(320a及320b),係如圖3所示具有發光部與光學系統,從發光部所射出之光透過光學系統而入射於分束器316,但在圖6係將發光部與光學系統的圖示作省略。然後,在檢測部400,係使各範圍顯示器(320a及320b)相對於接物鏡311及中繼透鏡312而相對且個別移動於X方向。藉此,可對於以窄於示於圖5之方法的間隔而配置之2個標示22a及22b進行檢測。然而,在如此構成之檢測部400,係構成為亦能以寬的間 隔(例如40mm)對於配列在X方向之2個標示22同時進行檢測之情況下,可能變成需要增加接物鏡311的直徑。亦即,示於圖6之檢測部400,係隨著接物鏡311的直徑增加,不僅X方向之尺寸變大,Y方向之尺寸亦可能變大。 In order to solve the above problem, there is a detection unit 400 configured to simultaneously detect two markers 22a and 22b using one of the objective lenses 311, one relay lens 312, and two range displays 320a and 320b. FIG. 6 is a view showing a conventional detecting unit 400 configured to simultaneously detect two indicia 22a and 22b adjacent in the X direction. The detecting unit 400 includes two range displays 320 including a mirror 313, aligning lenses 314 and 315, a beam splitter 316, and an imaging element 317 with respect to one of the objective lenses 311 and one relay lens 312. The display (320a and 320b) of each range shown in Fig. 6 has a light-emitting portion and an optical system as shown in Fig. 3. The light emitted from the light-emitting portion is incident on the beam splitter 316 through the optical system, but in Fig. 6 The illustration of the light-emitting portion and the optical system is omitted. Then, in the detecting unit 400, each of the range displays (320a and 320b) is relatively moved and moved in the X direction with respect to the objective lens 311 and the relay lens 312. Thereby, it is possible to detect the two marks 22a and 22b arranged at intervals smaller than the method shown in Fig. 5. However, the detecting unit 400 configured as described above is configured to have a wide space. When the partition (for example, 40 mm) is simultaneously detected by the two markers 22 arranged in the X direction, it may become necessary to increase the diameter of the objective lens 311. That is, the detecting unit 400 shown in Fig. 6 increases in size in the X direction as the diameter of the objective lens 311 increases, and the size in the Y direction may become larger.

所以,在第1實施形態的檢測系統100,其中所含之檢測部500,係構成為具有2個範圍顯示器510a、510b,該等範圍顯示器係對於標示22照射光,藉所反射之光而對於該標示22的位置進行檢測。然後,第1實施形態的檢測部500,係構成為:即使在配置於在X方向上相鄰的2個射擊區域23之間的2個標示22之間隔窄於範圍顯示器的X方向之寬度的情況下,仍可對於該2個標示同時進行檢測。此外,第1實施形態的檢測部500,係可構成為:亦可藉增加X方向之尺寸(後述的光學構材550的X方向之尺寸),而以寬的間隔(例如40mm)對於配列在X方向之2個標示22同時進行檢測。亦即,在檢測部500,係構成為能以寬的間隔對於配列在X方向之2個標示22同時進行檢測時,可減低Y方向之尺寸變大。接著,說明有關於第1實施形態的檢測部500之構成。 Therefore, in the detection system 100 according to the first embodiment, the detection unit 500 included in the detection system 100 is configured to have two range displays 510a and 510b for illuminating the indicator 22 with the reflected light. The position of the marker 22 is detected. The detecting unit 500 according to the first embodiment is configured such that the interval between the two marks 22 disposed between the two shooting regions 23 adjacent in the X direction is narrower than the width of the X display in the range display. In this case, the two markers can still be detected simultaneously. Further, the detecting unit 500 according to the first embodiment may be configured to be arranged at a wide interval (for example, 40 mm) by increasing the size in the X direction (the dimension of the optical member 550 in the X direction described later). Two markers 22 in the X direction are simultaneously detected. In other words, when the detection unit 500 is configured to simultaneously detect the two markers 22 arranged in the X direction at a wide interval, the size in the Y direction can be reduced. Next, the configuration of the detecting unit 500 according to the first embodiment will be described.

圖7,係繪示第1實施形態的檢測部500之構成的圖。第1實施形態的檢測部500,係例如,包含2個範圍顯示器(第1範圍顯示器510a及第2範圍顯示器510b)與光學構材550。第1範圍顯示器510a及第2範圍顯示器510b分別,係如同示於圖3之範圍顯示器 310,例如,可包含:發光部、光學系統、分束器503、孔徑光欄、接物鏡505、中繼透鏡506、攝像元件507。此外,光學構材550,係具有:使從第1範圍顯示器510a所射出之光以入射於基板21的方式而透射之透射部550d、及將從第2範圍顯示器510b所射出之光朝向基板21而反射之面550a。於此,在圖7中,係將第1範圍顯示器510a及第2範圍顯示器510b的各者之發光部、光學系統及孔徑光欄的圖示作省略。 Fig. 7 is a view showing the configuration of the detecting unit 500 according to the first embodiment. The detecting unit 500 according to the first embodiment includes, for example, two range displays (the first range display 510a and the second range display 510b) and the optical member 550. The first range display 510a and the second range display 510b are respectively as shown in the range of FIG. 310 may include, for example, a light emitting unit, an optical system, a beam splitter 503, an aperture stop, an objective lens 505, a relay lens 506, and an imaging element 507. Further, the optical member 550 has a transmissive portion 550d that transmits light emitted from the first range display 510a so as to be incident on the substrate 21, and light emitted from the second range display 510b toward the substrate 21. And the reflecting surface 550a. Here, in FIG. 7, the illustration of the light-emitting portion, the optical system, and the aperture diaphragm of each of the first range display 510a and the second range display 510b is omitted.

第1範圍顯示器510a,係如同示於圖3之範圍顯示器310,將從發光部所射出之光,透過光學系統、分束器503、接物鏡505而射出,對於基板上的第1標示22a進行科勒照明。此時,從第1範圍顯示器510a所射出之光,係透射光學構材550(面550b及面550c)而入射於基板21,對於第1標示22a進行科勒照明。此外,第2範圍顯示器510b,係如同第1範圍顯示器510a,將從發光部所射出之光透過光學系統、分束器503、接物鏡505而射出,對於基板上的第2標示22b進行科勒照明。此時,從第2範圍顯示器510b所射出之光,係反射光學構材之面550a而入射於基板21,對於第2標示22b進行科勒照明。於此,第1實施形態的第1範圍顯示器510a與第2範圍顯示器510b,係例如,能以波長和偏光特性成為彼此相同的方式,採用彼此相同的構成之範圍顯示器。此外,第1範圍顯示器510a,係以其光軸成為垂直於基板21的表面之方式而配置較佳,第2範圍顯示器510b, 係以其光軸與第1範圍顯示器510a的光軸之間的角度成為不足90度的方式而配置較佳。 The first range display 510a is as shown in the range display 310 of FIG. 3, and the light emitted from the light-emitting portion is transmitted through the optical system, the beam splitter 503, and the objective lens 505, and is performed on the first indicator 22a on the substrate. Kohler lighting. At this time, the light emitted from the first range display 510a is transmitted through the optical member 550 (surface 550b and surface 550c) and incident on the substrate 21, and Kohler illumination is performed on the first indicator 22a. Further, the second range display 510b is like the first range display 510a, and the light emitted from the light-emitting portion is transmitted through the optical system, the beam splitter 503, and the objective lens 505, and Kohler illumination is performed on the second indicator 22b on the substrate. . At this time, the light emitted from the second range display 510b is incident on the substrate 21 by reflecting the surface 550a of the optical member, and Kohler illumination is performed on the second indicator 22b. In the first range display 510a and the second range display 510b of the first embodiment, for example, the range display having the same configuration as each other can be used in such a manner that the wavelength and the polarization characteristics are the same. Further, the first range display 510a is preferably disposed such that its optical axis is perpendicular to the surface of the substrate 21, and the second range display 510b is It is preferable that the angle between the optical axis and the optical axis of the first range display 510a is less than 90 degrees.

光學構材550(透射部550d),係以可使例如玻璃等光透射之材料而製作,可包含;以成為平行於基板21的表面之方式而分別構成的上側(Z方向側)之面550b與下側(-Z方向側)之面550c(平行平板)。藉如此構成上側之面550b與下側之面550c,可將以成為垂直於基板21的表面之方式而從第1範圍顯示器510a所射出之光的主光線作成在透射光學構材550後仍相對於基板21的表面而垂直。此外,光學構材550,係包含將從第2範圍顯示器510b所射出之光朝向基板21而反射之面550a。光學構材550之面550a,係例如,以藉該面550a而反射之光的主光線成為垂直於基板21的表面之方式而構成。於此,在光學構材550之面550b及550c,係為了使光的透射率提升,設置防止光的反射之抗反射膜較佳,在光學構材550之面550a,係為了使光的反射率提升,設置將光反射之反射膜較佳。 The optical member 550 (transmission portion 550d) is formed of a material that can transmit light such as glass, and may include an upper surface (Z-direction side) 550b that is formed so as to be parallel to the surface of the substrate 21. The surface 550c (parallel plate) with the lower side (-Z direction side). By forming the upper surface 550b and the lower surface 550c in this way, the chief ray of the light emitted from the first range display 510a so as to be perpendicular to the surface of the substrate 21 can be made to be relatively transparent after the transmission optical member 550 It is perpendicular to the surface of the substrate 21. Further, the optical member 550 includes a surface 550a that reflects light emitted from the second range display 510b toward the substrate 21. The surface 550a of the optical member 550 is configured such that the chief ray of the light reflected by the surface 550a is perpendicular to the surface of the substrate 21. Here, in the surfaces 550b and 550c of the optical member 550, in order to increase the transmittance of light, it is preferable to provide an anti-reflection film for preventing reflection of light, and the surface 550a of the optical member 550 is for reflecting light. The rate is increased, and it is preferable to provide a reflective film that reflects light.

在如此構成之檢測部500,第1範圍顯示器510a,係構成為:能以透射光學構材之光的焦點之高度不會改變的方式相對於光學構材550而相對移動。例如,檢測部500係包含將第1範圍顯示器510a驅動於X方向之驅動機構,該驅動機構係可藉控制部50而作控制。藉此,檢測部500,係可將從第1範圍顯示器510a所射出之光的照射位置與從第2範圍顯示器510b所射出之光的照射位置 之間的距離,依在X方向上相鄰的2個標示22a及22b之相對位置而變更。於此,照射位置,係指會照射從各範圍顯示器510a、510b所射出之光的基板上之位置。 In the detection unit 500 configured as described above, the first range display 510a is configured to be relatively movable with respect to the optical member 550 so that the height of the focus of the light transmitting the optical member does not change. For example, the detecting unit 500 includes a driving mechanism that drives the first range display 510a in the X direction, and the driving mechanism can be controlled by the control unit 50. Thereby, the detecting unit 500 can irradiate the irradiation position of the light emitted from the first range display 510a and the irradiation position of the light emitted from the second range display 510b. The distance between them is changed depending on the relative positions of the two adjacent marks 22a and 22b in the X direction. Here, the irradiation position refers to a position on the substrate that will illuminate the light emitted from each of the range displays 510a and 510b.

圖8,係從Y方向觀看第1實施形態的檢測系統100時之圖。在第1實施形態的檢測系統100,係如上述(圖7)的方式而構成之複數個檢測部500被沿著X方向而配置。此外,在檢測系統100,係為了對於配置在X方向(-X方向)的端邊之1個標示進行檢測,於複數個檢測部500之X方向側(-X方向側)配置如圖3的方式而構成之檢測部300。於此,例如,想像:如圖9所示,配置於在X方向上相鄰的2個射擊區域23a及23b之間的第1標示22a及第2標示22b之X方向的間隔為間隔24a之情況。此情況下,控制部50,係以從檢測部500a的第2範圍顯示器510b所射出之光照射於第2標示22b的方式而對於驅動部200進行控制,而使檢測部500a移動於X方向。然後,控制部50,係以從檢測部500a的第1範圍顯示器510a所射出之光照明於第1標示22a之方式對於驅動機構進行控制,而使第1範圍顯示器510a相對於光學構材550(第2範圍顯示器510b)而相對移動於X方向。藉此,可如圖7所示,將從第1範圍顯示器510a所射出之光的照射位置與從第2範圍顯示器510b所射出之光的照射位置之間的距離(X方向),作成第1標示22a與第2標示22b之X方向的間隔24a。此外,控制部50,係對於檢測部500a以外的檢測部500,如同檢測部500a而配 置第1範圍顯示器510a與第2範圍顯示器510b,將檢測部300,以檢測出配置在X方向(-X方向)的端邊之1個標示22的方式而配置。藉此,檢測系統100,係可對於在基板上沿著X方向而配列之複數個標示22同時進行檢測。 Fig. 8 is a view showing the detection system 100 of the first embodiment viewed from the Y direction. In the detection system 100 of the first embodiment, the plurality of detecting units 500 configured as described above (FIG. 7) are arranged along the X direction. Further, in the detection system 100, in order to detect one of the indications arranged in the X direction (-X direction), the X direction side (the -X direction side) of the plurality of detection sections 500 is arranged as shown in FIG. The detecting unit 300 is configured in a manner. Here, for example, as shown in FIG. 9, the interval between the first indicator 22a and the second indicator 22b disposed between the two shot regions 23a and 23b adjacent in the X direction in the X direction is the interval 24a. Happening. In this case, the control unit 50 controls the driving unit 200 so that the light emitted from the second range display 510b of the detecting unit 500a is irradiated onto the second indicator 22b, and moves the detecting unit 500a in the X direction. Then, the control unit 50 controls the drive mechanism so that the light emitted from the first range display 510a of the detecting unit 500a is illuminated by the first indicator 22a, and the first range display 510a is opposed to the optical member 550 ( The second range display 510b) is relatively moved in the X direction. Thereby, as shown in FIG. 7, the distance (X direction) between the irradiation position of the light emitted from the first range display 510a and the irradiation position of the light emitted from the second range display 510b can be made first. The interval 24a in the X direction between the mark 22a and the second mark 22b is indicated. Further, the control unit 50 is configured as the detection unit 500 other than the detection unit 500a as the detection unit 500a. The first range display 510a and the second range display 510b are disposed such that the detecting unit 300 detects one of the labels 22 disposed at the end sides in the X direction (−X direction). Thereby, the detection system 100 can simultaneously detect a plurality of indicia 22 arranged along the X direction on the substrate.

另一方面,例如,想像:如圖10所示,第1標示22a及第2標示22b的X方向之間隔為比示於圖9之間隔24a窄的間隔24b之情況。此情況下,控制部50,係以從檢測部500a的第2範圍顯示器510b所射出之光照明於第2標示22b的方式而對於驅動部200進行控制,而使檢測部500a移動於X方向。然後,控制部50,係以從檢測部500a的第1範圍顯示器510a所射出之光照明於第1標示22a之方式對於驅動機構進行控制,而使第1範圍顯示器510a相對於光學構材550(第2範圍顯示器510b)而相對移動於X方向。亦即,對於入射於光學構材550(透射部550d)的來自第1範圍顯示器510a之光的入射位置與在光學構材550之面550a被反射的來自第2範圍顯示器510b之光的反射位置之相對位置進行改變。此時,將第1範圍顯示器510a配置於比示於圖7之位置靠近第2範圍顯示器510b之位置。藉此,可如圖11所示,將從第1範圍顯示器510a所射出之光的照射位置與第2範圍顯示器510b所射出之光的照射位置之間隔(X方向),作成比間隔24a窄之間隔24b。如此,第1實施形態的檢測部500,係藉使第1範圍顯示器510a移動於X方向,而可使 2個範圍顯示器510a、510b之照射位置的間隔,對應於在X方向上相鄰的2個標示22a及55b之間隔。 On the other hand, for example, as shown in FIG. 10, the interval between the X direction of the first indicator 22a and the second indicator 22b is smaller than the interval 24b which is narrower than the interval 24a of FIG. In this case, the control unit 50 controls the drive unit 200 such that the light emitted from the second range display 510b of the detection unit 500a is illuminated by the second indicator 22b, and moves the detection unit 500a in the X direction. Then, the control unit 50 controls the drive mechanism so that the light emitted from the first range display 510a of the detecting unit 500a is illuminated by the first indicator 22a, and the first range display 510a is opposed to the optical member 550 ( The second range display 510b) is relatively moved in the X direction. That is, the incident position of the light from the first range display 510a incident on the optical member 550 (transmission portion 550d) and the reflection position of the light from the second range display 510b reflected on the surface 550a of the optical member 550 are The relative position is changed. At this time, the first range display 510a is disposed at a position closer to the second range display 510b than the position shown in FIG. Thereby, as shown in FIG. 11, the interval (X direction) between the irradiation position of the light emitted from the first range display 510a and the irradiation position of the light emitted from the second range display 510b can be made narrower than the interval 24a. Interval 24b. As described above, the detecting unit 500 of the first embodiment can move the first range display 510a in the X direction. The interval between the irradiation positions of the two range displays 510a and 510b corresponds to the interval between the two marks 22a and 55b adjacent in the X direction.

於此,在第1實施形態的檢測部500,係以在使從第1範圍顯示器510a所射出之光透射於光學構材550時該光不會從光學構材550之面550c露出的方式而使第1範圍顯示器510a移動於X方向較佳。亦即,從第1範圍顯示器510a所射出之光的照射位置與從第2範圍顯示器510b所射出之光的照射位置,係可接近至從第1範圍顯示器510a所射出之光不會從光學構材550之面550c的X方向之端部露出之程度。在另一方面,在擴大從第1範圍顯示器510a所射出之光的照射位置與從第2範圍顯示器510b所射出之光的照射位置之情況下,係可藉使光學構材550(面550b及550c)伸長於-X方向而應對。此外,第1實施形態的檢測部500,係第1範圍顯示器510a以相對於光學構材550作移動之方式而構成,但並非限定於該者,亦可構成為:光學構材550相對於第1範圍顯示器510a作移動。在此情況下,係第2範圍顯示器510b,可與光學構材550一起移動。此外,在光學構材550之面550a朝向Y方向,第2範圍顯示器510b具有延伸於Y方向之光軸,可移動於X方向之情況下,係亦可構成為僅使第2範圍顯示器作移動。此外,亦可在第1範圍顯示器510a和第2範圍顯示器510b的光程之中途設置光程彎曲鏡,將光程彎曲鏡構成為可移動。 Here, in the detecting unit 500 according to the first embodiment, when the light emitted from the first range display 510a is transmitted through the optical member 550, the light is not exposed from the surface 550c of the optical member 550. It is preferable to move the first range display 510a in the X direction. That is, the irradiation position of the light emitted from the first range display 510a and the irradiation position of the light emitted from the second range display 510b are close to the light emitted from the first range display 510a. The end of the surface 550c of the material 550 in the X direction is exposed. On the other hand, when the irradiation position of the light emitted from the first range display 510a and the irradiation position of the light emitted from the second range display 510b are enlarged, the optical member 550 (surface 550b and 550c) Elongate in the -X direction and respond. Further, the detecting unit 500 of the first embodiment is configured such that the first range display 510a moves relative to the optical member 550, but the invention is not limited thereto, and the optical member 550 may be configured to be opposed to the first The 1 range display 510a is moved. In this case, the second range display 510b can be moved together with the optical member 550. Further, when the surface 550a of the optical member 550 faces the Y direction, and the second range display 510b has an optical axis extending in the Y direction and is movable in the X direction, it may be configured to move only the second range display. . Further, an optical path bending mirror may be provided in the optical path of the first range display 510a and the second range display 510b, and the optical path bending mirror may be configured to be movable.

如上所述,第1實施形態的檢測部500,係包含:對 於標示22照射光,藉所反射之光而對於該標示22的位置進行檢測之第1範圍顯示器510a與第2範圍顯示器510b。然後,第1實施形態的檢測部500,係包含:使從第1範圍顯示器510a所射出之光以入射於基板21的方式而透射之透射部、及具有將從第2範圍顯示器510b所射出之光朝向基板21而反射之面550a的光學構材550。此外,檢測部500,係可依設置在基板上之2個標示22的X方向之間隔,而使第1範圍顯示器510a相對於光學構材550而相對移動於X方向。藉如此構成檢測部500,檢測部500,係例如,在X方向上相鄰的2個標示22的間隔為互相不同的基板間,仍可藉使第1範圍顯示器510a移動而對於該2個標示22同時進行檢測。 As described above, the detecting unit 500 of the first embodiment includes: The first range display 510a and the second range display 510b that detect the position of the mark 22 by the reflected light are indicated by the light. The detecting unit 500 according to the first embodiment includes a transmissive portion that transmits light emitted from the first range display 510a so as to be incident on the substrate 21, and has a light that is emitted from the second range display 510b. The optical member 550 of the surface 550a on which the light is directed toward the substrate 21. Further, the detecting unit 500 can relatively move the first range display 510a in the X direction with respect to the optical member 550 in accordance with the interval in the X direction of the two marks 22 provided on the substrate. By configuring the detecting unit 500 in this manner, for example, the interval between the two marks 22 adjacent in the X direction is different between the substrates, and the first range display 510a can be moved for the two marks. 22 simultaneous testing.

<第2實施形態> <Second embodiment>

說明有關於第2實施形態的檢測部600。第2實施形態的檢測部600,係構成為:與第1實施形態的檢測部500比較下,可使從第1範圍顯示器510a所射出之光的照射位置與從第2範圍顯示器510b所射出之光的照射位置更接近。 The detection unit 600 according to the second embodiment will be described. In the detection unit 600 of the second embodiment, the irradiation position of the light emitted from the first range display 510a and the emission from the second range display 510b can be made in comparison with the detection unit 500 of the first embodiment. The illumination position of the light is closer.

圖12,係繪示第2實施形態的檢測部600之構成的圖。在第2實施形態的檢測部600,係在光學構材550之面550a接合了稜鏡560。稜鏡560,係以例如玻璃等與光學構材550之材料相同的材料而製作較佳。接合於光學構材550之面550a的稜鏡560,係例如,可包含:連續於 光學構材550之面550c且平行於基板21的表面之面560a、及正交於第2範圍顯示器510b的光軸之面560b。藉此,如圖13所示,可使從第1範圍顯示器510a所射出之光透過光學構材550之面550a而照射於基板21。為此,第2實施形態的檢測部600,係可與第1實施形態的檢測部500比較下,使從第1範圍顯示器510a所射出之光的照射位置與從第2範圍顯示器510b所射出之光的照射位置更接近。變成亦可使從第1範圍顯示器510a所射出之光的照射位置與從第2範圍顯示器510b所射出之光的照射位置一致。藉此,即使在X方向上相鄰的標示22a與標示22b之間隔為比示於圖12之間隔24c窄的間隔24d,檢測部600仍可對於標示22a與標示22b同時進行檢測。 FIG. 12 is a view showing the configuration of the detecting unit 600 according to the second embodiment. In the detecting unit 600 of the second embodiment, the crucible 560 is joined to the surface 550a of the optical member 550. The crucible 560 is preferably made of the same material as the material of the optical member 550 such as glass. The crucible 560 bonded to the face 550a of the optical member 550, for example, may include: continuous The surface 560c of the optical member 550 is parallel to the surface 560a of the surface of the substrate 21 and the surface 560b orthogonal to the optical axis of the second range display 510b. Thereby, as shown in FIG. 13, the light emitted from the first range display 510a can be transmitted to the substrate 21 through the surface 550a of the optical member 550. Therefore, the detecting unit 600 according to the second embodiment can compare the irradiation position of the light emitted from the first range display 510a with the second range display 510b as compared with the detecting unit 500 of the first embodiment. The illumination position of the light is closer. It is also possible to match the irradiation position of the light emitted from the first range display 510a with the irradiation position of the light emitted from the second range display 510b. Thereby, even if the interval between the adjacent mark 22a and the mark 22b in the X direction is smaller than the interval 24d shown in the interval 24c of FIG. 12, the detecting portion 600 can simultaneously detect the mark 22a and the mark 22b.

在如此構成之檢測部600,係較佳為在光學構材550之面550a設置:在波段方面將反射與透射切開之分光膜、和在偏光特性方面將反射與透射切開之偏光分束膜。在光學構材550之面550a設置分光膜之情況下,係以從第1範圍顯示器510a所射出之光與從第2範圍顯示器510b所射出之光互相具有不同的波段之方式而構成各範圍顯示器510a及510b較佳。作為使從第1範圍顯示器510a與第2範圍顯示器510b所射出之光的波段互相不同之方法,係例如,存在:採用射出互相不同的波段之光的光源之方法、和採用使互相不同的波段之光透射的波長濾波器之方法等。此外,在光學構材550之面550a設置偏 光分束膜之情況下,係以從第1範圍顯示器510a所射出之光與從第2範圍顯示器510b所射出之光具有互相不同的偏光特性之方式而構成各範圍顯示器510a及510b較佳。例如,使從第1範圍顯示器510a所射出之光的偏光特性為S偏光及P偏光之中的一者,使從第2範圍顯示器510b所射出之光的偏光特性為S偏光及P偏光之中的另一者較佳。作為使從第1範圍顯示器510a與第2範圍顯示器510b所射出之光的偏光特性互相不同的方法,係例如,存在:以從各範圍顯示器510a、510b所射出之光成為期望的偏光特性的方式而在各範圍顯示器510a、510b配置偏光板之方法。 In the detection unit 600 configured as described above, it is preferable that the surface 550a of the optical member 550 is provided with a light-splitting film that cuts reflection and transmission in terms of a wavelength band, and a polarization beam splitting film that cuts reflection and transmission in terms of polarization characteristics. When a spectroscopic film is provided on the surface 550a of the optical member 550, each range of display is configured such that the light emitted from the first range display 510a and the light emitted from the second range display 510b have different wavelength bands from each other. 510a and 510b are preferred. As a method of making the wavelength bands of the light emitted from the first range display 510a and the second range display 510b different from each other, for example, there is a method of using a light source that emits light of a different wavelength band, and a wavelength band different from each other. A method of transmitting a wavelength filter of light or the like. In addition, a partial offset is provided on the surface 550a of the optical member 550. In the case of the optical splitting film, it is preferable that each of the range displays 510a and 510b is configured such that the light emitted from the first range display 510a and the light emitted from the second range display 510b have mutually different polarization characteristics. For example, the polarization characteristic of the light emitted from the first range display 510a is one of S-polarized light and P-polarized light, and the polarization characteristics of the light emitted from the second range display 510b are S-polarized and P-polarized. The other one is better. The method of making the polarization characteristics of the light emitted from the first range display 510a and the second range display 510b different from each other is, for example, a method in which the light emitted from each of the range displays 510a and 510b has a desired polarization characteristic. A method of arranging a polarizing plate on each of the range displays 510a and 510b.

如上所述,第2實施形態的檢測部600,係於光學構材550之面550a使稜鏡560接合,使從第1範圍顯示器510a與第2範圍顯示器510b所射出之光的特性(波段或偏光特性)互相不同。藉此,第2實施形態的檢測部600,係與第1實施形態的檢測部500比較下,可使從第1範圍顯示器510a所射出之光的照射位置與從第2範圍顯示器510b所射出之光的照射位置更接近。 As described above, the detecting unit 600 of the second embodiment is configured to bond the crucible 560 to the surface 550a of the optical member 550, and to make the characteristics of the light emitted from the first range display 510a and the second range display 510b (band or The polarization characteristics are different from each other. As a result, the detecting unit 600 according to the second embodiment can detect the irradiation position of the light emitted from the first range display 510a and the second range display 510b as compared with the detecting unit 500 of the first embodiment. The illumination position of the light is closer.

<第3實施形態> <Third embodiment>

說明有關於第3實施形態的檢測部700。第3實施形態的檢測部700,係可包含:4個範圍顯示器520a~520d、及具有將從各範圍顯示器520a~520d所射出之光分別作反射的4個面580a~580d之光學構材580。然 後,檢測部700,係可藉使光學構材580移動於成為與基板21的表面垂直之方向,而對於從各範圍顯示器520a~520d所射出之光的照射位置之間隔進行變更。 The detection unit 700 according to the third embodiment will be described. The detecting unit 700 according to the third embodiment may include four range displays 520a to 520d and optical members 580 having four faces 580a to 580d that reflect light emitted from the respective range displays 520a to 520d. . Of course Thereafter, the detecting unit 700 changes the interval between the irradiation positions of the light emitted from the respective range displays 520a to 520d by moving the optical member 580 in a direction perpendicular to the surface of the substrate 21.

圖14,係從Y方向觀看第3實施形態的檢測部700時之圖,繪示了4個範圍顯示器520之中2個範圍顯示器520(第1範圍顯示器520a及第2範圍顯示器520b)。此外,圖15,係從Z方向觀看第3實施形態的檢測部700時之圖,繪示了4個範圍顯示器520(第1範圍顯示器520a、第2範圍顯示器520b、第3範圍顯示器520c及第4範圍顯示器520d)。各範圍顯示器520,係如同示於圖3之範圍顯示器310,例如,可分別包含:發光部、光學系統、分束器523、孔徑光欄、接物鏡525、中繼透鏡526、攝像元件527。在圖14及圖15,係將各範圍顯示器之發光部、光學系統、孔徑光欄的圖示分別作省略。 FIG. 14 is a view showing the detection unit 700 of the third embodiment viewed from the Y direction, and shows two range displays 520 (the first range display 520a and the second range display 520b) among the four range displays 520. In addition, FIG. 15 is a view showing the detection unit 700 of the third embodiment viewed from the Z direction, and shows four range displays 520 (first range display 520a, second range display 520b, third range display 520c, and 4 range display 520d). Each range display 520 is similar to the range display 310 shown in FIG. 3. For example, it may include a light emitting unit, an optical system, a beam splitter 523, an aperture stop, an objective lens 525, a relay lens 526, and an imaging element 527. In FIGS. 14 and 15, the illustrations of the light-emitting portion, the optical system, and the aperture diaphragm of each range display are omitted.

光學構材580,係可構成為:具有將從各範圍顯示器520a~520d所射出之光朝向基板21而反射之4個面580a~580d的四角錐之形狀。在圖14中,係繪示:在光學構材580,將從第1範圍顯示器520a所射出之光作反射之面580a(第1面)、及將從第2範圍顯示器520b所射出之光作反射之面580b(第2面)。此外,在圖14中,係繪示:將從第3範圍顯示器520c所射出之光作反射之面580c。如此構成之檢測部700,係可藉各範圍顯示器520a~520d,而如圖15所示,對於在基板上相鄰的標示22e~22h同時進行檢測。 The optical member 580 may have a quadrangular pyramid shape having four faces 580a to 580d that reflect light emitted from the respective range displays 520a to 520d toward the substrate 21. In FIG. 14, the optical member 580 is a surface 580a (first surface) for reflecting light emitted from the first range display 520a, and light emitted from the second range display 520b. Reflected surface 580b (second surface). In addition, in FIG. 14, the surface 580c which reflects the light emitted from the 3rd range display 520c is shown. The detecting unit 700 configured as described above can simultaneously detect the adjacent marks 22e to 22h on the substrate by using the range displays 520a to 520d.

在如此構成之第3實施形態的檢測部700,係光學構材580構成為可移動於與基板21的表面正交之方向(Z方向)。例如,檢測部700係包含將光學構材580驅動於Z方向之驅動機構,該驅動機構係可藉控制部50而作控制。藉此,檢測部700,係可將從各範圍顯示器520a~520d所射出之光的照射位置之間隔依相鄰的4個標示之相對位置而變更。例如,想像:如圖16所示使光學構材580移動於Z方向之情況。此情況下,可將從第1範圍顯示器520a所射出之光的照射位置與從第2範圍顯示器520b所射出之光的照射位置之間隔,從示於圖14之間隔24e窄化成示於圖16之間隔24g。此外,如從Z方向觀看使光學構材580移動於Z方向時之檢測部700時的圖17所示,可藉使光學構材580移動於Z方向,使從各範圍顯示器520a~520d所射出之光的照射位置之間隔窄化。因此,檢測部700,係可藉使光學構材580移動於Z方向,而對於以比示於圖15之4個標示22e~22h窄的間隔而配置之4個標示22i~22l同時進行檢測。 In the detecting unit 700 of the third embodiment configured as described above, the optical member 580 is configured to be movable in a direction (Z direction) orthogonal to the surface of the substrate 21. For example, the detecting unit 700 includes a driving mechanism that drives the optical member 580 in the Z direction, and the driving mechanism can be controlled by the control unit 50. Thereby, the detecting unit 700 can change the interval between the irradiation positions of the light beams emitted from the respective range displays 520a to 520d in accordance with the relative positions of the four adjacent marks. For example, imagine a case where the optical member 580 is moved in the Z direction as shown in FIG. In this case, the interval between the irradiation position of the light emitted from the first range display 520a and the irradiation position of the light emitted from the second range display 520b can be narrowed from the interval 24e shown in FIG. 14 to be shown in FIG. The interval is 24g. Further, as shown in FIG. 17 when the optical member 580 is moved in the Z direction from the Z direction, as shown in FIG. 17 , the optical member 580 can be moved in the Z direction to be emitted from the respective range displays 520a to 520d. The interval between the irradiation positions of the light is narrowed. Therefore, the detecting unit 700 can simultaneously detect the four marks 22i to 22l arranged at intervals narrower than the four marks 22e to 22h shown in FIG. 15 by moving the optical member 580 in the Z direction.

如上所述,第3實施形態的檢測部700,係可包含:4個範圍顯示器520a~520d、及具有將從各範圍顯示器520a~520d所射出之光朝向基板21而反射之4個面580a~580d的光學構材580。依如此之構成,檢測部700,係可藉使光學構材580移動於Z方向,而使從各範圍顯示器520a~520d所射出之光的照射位置之間隔作變更。為此,即使相鄰的4個標示之間隔為互相不同的基板間,仍 可藉使光學構材580移動於Z方向而對於該4個標示同時進行檢測。於此,在第3實施形態,係說明有關於在檢測部700包含4個範圍顯示器520a~520d之情況,但並非限定於此者。例如,在檢測部700包含2個或3個範圍顯示器520之情況下,或在包含5個以上的範圍顯示器520之情況下皆可應用本發明。 As described above, the detecting unit 700 of the third embodiment may include four range displays 520a to 520d and four faces 580a that have light reflected from the range displays 520a to 520d toward the substrate 21. 580d optical member 580. According to this configuration, the detecting unit 700 can change the interval of the irradiation position of the light emitted from each of the range displays 520a to 520d by moving the optical member 580 in the Z direction. For this reason, even if the adjacent four mark intervals are between mutually different substrates, The four markers can be simultaneously detected by moving the optical member 580 in the Z direction. Here, in the third embodiment, the case where the four range displays 520a to 520d are included in the detecting unit 700 is described, but the present invention is not limited thereto. For example, the present invention can be applied in the case where the detecting unit 700 includes two or three range displays 520, or in the case where five or more range displays 520 are included.

<物品之製造方法的實施形態> <Embodiment of Manufacturing Method of Article>

本發明之實施形態相關的物品之製造方法,係例如,適合於製造半導體裝置等之具有微型裝置和微細構造的元件等之物品。本實施形態的物品之製造方法,係包含:使用上述的光刻裝置(曝光裝置和壓印裝置、描繪裝置等)而將原版的圖案轉印於基板之程序、及對於在如此之程序轉印了圖案之基板進行加工之程序。再者,如此之製造方法,係包含其他周知之程序(氧化、成膜、蒸鍍、摻雜、平坦化、蝕刻、抗蝕層剝離、切割、接合、封裝等)。本實施形態的物品之製造方法,係相較於歷來的方法,有利於物品之性能/品質/生產率/生產成本中之至少1者。 The method for producing an article according to the embodiment of the present invention is, for example, an article suitable for manufacturing a semiconductor device or the like having a micro device and a fine structure. The method for producing an article according to the present embodiment includes a procedure of transferring a pattern of a master to a substrate by using the above-described photolithography apparatus (exposure apparatus, imprint apparatus, drawing apparatus, etc.), and transferring to such a program The process of processing the substrate of the pattern. Further, such a manufacturing method includes other well-known procedures (oxidation, film formation, vapor deposition, doping, planarization, etching, resist peeling, dicing, bonding, encapsulation, etc.). The method for producing an article according to the present embodiment is advantageous for at least one of performance, quality, productivity, and production cost of the article compared to the conventional method.

以上,雖說明有關於本發明之較佳實施形態,惟本發明理當不限定於此等實施形態,在其要旨之範圍內,可作各種的變化及變更。 The present invention has been described with reference to the preferred embodiments of the present invention. However, the present invention is not limited thereto, and various changes and modifications can be made therein.

21‧‧‧基板 21‧‧‧Substrate

22a,b‧‧‧標示 22a, b‧‧‧ marked

24a,b‧‧‧間隔 24a, b‧‧‧ interval

503‧‧‧分束器 503‧‧‧beam splitter

505‧‧‧接物鏡 505‧‧‧ Sightpiece

506‧‧‧中繼透鏡 506‧‧‧Relay lens

507‧‧‧攝像元件 507‧‧‧Photographic components

510a‧‧‧第1範圍顯示器 510a‧‧‧1st range display

510b‧‧‧第2範圍顯示器 510b‧‧‧2nd range display

550a~c‧‧‧面 550a~c‧‧‧ face

550d‧‧‧透射部 550d‧‧‧Transmission Department

Claims (18)

一種檢測裝置,對於設置在基板之複數個標示進行檢測,特徵在於:包含:前述複數個標示之中對於第1標示照射第1光,藉在前述第1標示所反射之光而對於前述第1標示進行檢測之第1範圍顯示器;前述複數個標示之中對於與前述第1標示不同的第2標示照射第2光,藉在前述第2標示所反射之光而對於前述第2標示進行檢測之第2範圍顯示器;以及具有使前述第1光透射以入射於前述基板之透射部、及將前述第2光朝向前述基板而反射之面的光學構材;對於入射於前述光學構材的前述第1光的入射位置與在前述光學構材之前述面所反射的前述第2光的反射位置之相對位置作改變,使得前述第1光透射過前述透射部而照射之前述基板上的位置與前述第2光在前述面所反射而照射之前述基板上的位置之間的距離改變。 A detecting device for detecting a plurality of marks provided on a substrate, comprising: illuminating the first light with respect to the first mark among the plurality of marks, and the first light is reflected by the first mark a first range display for detecting the detection; wherein the second indicator is different from the first indicator different from the first indicator, and the second indicator is detected by the light reflected by the second indicator. a second range display; and an optical member having a transmissive portion that transmits the first light to be incident on the substrate and a surface that reflects the second light toward the substrate; and the first portion incident on the optical member a position at which the incident position of the light is changed from a position at which the second light is reflected by the surface of the optical member is changed, and a position on the substrate on which the first light is transmitted through the transmitting portion and the aforementioned The distance between the positions of the second light reflected on the surface and irradiated on the substrate is changed. 如申請專利範圍第1項之檢測裝置,其中,前述光學構材,係構成為:透射過前述透射部後之前述第1光的主光線、及在前述面所反射後之前述第2光的主光線成為平行。 The detecting device according to claim 1, wherein the optical member is configured to: a principal ray of the first light transmitted through the transmitting portion, and a second ray reflected by the surface The chief rays become parallel. 如申請專利範圍第1項之檢測裝置,其中,前述光學構材,係構成為:透射過前述光學構材後之前述第1光的主光線、及在前述面所反射後之前述第2光的主光線 分別成為相對於前述基板的表面而垂直。 The detecting device according to claim 1, wherein the optical member is configured to: a principal ray of the first light transmitted through the optical member, and a second ray reflected on the surface Main light They are perpendicular to the surface of the substrate, respectively. 如申請專利範圍第1項之檢測裝置,其中,前述光學構材之前述面,係構成為:使從前述第1範圍顯示器所射出之前述第1光透射,且將從前述第2範圍顯示器所射出之前述第2光反射。 The detecting device according to claim 1, wherein the optical member has a surface configured to transmit the first light emitted from the first range display and to be displayed from the second range display The aforementioned second light reflection is emitted. 如申請專利範圍第4項之檢測裝置,其中,前述第1光及前述第2光,係具有互相不同的偏光特性,在前述光學構材之前述面,係設有依光的偏光特性使光反射或透射的偏光分束膜。 The detecting device according to claim 4, wherein the first light and the second light have mutually different polarization characteristics, and the polarizing property of the light is made on the surface of the optical member. A polarizing beam splitting film that is reflected or transmitted. 如申請專利範圍第1項之檢測裝置,其中,前述第1光係前述第1波段中的光,前述第2光係與前述第1波段不同的波段中的光,在前述光學構材之前述面,係設有依波段而使光反射或透射的分光膜。 The detection device according to the first aspect of the invention, wherein the first light-based light in the first wavelength band and the second light-based light in a wavelength band different from the first wavelength band are in the optical member The surface is provided with a spectroscopic film that reflects or transmits light according to the wavelength band. 如申請專利範圍第1項之檢測裝置,其中,在前述光學構材之前述面,係設有將從前述第2範圍顯示器所射出之光反射的反射膜。 The detecting device according to claim 1, wherein the reflecting surface of the optical member is provided with a reflecting film that reflects light emitted from the display of the second range. 如申請專利範圍第1項之檢測裝置,其中,前述第1範圍顯示器,係以透射過前述透射部之光的焦點之高度不變的方式相對於前述光學構材而相對移動。 The detecting device according to the first aspect of the invention, wherein the first range display is relatively moved relative to the optical member such that a height of a focus of light transmitted through the transmitting portion does not change. 如申請專利範圍第1項之檢測裝置,其中,前述第1範圍顯示器,係以其光軸成為垂直於前述基板的表面之方式而配置,前述第2範圍顯示器,係以前述第1範圍顯示器的光 軸與前述第2範圍顯示器的光軸之間的角度成為不足90度之方式而配置。 The detecting device according to claim 1, wherein the first range display is disposed such that an optical axis thereof is perpendicular to a surface of the substrate, and the second range display is the first range display Light The angle between the axis and the optical axis of the second range display is set to be less than 90 degrees. 如申請專利範圍第1項之檢測裝置,其中,在前述光學構材之前述面接合了稜鏡。 The detecting device of claim 1, wherein the surface of the optical member is joined to the surface. 如申請專利範圍第1項之檢測裝置,其中,在前述第1標示與前述第2標示牌列的方向上,將入射於前述光學構材的前述第1光的入射位置與在前述光學構材的前述面所反射的前述第2光的反射位置的相對位置作改變,使得前述第1光透射過前述透射部而照射的前述基板上的位置與前述第2光在前述面所反射而照射的前述基板上的位置之間的距離改變。 The detecting device according to claim 1, wherein an incident position of the first light incident on the optical member and the optical member are in a direction of the first indicator and the second indicator card row The relative position of the reflection position of the second light reflected by the surface is changed such that the position on the substrate on which the first light is transmitted through the transmission portion and the second light are reflected on the surface and irradiated The distance between the positions on the aforementioned substrate changes. 如申請專利範圍第11項之檢測裝置,其中,使前述第1範圍顯示器移動於前述方向,從而改變入射於前述光學構材的前述第1光的入射位置與在前述光學構材的前述面所反射的前述第2光的反射位置的前述方向上的相對位置。 The detecting device according to claim 11, wherein the first range display is moved in the direction to change an incident position of the first light incident on the optical member and the surface of the optical member The relative position in the aforementioned direction of the reflected position of the reflected second light. 如申請專利範圍第11項之檢測裝置,其中,使前述光學構材移動於前述方向,從而改變入射於前述光學構材的前述第1光的入射位置與在前述光學構材的前述面所反射的前述第2光的反射位置的前述方向上的相對位置。 The detecting device of claim 11, wherein the optical member is moved in the direction to change an incident position of the first light incident on the optical member and reflected on a surface of the optical member The relative position in the aforementioned direction of the reflection position of the second light. 如申請專利範圍第1項之檢測裝置,其中,前述面係相對於前述基板而斜向配置,前述光學構材的前述第1光所入射之面,係沿著前述 基板而配置。 The detecting device according to claim 1, wherein the surface is obliquely arranged with respect to the substrate, and a surface on which the first light of the optical member enters is along the surface Arranged on the substrate. 如申請專利範圍第1項之檢測裝置,其中,前述基板係具有複數個射擊區域,前述第1標示及前述第2標示係設於彼此相鄰的射擊區域之間。 The detecting device according to claim 1, wherein the substrate has a plurality of shooting regions, and the first indicator and the second indicator are disposed between shot regions adjacent to each other. 如申請專利範圍第1項之檢測裝置,其進一步包含:變更前述第1範圍顯示器與前述光學構材的相對位置的變更部;以及依前述第1標示與前述第2標示的相對位置,以前述第1光照射於前述第1標示且前述第2光照射於前述第2標示的方式控制前述變更部的控制部。 The detecting device according to claim 1, further comprising: a changing unit that changes a relative position between the first range display and the optical member; and a relative position between the first indicator and the second indicator, The control unit that controls the change unit is configured such that the first light is irradiated onto the first indicator and the second light is irradiated on the second indicator. 一種光刻裝置,在基板形成圖案,特徵在於:包含如申請專利範圍第1至16項之對於設於前述基板之複數個標示進行檢測的檢測裝置。 A lithographic apparatus for patterning a substrate, comprising: a detecting device for detecting a plurality of marks provided on the substrate as set forth in claims 1 to 16. 一種製造裝置之製造方法,特徵在於:包含:使用光刻裝置而在基板形成圖案之程序;以及對於在前述程序形成了前述圖案之前述基板進行加工之程序;前述光刻裝置,係包含:對於設置在前述基板之複數個標示進行檢測的檢測裝置,前述檢測裝置,係包含:前述複數個標示之中對於第1標示照射第1光,藉在前述第1標示所反射之光而對於前述第1標示進行檢測之 第1範圍顯示器;前述複數個標示之中對於與前述第1標示不同的第2標示照射第2光,藉在前述第2標示所反射之光而對於前述第2標示進行檢測之第2範圍顯示器;以及具有使前述第1光透射以入射於前述基板之透射部、及將前述第2光朝向前述基板而反射之面的光學構材;對於入射於前述光學構材的前述第1光的入射位置與在前述光學構材之前述面所反射的前述第2光的反射位置之相對位置作改變,使得前述第1光透射過前述透射部而照射之前述基板上的位置與前述第2光在前述面所反射而照射之前述基板上的位置之間的距離改變。 A manufacturing method of a manufacturing apparatus, comprising: a program for forming a pattern on a substrate using a lithography apparatus; and a program for processing the substrate on which the pattern is formed by the program; and the lithographic apparatus includes: a detecting device for detecting a plurality of indications on the substrate, wherein the detecting device includes: the first indicator illuminating the first light with respect to the first indicator, and the light reflected by the first indicator 1 marked for testing a first range display; wherein the second indicator that emits the second light from the second indicator different from the first indicator among the plurality of labels, and the second range display that detects the second indicator by the light reflected by the second indicator And an optical member having a transmissive portion that transmits the first light to be incident on the substrate and a surface that reflects the second light toward the substrate; and incident on the first light incident on the optical member a position is changed between a position of the reflection position of the second light reflected by the surface of the optical member, and a position of the first light transmitted through the transmission portion on the substrate and the second light is changed The distance between the positions on the aforementioned substrate reflected by the aforementioned surface changes.
TW103126742A 2013-10-08 2014-08-05 A detection device, a lithographic apparatus, and a manufacturing method of the device TWI557517B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013211430A JP6228420B2 (en) 2013-10-08 2013-10-08 Detection apparatus, lithographic apparatus, and article manufacturing method

Publications (2)

Publication Number Publication Date
TW201514634A TW201514634A (en) 2015-04-16
TWI557517B true TWI557517B (en) 2016-11-11

Family

ID=52791741

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103126742A TWI557517B (en) 2013-10-08 2014-08-05 A detection device, a lithographic apparatus, and a manufacturing method of the device

Country Status (4)

Country Link
JP (1) JP6228420B2 (en)
KR (2) KR101783514B1 (en)
CN (1) CN104516214B (en)
TW (1) TWI557517B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6926596B2 (en) * 2017-03-31 2021-08-25 ウシオ電機株式会社 Exposure equipment and exposure method
US20220100109A1 (en) * 2018-12-20 2022-03-31 Asml Holding N.V. Apparatus for and method of simultaneously acquiring parallel alignment marks

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120099107A1 (en) * 2010-10-25 2012-04-26 Samsung Electronics Co., Ltd. Workpiece Alignment Device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0721586B2 (en) * 1985-09-30 1995-03-08 株式会社ニコン Image forming optics
JPS62262426A (en) * 1986-05-09 1987-11-14 Canon Inc Exposure device
US5148214A (en) * 1986-05-09 1992-09-15 Canon Kabushiki Kaisha Alignment and exposure apparatus
JP3074579B2 (en) * 1992-01-31 2000-08-07 キヤノン株式会社 Position shift correction method
KR100464854B1 (en) * 2002-06-26 2005-01-06 삼성전자주식회사 Method for aligning of wafer and apparatus for same
US7388663B2 (en) * 2004-10-28 2008-06-17 Asml Netherlands B.V. Optical position assessment apparatus and method
WO2007094407A1 (en) * 2006-02-16 2007-08-23 Nikon Corporation Exposure apparatus, exposing method, and device manufacturing method
KR101423017B1 (en) * 2006-08-31 2014-07-28 가부시키가이샤 니콘 Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
CN101526750B (en) * 2009-01-13 2011-06-29 上海微电子装备有限公司 Alignment system for photolithographic device and photolithographic device applying same
CN101950132A (en) * 2010-08-17 2011-01-19 中国科学院光电技术研究所 Device for measuring clearance between mask and silicon chip and leveling mask and silicon chip in nanolithography
CN102141738B (en) * 2011-04-02 2012-09-19 中国科学院光电技术研究所 Nanometer-level automatic focusing system for projection lithography
US8842294B2 (en) * 2011-06-21 2014-09-23 Canon Kabushiki Kaisha Position detection apparatus, imprint apparatus, and position detection method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120099107A1 (en) * 2010-10-25 2012-04-26 Samsung Electronics Co., Ltd. Workpiece Alignment Device

Also Published As

Publication number Publication date
KR101783514B1 (en) 2017-09-29
KR20150041579A (en) 2015-04-16
JP2015076491A (en) 2015-04-20
CN104516214B (en) 2017-04-26
KR101828739B1 (en) 2018-02-12
CN104516214A (en) 2015-04-15
JP6228420B2 (en) 2017-11-08
KR20170016421A (en) 2017-02-13
TW201514634A (en) 2015-04-16

Similar Documents

Publication Publication Date Title
JP6341883B2 (en) Position detection apparatus, position detection method, imprint apparatus, and article manufacturing method
US8159649B2 (en) Exposure method, exposure apparatus, photomask and method for manufacturing photomask
JP5630628B2 (en) Surface position detection apparatus, surface position detection method, exposure apparatus, and device manufacturing method
TWI461858B (en) Surface position detection device, exposure device, surface position detection method and device production method
US8922786B2 (en) Detector, imprint apparatus, and article manufacturing method
TWI432910B (en) Surface position detecting device, exposure device and component manufacturing method
TW200842511A (en) Position detection apparatus and exposure apparatus
JP2010066256A (en) Plane position detection apparatus, exposure system, method for detecting plane position, and method for manufacturing device
KR101573572B1 (en) Imprint apparatus, article manufacturing method and pattern transfer method
JP7414576B2 (en) Position measuring device, overlay inspection device, position measuring method, imprint device, and article manufacturing method
JP2000081320A (en) Face position detector and fabrication of device employing it
JP7152877B2 (en) Detection apparatus, lithography apparatus and article manufacturing method
JPH0566109A (en) Position detecting device
TWI557517B (en) A detection device, a lithographic apparatus, and a manufacturing method of the device
TW200307182A (en) Exposing method, exposing device and manufacturing method for device
KR101760843B1 (en) Mask alignment mark, photomask, exposure apparatus, exposure method, and manufacturing method of device
JP2017092294A (en) Imprinting device, mold, and manufacturing method for article
JP5401770B2 (en) Surface position detection apparatus, exposure apparatus, and device manufacturing method
WO2013168456A1 (en) Surface position measurement device, exposure device, and device production method
JP2020122922A (en) Light source device, illuminating device, exposure device and manufacturing method of articles
JP2014229803A (en) Surface position measuring device, exposure device and device manufacturing method
JP2011114209A (en) Projection exposure device
TW200937145A (en) Surface position detecting device, exposure apparatus, and device manufacturing method
JP2002122412A (en) Position detection device, exposure device and manufacturing method of microdevice
JPH06302504A (en) Alignment device