JP2015002208A5 - - Google Patents
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- Publication number
- JP2015002208A5 JP2015002208A5 JP2013124847A JP2013124847A JP2015002208A5 JP 2015002208 A5 JP2015002208 A5 JP 2015002208A5 JP 2013124847 A JP2013124847 A JP 2013124847A JP 2013124847 A JP2013124847 A JP 2013124847A JP 2015002208 A5 JP2015002208 A5 JP 2015002208A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- vertical
- flow path
- ejection hole
- ejected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000007789 gas Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013124847A JP6199619B2 (ja) | 2013-06-13 | 2013-06-13 | 気相成長装置 |
| TW103117491A TWI574306B (zh) | 2013-06-13 | 2014-05-19 | Gas growth device |
| US14/301,703 US9803282B2 (en) | 2013-06-13 | 2014-06-11 | Vapor phase growth apparatus |
| KR1020140072118A KR101699815B1 (ko) | 2013-06-13 | 2014-06-13 | 기상 성장 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013124847A JP6199619B2 (ja) | 2013-06-13 | 2013-06-13 | 気相成長装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015002208A JP2015002208A (ja) | 2015-01-05 |
| JP2015002208A5 true JP2015002208A5 (enExample) | 2016-06-30 |
| JP6199619B2 JP6199619B2 (ja) | 2017-09-20 |
Family
ID=52018122
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013124847A Active JP6199619B2 (ja) | 2013-06-13 | 2013-06-13 | 気相成長装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9803282B2 (enExample) |
| JP (1) | JP6199619B2 (enExample) |
| KR (1) | KR101699815B1 (enExample) |
| TW (1) | TWI574306B (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6199619B2 (ja) * | 2013-06-13 | 2017-09-20 | 株式会社ニューフレアテクノロジー | 気相成長装置 |
| KR102215965B1 (ko) * | 2014-04-11 | 2021-02-18 | 주성엔지니어링(주) | 가스 분사 장치 및 이를 포함하는 기판 처리 장치 |
| JP6193284B2 (ja) * | 2015-03-18 | 2017-09-06 | 株式会社東芝 | 流路構造、吸排気部材、及び処理装置 |
| US10438795B2 (en) | 2015-06-22 | 2019-10-08 | Veeco Instruments, Inc. | Self-centering wafer carrier system for chemical vapor deposition |
| NL2015215B1 (en) | 2015-07-23 | 2017-02-08 | Meyer Burger (Netherlands) B V | Programmable deposition apparatus. |
| USD810705S1 (en) | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
| USD819580S1 (en) | 2016-04-01 | 2018-06-05 | Veeco Instruments, Inc. | Self-centering wafer carrier for chemical vapor deposition |
| US20180077437A1 (en) * | 2016-09-09 | 2018-03-15 | Barrie Hansen | Parallel Video Streaming |
| JP2018107156A (ja) * | 2016-12-22 | 2018-07-05 | 株式会社ニューフレアテクノロジー | 気相成長装置及び気相成長方法 |
| TWI754765B (zh) * | 2017-08-25 | 2022-02-11 | 美商應用材料股份有限公司 | 用於磊晶沉積製程之注入組件 |
| US11149350B2 (en) * | 2018-01-10 | 2021-10-19 | Asm Ip Holding B.V. | Shower plate structure for supplying carrier and dry gas |
| CN108195607A (zh) * | 2018-02-02 | 2018-06-22 | 中国科学院西安光学精密机械研究所 | 一种火星表面环境模拟试验装置及方法 |
| KR102641752B1 (ko) * | 2018-11-21 | 2024-03-04 | 삼성전자주식회사 | 가스 주입 모듈, 기판 처리 장치, 및 그를 이용한 반도체 소자의 제조방법 |
| TW202146691A (zh) * | 2020-02-13 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | 氣體分配總成、噴淋板總成、及調整至反應室之氣體的傳導率之方法 |
| TW202147492A (zh) * | 2020-06-03 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | 噴淋板、基板處理裝置、基板處理方法 |
| CN120138791A (zh) * | 2023-12-12 | 2025-06-13 | 中微半导体设备(上海)股份有限公司 | 一种进气装置及气相沉积设备 |
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-
2013
- 2013-06-13 JP JP2013124847A patent/JP6199619B2/ja active Active
-
2014
- 2014-05-19 TW TW103117491A patent/TWI574306B/zh active
- 2014-06-11 US US14/301,703 patent/US9803282B2/en active Active
- 2014-06-13 KR KR1020140072118A patent/KR101699815B1/ko active Active
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